An exposure apparatus of the present invention provides a mask having a first space formed by a protection member, which protects a pattern formation area on a mask substrate, and a frame, which supports the protection member, inside a second space, and transfers the pattern of the mask provided in the...http://www.google.ca/patents/US6614504?utm_source=gb-gplus-sharePatent US6614504 - Exposure apparatus, exposure method, and device manufacturing method
