A method for drying semiconductor wafers produces ultra-clean wafers without conventional drying chemicals. The method involves slowing draining a rinsing fluid from a processing tank while heating the wafer at the fluid interface as the wafer emerges from the rinsing fluid. The portion of the wafer...http://www.google.ca/patents/US5556479?utm_source=gb-gplus-sharePatent US5556479 - Method and apparatus for drying semiconductor wafers
