A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a surface of a semiconductor wafer. A pattern on a reticle is first generated using a medium such as computer...http://www.google.ca/patents/US6898779?utm_source=gb-gplus-sharePatent US6898779 - Pattern generation on a semiconductor surface
