Provided is a manufacturing method of a CMOS image sensor. The method includes forming an interlayer insulating layer, a color filter layer, and a planarizing layer. A first photoresist is applied on the planarizing layer, and patterning of the first photoresist is performed using a first mask to form...http://www.google.ca/patents/US7413923?utm_source=gb-gplus-sharePatent US7413923 - Method of manufacturing CMOS image sensor
