Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.


  1. Advanced Patent Search
Publication numberUSD590430 S1
Publication typeGrant
Application numberUS 29/300,533
Publication date14 Apr 2009
Filing date7 Apr 2008
Priority date7 Apr 2008
Publication number29300533, 300533, US D590430 S1, US D590430S1, US-S1-D590430, USD590430 S1, USD590430S1
InventorsChih-Cheng Shiue
Original AssigneeQbas Co., Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Diving mask
US D590430 S1
Abstract  available in
Previous page
Next page
  1. The ornamental design for a diving mask, as shown and described.

FIG. 1 is a perspective view of a diving mask showing the new design;

FIG. 2 is a top view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a rear view thereof;

FIG. 6 is a left side view thereof; and,

FIG. 7 is a right side view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US20080196714 *21 Feb 200721 Aug 2008Qds Injection Molding Llc.Dive mask with flexible portions on sides of nose enclosure
USD785076 *6 Nov 201525 Apr 2017Shine Ball Enterprise Co., Ltd.Diving mask
U.S. ClassificationD16/312, D16/303