A biased pulse DC reactor for sputtering of oxide films is presented. The biased pulse DC reactor couples pulsed DC at a particular frequency to the target through a filter which filters out the effects of a bias power applied to the substrate, protecting the pulsed DC power supply. Films deposited utilizing...http://www.google.ca/patents/US7413998?utm_source=gb-gplus-sharePatent US7413998 - Biased pulse DC reactive sputtering of oxide films
