An optical pellicle to protect a photomask from particulate contamination during semiconductor lithography is provided which has enhanced transparency and operational characteristics. The pellicle utilizes alternating layers of a transparent polymer and a transparent inorganic layer to form pellicles...http://www.google.ca/patents/US7416820?utm_source=gb-gplus-sharePatent US7416820 - Pellicle film optimized for immersion lithography systems with NA>1
