EP1103985A3 - Optical focusing device and measuring system - Google Patents

Optical focusing device and measuring system Download PDF

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Publication number
EP1103985A3
EP1103985A3 EP00125565A EP00125565A EP1103985A3 EP 1103985 A3 EP1103985 A3 EP 1103985A3 EP 00125565 A EP00125565 A EP 00125565A EP 00125565 A EP00125565 A EP 00125565A EP 1103985 A3 EP1103985 A3 EP 1103985A3
Authority
EP
European Patent Office
Prior art keywords
rays
measuring system
optical element
sample
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP00125565A
Other languages
German (de)
French (fr)
Other versions
EP1103985A2 (en
Inventor
Lutz Dr. Kipp
Ralph Dr. Seemann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
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Individual
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Publication date
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Publication of EP1103985A2 publication Critical patent/EP1103985A2/en
Publication of EP1103985A3 publication Critical patent/EP1103985A3/en
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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Abstract

Die Erfindung betrifft ein optisches Element zur Fokussierung von elektromagnetischen Strahlen (20, 21) oder Strahlen von Elementarteilchen, insbesondere von Röntgenstrahlen, umfassend eine Fresnelsche Zonenplatte (30) mit Ringzonen, die durchlässig für die Strahlen (20, 21) sind und Ringzonen, die für die Strahlen (20, 21) un-durchlässig sind und ferner ein Meßsystem, insbesondere zum Vermessen von inneren Bereichen dreidimensionaler Proben mit hoher Ortsauflösung und einer Apparatur zur Veränderung der physikalischen, chemischen und/oder biologischen Eigenschaften eines Bereichs einer Probe, insbesondere eines Innenbereichs einer Probe. Die Erfindung zeichnet sich dadurch aus, daß das optische Element dadurch weitergebildet ist, daß die für die Strahlen (20, 21) durchlässigen Ringzonen der Fresnelschen Zonenplatte (30) teilweise für die Strahlen (20, 21) undurchlässig sind. Die Erfindung zeichnet sich ferner dadurch aus. daß das Meßsystem und die Apparatur zur Veränderung der Eigenschaften eines Bereichs einer Probe wenigstens ein entsprechendes optisches Element umfassen.

Figure 00000001
The invention relates to an optical element for focusing electromagnetic rays (20, 21) or rays from elementary particles, in particular X-rays, comprising a Fresnel zone plate (30) with ring zones that are transparent to the rays (20, 21) and ring zones that are impermeable to the rays (20, 21) and also a measuring system, in particular for measuring internal areas of three-dimensional samples with high spatial resolution and an apparatus for changing the physical, chemical and / or biological properties of an area of a sample, in particular an internal area a sample. The invention is characterized in that the optical element is further developed in that the ring zones of the Fresnel zone plate (30) which are permeable to the rays (20, 21) are partially impermeable to the rays (20, 21). The invention is further characterized by this. that the measuring system and the apparatus for changing the properties of an area of a sample comprise at least one corresponding optical element.
Figure 00000001
EP00125565A 1999-11-25 2000-11-22 Optical focusing device and measuring system Withdrawn EP1103985A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19956782 1999-11-25
DE1999156782 DE19956782C2 (en) 1999-11-25 1999-11-25 Optical focusing element, measuring system and apparatus with such an optical element and use of the same

Publications (2)

Publication Number Publication Date
EP1103985A2 EP1103985A2 (en) 2001-05-30
EP1103985A3 true EP1103985A3 (en) 2003-04-09

Family

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Family Applications (1)

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EP00125565A Withdrawn EP1103985A3 (en) 1999-11-25 2000-11-22 Optical focusing device and measuring system

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EP (1) EP1103985A3 (en)
DE (1) DE19956782C2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10125870B4 (en) * 2001-05-26 2006-09-14 Lutz Dr. Kipp Optical element for imaging objects and / or for focusing electromagnetic radiation or rays of elementary particles and its use
DE10242431A1 (en) * 2002-09-11 2004-03-25 Lutz Dr. Kipp Electromagnetic radiation or x-ray focussing element, for processing cells or tissues, has structural elements of size that is not much smaller or larger than resolution to be achieved

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3867637A (en) * 1973-09-04 1975-02-18 Raytheon Co Extended monochromatic x-ray source
GB2252843A (en) * 1991-01-17 1992-08-19 Atomic Energy Authority Uk Diffractive focussing means
JPH09251100A (en) * 1996-03-15 1997-09-22 Olympus Optical Co Ltd Soft x-ray microscope
US5715219A (en) * 1991-11-29 1998-02-03 Nippon Steel Corporation Displacement detecting device for optical head

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2921038B2 (en) * 1990-06-01 1999-07-19 キヤノン株式会社 Observation device using X-ray
DE4027285A1 (en) * 1990-08-29 1992-03-05 Zeiss Carl Fa X-RAY MICROSCOPE
DE19540195C2 (en) * 1995-10-30 2000-01-20 Fraunhofer Ges Forschung X-ray fluorescence microscopy

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3867637A (en) * 1973-09-04 1975-02-18 Raytheon Co Extended monochromatic x-ray source
GB2252843A (en) * 1991-01-17 1992-08-19 Atomic Energy Authority Uk Diffractive focussing means
US5715219A (en) * 1991-11-29 1998-02-03 Nippon Steel Corporation Displacement detecting device for optical head
JPH09251100A (en) * 1996-03-15 1997-09-22 Olympus Optical Co Ltd Soft x-ray microscope

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BETT T H ET AL: "A binary phase zone plate array for laser beam spatial intensity distribution conversion", FOURTH INTERNATIONAL CONFERENCE ON HOLOGRAPHIC SYSTEMS, COMPONENTS AND APPLICATIONS (CONF. PUBL. NO.379), NEUCHATEL, SWITZERLAND, 13-15 SEPT. 1993, 1993, London, UK, IEE, UK, pages 249 - 254, XP008013081, ISBN: 0-85296-578-8 *
CANNON T M ET AL: "Coded aperture imaging: many holes make light work", OPTICAL ENGINEERING, MAY-JUNE 1980, USA, vol. 19, no. 3, pages 283 - 289, XP001092857, ISSN: 0091-3286 *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 01 30 January 1998 (1998-01-30) *

Also Published As

Publication number Publication date
DE19956782A1 (en) 2001-06-28
DE19956782C2 (en) 2001-11-15
EP1103985A2 (en) 2001-05-30

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