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Publication numberUSD590430 S1
Publication typeGrant
Application numberUS 29/300,533
Publication date14 Apr 2009
Filing date7 Apr 2008
Priority date7 Apr 2008
Publication number29300533, 300533, US D590430 S1, US D590430S1, US-S1-D590430, USD590430 S1, USD590430S1
InventorsChih-Cheng Shiue
Original AssigneeQbas Co., Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Diving mask
US D590430 S1
Abstract  available in
Images(4)
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Claims(1)
  1. The ornamental design for a diving mask, as shown and described.
Description

FIG. 1 is a perspective view of a diving mask showing the new design;

FIG. 2 is a top view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a rear view thereof;

FIG. 6 is a left side view thereof; and,

FIG. 7 is a right side view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US20080196714 *21 Feb 200721 Aug 2008Qds Injection Molding Llc.Dive mask with flexible portions on sides of nose enclosure
USD785076 *6 Nov 201525 Apr 2017Shine Ball Enterprise Co., Ltd.Diving mask
Classifications
U.S. ClassificationD16/312, D16/303