Germanium is employed as an antireflective coating material for use in active area lithography and gate area lithography steps in the formation of a semiconductor integrated circuit. A germanium layer is deposited over an active area nitride layer or over a gate area nitride layer, and a photoresist...http://www.google.ca/patents/US5750442?utm_source=gb-gplus-sharePatent US5750442 - Germanium as an antireflective coating and method of use
