In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form...http://www.google.ca/patents/US7825037?utm_source=gb-gplus-sharePatent US7825037 - Fabrication of enclosed nanochannels using silica nanoparticles
