The present invention generally provides a precleaning process prior to moralization for submicron features on substrates. The method includes cleaning the submicron features with radicals from a plasma of a reactive gas such as oxygen, a mixture of CF4/O2, or a mixture of He/NF3, wherein the plasma...http://www.google.ca/patents/US6693030?utm_source=gb-gplus-sharePatent US6693030 - Reactive preclean prior to metallization for sub-quarter micron application
