A method of patterning a thin film. The method includes forming a mask on a film to be patterned. The film is then etched in alignment with the mask to form a patterned film having a pair of laterally opposite sidewalls. A protective layer is formed on the pair of laterally opposite sidewalls. Next,...http://www.google.ca/patents/US7579280?utm_source=gb-gplus-sharePatent US7579280 - Method of patterning a film