A method and apparatus for real-time monitoring of the substrate and the gaseous process environment in a semi-conductor process step is described. The method uses infrared spectroscopy for in-situ analysis of gaseous molecular species in the process region and characterization of adsorbed chemical species...http://www.google.ca/patents/US20050082482?utm_source=gb-gplus-sharePatent US20050082482 - Process monitoring using infrared optical diagnostics
