Chemical vapor deposition systems include elements to preheat reactant gases prior to reacting the gases to form layers of a material on a substrate, which provides devices and systems with deposited layers substantially free of residual compounds from the reaction process. Heating reactant gases prior...http://www.google.ca/patents/US20030032283?utm_source=gb-gplus-sharePatent US20030032283 - Preheating of chemical vapor deposition precursors
