Maskless patterning of high-resolution microelectronics features onto large curved substrates. A computer controls individual pixel elements in a spatial light modulator array (SLM) which provides the pattern. Maintaining optical track length constant is by software control of SLM vertical positioning,...http://www.google.ca/patents/US6707534?utm_source=gb-gplus-sharePatent US6707534 - Maskless conformable lithography
