WO2011146413A1 - Method and structure capable of changing color saturation - Google Patents
Method and structure capable of changing color saturation Download PDFInfo
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- WO2011146413A1 WO2011146413A1 PCT/US2011/036690 US2011036690W WO2011146413A1 WO 2011146413 A1 WO2011146413 A1 WO 2011146413A1 US 2011036690 W US2011036690 W US 2011036690W WO 2011146413 A1 WO2011146413 A1 WO 2011146413A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
Definitions
- This disclosure relates to displays including electromechanical systems.
- Electromechanical systems include devices having electrical and mechanical elements, actuators, transducers, sensors, optical components (e.g., mirrors) and electronics. Electromechanical systems can be manufactured at a variety of scales including, but not limited to, microscales and nanoscales.
- microelectromechanical systems (MEMS) devices can include structures having sizes ranging from about a micron to hundreds of microns or more.
- Nanoelectromechanical systems (NEMS) devices can include structures having sizes smaller than a micron including, for example, sizes smaller than several hundred nanometers.
- Electromechanical elements may be created using deposition, etching, lithography, and/or other micromachining processes that etch away parts of substrates and/or deposited material layers, or that add layers to form electrical and electromechanical devices.
- an interferometric modulator refers to a device that selectively absorbs and/or reflects light using the principles of optical interference.
- an interferometric modulator may include a pair of conductive plates, one or both of which may be transparent and/or reflective, wholly or in part, and capable of relative motion upon application of an appropriate electrical signal.
- one plate may include a stationary layer deposited on a substrate and the other plate may include a metallic membrane separated from the stationary layer by an air gap. The position of one plate in relation to another can change the optical interference of light incident on the interferometric modulator.
- Interferometric modulator devices have a wide range of applications, and are anticipated to be used in improving existing products and creating new products, especially those with display capabilities.
- a device for modulating light comprising: a movable reflector; a partial reflector positioned at a first distance from said movable reflector; a substrate positioned at a fixed distance from said partial reflector, the substrate having an index of refraction different from the partial reflector; and a multilayer configured to provide a refractive index gradient between the partial reflector and the substrate, the multilayer including at least two dielectric layers, wherein the respective indices of refraction of the at least two dielectric layers are configured to provide a reduction in the index of refraction from the partial reflector to the substrate thereby increasing the color saturation of light reflected by the device.
- the index of refraction of the partial reflector can be larger than the index of refraction of the substrate.
- at least one dielectric layer included in the multilayer can form a color filter.
- the color filter can be a red color filter that substantially suppresses light wavelengths associated with cyan hues.
- the color filter can be a blue color filter that substantially suppresses light wavelengths associated with yellow hues.
- the color filter can be a green color filter that substantially suppresses light wavelengths associated with magenta hues.
- the respective indices of refraction of the at least two dielectric layers can be configured to provide a plurality of reductions in the index of refraction from the partial reflector to the substrate thereby increasing the color saturation of light reflected by the device. In some implementations the respective indices of refraction of the at least two dielectric layers can be configured to provide at least three reductions in the index of refraction from the partial reflector to the substrate thereby increasing the color saturation of light reflected by the device. In some implementations the respective indices of refraction of the at least three dielectric layers can be configured to provide at least four reductions in the index of refraction from the partial reflector to the substrate thereby increasing the color saturation of light reflected by the device.
- a device for modulating light comprising: a movable reflector; a partial reflector positioned at a first distance from said movable reflector; a substrate positioned at a fixed distance from said partial reflector, the substrate having an index of refraction different from the partial reflector; and a dielectric layer having an index of refraction between that of the partial reflector and the substrate and a thickness sufficient to produce an interference filtering effect that increases saturation of light reflected by the device, wherein metal layers are excluded from between the dielectric layer and the substrate.
- a display comprising a plurality of display elements, each of the display elements comprising: means for reflecting light, said reflecting means being movable; means for partially reflecting light, wherein said movable reflecting means and said partial reflecting means are configured to interferometrically modulate light; a substrate positioned at a fixed distance from said partial reflecting means, the substrate having an index of refraction different from the partial reflecting means, wherein there are no metal layers between the substrate and the partial reflecting means; and means for matching refractive indices of the partial reflecting means and the substrate, wherein the refractive index matching means provides a reduction in the index of refraction from the partial reflecting means to the substrate thereby increasing the saturation of a particular color of light reflected by the device.
- the moveable reflecting means can comprise a reflective layer; or the partial reflecting means comprises a partially reflective material; or the refractive index matching means comprises a dielectric layer, the dielectric layer configured to provide a refractive index gradient between the partial reflector and the substrate, and wherein the dielectric layer is also configured as a color filter having a thickness sufficient to produce an interference effect that increases saturation of light reflected by the device.
- Another innovative aspect of the subject matter described in this disclosure can be implemented in a method of making a device for modulating light, the method comprising: forming a movable reflector; forming a partial reflector positioned at a first distance from said movable reflector; providing a substrate positioned at a fixed distance from said partial reflector, the substrate having an index of refraction different from the partial reflector; and forming a dielectric layer configured to provide a refractive index gradient between the partial reflector and the substrate, and wherein the dielectric layer is also configured as a color filter having a thickness sufficient to produce an interference effect that increases saturation of light reflected by the device.
- Figure 1 shows an example of an isometric view depicting two adjacent pixels in a series of pixels of an interferometric modulator (IMOD) display device.
- IMOD interferometric modulator
- Figure 2 shows an example of a system block diagram illustrating an electronic device incorporating a 3x3 interferometric modulator display.
- Figure 3 shows an example of a diagram illustrating movable reflective layer position versus applied voltage for the interferometric modulator of Figure 1.
- Figure 4 shows an example of a table illustrating various states of an interferometric modulator when various common and segment voltages are applied.
- Figure 5 A shows an example of a diagram illustrating a frame of display data in the 3x3 interferometric modulator display of Figure 2.
- Figure 5B shows an example of a timing diagram for common and segment signals that may be used to write the frame of display data illustrated in Figure 5A.
- Figure 6A shows an example of a partial cross-section of the interferometric modulator display of Figure 1.
- Figures 6B-6E show examples of cross-sections of varying implementations of interferometric modulators.
- Figure 7 shows an example of a flow diagram illustrating a manufacturing process for an interferometric modulator.
- Figures 8A-8E show examples of cross-sectional schematic illustrations of various stages in a method of making an interferometric modulator.
- Figure 9 is a chromaticity diagram that illustrates an example of an expanded color gamut provided by one implementation of a display that includes an interferometric modulator in combination with a multilayer having a refractive index gradient.
- Figure 10 is a side cross-sectional view of an implementation of an electromechanical systems device including an interferometric modulator and a multilayer having a refractive index gradient.
- Figures 11 A and 1 IB show examples of system block diagrams illustrating a display device that includes a plurality of interferometric modulators.
- the implementations may be implemented in or associated with a variety of electronic devices such as, but not limited to, mobile telephones, multimedia Internet enabled cellular telephones, mobile television receivers, wireless devices, smartphones, bluetooth devices, personal data assistants (PDAs), wireless electronic mail receivers, hand-held or portable computers, netbooks, notebooks, smartbooks, printers, copiers, scanners, facsimile devices, GPS receivers/navigators, cameras, MP3 players, camcorders, game consoles, wrist watches, clocks, calculators, television monitors, flat panel displays, electronic reading devices (e.g., e-readers), computer monitors, auto displays (e.g., odometer display, etc.), cockpit controls and/or displays, camera view displays (e.g., display of a rear view camera in a vehicle), electronic photographs, electronic billboards or signs, projectors, architectural structures, microwaves, refrigerators, stereo systems, cassette recorders or players, DVD players, CD players, VCRs, radios, portable memory
- PDAs personal data assistant
- teachings herein also can be used in non-display applications such as, but not limited to, electronic switching devices, radio frequency filters, sensors, accelerometers, gyroscopes, motion-sensing devices, magnetometers, inertial components for consumer electronics, parts of consumer electronics products, varactors, liquid crystal devices, electrophoretic devices, drive schemes, manufacturing processes, electronic test equipment.
- electronic switching devices radio frequency filters
- sensors accelerometers
- gyroscopes motion-sensing devices
- magnetometers magnetometers
- inertial components for consumer electronics
- parts of consumer electronics products varactors
- liquid crystal devices parts of consumer electronics products
- electrophoretic devices drive schemes
- manufacturing processes electronic test equipment
- Various implementations include an interferometric modulator device configured to provide improved saturation. With the addition of a color filter layer, the color saturation of an interferometric modulator is improved. In particular, increased saturation and filtering is provided by optically matching the impedance of two materials in the interference modulator using a multilayer having layers with different refractive indices arranged to yield a refractive index gradient. In various implementations the thickness one or more of the layers are selected to provide increased saturation. Accordingly, in various embodiments the multilayer having a refractive index gradient narrows the resonance of a pixel such that the band of wavelengths that are reflected from the pixel is smaller. In turn, a device including a combination of red, green and blue pixels may expand the spectrum of colors that are reflected by the device in operation. Additionally, there may be better contrast between whites and blacks, with the black appearing more true black and containing less of a hue.
- a reflective display device can incorporate interferometric modulators (IMODs) to selectively absorb and/or reflect light incident thereon using principles of optical interference.
- IMODs can include an absorber, a reflector that is movable with respect to the absorber, and an optical resonant cavity defined between the absorber and the reflector.
- the reflector can be moved to two or more different positions, which can change the size of the optical resonant cavity and thereby affect the reflectance of the interferometric modulator.
- the reflectance spectrums of IMODs can create fairly broad spectral bands which can be shifted across the visible wavelengths to generate different colors. The position of the spectral band can be adjusted by changing the thickness of the optical resonant cavity, i.e., by changing the position of the reflector.
- FIG. 1 shows an example of an isometric view depicting two adjacent pixels in a series of pixels of an interferometric modulator (IMOD) display device.
- the IMOD display device includes one or more interferometric MEMS display elements.
- the pixels of the MEMS display elements can be in either a bright or dark state. In the bright ("relaxed,” “open” or “on”) state, the display element reflects a large portion of incident visible light, e.g., to a user. Conversely, in the dark (“actuated,” “closed” or “off) state, the display element reflects little incident visible light. In some implementations, the light reflectance properties of the on and off states may be reversed.
- MEMS pixels can be configured to reflect predominantly at particular wavelengths allowing for a color display in addition to black and white.
- the IMOD display device can include a row/column array of IMODs.
- Each IMOD can include a pair of reflective layers, i.e., a movable reflective layer and a fixed partially reflective layer, positioned at a variable and controllable distance from each other to form an air gap (also referred to as an optical gap or cavity).
- the movable reflective layer may be moved between at least two positions. In a first position, i.e., a relaxed position, the movable reflective layer can be positioned at a relatively large distance from the fixed partially reflective layer. In a second position, i.e., an actuated position, the movable reflective layer can be positioned more closely to the partially reflective layer.
- Incident light that reflects from the two layers can interfere constructively or destructively depending on the position of the movable reflective layer, producing either an overall reflective or non- reflective state for each pixel.
- the IMOD may be in a reflective state when unactuated, reflecting light within the visible spectrum, and may be in a dark state when unactuated, reflecting light outside of the visible range (e.g., infrared light). In some other implementations, however, an IMOD may be in a dark state when unactuated, and in a reflective state when actuated.
- the introduction of an applied voltage can drive the pixels to change states.
- an applied charge can drive the pixels to change states.
- the depicted portion of the pixel array in Figure 1 includes two adjacent interferometric modulators 12.
- a movable reflective layer 14 is illustrated in a relaxed position at a predetermined distance from an optical stack 16, which includes a partially reflective layer.
- the voltage V 0 applied across the IMOD 12 on the left is insufficient to cause actuation of the movable reflective layer 14.
- the movable reflective layer 14 is illustrated in an actuated position near or adjacent the optical stack 16.
- the voltage Vbias applied across the IMOD 12 on the right is sufficient to maintain the movable reflective layer 14 in the actuated position.
- the reflective properties of pixels 12 are generally illustrated with arrows 13 indicating light incident upon the pixels 12, and light 15 reflecting from the pixel 12 on the left.
- arrows 13 indicating light incident upon the pixels 12, and light 15 reflecting from the pixel 12 on the left.
- a portion of the light incident upon the optical stack 16 will be transmitted through the partially reflective layer of the optical stack 16, and a portion will be reflected back through the transparent substrate 20.
- the portion of light 13 that is transmitted through the optical stack 16 will be reflected at the movable reflective layer 14, back toward (and through) the transparent substrate 20. Interference (constructive or destructive) between the light reflected from the partially reflective layer of the optical stack 16 and the light reflected from the movable reflective layer 14 will determine the wavelength(s) of light 15 reflected from the pixel 12.
- the optical stack 16 can include a single layer or several layers.
- the layer(s) can include one or more of an electrode layer, a partially reflective and partially transmissive layer and a transparent dielectric layer.
- the optical stack 16 is electrically conductive, partially transparent and partially reflective, and may be fabricated, for example, by depositing one or more of the above layers onto a transparent substrate 20.
- the electrode layer can be formed from a variety of materials, such as various metals, for example indium tin oxide (ITO).
- the partially reflective layer can be formed from a variety of materials that are partially reflective, such as various metals, e.g., chromium (Cr), semiconductors, and dielectrics.
- the partially reflective layer can be formed of one or more layers of materials, and each of the layers can be formed of a single material or a combination of materials.
- the optical stack 16 can include a single semi-transparent thickness of metal or semiconductor which serves as both an optical absorber and conductor, while different, more conductive layers or portions (e.g., of the optical stack 16 or of other structures of the IMOD) can serve to bus signals between IMOD pixels.
- the optical stack 16 also can include one or more insulating or dielectric layers covering one or more conductive layers or a conductive/absorptive layer.
- the layer(s) of the optical stack 16 can be patterned into parallel strips, and may form row electrodes in a display device as described further below.
- the term "patterned" is used herein to refer to masking as well as etching processes.
- a highly conductive and reflective material such as aluminum (Al) may be used for the movable reflective layer 14, and these strips may form column electrodes in a display device.
- the movable reflective layer 14 may be formed as a series of parallel strips of a deposited metal layer or layers (orthogonal to the row electrodes of the optical stack 16) to form columns deposited on top of posts 18 and an intervening sacrificial material deposited between the posts 18.
- a defined gap 19, or optical cavity can be formed between the movable reflective layer 14 and the optical stack 16.
- the spacing between posts 18 may be on the order of 1-1000 um, while the gap 19 may be on the order of ⁇ 10,000 Angstroms (A).
- each pixel of the IMOD is essentially a capacitor formed by the fixed and moving reflective layers.
- the movable reflective layer 14a remains in a mechanically relaxed state, as illustrated by the pixel 12 on the left in Figure 1, with the gap 19 between the movable reflective layer 14 and optical stack 16.
- a potential difference e.g., voltage
- the capacitor formed at the intersection of the row and column electrodes at the corresponding pixel becomes charged, and electrostatic forces pull the electrodes together. If the applied voltage exceeds a threshold, the movable reflective layer 14 can deform and move near or against the optical stack 16.
- a dielectric layer (not shown) within the optical stack 16 may prevent shorting and control the separation distance between the layers 14 and 16, as illustrated by the actuated pixel 12 on the right in Figure 1.
- the behavior is the same regardless of the polarity of the applied potential difference.
- a series of pixels in an array may be referred to in some instances as “rows” or “columns,” a person having ordinary skill in the art will readily understand that referring to one direction as a "row” and another as a “column” is arbitrary. Restated, in some orientations, the rows can be considered columns, and the columns considered to be rows.
- the display elements may be evenly arranged in orthogonal rows and columns (an “array"), or arranged in non-linear configurations, for example, having certain positional offsets with respect to one another (a “mosaic”).
- array and “mosaic” may refer to either configuration.
- the display is referred to as including an “array” or “mosaic,” the elements themselves need not be arranged orthogonally to one another, or disposed in an even distribution, in any instance, but may include arrangements having asymmetric shapes and unevenly distributed elements.
- Figure 2 shows an example of a system block diagram illustrating an electronic device incorporating a 3x3 interferometric modulator display.
- the electronic device includes a processor 21 that may be configured to execute one or more software modules.
- the processor 21 may be configured to execute one or more software applications, including a web browser, a telephone application, an email program, or any other software application.
- the processor 21 can be configured to communicate with an array driver 22.
- the array driver 22 can include a row driver circuit 24 and a column driver circuit 26 that provide signals to, e.g., a display array or panel 30.
- the cross section of the IMOD display device illustrated in Figure 1 is shown by the lines 1-1 in Figure 2.
- Figure 2 illustrates a 3x3 array of IMODs for the sake of clarity, the display array 30 may contain a very large number of IMODs, and may have a different number of IMODs in rows than in columns, and vice versa.
- Figure 3 shows an example of a diagram illustrating movable reflective layer position versus applied voltage for the interferometric modulator of Figure 1.
- the row/column (i.e., common/segment) write procedure may take advantage of a hysteresis property of these devices as illustrated in Figure 3.
- An interferometric modulator may require, for example, about a 10-volt potential difference to cause the movable reflective layer, or mirror, to change from the relaxed state to the actuated state.
- the movable reflective layer maintains its state as the voltage drops back below, e.g., 10-volts, however, the movable reflective layer does not relax completely until the voltage drops below 2-volts.
- a range of voltage approximately 3 to 7-volts, as shown in Figure 3, exists where there is a window of applied voltage within which the device is stable in either the relaxed or actuated state.
- This is referred to herein as the "hysteresis window” or "stability window.”
- the row/column write procedure can be designed to address one or more rows at a time, such that during the addressing of a given row, pixels in the addressed row that are to be actuated are exposed to a voltage difference of about 10-volts, and pixels that are to be relaxed are exposed to a voltage difference of near zero volts.
- each pixel After addressing, the pixels are exposed to a steady state or bias voltage difference of approximately 5-volts such that they remain in the previous strobing state. In this example, after being addressed, each pixel sees a potential difference within the "stability window" of about 3-7-volts.
- This hysteresis property feature enables the pixel design, e.g., illustrated in Figure 1, to remain stable in either an actuated or relaxed pre-existing state under the same applied voltage conditions. Since each IMOD pixel, whether in the actuated or relaxed state, is essentially a capacitor formed by the fixed and moving reflective layers, this stable state can be held at a steady voltage within the hysteresis window without substantially consuming or losing power. Moreover, essentially little or no current flows into the IMOD pixel if the applied voltage potential remains substantially fixed.
- a frame of an image may be created by applying data signals in the form of "segment" voltages along the set of column electrodes, in accordance with the desired change (if any) to the state of the pixels in a given row.
- Each row of the array can be addressed in turn, such that the frame is written one row at a time.
- segment voltages corresponding to the desired state of the pixels in the first row can be applied on the column electrodes, and a first row pulse in the form of a specific "common" voltage or signal can be applied to the first row electrode.
- the set of segment voltages can then be changed to correspond to the desired change (if any) to the state of the pixels in the second row, and a second common voltage can be applied to the second row electrode.
- the pixels in the first row are unaffected by the change in the segment voltages applied along the column electrodes, and remain in the state they were set to during the first common voltage row pulse.
- This process may be repeated for the entire series of rows, or alternatively, columns, in a sequential fashion to produce the image frame.
- the frames can be refreshed and/or updated with new image data by continually repeating this process at some desired number of frames per second.
- FIG. 4 shows an example of a table illustrating various states of an interferometric modulator when various common and segment voltages are applied.
- the "segment” voltages can be applied to either the column electrodes or the row electrodes, and the “common” voltages can be applied to the other of the column electrodes or the row electrodes.
- a hold voltage When a hold voltage is applied on a common line, such as a high hold voltage VCHOLD H or a low hold voltage VCHOLD_L, the state of the interferometric modulator will remain constant. For example, a relaxed IMOD will remain in a relaxed position, and an actuated IMOD will remain in an actuated position.
- the hold voltages can be selected such that the pixel voltage will remain within a stability window both when the high segment voltage VSH and the low segment voltage VS L are applied along the corresponding segment line.
- the segment voltage swing i.e., the difference between the high VSH and low segment voltage VSL, is less than the width of either the positive or the negative stability window.
- a common line such as a high addressing voltage VCADD H or a low addressing voltage VCADD_L
- data can be selectively written to the modulators along that line by application of segment voltages along the respective segment lines.
- the segment voltages may be selected such that actuation is dependent upon the segment voltage applied.
- an addressing voltage is applied along a common line
- application of one segment voltage will result in a pixel voltage within a stability window, causing the pixel to remain unactuated.
- application of the other segment voltage will result in a pixel voltage beyond the stability window, resulting in actuation of the pixel.
- the particular segment voltage which causes actuation can vary depending upon which addressing voltage is used.
- the high addressing voltage VCADD H when the high addressing voltage VCADD H is applied along the common line, application of the high segment voltage VSH can cause a modulator to remain in its current position, while application of the low segment voltage VSL can cause actuation of the modulator.
- the effect of the segment voltages can be the opposite when a low addressing voltage VCADD L is applied, with high segment voltage VSH causing actuation of the modulator, and low segment voltage VSL having no effect (i.e., remaining stable) on the state of the modulator.
- hold voltages, address voltages, and segment voltages may be used which always produce the same polarity potential difference across the modulators.
- signals can be used which alternate the polarity of the potential difference of the modulators. Alternation of the polarity across the modulators (that is, alternation of the polarity of write procedures) may reduce or inhibit charge accumulation which could occur after repeated write operations of a single polarity.
- Figure 5A shows an example of a diagram illustrating a frame of display data in the 3x3 interferometric modulator display of Figure 2.
- Figure 5B shows an example of a timing diagram for common and segment signals that may be used to write the frame of display data illustrated in Figure 5 A.
- the signals can be applied to the, e.g., 3x3 array of Figure 2, which will ultimately result in the line time 60e display arrangement illustrated in Figure 5A.
- the actuated modulators in Figure 5A are in a dark-state, i.e., where a substantial portion of the reflected light is outside of the visible spectrum so as to result in a dark appearance to, e.g., a viewer.
- the pixels Prior to writing the frame illustrated in Figure 5A, the pixels can be in any state, but the write procedure illustrated in the timing diagram of Figure 5B presumes that each modulator has been released and resides in an unactuated state before the first line time 60a.
- a release voltage 70 is applied on common line 1 ; the voltage applied on common line 2 begins at a high hold voltage 72 and moves to a release voltage 70; and a low hold voltage 76 is applied along common line 3.
- the modulators (common 1 , segment 1), (1,2) and (1,3) along common line 1 remain in a relaxed, or unactuated, state for the duration of the first line time 60a, the modulators (2, 1 ), (2,2) and (2,3) along common line 2 will move to a relaxed state, and the modulators (3, 1 ), (3,2) and (3,3) along common line 3 will remain in their previous state.
- segment voltages applied along segment lines 1 , 2 and 3 will have no effect on the state of the interferometric modulators, as none of common lines 1 , 2 or 3 are being exposed to voltage levels causing actuation during line time 60a (i.e., VCREL - relax and VCHOLD L - stable).
- the voltage on common line 1 moves to a high hold voltage 72, and all modulators along common line 1 remain in a relaxed state regardless of the segment voltage applied because no addressing, or actuation, voltage was applied on the common line 1.
- the modulators along common line 2 remain in a relaxed state due to the application of the release voltage 70, and the modulators (3,1), (3,2) and (3,3) along common line 3 will relax when the voltage along common line 3 moves to a release voltage 70.
- common line 1 is addressed by applying a high address voltage 74 on common line 1. Because a low segment voltage 64 is applied along segment lines 1 and 2 during the application of this address voltage, the pixel voltage across modulators (1 , 1) and (1,2) is greater than the high end of the positive stability window (i.e., the voltage differential exceeded a predefined threshold) of the modulators, and the modulators (1 , 1) and (1,2) are actuated. Conversely, because a high segment voltage 62 is applied along segment line 3, the pixel voltage across modulator (1,3) is less than that of modulators (1 , 1) and (1,2), and remains within the positive stability window of the modulator; modulator (1,3) thus remains relaxed. Also during line time 60c, the voltage along common line 2 decreases to a low hold voltage 76, and the voltage along common line 3 remains at a release voltage 70, leaving the modulators along common lines 2 and 3 in a relaxed position.
- the voltage on common line 1 returns to a high hold voltage 72, leaving the modulators along common line 1 in their respective addressed states.
- the voltage on common line 2 is decreased to a low address voltage 78. Because a high segment voltage 62 is applied along segment line 2, the pixel voltage across modulator (2,2) is below the lower end of the negative stability window of the modulator, causing the modulator (2,2) to actuate. Conversely, because a low segment voltage 64 is applied along segment lines 1 and 3, the modulators (2,1) and (2,3) remain in a relaxed position.
- the voltage on common line 3 increases to a high hold voltage 72, leaving the modulators along common line 3 in a relaxed state.
- the voltage on common line 1 remains at high hold voltage 72, and the voltage on common line 2 remains at a low hold voltage 76, leaving the modulators along common lines 1 and 2 in their respective addressed states.
- the voltage on common line 3 increases to a high address voltage 74 to address the modulators along common line 3.
- the modulators (3,2) and (3,3) actuate, while the high segment voltage 62 applied along segment line 1 causes modulator (3,1) to remain in a relaxed position.
- the 3x3 pixel array is in the state shown in Figure 5A, and will remain in that state as long as the hold voltages are applied along the common lines, regardless of variations in the segment voltage which may occur when modulators along other common lines (not shown) are being addressed.
- a given write procedure (i.e., line times 60a-60e) can include the use of either high hold and address voltages, or low hold and address voltages.
- the pixel voltage remains within a given stability window, and does not pass through the relaxation window until a release voltage is applied on that common line.
- the actuation time of a modulator may determine the necessary line time.
- the release voltage may be applied for longer than a single line time, as depicted in Figure 5B.
- voltages applied along common lines or segment lines may vary to account for variations in the actuation and release voltages of different modulators, such as modulators of different colors.
- Figures 6A- 6E show examples of cross-sections of varying implementations of interferometric modulators, including the movable reflective layer 14 and its supporting structures.
- Figure 6A shows an example of a partial cross-section of the interferometric modulator display of Figure 1, where a strip of metal material, i.e., the movable reflective layer 14 is deposited on supports 18 extending orthogonally from the substrate 20.
- the movable reflective layer 14 of each IMOD is generally square or rectangular in shape and attached to supports at or near the corners, on tethers 32.
- the movable reflective layer 14 is generally square or rectangular in shape and suspended from a deformable layer 34, which may include a flexible metal.
- the deformable layer 34 can connect, directly or indirectly, to the substrate 20 around the perimeter of the movable reflective layer 14. These connections are herein referred to as support posts.
- the implementation shown in Figure 6C has additional benefits deriving from the decoupling of the optical functions of the movable reflective layer 14 from its mechanical functions, which are carried out by the deformable layer 34.
- This decoupling allows the structural design and materials used for the reflective layer 14 and those used for the deformable layer 34 to be optimized independently of one another.
- Figure 6D shows another example of an IMOD, where the movable reflective layer 14 includes a reflective sub-layer 14a.
- the movable reflective layer 14 rests on a support structure, such as support posts 18.
- the support posts 18 provide separation of the movable reflective layer 14 from the lower stationary electrode (i.e., part of the optical stack 16 in the illustrated IMOD) so that a gap 19 is formed between the movable reflective layer 14 and the optical stack 16, for example when the movable reflective layer 14 is in a relaxed position.
- the movable reflective layer 14 also can include a conductive layer 14c, which may be configured to serve as an electrode, and a support layer 14b.
- the conductive layer 14c is disposed on one side of the support layer 14b, distal from the substrate 20, and the reflective sub-layer 14a is disposed on the other side of the support layer 14b, proximal to the substrate 20.
- the reflective sub-layer 14a can be conductive and can be disposed between the support layer 14b and the optical stack 16.
- the support layer 14b can include one or more layers of a dielectric material, for example, silicon oxynitride (SiON) or silicon dioxide (Si0 2 ).
- the support layer 14b can be a stack of layers, such as, for example, a Si0 2 /SiON/Si0 2 tri-layer stack.
- Either or both of the reflective sub-layer 14a and the conductive layer 14c can include, e.g., an Al alloy with about 0.5% Cu ; or another reflective metallic material.
- Employing conductive layers 14a, 14c above and below the dielectric support layer 14b can balance stresses and provide enhanced conduction.
- the reflective sub-layer 14a and the conductive layer 14c can be formed of different materials for a variety of design purposes, such as achieving specific stress profiles within the movable reflective layer 14.
- some implementations also can include a black mask structure 23.
- the black mask structure 23 can be formed in optically inactive regions (e.g., between pixels or under posts 18) to absorb ambient or stray light.
- the black mask structure 23 also can improve the optical properties of a display device by inhibiting light from being reflected from or transmitted through inactive portions of the display, thereby increasing the contrast ratio.
- the black mask structure 23 can be conductive and be configured to function as an electrical bussing layer.
- the row electrodes can be connected to the black mask structure 23 to reduce the resistance of the connected row electrode.
- the black mask structure 23 can be formed using a variety of methods, including deposition and patterning techniques.
- the black mask structure 23 can include one or more layers.
- the black mask structure 23 includes a molybdenum-chromium (MoCr) layer that serves as an optical absorber, a Si0 2 layer, and an aluminum alloy that serves as a reflector and a bussing layer, with a thickness in the range of about 30-80 A, 500-1000 A, and 500-6000 A, respectively.
- the one or more layers can be patterned using a variety of techniques, including photolithography and dry etching, including, for example, CF 4 and/or 0 2 for the MoCr and Si0 2 layers and Cl 2 and/or BC1 3 for the aluminum alloy layer.
- the black mask 23 can be an etalon or interferometric stack structure.
- the conductive absorbers can be used to transmit or bus signals between lower, stationary electrodes in the optical stack 16 of each row or column.
- a spacer layer 35 can serve to generally electrically isolate the absorber layer 16a from the conductive layers in the black mask 23.
- Figure 6E shows another example of an IMOD, where the movable reflective layer 14 is self supporting.
- the implementation of Figure 6E does not include support posts 18. Instead, the movable reflective layer 14 contacts the underlying optical stack 16 at multiple locations, and the curvature of the movable reflective layer 14 provides sufficient support that the movable reflective layer 14 returns to the unactuated position of Figure 6E when the voltage across the interferometric modulator is insufficient to cause actuation.
- the IMODs function as direct-view devices, in which images are viewed from the front side of the transparent substrate 20, i.e., the side opposite to that upon which the modulator is arranged.
- the back portions of the device that is, any portion of the display device behind the movable reflective layer 14, including, for example, the deformable layer 34 illustrated in Figure 6C
- the reflective layer 14 optically shields those portions of the device.
- a bus structure (not illustrated) can be included behind the movable reflective layer 14 which provides the ability to separate the optical properties of the modulator from the electromechanical properties of the modulator, such as voltage addressing and the movements that result from such addressing.
- the implementations of Figures 6A-6E can simplify processing, such as, e.g., patterning.
- Figure 7 shows an example of a flow diagram illustrating a manufacturing process 80 for an interferometric modulator
- Figures 8A-8E show examples of cross- sectional schematic illustrations of corresponding stages of such a manufacturing process 80.
- the manufacturing process 80 can be implemented to manufacture, e.g., interferometric modulators of the general type illustrated in Figures 1 and 6, in addition to other blocks not shown in Figure 7.
- the process 80 begins at block 82 with the formation of the optical stack 16 over the substrate 20.
- Figure 8A illustrates such an optical stack 16 formed over the substrate 20.
- the substrate 20 may be a transparent substrate such as glass or plastic, it may be flexible or relatively stiff and unbending, and may have been subjected to prior preparation processes, e.g., cleaning, to facilitate efficient formation of the optical stack 16.
- the optical stack 16 can be electrically conductive, partially transparent and partially reflective and may be fabricated, for example, by depositing one or more layers having the desired properties onto the transparent substrate 20.
- the optical stack 16 includes a multilayer structure having sub-layers 16a and 16b, although more or fewer sub-layers may be included in some other implementations.
- one of the sub-layers 16a, 16b can be configured with both optically absorptive and conductive properties, such as the combined conductor/absorber sub-layer 16a. Additionally, one or more of the sub-layers 16a, 16b can be patterned into parallel strips, and may form row electrodes in a display device. Such patterning can be performed by a masking and etching process or another suitable process known in the art. In some implementations, one of the sub-layers 16a, 16b can be an insulating or dielectric layer, such as sub-layer 16b that is deposited over one or more metal layers (e.g., one or more reflective and/or conductive layers). In addition, the optical stack 16 can be patterned into individual and parallel strips that form the rows of the display.
- the process 80 continues at block 84 with the formation of a sacrificial layer 25 over the optical stack 16.
- the sacrificial layer 25 is later removed (e.g., at block 90) to form the cavity 19 and thus the sacrificial layer 25 is not shown in the resulting interferometric modulators 12 illustrated in Figure 1.
- Figure 8B illustrates a partially fabricated device including a sacrificial layer 25 formed over the optical stack 16.
- the formation of the sacrificial layer 25 over the optical stack 16 may include deposition of a xenon difluoride (XeF 2 )-etchable material such as molybdenum (Mo) or amorphous silicon (Si), in a thickness selected to provide, after subsequent removal, a gap or cavity 19 (see also Figures 1 and 8E) having a desired design size.
- XeF 2 xenon difluoride
- Mo molybdenum
- Si amorphous silicon
- Deposition of the sacrificial material may be carried out using deposition techniques such as physical vapor deposition (PVD, e.g., sputtering), plasma-enhanced chemical vapor deposition (PECVD), thermal chemical vapor deposition (thermal CVD), or spin-coating.
- PVD physical vapor deposition
- PECVD plasma-enhanced chemical vapor deposition
- thermal CVD thermal chemical vapor deposition
- the process 80 continues at block 86 with the formation of a support structure e.g., a post 18 as illustrated in Figures 1, 6 and 8C.
- the formation of the post 18 may include patterning the sacrificial layer 25 to form a support structure aperture, then depositing a material (e.g., a polymer or an inorganic material, e.g., silicon oxide) into the aperture to form the post 18, using a deposition method such as PVD, PECVD, thermal CVD, or spin-coating.
- a material e.g., a polymer or an inorganic material, e.g., silicon oxide
- the support structure aperture formed in the sacrificial layer can extend through both the sacrificial layer 25 and the optical stack 16 to the underlying substrate 20, so that the lower end of the post 18 contacts the substrate 20 as illustrated in Figure 6A.
- the aperture formed in the sacrificial layer 25 can extend through the sacrificial layer 25, but not through the optical stack 16.
- Figure 8E illustrates the lower ends of the support posts 18 in contact with an upper surface of the optical stack 16.
- the post 18, or other support structures may be formed by depositing a layer of support structure material over the sacrificial layer 25 and patterning portions of the support structure material located away from apertures in the sacrificial layer 25.
- the support structures may be located within the apertures, as illustrated in Figure 8C, but also can, at least partially, extend over a portion of the sacrificial layer 25.
- the patterning of the sacrificial layer 25 and/or the support posts 18 can be performed by a patterning and etching process, but also may be performed by alternative etching methods.
- the process 80 continues at block 88 with the formation of a movable reflective layer or membrane such as the movable reflective layer 14 illustrated in Figures 1, 6 and 8D.
- the movable reflective layer 14 may be formed by employing one or more deposition steps, e.g., reflective layer (e.g., aluminum, aluminum alloy) deposition, along with one or more patterning, masking, and/or etching steps.
- the movable reflective layer 14 can be electrically conductive, and referred to as an electrically conductive layer.
- the movable reflective layer 14 may include a plurality of sub-layers 14a, 14b, 14c as shown in Figure 8D.
- one or more of the sub-layers may include highly reflective sub-layers selected for their optical properties, and another sub-layer 14b may include a mechanical sub-layer selected for its mechanical properties. Since the sacrificial layer 25 is still present in the partially fabricated interferometric modulator formed at block 88, the movable reflective layer 14 is typically not movable at this stage. A partially fabricated IMOD that contains a sacrificial layer 25 may also be referred to herein as an "unreleased" IMOD. As described above in connection with Figure 1, the movable reflective layer 14 can be patterned into individual and parallel strips that form the columns of the display.
- the process 80 continues at block 90 with the formation of a cavity, e.g., cavity 19 as illustrated in Figures 1, 6 and 8E.
- the cavity 19 may be formed by exposing the sacrificial material 25 (deposited at block 84) to an etchant.
- an etchable sacrificial material such as Mo or amorphous Si may be removed by dry chemical etching, e.g., by exposing the sacrificial layer 25 to a gaseous or vaporous etchant, such as vapors derived from solid XeF 2 for a period of time that is effective to remove the desired amount of material, typically selectively removed relative to the structures surrounding the cavity 19.
- a gaseous or vaporous etchant such as vapors derived from solid XeF 2
- the sacrificial layer 25 is removed during block 90, the movable reflective layer 14 is typically movable after this stage. After removal of the sacrificial material 25, the resulting fully or partially fabricated IMOD may be referred to herein as a "released" IMOD.
- modulators 12 reflect light that has one or more spectral peaks when wavelength is plotted versus intensity.
- the perceived color of light produced by a modulator 12 depends on the number, location, and spectral width of these peaks of the modulator 12 within the visible spectrum.
- the width of such peaks may be characterized by the width of the peak at the half maximum of intensity of reflected light, e.g., the full width at half maximum.
- modulators 12 that reflect light over a narrower range of wavelengths e.g., have a narrower peak or higher "Q" value, produce colored light that is more saturated.
- saturation refers to the dominance of hue in the color as indicated by the narrowness of the range of wavelengths of light output.
- a highly saturated hue has a vivid, intense color, while a less saturated hue appears more muted and grey.
- a laser which produces a very narrow range of wavelengths, produces highly saturated light.
- a typical incandescent light bulb produces white light that may have a desaturated red or blue color.
- the saturation of the modulators 12 that comprise a color pixel affects properties of a display such as the color gamut and white point of the display.
- An exemplary color display includes red, green, and blue display elements. Other colors are produced in such a display by varying the relative intensity of light produced by the red, green, and blue elements. Such mixtures of primary colors such as red, green, and blue are perceived by the human eye as other colors.
- the relative values of red, green, and blue in such a color system may be referred to as tristimulus values in reference to the stimulation of red, green, and blue light sensitive portions of the human eye.
- the range of colors that can be produced by a particular display may be referred to as the color gamut of the display. In general, increasing the saturation of the primary colors increases the color gamut, or range of colors that can be produced by the display.
- an embodiment of a display has a relatively larger color gamut as compared to some other displays because the saturation of at least one of the primary colors is substantially increased. While an exemplary color system based on red, green, and blue are disclosed herein, in other embodiments, the display may include modulators 12 having sets of colors that define other color systems in terms of sets of colors other than red, green, and blue.
- an output spectral peak of a light modulator that is broad or wide will appear brighter than one that is narrow because more light energy is reflected.
- the broader spectrum will appear brighter, it will also be less saturated, e.g., appear pastel in color because the reflected light energy is spread across a broader spectrum.
- the modulators 12 may be formed so as to increase the color saturation of reflected light.
- the saturation of light output by a display that includes the interferometric modulator 12 is increased using a color filter.
- a display may include a color filter that is configured to cause the interferometric modulator to output light having a wavelength response peak that is narrower than the visible light wavelength response peak of the modulator 12 without the color filter.
- this filter is an interference filter. This filter may be formed by adding a dielectric layer to the interferometric modulator.
- an interferometric modulator is provided with a multilayer having layers with different refractive indices arranged to yield a refractive index gradient.
- the multilayer is included in the interferometric modulator so as to optically match the impedance of two materials in the interference modulator.
- the multilayer may include one or more color filter layers. In some embodiments, for example, a plurality of layers and possibly each layer in the multilayer contributes to increasing color saturation.
- a single layer is configured as a color filter that increases saturation.
- the single layer is configured to improve saturation by forming the color filter layer.
- the layer comprises a dielectric layer having a thickness tuned to provide a narrow spectral transmission band.
- the layer operates as an interference filter with reflective surfaces formed at the top and bottom (rear and front) of the dielectric layer are separated by a distance so as to provide optical interference and a resultant transmission spectrum with a narrow spectral band.
- the dielectric layer through such an interferometric effect operates as a color filter layer.
- the dielectric layer may have an index of refraction that is between that of adjacent layers so as to provide a gradient in refractive index. As described above, the dielectric layer having a refractive index gradient narrows the resonance of a pixel such that the band of wavelengths that are reflected from the pixel is smaller.
- additional layers for example, additional dielectric layers. These layers may establish a gradient in refractive index. One or more (possibly all) of these layers may also have a thickness that provides for color filtering and/or increased saturation. The additional layers may in some embodiments provide increased saturation. Such a designed is discussed in more detail with regard to Figure 10.
- Figure 9 is a chromaticity diagram that illustrates an example of an expanded color gamut provided by an embodiment of a display that includes an interferometric modulator with a multilayer having a refractive index gradient.
- the multilayer having a refractive index gradient may be configured to provide color filtering and to provide refractive index matching between a reflector and the transparent substrate of the interferometric modulator.
- color is often described using three dimensions: hue, saturation, and lightness-darkness.
- the CIE defines color in three dimensions according to a color model known as the CIE 1976 ( * u*, v*) color space (also referred to as the CIELUV color space).
- the model was originally developed based on the tristimulus theory of color perception, which is based on the scientific understanding that human eyes contain three different types of color receptors called cones. These three receptors respond differently to different wavelengths of visible light.
- Hue is often described with the words that are commonly used to describe color: red, orange, yellow, green, blue, purple, etc.
- hue is more specifically described as the dominant wavelength of light perceived by the human eye.
- Saturation refers to the dominance or purity of a hue in a particular color relative to other colors.
- saturation is the ratio of the dominant light wavelength to other wavelengths in the color. For example saturated red light contains less light energy from others colors than less saturated red light, but the less saturated red may appear brighter.
- White light is white because it contains an even balance of all wavelengths. How light or dark a color appears is referred to as value or brightness.
- value describes the overall intensity or strength of the light. As noted above, brighter colors tend to be muted or pastel colors because bright colors tend to have a broader spectrum that very saturated colors.
- Chromaticity is understood by those skilled in the art to be one possible objective specification of the quality of a particular color irrespective of luminance, as determined by the hue and saturation (or excitation purity).
- the chromaticity diagram of Figure 9 is defined by a pair of chromaticity dimensions or coordinates (u*,v*), leaving out the luminance dimension, L*, defining the CIELUV color space.
- the chromaticity dimensions (w* v*) of the CIELUV color space allow the saturation of colored light to be considered in a two-dimensional space, which is easier to represent and interpret graphically than higher order spaces.
- an embodiment of an interferometric modulator-based display can be characterized for the purposes of measurement and testing using any suitable color model or system, and that the CIELUV color space is merely described herein as one of many possible color models that may be employed to characterize an embodiment of an interferometric modulator-based display.
- trace 91 defines the approximate boundary of the color gamut provided by the CIELUV color space.
- the trace 91 defines the approximate boundary of colors perceptible by human eyes according to the definition of the CIELUV color space.
- Trace 92 defines the approximate boundary of the color gamut provided by the sRGB color space.
- the trace 92 defines the approximate boundary of colors perceptible by human eyes that can be reproduced under the sRGB color space by electronics, such as, monitors, printers, projectors, etc.
- the simulated point D65 as defined by the CIE and discussed above, is the simulated standard white point corresponding roughly to a midday sun in Northwestern Europe.
- the CIE specifies that D65 is preferably used in all colorimetric calculations requiring representative daylight, unless there are specific reasons for using a different illuminant. Variations in the relative spectral power distribution of daylight are known to occur, particularly in the ultraviolet spectral region, as a function of season, time of day, and geographic location. Those skilled in the art will also appreciate that there are no actual D65 light sources, only simulators. The traces 91, 92 and the point D65 are useful references for evaluating the performance of displays and the like.
- Trace 94 is a test result which defines the approximate boundary of the color gamut that can be reflected by an embodiment of a display including display elements, which include an interferometric modulator with a multilayer having a refractive index gradient.
- the multilayer having a refractive index gradient is configured to provide refractive index matching between a reflector and a transparent substrate of the interferometric modulator and to provide color filtering.
- trace 93 is a trace that defines the approximate boundary of the color gamut of a display that employs similar interferometric modulators that do not include the multilayer having a refractive index gradient between the reflector and a transparent substrate of the interferometric modulator.
- the area enclosed by the trace 93 is smaller than the area enclosed by the trace 94, which means that the color gamut defined by the trace 94 is larger than the trace 93.
- the larger color gamut is the result of increasing the color saturation of red, blue and green, which, with reference to the chromaticity diagram of Figure 9, is represented by the larger enclosed area defined by trace 94.
- Those skilled in the art will appreciate that increasing the saturation of any one or more of red, blue, and green will increase the color gamut. As such, the color gamut of a display can be increased by merely increasing the color saturation of just one of red, blue and green.
- one of the red, blue or green subpixels of a display is provided with a multilayer having a refractive index gradient, which is configured to provide refractive index matching and color filtering.
- one or more of the red, blue and green subpixels of a display is provided with a multilayer having a refractive index gradient, which is configured index matching and color filtering.
- Figure 10 is a side cross-sectional view of an embodiment of an interferometric modulator that includes a multilayer having a refractive index gradient formed on the transparent substrate 20.
- the interferometric modulator functions as a direct-view device, in which images are viewed from the front side of the transparent substrate 20, the side opposite to that upon which the interferometric modulator is arranged.
- the interferometric modulator includes a moveable reflective layer 14, a partially reflective layer 106, and dielectric layers 108a, 108b.
- the dielectric layer 108a includes Si0 2 .
- the dielectric layer 108b includes AlOx.
- the reflective layer 14 includes AlCu.
- the partially reflective layer 106 includes MoCr.
- the reflective layer 14 is connected to the substrate 20 by the posts 18.
- the modulator 122 may include features according to any embodiment of the modulator 12 disclosed herein.
- the application of a voltage between the reflective layer 14 and the partially reflective layer 106 causes the reflective layer 14 to move toward the partially reflective layer 106.
- the dielectric layers 108a, 108b electrically isolate the reflective layer 14 from the partially reflective layer 106.
- a multilayer 126 that provides a refractive index gradient is formed between the substrate 20 and the partially reflective layer 106.
- the multilayer 126 having a refractive index gradient comprises a stack of layers including at least two dielectric layers.
- the respective indices of refraction of the at least two dielectric layers are configured to provide a gradual change in the index of refraction from the partial reflector 106 to the substrate 20 thereby increasing color saturation.
- the respective indices of refraction of the at least two dielectric layers are configured to provide at least three reductions in the index of refraction from the partially reflector layer 106 to the substrate 20 thereby increasing the color saturation of light reflected by the device.
- At least one dielectric layer included in the multilayer 126 is also configured as a color filter.
- at least one dielectric layer e.g., dielectric layer 104a
- top and bottom surfaces may be in contact with the layers above and below (e.g., partially reflective layer 106, dielectric layer 104b), respectively that may have different refractive indexes such that the interfaces between the layers (e.g., 106/104a and 104a/104b) form reflective surfaces via Fresnel reflection and index mismatch. Reflections from these surfaces can contribute to optical interference that affects spectral transmission.
- the space separating these interfaces is determined by the thickness of the dielectric layer (e.g., 104a) and can be such that the spectral transmission has a narrow transmission band or peak that provides color filtering.
- the dielectric layer can alter the transmission spectrum in other ways as well.
- additional dielectric layers may provide index matching.
- These additional dielectric layers may also have suitable thickness so as to enhance the filtering effect and increase optical saturation as a result of optical interference.
- Any one of the layers e.g., 104b, 104c, 104d
- the thickness of one or more of the layers is such that the optical interference results in color filtering and increased color saturation.
- the respective indices of refraction of the three dielectric layers 104b, 104c, 104d are configured to provide at least four reductions in the index of refraction from the partially reflector layer 106 to the substrate 20 thereby increasing the color saturation of light reflected by the device. That is, in such an embodiment, there is a first reduction in the index of refraction between the partially reflective layer 106 and the dielectric layer 104b. Additionally, there is a second reduction in the index of refraction between the dielectric layers 104b, 104c. Additionally, there is a third reduction in the index of refraction between the dielectric layers 104c, 104d. And there is a fourth reduction in the index of refraction between the dielectric layer 104d and the substrate 20.
- the multilayer 126 having a refractive index gradient is an optical stack made up of the four layers 104a, 104b, 104c, 104d of material.
- the first layer 104a is configured to serve as a color filter.
- the layer 104a is configured to serve as a red color filter that substantially suppresses light wavelengths associated with cyan hues.
- the layer 104a that is configured to serve as a color filter is configured to serve as a blue color filter that substantially suppresses light wavelengths associated with yellow hues.
- the color filter layer 104a is configured to serve as a green color filter that substantially suppresses light wavelengths associated with magenta hues.
- the second layer 104b is configured to serve as an etch stop layer, and includes a material less susceptible to etchants (e.g. AlOx) that might otherwise go through the layer beneath the second layer 104b when etching the layer 104a on top of the second layer 104b.
- the third layer 104c includes Si0 2 .
- the fourth layer 104d is configured to serve as an etch stop layer, and includes a material less susceptible to etchants (e.g. AlOx) that might otherwise go through the material beneath the fourth layer 104d when etching the layer 104c (e.g., Si0 2 ) on top of the fourth layer 104d.
- the dielectric layers 104a, 104b, 104c, 104d are configured to produce a refractive index gradient between the partially reflective layer 106 and the substrate 20. Providing such a gradient between the partially reflective layer and the substrate 20 can also be described as a form of optical impedance matching. More specifically, in one embodiment: the first partially reflective layer 106 (MoCr) has a refractive index of approximately 3.0 - 4.0; the first dielectric layer 104a (e.g.
- the color filter is configured to have a refractive index of approximately 1.9 - 2.6; the second dielectric layer 104b is configured to have a refractive index of approximately 1.7; the third dielectric layer 104c is configured to have a refractive index of approximately 1.5; the fourth dielectric layer 104d is configured to have a refractive index of approximately 1.7; and the substrate 20 is configured to have a refractive index of approximately 1.4 - 1.6.
- the thickness of one or more, possibly all, of these layers 104a, 104b, 104c, 104d may be selected to provide color filtering and increased saturation via optical interference effects. Accordingly, the presence of any of these layers may increase the color saturation of the resultant modulator in comparison to an identical modulator without the layer (or layers). In some embodiments, the presence of any of these dielectric layers (e.g., 104a, 104b, 104c, 104d) may even increase the color saturation of the resultant modulator in comparison to a modulator with the same layer (or layers) removed but having the thickness(es) of the remaining layers in the modulator adjusted to optimize saturation.
- these dielectric layers e.g., 104a, 104b, 104c, 104d
- various embodiments such as the embodiment shown in Figure 10 may provide a more saturated red interferometric modulator. Similar approaches may be used to form different color interferometric modulators. For example, a green interferometric modulator having increase saturation may be produced using the same, similar, or different materials. Other color interferometric modulators having improved saturation may also be produced.
- the multilayer index gradient provides for at least one reduction in refractive index from the partial reflector to a first layer in the multilayer that is under the partial reflector, at least one reduction in refractive index from the first layer in the multilayer to a second layer in the multilayer that is under the first layer, and at least one reduction from the second layer in the multilayer to the substrate that is under the second layer.
- additional reductions are included.
- a third layer may be included in the multilayer under the second layer. This third layer may provide a reduction in refractive index with respect to the second layer.
- the index of the third layer may be such that the substrate, which is located under the third layer, has a lower refractive index than the third layer.
- Other embodiments are possible.
- the multilayer itself has layers that provide the multilayer with a gradient in refractive index.
- layers may be included that deviate from the trend of the gradient provided by the multilayer.
- the multilayer may include a plurality of layers with progressively decreasing index of refraction, one or more layers may be introduced between layers in the multilayer which result in an increase of index of refraction from one layer to the next. In some embodiments, however, the overall gradient may still be maintained.
- the multilayer index gradient may provide for at least one reduction in refractive index from the partial reflector to a first layer in the multilayer that is under the partial reflector, at least one reduction in refractive index from the first layer in the multilayer to a second layer in the multilayer that is under the first layer, and at least one reduction from the second layer in the multilayer to a third layer in the multilayer that is under the second layer but an increase in refractive index from the third layer in the multilayer to the substrate that is under the third layer, however, with the index of the substrate being lower than the index of the second layer.
- one or more layers may be included in the multilayer that deviate from the trend of the refractive index gradient within the multilayer.
- Other designs are possible.
- optically matching the impedance of two materials with substantially different respective refractive indices with a refractive index gradient comprising a plurality of layers of material arranged to provide a gradient index substantially improves the saturation of the interferometric modulator.
- the optical impedance matching helps to improve saturation by narrowing the resonance of a pixel such that the band of wavelengths that are reflected from the pixel is smaller.
- the resonance of a pixel may be narrowed by specifically configuring the refractive index of each of one or more dielectric layers 104b, 104c, 104d below the first dielectric layer 104a.
- the refractive index of each particular dielectric layer 104a, 104b, 104c, 104d can be adjusted by, for example, the chemistry of each layer.
- any one or more of the dielectric layers 104a, 104b, 104c, 104d can have a thickness suitable to provide through interference effects increased saturation.
- the topmost layer (e.g., layer 104a) in the multilayer is referred to as a color filter, any one or more of the other layers may be characterized as a color filter in various embodiments.
- a combination of red, green and blue display elements may expand the spectrum of colors that are reflected by the display in operation. Additionally, by providing index matching, an index gradient, and/or one or more color filters (e.g., by adjusting the thickness of layers) such as described herein, there may be better contrast between whites and blacks, as the black state produced by the interferometric modulator may be darker with less hue. A blacker back, which may be produced by using embodiments described herein, provides for more desirable images as well as better contrast.
- dielectric layers are described above in the multilayer, more or less dielectric layers may be used. Additionally, other materials may be used. Another type of material that may be used is SiON. Materials other than those specifically recited herein may also be used.
- a single layer (e.g. 104a) that is configured as a color filter may have a thickness that provides an interferometric filtering effect that improves saturation.
- the thickness of the single layer may be such that Fresnel reflections from the top and bottom of the single layer produce optical interference and yield a transmission spectrum that provides color filtering.
- the single dielectric layer having a thickness sufficient to create an interferometric filtering effect as a result of an optical resonant cavity as defined by the boundaries of the dielectric layer adjacent to other materials, may improve saturation.
- the thickness is sufficient to create an effect similar to or substantially identical to an interference filter.
- the single layer may also provide index matching.
- the single dielectric layer may, for example, have an index of refraction between the index of refraction of that layer directly above (e.g., partially reflective layer) and the layer (e.g. substrate) directly below the single dielectric layer.
- no metal layers are included between the single dielectric layer and the substrate.
- the multilayer does not include any metal layers in various embodiments.
- No metal layers are also included between the multilayer and the substrate in various embodiments.
- no metal layers are included between the dielectric layer or layers and the substrate.
- an interferometric modulator device incorporating a wavelength filter such as the dielectric layer or the multilayer having a refractive index gradient involves only a few additional process steps compared to the production of an interferometric modulator device without the dielectric layer or multilayer having a refractive index gradient.
- incorporation of the multilayer having a refractive index gradient involves only the additional steps of depositing the dielectric layers 104a, 104b, 104c, 104d.
- FIGS 11 A and 1 IB show examples of system block diagrams illustrating a display device 40 that includes a plurality of interferometric modulators.
- the display device 40 can be, for example, a cellular or mobile telephone. However, the same components of the display device 40 or slight variations thereof are also illustrative of various types of display devices such as televisions, e-readers and portable media players.
- the display device 40 includes a housing 41 , a display 30, an antenna 43, a speaker 45, an input device 48, and a microphone 46.
- the housing 41 can be formed from any of a variety of manufacturing processes, including injection molding, and vacuum forming.
- the housing 41 may be made from any of a variety of materials, including, but not limited to: plastic, metal, glass, rubber, and ceramic, or a combination thereof.
- the housing 41 can include removable portions (not shown) that may be interchanged with other removable portions of different color, or containing different logos, pictures, or symbols.
- the display 30 may be any of a variety of displays, including a bi-stable or analog display, as described herein.
- the display 30 also can be configured to include a flat- panel display, such as plasma, EL, OLED, STN LCD, or TFT LCD, or a non-flat-panel display, such as a CRT or other tube device.
- the display 30 can include an interferometric modulator display, as described herein.
- the components of the display device 40 are schematically illustrated in Figure 1 IB.
- the display device 40 includes a housing 41 and can include additional components at least partially enclosed therein.
- the display device 40 includes a network interface 27 that includes an antenna 43 which is coupled to a transceiver 47.
- the transceiver 47 is connected to a processor 21, which is connected to conditioning hardware 52.
- the conditioning hardware 52 may be configured to condition a signal (e.g., filter a signal).
- the conditioning hardware 52 is connected to a speaker 45 and a microphone 46.
- the processor 21 is also connected to an input device 48 and a driver controller 29.
- the driver controller 29 is coupled to a frame buffer 28, and to an array driver 22, which in turn is coupled to a display array 30.
- a power supply 50 can provide power to all components as required by the particular display device 40 design.
- the network interface 27 includes the antenna 43 and the transceiver 47 so that the display device 40 can communicate with one or more devices over a network.
- the network interface 27 also may have some processing capabilities to relieve, e.g., data processing requirements of the processor 21.
- the antenna 43 can transmit and receive signals.
- the antenna 43 transmits and receives RF signals according to the IEEE 16.1 1 standard, including IEEE 16.1 1(a), (b), or (g), or the IEEE 802.11 standard, including IEEE 802.11a, b, g or n.
- the antenna 43 transmits and receives RF signals according to the BLUETOOTH standard.
- the antenna 43 is designed to receive code division multiple access (CDMA), frequency division multiple access (FDMA), time division multiple access (TDMA), Global System for Mobile communications (GSM), GSM/General Packet Radio Service (GPRS), Enhanced Data GSM Environment (EDGE), Terrestrial Trunked Radio (TETRA), Wideband-CDMA (W-CDMA), Evolution Data Optimized (EV-DO), lxEV-DO, EV-DO Rev A, EV-DO Rev B, High Speed Packet Access (HSPA), High Speed Downlink Packet Access (HSDPA), High Speed Uplink Packet Access (HSUPA), Evolved High Speed Packet Access (HSPA+), Long Term Evolution (LTE), AMPS, or other known signals that are used to communicate within a wireless network, such as a system utilizing 3G or 4G technology.
- CDMA code division multiple access
- FDMA frequency division multiple access
- TDMA Time division multiple access
- GSM Global System for Mobile communications
- GPRS GSM/General Packe
- the transceiver 47 can pre-process the signals received from the antenna 43 so that they may be received by and further manipulated by the processor 21.
- the transceiver 47 also can process signals received from the processor 21 so that they may be transmitted from the display device 40 via the antenna 43.
- the transceiver 47 can be replaced by a receiver.
- the network interface 27 can be replaced by an image source, which can store or generate image data to be sent to the processor 21.
- the processor 21 can control the overall operation of the display device 40.
- the processor 21 receives data, such as compressed image data from the network interface 27 or an image source, and processes the data into raw image data or into a format that is readily processed into raw image data.
- the processor 21 can send the processed data to the driver controller 29 or to the frame buffer 28 for storage.
- Raw data typically refers to the information that identifies the image characteristics at each location within an image. For example, such image characteristics can include color, saturation, and gray-scale level.
- the processor 21 can include a microcontroller, CPU, or logic unit to control operation of the display device 40.
- the conditioning hardware 52 may include amplifiers and filters for transmitting signals to the speaker 45, and for receiving signals from the microphone 46.
- the conditioning hardware 52 may be discrete components within the display device 40, or may be incorporated within the processor 21 or other components.
- the driver controller 29 can take the raw image data generated by the processor 21 either directly from the processor 21 or from the frame buffer 28 and can reformat the raw image data appropriately for high speed transmission to the array driver 22. In some implementations, the driver controller 29 can re-format the raw image data into a data flow having a raster-like format, such that it has a time order suitable for scanning across the display array 30.
- driver controller 29 sends the formatted information to the array driver 22.
- a driver controller 29, such as an LCD controller is often associated with the system processor 21 as a stand-alone Integrated Circuit (IC), such controllers may be implemented in many ways.
- controllers may be embedded in the processor 21 as hardware, embedded in the processor 21 as software, or fully integrated in hardware with the array driver 22.
- the array driver 22 can receive the formatted information from the driver controller 29 and can re-format the video data into a parallel set of waveforms that are applied many times per second to the hundreds, and sometimes thousands (or more), of leads coming from the display's x-y matrix of pixels.
- the driver controller 29, the array driver 22, and the display array 30 are appropriate for any of the types of displays described herein.
- the driver controller 29 can be a conventional display controller or a bi-stable display controller (e.g., an IMOD controller).
- the array driver 22 can be a conventional driver or a bi-stable display driver (e.g., an IMOD display driver).
- the display array 30 can be a conventional display array or a bi-stable display array (e.g., a display including an array of IMODs).
- the driver controller 29 can be integrated with the array driver 22. Such an implementation is common in highly integrated systems such as cellular phones, watches and other small-area displays.
- the input device 48 can be configured to allow, e.g., a user to control the operation of the display device 40.
- the input device 48 can include a keypad, such as a QWERTY keyboard or a telephone keypad, a button, a switch, a rocker, a touch-sensitive screen, or a pressure- or heat-sensitive membrane.
- the microphone 46 can be configured as an input device for the display device 40. In some implementations, voice commands through the microphone 46 can be used for controlling operations of the display device 40.
- the power supply 50 can include a variety of energy storage devices as are well known in the art.
- the power supply 50 can be a rechargeable battery, such as a nickel-cadmium battery or a lithium-ion battery.
- the power supply 50 also can be a renewable energy source, a capacitor, or a solar cell, including a plastic solar cell or solar-cell paint.
- the power supply 50 also can be configured to receive power from a wall outlet.
- control programmability resides in the driver controller 29 which can be located in several places in the electronic display system. In some other implementations, control programmability resides in the array driver 22.
- the above- described optimization may be implemented in any number of hardware and/or software components and in various configurations.
- the hardware and data processing apparatus used to implement the various illustrative logics, logical blocks, modules and circuits described in connection with the aspects disclosed herein may be implemented or performed with a general purpose single- or multi-chip processor, a digital signal processor (DSP), an application specific integrated circuit (ASIC), a field programmable gate array (FPGA) or other programmable logic device, discrete gate or transistor logic, discrete hardware components, or any combination thereof designed to perform the functions described herein.
- a general purpose processor may be a microprocessor, or, any conventional processor, controller, microcontroller, or state machine.
- a processor may also be implemented as a combination of computing devices, e.g., a combination of a DSP and a microprocessor, a plurality of microprocessors, one or more microprocessors in conjunction with a DSP core, or any other such configuration.
- particular steps and methods may be performed by circuitry that is specific to a given function.
- the functions described may be implemented in hardware, digital electronic circuitry, computer software, firmware, including the structures disclosed in this specification and their structural equivalents thereof, or in any combination thereof. Implementations of the subject matter described in this specification also can be implemented as one or more computer programs, i.e., one or more modules of computer program instructions, encoded on a computer storage media for execution by, or to control the operation of, data processing apparatus.
Abstract
Description
Claims
Priority Applications (4)
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EP11724322A EP2572228A1 (en) | 2010-05-20 | 2011-05-16 | Method and structure capable of changing color saturation |
JP2013511267A JP5592003B2 (en) | 2010-05-20 | 2011-05-16 | Method and structure capable of changing saturation |
CN2011800248482A CN103003735A (en) | 2010-05-20 | 2011-05-16 | Method and structure capable of changing color saturation |
KR1020127032910A KR20130107208A (en) | 2010-05-20 | 2011-05-16 | Method and structure capable of changing color saturation |
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US34684610P | 2010-05-20 | 2010-05-20 | |
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US12/910,694 US8848294B2 (en) | 2010-05-20 | 2010-10-22 | Method and structure capable of changing color saturation |
US12/910,694 | 2010-10-22 |
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WO2011146413A1 true WO2011146413A1 (en) | 2011-11-24 |
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JP (1) | JP5592003B2 (en) |
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Also Published As
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KR20130107208A (en) | 2013-10-01 |
US20110286072A1 (en) | 2011-11-24 |
TW201207542A (en) | 2012-02-16 |
JP5592003B2 (en) | 2014-09-17 |
US8848294B2 (en) | 2014-09-30 |
JP2013528833A (en) | 2013-07-11 |
CN103003735A (en) | 2013-03-27 |
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