A method and composition for planarizing a substrate surface is provided. The polishing composition includes an oxidizer capable of oxidizing a metal undergoing planarization and yielding a complexing agent which complexes with the oxidized metal and a stabilizer such as a stannate salt. The composition...http://www.google.ca/patents/US6872329?utm_source=gb-gplus-sharePatent US6872329 - Chemical mechanical polishing composition and process
