A method for forming a patterned layer within an integrated circuit. There is first provided a substrate having formed thereover a blanket target layer. There is then formed upon the blanket target layer a blanket focusing layer, where the blanket focusing layer is formed of an organic anti-reflective...http://www.google.ca/patents/US5753418?utm_source=gb-gplus-sharePatent US5753418 - 0.3 Micron aperture width patterning process
