This invention provides a method for converting residual chlorine, remaining after using a chlorine specie etchant to etch metal electrodes in an integrated circuit device, to a stable polymer thereby eliminating any possibility for residual chlorine to cause corrosion of the metal electrodes. In conventional...http://www.google.ca/patents/US5533635?utm_source=gb-gplus-sharePatent US5533635 - Method of wafer cleaning after metal etch
