An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution...http://www.google.ca/patents/US5942035?utm_source=gb-gplus-sharePatent US5942035 - Solvent and resist spin coating apparatus
