WO2011160129A2 - Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices - Google Patents

Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices Download PDF

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Publication number
WO2011160129A2
WO2011160129A2 PCT/US2011/041106 US2011041106W WO2011160129A2 WO 2011160129 A2 WO2011160129 A2 WO 2011160129A2 US 2011041106 W US2011041106 W US 2011041106W WO 2011160129 A2 WO2011160129 A2 WO 2011160129A2
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Prior art keywords
plane
planes
region
surface regions
gallium
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PCT/US2011/041106
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French (fr)
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WO2011160129A3 (en
Inventor
Rajat Sharma
Andrew Felker
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Soraa, Inc.
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Priority to CN201180029188.7A priority Critical patent/CN102947492B/en
Priority to DE112011102068T priority patent/DE112011102068T5/en
Priority to JP2013515583A priority patent/JP5870097B2/en
Publication of WO2011160129A2 publication Critical patent/WO2011160129A2/en
Publication of WO2011160129A3 publication Critical patent/WO2011160129A3/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0095Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate

Definitions

  • This invention relates generally to lighting techniques. More specifically, embodiments of the invention include techniques for manufacturing optical devices, such as light emitting diodes (LEDs) using a separation process of thick gallium and nitrogen containing substrate members, such as GaN configured in polar crystalline orientations. In some embodiments, the gallium and nitrogen containing substrate is configured in a triangular shape or a diamond shape.
  • the invention can be applied to applications such as white lighting, multi-colored lighting, general illumination, decorative lighting, automotive and aircraft lamps, street lights, lighting for plant growth, indicator lights, lighting for flat panel displays, and other optoelectronic devices.
  • the conventional light bulb commonly called the “Edison bulb”
  • the conventional light bulb uses a tungsten filament enclosed in a glass bulb sealed in a base, which is screwed into a socket.
  • the socket is coupled to an AC power or DC power source.
  • the conventional light bulb can be found commonly in houses, buildings, and outdoor lightings, and other areas requiring light. Unfortunately, drawbacks exist with the
  • the conventional light bulb dissipates more than 90% of the energy used as thermal energy. Additionally, the conventional light bulb routinely fails often due to thermal expansion and contraction of the filament element.
  • Solid state lighting techniques are known. Solid state lighting relies upon semiconductor materials to produce light emitting diodes, commonly called LEDs. At first, red LEDs were demonstrated and introduced into commerce. Red LEDs use Aluminum Indium Gallium Phosphide or AlInGaP semiconductor materials. Most recently, Shuji Nakamura pioneered the use of InGaN materials to produce LEDs emitting light in the blue color range for blue LEDs. The blue colored LEDs led to innovations such as solid state white lighting, the blue laser diode, which in turn enabled the Blu-RayTM (trademark of the Blu-Ray Disc Association) DVD player, and other developments. Other colored LEDs have also been proposed.
  • Conventional LED fabrication process typically employs a wafer scribing and breaking procedure to generate individual LED chips. These wafers are typically scribed along two substantially orthogonal axes, wherein these individual axes are respectively parallel to and co-planar with two non-equivalent crystal plane orientations of the wafer. For example, for an LED wafer comprising GaN on sapphire singulated into square or rectangular chips, the two orthogonal scribe axes are respectively parallel to and co-planar with m-plane and a-plane orientations of the sapphire wafer, wherein the m-planes and a-planes are not equivalent by definition.
  • the present method includes a scribe and break process for bulk c-plane GaN wafers.
  • the wafers are scribed along two or more non-orthogonal axes. These two or more axes are respectively parallel to and co-planar with equivalent crystal planes of the GaN wafer.
  • a bulk c-plane GaN wafer is scribed along three axes (with an angle of 60o between each of these three axes) wherein these three axes are respectively parallel to and co-planar with three m-plane orientations of the c-plane GaN wafer.
  • the three m-plane orientations are equivalent by definition.
  • the present invention includes a method to fabricate a triangular- shaped or diamond-shaped chip geometry in the case of c-plane GaN wafers, which may have several advantages over conventional square or rectangular geometries.
  • This present invention utilizes the in-plane 6-fold rotational symmetry and crystallography unique to c- plane GaN wafers - GaN has the Wurtzite crystal structure according to a specific
  • the bulk c-plane GaN wafer may be scribed along three axes (with an angle of 60 degrees between each of these three axes) wherein these three axes are respectively parallel to and co-planar with three a-plane orientations of the c-plane GaN wafer, the three a-plane orientations being equivalent by definition.
  • the present invention provides a gallium and nitrogen containing substrate configured in a triangular shape consisting of no more than five surface regions.
  • the five surface regions comprise three surface regions configured from respective first equivalent planes and two surface regions configured from second equivalent planes.
  • the invention provides a diamond shape substrate consisting of no more than six surface regions.
  • the six surface regions comprise four surface regions configured from respective first equivalent planes and two surface regions configured from second equivalent planes.
  • a first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation.
  • the method also includes exposing at least a first m-plane region, a second m-plane region, and a third m-plane region.
  • the present invention provides a method of separating die from a gallium and nitrogen containing substrate.
  • the invention also includes a gallium and nitrogen containing optical device.
  • the device includes a gallium and nitrogen containing substrate having a base region and no more than three major planar side regions configured in a triangular arrangement provided from the base region.
  • the present method and structure can include one or more of the following elements that can include variations, modifications, and alternatives.
  • a bulk c-plane GaN wafer with an overlying LED epitaxial structure and with p-type and n-type metallizations is fabricated, such that there are 'scribe streets' along three directions (at 60o angles relative to each other) separating individual LED traces on the wafer.
  • the scribe streets are aligned to be respectively parallel to three m-plane orientations of the c-plane GaN wafer, and are designed to intersect such that the triangle shape defined by three scribe lines is an equilateral triangle.
  • the LED wafer is laser-scribed on a first surface of the wafer, along a first 'scribe street' direction.
  • the scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.
  • the LED wafer is then laser-scribed on a first surface of the wafer, along a second 'scribe street' direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.
  • the LED wafer is laser-scribed on a first surface of the wafer, along the third 'scribe street' direction.
  • the scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.
  • the scribe depth in the scribed regions on the second surface is typically 20- 50% of the thickness of the LED wafer.
  • the scribed LED wafer is then broken using an anvil breaker setup along the three 'scribe street' orientations. Breaking occurs along the planes defined by scribed regions on the first surface of the wafer in a specific embodiment. Breaking along the third 'scribe street' orientation yields individual triangle-shaped LED chips.
  • the invention provides for a method for singulation of thick c-plane GaN wafers into triangle-shaped LED chips defined by three equivalent m- plane oriented sidewalls.
  • the m-plane is a natural break plane, which easily cleaves, in the case of c-plane GaN wafers, and therefore, a singulation process involving breaking exclusively or predominately along a set of m-plane orientations will have a higher yield than a process involving breaking along both m-plane orientations and a-plane orientations.
  • the present invention provides for a method for singulation of c-plane GaN wafers into triangle-shaped LED chips defined by three equivalent m-plane oriented sidewalls.
  • break along the a-plane yields a characteristic surface texture which results in improved light extraction.
  • the invention provides triangle-shaped chips characterized by improved light extraction when compared to conventional square- or rectangle-shaped chips, due to an increase in the per-pass probability of escape of in-plane emission arising from a decrease in the probability of total internal reflection at the sidewalls. Additionally, triangle-shaped chips provide fewer trapped trajectories of light than square or rectangle chips, so that the chip light extraction efficiency can be increased.
  • Figures 1 through 3 are diagrams illustrating a method for forming triangular shaped gallium and nitrogen containing material.
  • Figures 4 through 6 are diagrams illustrating a method for forming a diamond shaped gallium and nitrogen containing material.
  • Figure 7 is a diagram showing relative orientations of m-planes (red lines) and a- planes (green lines), wherein the plane of the diagram represents a c-plane, in the case of the GaN (Wurtzite) crystal structure.
  • Figure 8 is a side-view diagram depecting a laser scribing process for an optical device.
  • Figure 9 is a side-view diagram depecting a breaking process for an optical device.
  • Figure 10 is the light extraction diagram obtained from modeling light extraction in a square and a triangular chip.
  • Figure 1 1 is a simulation of light extraction efficiency of a triangular chip as a function of sidewall surface roughening.
  • Figures 1 through 3 are simplified diagrams illustrating a method for forming a triangular shaped gallium and nitrogen containing material according to an embodiment of the present invention.
  • the invention provides a gallium and nitrogen containing substrate member.
  • the member includes a gallium and nitrogen containing thickness of material configured in a triangular shape consisting of no more than five surface regions.
  • the five surface regions comprises a three surface regions configured from respective first equivalent planes and the five surface regions excluding the three surface regions comprises two surface regions configured from second equivalent planes.
  • a top-view of a triangular shaped chip showing orientation of three edges relative to GaN m-planes according to a specific embodiment (see dashed or red lines).
  • the gallium and nitrogen containing substrate is triangular shaped.
  • the triangular shaped substrate may be an extruded triangular shape.
  • the three surface regions of the triangular shaped regions are respective first equivalent planes, which are either m-planes or a-planes, see Figure 2.
  • the second surface regions of the triangular shaped regions are respective second equivalent planes, which are c- planes.
  • the gallium and nitrogen containing substrate is a GaN substrate.
  • the three surface regions of the triangular shaped regions are configured from respective scribes provided on respective first equivalent planes.
  • the three surface regions are configured by an interior region of 180 Degrees or the like.
  • the two surface regions are configured in parallel arrangement to each other.
  • the GaN substrate is configured from bulk c-plane GaN having three m-plane surface orientations exposed.
  • the gallium and nitrogen containing member comprises at least an optical device thereon in at least one specific embodiment.
  • the optical device can be a light emitting diode, a laser device, or other device, as well as combinations of optical and electrical devices. Other types of devices can include electrical switching devices, mechanical devices, and any combination of these and the like.
  • Figures 4 through 6 are simplified diagrams illustrating a method for forming a triangular shaped gallium and nitrogen containing material according to an embodiment of the present invention.
  • the substrate shows four edges relative to GaN m-planes (see dotted or red lines).
  • the substrate member includes a gallium and nitrogen containing thickness of material configured in a diamond shape consisting of no more than six surface regions.
  • the six surface regions comprises four surface regions configured from respective first equivalent planes and the six surface regions excluding the four surface regions comprises two surface regions configured from second equivalent planes.
  • the substrate that is the diamond shape is free from a 90 degree intersection between any two of the first four surface regions out of the six surface regions.
  • the diamond shape includes the first equivalent planes that are either m-planes or a-planes, as illustrated by Figure 5. As shown, the four edges are associated with GaN a-planes (green dashed lines or dashed lines).
  • the diamond shape includes the second equivalent planes that are c-planes.
  • the four surface regions of the diamond shape are configured from respective scribes provided on respective first equivalent planes in a specific embodiment.
  • the four surface regions are configured by an interior region free from a 90 degree angle.
  • the two surface regions are configured in parallel arrangement to each other.
  • the GaN substrate is configured from bulk c-plane GaN having four m-plane surface orientations exposed.
  • the gallium and nitrogen containing member comprises at least an optical device thereon in at least one specific embodiment.
  • the optical device can be a light emitting diode, a laser device, or other device, as well as combinations of optical and electrical devices.
  • Figure 7 is a simplified diagram showing relative orientations of m-planes (red lines) and a-planes (green lines), wherein the plane of the diagram represents a c-plane, in the case of the GaN (Wurtzite) crystal structure according to an embodiment of the present invention.
  • Figure 8 is a simplified side-view diagram depicting a laser scribing process for an optical device according to an embodiment of the present invention.
  • the LED wafer is laser-scribed within the 'scribe streets' on a first surface of the wafer, along one or more axes according to a specific embodiment.
  • the scribing can occur using a saw, a diamond scribe, a chemical etchant (with or without a photo-assisted component), reactive ion or plasma etchant or milling, or combinations, and the like.
  • the scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer according to a specific embodiment. In other embodiments, the scribe depth can vary and have other dimension.
  • the LED wafer is then flipped over, and is then laser- scribed within the 'scribe streets' on a second surface of the wafer, along one or more axes, taking care to ensure that the scribes on the second surface are aligned to be substantially overlying the scribes on the first side of the wafer.
  • the scribe depth in the scribed regions on the second surface is typically 20-50% of the thickness of the LED wafer.
  • Figure 9 is a simplified side-view diagram depicting a breaking process for an optical device according to an embodiment of the present invention. As shown, breaking occurs along the planes defined by two aligned scribed regions on the two opposing sides of the wafer.
  • the present method provides for the singulation of thick GaN wafers, thereby eliminating the need for expensive and time-consuming lapping and polishing steps in the LED fabrication process.
  • Figure 10 displays modeling results which compare the light extraction efficiency Cex of square and triangular chips.
  • the simulation yields the light extraction diagram, e.g. the extraction efficiency versus the direction of emission of photons (kx,ky).
  • Figure 1 1 illustrates the impact of sidewall roughening on light extraction efficiency, as predicted by modeling.
  • the light extraction efficiency of a triangular chip can exceed 80% (versus 57% for smooth sidewalls).
  • the present method provides for the singulation of thick GaN wafers into individual LED chips with lateral chip dimensions that are significantly smaller than those enabled by standard single-sided scribe methods.
  • the present method provides higher process yields at the scribe and break process steps than conventional methods. Additionally, there is a reduced incidence of chip-outs, as well as doublets (pairs of chips that are not separated during the break step).
  • the scribed regions may induce surface roughening on the side-walls of the generated LED chips which may enhance light extraction from the chips when compared to chips generated by scribing on a single side.
  • the present method can also include other variations, combinations, and modifications, as described below.
  • the LED wafer may be a c-plane GaN wafer
  • An individual LED wafer may be scribed on at least one of the two surfaces using at least one of a plurality of scribe methods in other embodiments.
  • the scribe methods may include at least two or more methods selected from laser scribing, diamond scribing, and sawing/dicing.
  • the scribe depth on any one side of the LED wafer may be varied between 0.5% and 99.5% of the thickness of the LED wafer.
  • the scribed regions may have continuous scribe lines, or may comprise of dashed or dotted scribe lines.
  • the scribed regions along two or more axes may or may not intersect in the regions defined by intersecting 'scribe streets,' by design according to a specific embodiment.
  • scribing may be performed along at least one 'scribe street' orientation on a first surface, and along at least one 'scribe street' orientation on the second surface, such that at least two 'scribe street' orientations chosen are non-parallel according to a specific embodiment.
  • the scribed LED wafer may be broken using a method or a plurality of methods chosen from a group including anvil breaker, roller breaker or breaker bar, combinations, and the like.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
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Abstract

A gallium and nitrogen containing optical device has a base region and no more than three major planar side regions configured in a triangular arrangement provided from the base region.

Description

Gallium and Nitrogen Containing Triangular or Diamond-shaped Configuration for Optical Devices
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application claims priority to U.S. Provisional Application No. 61/356,473, filed June 18, 2010, which is incorporated herein by reference for all purposes.
BACKGROUND OF THE INVENTION
[0002] This invention relates generally to lighting techniques. More specifically, embodiments of the invention include techniques for manufacturing optical devices, such as light emitting diodes (LEDs) using a separation process of thick gallium and nitrogen containing substrate members, such as GaN configured in polar crystalline orientations. In some embodiments, the gallium and nitrogen containing substrate is configured in a triangular shape or a diamond shape. The invention can be applied to applications such as white lighting, multi-colored lighting, general illumination, decorative lighting, automotive and aircraft lamps, street lights, lighting for plant growth, indicator lights, lighting for flat panel displays, and other optoelectronic devices.
[0003] In the late 1800's, Thomas Edison invented the light bulb. The conventional light bulb, commonly called the "Edison bulb," has been used for over one hundred years. The conventional light bulb uses a tungsten filament enclosed in a glass bulb sealed in a base, which is screwed into a socket. The socket is coupled to an AC power or DC power source. The conventional light bulb can be found commonly in houses, buildings, and outdoor lightings, and other areas requiring light. Unfortunately, drawbacks exist with the
conventional Edison light bulb. That is, the conventional light bulb dissipates more than 90% of the energy used as thermal energy. Additionally, the conventional light bulb routinely fails often due to thermal expansion and contraction of the filament element.
[0004] Solid state lighting techniques are known. Solid state lighting relies upon semiconductor materials to produce light emitting diodes, commonly called LEDs. At first, red LEDs were demonstrated and introduced into commerce. Red LEDs use Aluminum Indium Gallium Phosphide or AlInGaP semiconductor materials. Most recently, Shuji Nakamura pioneered the use of InGaN materials to produce LEDs emitting light in the blue color range for blue LEDs. The blue colored LEDs led to innovations such as solid state white lighting, the blue laser diode, which in turn enabled the Blu-Ray™ (trademark of the Blu-Ray Disc Association) DVD player, and other developments. Other colored LEDs have also been proposed.
[0005] High intensity UV, blue, and green LEDs based on GaN have been proposed and even demonstrated with some success. Efficiencies have typically been highest in the UV- violet, dropping off as the emission wavelength increases to blue or green. Unfortunately, achieving high intensity, high-efficiency GaN-based green LEDs has been particularly problematic. Additionally, GaN based LEDs have been costly and difficult to produce on a wide-scale in an efficient manner.
BRIEF SUMMARY OF THE INVENTION
[0006] Conventional LED fabrication process typically employs a wafer scribing and breaking procedure to generate individual LED chips. These wafers are typically scribed along two substantially orthogonal axes, wherein these individual axes are respectively parallel to and co-planar with two non-equivalent crystal plane orientations of the wafer. For example, for an LED wafer comprising GaN on sapphire singulated into square or rectangular chips, the two orthogonal scribe axes are respectively parallel to and co-planar with m-plane and a-plane orientations of the sapphire wafer, wherein the m-planes and a-planes are not equivalent by definition.
[0007] In a specific embodiment, the present method includes a scribe and break process for bulk c-plane GaN wafers. The wafers are scribed along two or more non-orthogonal axes. These two or more axes are respectively parallel to and co-planar with equivalent crystal planes of the GaN wafer. For example, a bulk c-plane GaN wafer is scribed along three axes (with an angle of 60o between each of these three axes) wherein these three axes are respectively parallel to and co-planar with three m-plane orientations of the c-plane GaN wafer. In a specific embodiment, the three m-plane orientations are equivalent by definition. In one or more aspects, the present invention includes a method to fabricate a triangular- shaped or diamond-shaped chip geometry in the case of c-plane GaN wafers, which may have several advantages over conventional square or rectangular geometries. This present invention utilizes the in-plane 6-fold rotational symmetry and crystallography unique to c- plane GaN wafers - GaN has the Wurtzite crystal structure according to a specific
embodiment. In an alternative preferred embodiment, the bulk c-plane GaN wafer may be scribed along three axes (with an angle of 60 degrees between each of these three axes) wherein these three axes are respectively parallel to and co-planar with three a-plane orientations of the c-plane GaN wafer, the three a-plane orientations being equivalent by definition.
[0008] In a specific embodiment, the present invention provides a gallium and nitrogen containing substrate configured in a triangular shape consisting of no more than five surface regions. Preferably, the five surface regions comprise three surface regions configured from respective first equivalent planes and two surface regions configured from second equivalent planes.
[0009] In alternative embodiments, the invention provides a diamond shape substrate consisting of no more than six surface regions. Preferably, the six surface regions comprise four surface regions configured from respective first equivalent planes and two surface regions configured from second equivalent planes. A first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation. The method also includes exposing at least a first m-plane region, a second m-plane region, and a third m-plane region. Moreover, the present invention provides a method of separating die from a gallium and nitrogen containing substrate. The invention also includes a gallium and nitrogen containing optical device. The device includes a gallium and nitrogen containing substrate having a base region and no more than three major planar side regions configured in a triangular arrangement provided from the base region.
[0010] In a preferred embodiment, the present method and structure can include one or more of the following elements that can include variations, modifications, and alternatives.
[0011] 1. A bulk c-plane GaN wafer with an overlying LED epitaxial structure and with p-type and n-type metallizations is fabricated, such that there are 'scribe streets' along three directions (at 60o angles relative to each other) separating individual LED traces on the wafer. The scribe streets are aligned to be respectively parallel to three m-plane orientations of the c-plane GaN wafer, and are designed to intersect such that the triangle shape defined by three scribe lines is an equilateral triangle.
[0012] 2. The LED wafer is laser-scribed on a first surface of the wafer, along a first 'scribe street' direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer. [0013] 3. The LED wafer is then laser-scribed on a first surface of the wafer, along a second 'scribe street' direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.
[0014] 4. The LED wafer is laser-scribed on a first surface of the wafer, along the third 'scribe street' direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.
[0015] 5. The scribe depth in the scribed regions on the second surface is typically 20- 50% of the thickness of the LED wafer.
[0016] 6. The scribed LED wafer is then broken using an anvil breaker setup along the three 'scribe street' orientations. Breaking occurs along the planes defined by scribed regions on the first surface of the wafer in a specific embodiment. Breaking along the third 'scribe street' orientation yields individual triangle-shaped LED chips.
[0017] In a specific embodiment, the invention provides for a method for singulation of thick c-plane GaN wafers into triangle-shaped LED chips defined by three equivalent m- plane oriented sidewalls. In one or more embodiments, the m-plane is a natural break plane, which easily cleaves, in the case of c-plane GaN wafers, and therefore, a singulation process involving breaking exclusively or predominately along a set of m-plane orientations will have a higher yield than a process involving breaking along both m-plane orientations and a-plane orientations. In another specific embodiment, the present invention provides for a method for singulation of c-plane GaN wafers into triangle-shaped LED chips defined by three equivalent m-plane oriented sidewalls. In one or more embodiments, break along the a-plane yields a characteristic surface texture which results in improved light extraction. I
[0018] The invention provides triangle-shaped chips characterized by improved light extraction when compared to conventional square- or rectangle-shaped chips, due to an increase in the per-pass probability of escape of in-plane emission arising from a decrease in the probability of total internal reflection at the sidewalls. Additionally, triangle-shaped chips provide fewer trapped trajectories of light than square or rectangle chips, so that the chip light extraction efficiency can be increased.
BRIEF DESCRIPTION OF THE DRAWINGS
[0019] Figures 1 through 3 are diagrams illustrating a method for forming triangular shaped gallium and nitrogen containing material. [0020] Figures 4 through 6 are diagrams illustrating a method for forming a diamond shaped gallium and nitrogen containing material.
[0021] Figure 7 is a diagram showing relative orientations of m-planes (red lines) and a- planes (green lines), wherein the plane of the diagram represents a c-plane, in the case of the GaN (Wurtzite) crystal structure.
[0022] Figure 8 is a side-view diagram depecting a laser scribing process for an optical device.
[0023] Figure 9 is a side-view diagram depecting a breaking process for an optical device.
[0024] Figure 10 is the light extraction diagram obtained from modeling light extraction in a square and a triangular chip.
[0025] Figure 1 1 is a simulation of light extraction efficiency of a triangular chip as a function of sidewall surface roughening.
DETAILED DESCRIPTION OF THE INVENTION
[0026] Figures 1 through 3 are simplified diagrams illustrating a method for forming a triangular shaped gallium and nitrogen containing material according to an embodiment of the present invention. As shown in Figure 1 , the invention provides a gallium and nitrogen containing substrate member. The member includes a gallium and nitrogen containing thickness of material configured in a triangular shape consisting of no more than five surface regions. Preferably, the five surface regions comprises a three surface regions configured from respective first equivalent planes and the five surface regions excluding the three surface regions comprises two surface regions configured from second equivalent planes. As shown is a top-view of a triangular shaped chip showing orientation of three edges relative to GaN m-planes according to a specific embodiment (see dashed or red lines).
[0027] In a specific embodiment, the gallium and nitrogen containing substrate is triangular shaped. The triangular shaped substrate may be an extruded triangular shape. In a specific embodiment, the three surface regions of the triangular shaped regions are respective first equivalent planes, which are either m-planes or a-planes, see Figure 2. The second surface regions of the triangular shaped regions are respective second equivalent planes, which are c- planes. In a specific embodiment, the gallium and nitrogen containing substrate is a GaN substrate. Of course, there can be other variations, modifications, and alternatives. [0028] In a specific embodiment, the three surface regions of the triangular shaped regions are configured from respective scribes provided on respective first equivalent planes. As an example, the three surface regions are configured by an interior region of 180 Degrees or the like. In other examples, the two surface regions are configured in parallel arrangement to each other.
[0029] Referring now to Figure 3, an optical micrograph of a triangular shaped LED chip is illustrated. As shown, the GaN substrate is configured from bulk c-plane GaN having three m-plane surface orientations exposed. As also shown, the gallium and nitrogen containing member comprises at least an optical device thereon in at least one specific embodiment. The optical device can be a light emitting diode, a laser device, or other device, as well as combinations of optical and electrical devices. Other types of devices can include electrical switching devices, mechanical devices, and any combination of these and the like.
[0030] Figures 4 through 6 are simplified diagrams illustrating a method for forming a triangular shaped gallium and nitrogen containing material according to an embodiment of the present invention. As shown, the substrate shows four edges relative to GaN m-planes (see dotted or red lines). The substrate member includes a gallium and nitrogen containing thickness of material configured in a diamond shape consisting of no more than six surface regions. Preferably, the six surface regions comprises four surface regions configured from respective first equivalent planes and the six surface regions excluding the four surface regions comprises two surface regions configured from second equivalent planes.
[0031] In a specific embodiment, the substrate that is the diamond shape is free from a 90 degree intersection between any two of the first four surface regions out of the six surface regions. In a specific embodiment, the diamond shape includes the first equivalent planes that are either m-planes or a-planes, as illustrated by Figure 5. As shown, the four edges are associated with GaN a-planes (green dashed lines or dashed lines). In a specific embodiment, the diamond shape includes the second equivalent planes that are c-planes.
[0032] The four surface regions of the diamond shape are configured from respective scribes provided on respective first equivalent planes in a specific embodiment. Preferably, the four surface regions are configured by an interior region free from a 90 degree angle. Preferably, the two surface regions are configured in parallel arrangement to each other.
[0033] Referring now to Figure 6, an optical micrograph of a diamond shaped LED chip is illustrated. As shown, the GaN substrate is configured from bulk c-plane GaN having four m-plane surface orientations exposed. As also shown, the gallium and nitrogen containing member comprises at least an optical device thereon in at least one specific embodiment. The optical device can be a light emitting diode, a laser device, or other device, as well as combinations of optical and electrical devices.
[0034] Figure 7 is a simplified diagram showing relative orientations of m-planes (red lines) and a-planes (green lines), wherein the plane of the diagram represents a c-plane, in the case of the GaN (Wurtzite) crystal structure according to an embodiment of the present invention.
[0035] Figure 8 is a simplified side-view diagram depicting a laser scribing process for an optical device according to an embodiment of the present invention. In a specific
embodiment, the LED wafer is laser-scribed within the 'scribe streets' on a first surface of the wafer, along one or more axes according to a specific embodiment. In other embodiments, the scribing can occur using a saw, a diamond scribe, a chemical etchant (with or without a photo-assisted component), reactive ion or plasma etchant or milling, or combinations, and the like. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer according to a specific embodiment. In other embodiments, the scribe depth can vary and have other dimension.
[0036] In a specific embodiment, the LED wafer is then flipped over, and is then laser- scribed within the 'scribe streets' on a second surface of the wafer, along one or more axes, taking care to ensure that the scribes on the second surface are aligned to be substantially overlying the scribes on the first side of the wafer. In a specific embodiment, the scribe depth in the scribed regions on the second surface is typically 20-50% of the thickness of the LED wafer The scribed LED wafer is then broken using an anvil breaker setup, such as the one further described below.
[0037] Figure 9 is a simplified side-view diagram depicting a breaking process for an optical device according to an embodiment of the present invention. As shown, breaking occurs along the planes defined by two aligned scribed regions on the two opposing sides of the wafer. In a specific embodiment, the present method provides for the singulation of thick GaN wafers, thereby eliminating the need for expensive and time-consuming lapping and polishing steps in the LED fabrication process.
[0038] Figure 10 displays modeling results which compare the light extraction efficiency Cex of square and triangular chips. The simulation yields the light extraction diagram, e.g. the extraction efficiency versus the direction of emission of photons (kx,ky). As can be seen, square chips offer 5 extraction cones (one per face) yielding Cex=46%. Triangular chips offer 7 extraction cones (each vertical sidewall can extract in-plane light directly or after a bounce off another sidewall) yielding Cex=57%. These numbers pertain to realistic structures (including loss in the metals and GaN substrate) and do not integrated any surface roughening of the chip walls.
[0039] Figure 1 1 illustrates the impact of sidewall roughening on light extraction efficiency, as predicted by modeling. For efficient sidewall roughness, the light extraction efficiency of a triangular chip can exceed 80% (versus 57% for smooth sidewalls).
[0040] In a specific embodiment, the present method provides for the singulation of thick GaN wafers into individual LED chips with lateral chip dimensions that are significantly smaller than those enabled by standard single-sided scribe methods. In other embodiments, the present method provides higher process yields at the scribe and break process steps than conventional methods. Additionally, there is a reduced incidence of chip-outs, as well as doublets (pairs of chips that are not separated during the break step). In other embodiments, the scribed regions may induce surface roughening on the side-walls of the generated LED chips which may enhance light extraction from the chips when compared to chips generated by scribing on a single side.
[0041] In other embodiments, the present method can also include other variations, combinations, and modifications, as described below.
[0042] 1. The LED wafer may be a c-plane GaN wafer
[0043] 2. An individual LED wafer may be scribed on at least one of the two surfaces using at least one of a plurality of scribe methods in other embodiments. The scribe methods may include at least two or more methods selected from laser scribing, diamond scribing, and sawing/dicing.
[0044] 3. In a specific embodiment, the scribe depth on any one side of the LED wafer may be varied between 0.5% and 99.5% of the thickness of the LED wafer.
[0045] 4. In an alternative embodiment, the scribed regions may have continuous scribe lines, or may comprise of dashed or dotted scribe lines. The scribed regions along two or more axes may or may not intersect in the regions defined by intersecting 'scribe streets,' by design according to a specific embodiment.
[0046] 5. Also, scribing may be performed along at least one 'scribe street' orientation on a first surface, and along at least one 'scribe street' orientation on the second surface, such that at least two 'scribe street' orientations chosen are non-parallel according to a specific embodiment.
[0047] 6. The scribed LED wafer may be broken using a method or a plurality of methods chosen from a group including anvil breaker, roller breaker or breaker bar, combinations, and the like.
[0048] While the above is a full description of the specific embodiments, various modifications, alternative constructions and equivalents may be used. The present specification describes one or more specific gallium and nitrogen containing surface orientations, but it would be recognized that any one of a plurality of family of plane orientations can be used. The above description and illustrations should not be taken as limiting the scope of the present invention which is defined by the appended claims.

Claims

What is claimed is:
1. A gallium and nitrogen containing substrate comprising:
a thickness of material configured in a triangular shape consisting of no more than five surface regions;
wherein the five surface regions comprises three surface regions configured from respective first equivalent crystal planes; and
wherein the five surface regions excluding the three surface regions include two surface regions configured from second equivalent crystal planes.
2. The substrate of claim 1 wherein the first equivalent planes are either m-planes or a-planes.
3. The substrate of claim 1 wherein the second equivalent planes are c-planes.
4. The substrate of claim 1 wherein the three surface regions are configured from respective scribes provided within a vicinity of respective first equivalent planes.
5. The substrate of claim 1 wherein the first equivalent planes are configured on respective a-planes.
6. The member of claim 1 wherein the two surface regions are in parallel to each other.
7. A gallium and nitrogen containing substrate comprising:
a thickness of material configured in a diamond shape consisting of no more than six surface regions;
wherein the six surface regions comprises four surface regions configured from respective first equivalent crystal planes; and
wherein the six surface regions excluding the four surface regions include two surface regions configured from second equivalent crystal planes.
8. The substrate of claim 7 wherein the diamond shape does not have a 90 degree intersection between any two surface regions out of the four surface regions.
9. The substrate of claim 7 wherein the first equivalent planes are either m-planes or a-planes.
10. The substrate of claim 7 wherein the second equivalent planes are c-planes.
1 1. The substrate of claim 7 wherein the four surface regions are configured from respective scribes provided within a vicinity of respective first equivalent planes.
12. The substrate of claim 7 wherein the first equivalent planes are configured on respective a-planes.
13. The substrate of claim 1 wherein the two surface regions are parallel to each other.
14. A method of separating at least one die from a gallium and nitrogen containing substrate comprising:
providing the gallium and nitrogen containing substrate having a first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation;
providing a first scribe region to expose a first m-plane region;
providing a second scribe region to expose a second m-plane region;
providing a third scribe region to expose a third m-plane region; and
separating the die using at least the first scribe region, the second scribe region, and the third scribe region.
15. A method of separating at least one die from a gallium and nitrogen containing substrate having a first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation, and exposing at least a first m-plane region, a second m-plane region, and a third m-plane region to configure the at least one die.
16 A method of separating at least one die from a gallium and nitrogen containing substrate comprising: providing the gallium and nitrogen containing substrate a first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation; and
exposing at least a first a-plane region, a second a-plane region, and a third a-plane region to configure the at least one die.
17. A method of separating at least one die from a gallium and nitrogen having a first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation, the method comprising:
exposing at least a first m-plane region and a second m-plane region configured in a first substantially parallel arrangement;
exposing at least a third m-plane region and a fourth m-plane region configured in a second substantially parallel arrangement; and
removing at least one die.
18. A method of separating at least one die from a gallium and nitrogen containing substrate having a first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation, the method comprising:
exposing at least a first a-plane region and a second a-plane region configured in a first substantially parallel arrangement;
exposing at least a third a-plane region and a fourth a-plane region configured in a second substantially parallel arrangement; and
removing at least one die.
PCT/US2011/041106 2010-06-18 2011-06-20 Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices WO2011160129A2 (en)

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Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470823B (en) * 2009-02-11 2015-01-21 Epistar Corp Light-emitting device and manufacturing method thereof
US8247886B1 (en) 2009-03-09 2012-08-21 Soraa, Inc. Polarization direction of optical devices using selected spatial configurations
US8299473B1 (en) 2009-04-07 2012-10-30 Soraa, Inc. Polarized white light devices using non-polar or semipolar gallium containing materials and transparent phosphors
US8791499B1 (en) 2009-05-27 2014-07-29 Soraa, Inc. GaN containing optical devices and method with ESD stability
US9000466B1 (en) 2010-08-23 2015-04-07 Soraa, Inc. Methods and devices for light extraction from a group III-nitride volumetric LED using surface and sidewall roughening
US9583678B2 (en) 2009-09-18 2017-02-28 Soraa, Inc. High-performance LED fabrication
US9293644B2 (en) 2009-09-18 2016-03-22 Soraa, Inc. Power light emitting diode and method with uniform current density operation
KR101368906B1 (en) 2009-09-18 2014-02-28 소라, 인코포레이티드 Power light emitting diode and method with current density operation
US8933644B2 (en) 2009-09-18 2015-01-13 Soraa, Inc. LED lamps with improved quality of light
US8905588B2 (en) 2010-02-03 2014-12-09 Sorra, Inc. System and method for providing color light sources in proximity to predetermined wavelength conversion structures
US10147850B1 (en) 2010-02-03 2018-12-04 Soraa, Inc. System and method for providing color light sources in proximity to predetermined wavelength conversion structures
US8740413B1 (en) 2010-02-03 2014-06-03 Soraa, Inc. System and method for providing color light sources in proximity to predetermined wavelength conversion structures
US9450143B2 (en) * 2010-06-18 2016-09-20 Soraa, Inc. Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices
US8786053B2 (en) 2011-01-24 2014-07-22 Soraa, Inc. Gallium-nitride-on-handle substrate materials and devices and method of manufacture
US8686431B2 (en) 2011-08-22 2014-04-01 Soraa, Inc. Gallium and nitrogen containing trilateral configuration for optical devices
US9646827B1 (en) 2011-08-23 2017-05-09 Soraa, Inc. Method for smoothing surface of a substrate containing gallium and nitrogen
US8912025B2 (en) 2011-11-23 2014-12-16 Soraa, Inc. Method for manufacture of bright GaN LEDs using a selective removal process
KR101909633B1 (en) 2011-12-30 2018-12-19 삼성전자 주식회사 Method of cutting light emitting device chip wafer using laser scribing
EP2823515A4 (en) 2012-03-06 2015-08-19 Soraa Inc Light emitting diodes with low refractive index material layers to reduce light guiding effects
US8971368B1 (en) 2012-08-16 2015-03-03 Soraa Laser Diode, Inc. Laser devices having a gallium and nitrogen containing semipolar surface orientation
US9978904B2 (en) 2012-10-16 2018-05-22 Soraa, Inc. Indium gallium nitride light emitting devices
US8802471B1 (en) 2012-12-21 2014-08-12 Soraa, Inc. Contacts for an n-type gallium and nitrogen substrate for optical devices
US8994033B2 (en) 2013-07-09 2015-03-31 Soraa, Inc. Contacts for an n-type gallium and nitrogen substrate for optical devices
US9419189B1 (en) 2013-11-04 2016-08-16 Soraa, Inc. Small LED source with high brightness and high efficiency
JP2015207752A (en) 2014-04-08 2015-11-19 パナソニックIpマネジメント株式会社 Nitride semiconductor light emission diode
GB201418810D0 (en) 2014-10-22 2014-12-03 Infiniled Ltd Display
GB201418772D0 (en) * 2014-10-22 2014-12-03 Infiniled Ltd Display
KR102306671B1 (en) * 2015-06-16 2021-09-29 삼성전자주식회사 Light emitting diode package
KR102599333B1 (en) * 2016-12-23 2023-11-06 엘지디스플레이 주식회사 Light source module, back light unit and liquid crystal display device using the same
DE102017120037A1 (en) * 2017-08-31 2019-02-28 Osram Opto Semiconductors Gmbh Method for producing a plurality of radiation-emitting semiconductor chips, radiation-emitting semiconductor chip and radiation-emitting semiconductor chip array
DE102022123683A1 (en) 2022-09-15 2024-03-21 Ams-Osram International Gmbh OPTOELECTRONIC COMPONENT AND METHOD FOR THE PRODUCTION THEREOF

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070054476A1 (en) * 2005-09-05 2007-03-08 Sumitomo Electric Industries. Ltd. Method of producing a nitride semiconductor device and nitride semiconductor device
US20090095973A1 (en) * 2007-09-27 2009-04-16 Rohm Co., Ltd. Semiconductor light emitting device

Family Cites Families (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3557011B2 (en) * 1995-03-30 2004-08-25 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
JPH0982587A (en) * 1995-09-08 1997-03-28 Hewlett Packard Co <Hp> Preparation of nonsquare electronic chip
US5764674A (en) 1996-06-28 1998-06-09 Honeywell Inc. Current confinement for a vertical cavity surface emitting laser
US6542526B1 (en) 1996-10-30 2003-04-01 Hitachi, Ltd. Optical information processor and semiconductor light emitting device suitable for the same
US6104450A (en) 1996-11-07 2000-08-15 Sharp Kabushiki Kaisha Liquid crystal display device, and methods of manufacturing and driving same
JPH10335750A (en) 1997-06-03 1998-12-18 Sony Corp Semiconductor substrate and semiconductor device
JPH11340507A (en) * 1998-05-26 1999-12-10 Matsushita Electron Corp Semiconductor light-emitting element and its manufacture
JPH11340576A (en) * 1998-05-28 1999-12-10 Sumitomo Electric Ind Ltd Gallium nitride based semiconductor device
JP2001177146A (en) * 1999-12-21 2001-06-29 Mitsubishi Cable Ind Ltd Triangular shape semiconductor element and manufacturing method therefor
US6858882B2 (en) 2000-09-08 2005-02-22 Sharp Kabushiki Kaisha Nitride semiconductor light-emitting device and optical device including the same
US6936488B2 (en) 2000-10-23 2005-08-30 General Electric Company Homoepitaxial gallium-nitride-based light emitting device and method for producing
JP2002190635A (en) 2000-12-20 2002-07-05 Sharp Corp Semiconductor laser element and its fabricating method
JP4055503B2 (en) * 2001-07-24 2008-03-05 日亜化学工業株式会社 Semiconductor light emitting device
JP3801125B2 (en) 2001-10-09 2006-07-26 住友電気工業株式会社 Single crystal gallium nitride substrate, method for crystal growth of single crystal gallium nitride, and method for manufacturing single crystal gallium nitride substrate
US6498355B1 (en) 2001-10-09 2002-12-24 Lumileds Lighting, U.S., Llc High flux LED array
US6809781B2 (en) 2002-09-24 2004-10-26 General Electric Company Phosphor blends and backlight sources for liquid crystal displays
US7009199B2 (en) 2002-10-22 2006-03-07 Cree, Inc. Electronic devices having a header and antiparallel connected light emitting diodes for producing light from AC current
US7157745B2 (en) 2004-04-09 2007-01-02 Blonder Greg E Illumination devices comprising white light emitting diodes and diode arrays and method and apparatus for making them
US7341880B2 (en) 2003-09-17 2008-03-11 Luminus Devices, Inc. Light emitting device processes
US7128849B2 (en) 2003-10-31 2006-10-31 General Electric Company Phosphors containing boron and metals of Group IIIA and IIIB
US20060038542A1 (en) 2003-12-23 2006-02-23 Tessera, Inc. Solid state lighting device
US20050199899A1 (en) 2004-03-11 2005-09-15 Ming-Der Lin Package array and package unit of flip chip LED
US6956246B1 (en) 2004-06-03 2005-10-18 Lumileds Lighting U.S., Llc Resonant cavity III-nitride light emitting devices fabricated by growth substrate removal
KR100661708B1 (en) 2004-10-19 2006-12-26 엘지이노텍 주식회사 Nitride semiconductor LED and fabrication method thereof
US7858408B2 (en) 2004-11-15 2010-12-28 Koninklijke Philips Electronics N.V. LED with phosphor tile and overmolded phosphor in lens
US7358542B2 (en) 2005-02-02 2008-04-15 Lumination Llc Red emitting phosphor materials for use in LED and LCD applications
KR101145755B1 (en) 2005-03-10 2012-05-16 재팬 사이언스 앤드 테크놀로지 에이젼시 Technique for the growth of planar semi-polar gallium nitride
US7358543B2 (en) 2005-05-27 2008-04-15 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Light emitting device having a layer of photonic crystals and a region of diffusing material and method for fabricating the device
TWI397199B (en) 2005-06-21 2013-05-21 Japan Science & Tech Agency Packaging technique for the fabrication of polarized light emitting diodes
US8148713B2 (en) 2008-04-04 2012-04-03 The Regents Of The University Of California Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes
CN101371413A (en) 2006-01-18 2009-02-18 松下电器产业株式会社 Nitride semiconductor light-emitting device
US8044412B2 (en) 2006-01-20 2011-10-25 Taiwan Semiconductor Manufacturing Company, Ltd Package for a light emitting element
JP4819577B2 (en) 2006-05-31 2011-11-24 キヤノン株式会社 Pattern transfer method and pattern transfer apparatus
US20090273005A1 (en) 2006-07-24 2009-11-05 Hung-Yi Lin Opto-electronic package structure having silicon-substrate and method of forming the same
JP2008141118A (en) 2006-12-05 2008-06-19 Rohm Co Ltd Semiconductor white light emitting device
TW200834962A (en) 2007-02-08 2008-08-16 Touch Micro System Tech LED array package structure having Si-substrate and method of making the same
JP2010518626A (en) 2007-02-12 2010-05-27 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア Optimization of laser rod orientation for nonpolar and semipolar (Ga, Al, In, B) N diode lasers
US7843980B2 (en) 2007-05-16 2010-11-30 Rohm Co., Ltd. Semiconductor laser diode
JP4614988B2 (en) 2007-05-31 2011-01-19 シャープ株式会社 Nitride-based semiconductor laser device and manufacturing method thereof
EP2003696B1 (en) 2007-06-14 2012-02-29 Sumitomo Electric Industries, Ltd. GaN substrate, substrate with epitaxial layer, semiconductor device and method of manufacturing GaN substrate
US7733571B1 (en) 2007-07-24 2010-06-08 Rockwell Collins, Inc. Phosphor screen and displays systems
JP2009071162A (en) * 2007-09-14 2009-04-02 Rohm Co Ltd Semiconductor device and method of manufacturing semiconductor device
JP5053893B2 (en) * 2008-03-07 2012-10-24 住友電気工業株式会社 Method for fabricating a nitride semiconductor laser
US8847249B2 (en) 2008-06-16 2014-09-30 Soraa, Inc. Solid-state optical device having enhanced indium content in active regions
US20100006873A1 (en) 2008-06-25 2010-01-14 Soraa, Inc. HIGHLY POLARIZED WHITE LIGHT SOURCE BY COMBINING BLUE LED ON SEMIPOLAR OR NONPOLAR GaN WITH YELLOW LED ON SEMIPOLAR OR NONPOLAR GaN
CN101621101A (en) 2008-06-30 2010-01-06 展晶科技(深圳)有限公司 LED and production method thereof
US8124996B2 (en) 2008-08-04 2012-02-28 Soraa, Inc. White light devices using non-polar or semipolar gallium containing materials and phosphors
US8148801B2 (en) 2008-08-25 2012-04-03 Soraa, Inc. Nitride crystal with removable surface layer and methods of manufacture
US7923741B1 (en) 2009-01-05 2011-04-12 Lednovation, Inc. Semiconductor lighting device with reflective remote wavelength conversion
US20110056429A1 (en) 2009-08-21 2011-03-10 Soraa, Inc. Rapid Growth Method and Structures for Gallium and Nitrogen Containing Ultra-Thin Epitaxial Structures for Devices
JP5123331B2 (en) * 2010-01-18 2013-01-23 シャープ株式会社 Nitride semiconductor chip manufacturing method and nitride semiconductor chip

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070054476A1 (en) * 2005-09-05 2007-03-08 Sumitomo Electric Industries. Ltd. Method of producing a nitride semiconductor device and nitride semiconductor device
US20090095973A1 (en) * 2007-09-27 2009-04-16 Rohm Co., Ltd. Semiconductor light emitting device

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