WO2010045041A3 - Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device - Google Patents

Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device Download PDF

Info

Publication number
WO2010045041A3
WO2010045041A3 PCT/US2009/059478 US2009059478W WO2010045041A3 WO 2010045041 A3 WO2010045041 A3 WO 2010045041A3 US 2009059478 W US2009059478 W US 2009059478W WO 2010045041 A3 WO2010045041 A3 WO 2010045041A3
Authority
WO
WIPO (PCT)
Prior art keywords
tco
deposited
film
front electrode
metallic
Prior art date
Application number
PCT/US2009/059478
Other languages
French (fr)
Other versions
WO2010045041A2 (en
Inventor
Alexey Krasnov
Yiwei Lu
Scott V. Thomsen
Original Assignee
Guardian Industries Corp.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guardian Industries Corp. filed Critical Guardian Industries Corp.
Priority to BRPI0920344A priority Critical patent/BRPI0920344A2/en
Priority to EP09793298A priority patent/EP2351110A2/en
Publication of WO2010045041A2 publication Critical patent/WO2010045041A2/en
Publication of WO2010045041A3 publication Critical patent/WO2010045041A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)

Abstract

Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. The front electrode has a transparent conductive oxide (TCO) film having first and second layers (continuous or discontinuous) of the same material (e.g., zinc oxide, zinc aluminum oxide, indium-tin-oxide, or tin oxide), where the first TCO layer is sputter-deposited using a ceramic sputtering target(s) and the second TCO layer of the same material is sputter-deposited using a metallic or substantially metallic sputtering target(s). This allows the better quality TCO of the film, deposited more slowly via the ceramic target(s), to be formed using the ceramic target and the lesser quality TCO of the film to be deposited more quickly and cost effectively via the metallic target(s). After the etching, most or all of the better quality ceramic-deposited TCO remains whereas much of the lesser quality metallic-deposited TCO of the film was removed during the etching process.
PCT/US2009/059478 2008-10-15 2009-10-05 Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device WO2010045041A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
BRPI0920344A BRPI0920344A2 (en) 2008-10-15 2009-10-05 photovoltaic device front electrode production method having etched surface and corresponding photovoltaic device.
EP09793298A EP2351110A2 (en) 2008-10-15 2009-10-05 Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/285,890 US8022291B2 (en) 2008-10-15 2008-10-15 Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device
US12/285,890 2008-10-15

Publications (2)

Publication Number Publication Date
WO2010045041A2 WO2010045041A2 (en) 2010-04-22
WO2010045041A3 true WO2010045041A3 (en) 2010-06-10

Family

ID=41470994

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/059478 WO2010045041A2 (en) 2008-10-15 2009-10-05 Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device

Country Status (4)

Country Link
US (1) US8022291B2 (en)
EP (1) EP2351110A2 (en)
BR (1) BRPI0920344A2 (en)
WO (1) WO2010045041A2 (en)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101243995B1 (en) * 2008-10-29 2013-03-15 가부시키가이샤 아루박 Method for manufacturing solar cell, etching device, and CVD device
JPWO2010084758A1 (en) * 2009-01-23 2012-07-19 株式会社アルバック Solar cell manufacturing method and solar cell
JP2011014884A (en) * 2009-06-05 2011-01-20 Semiconductor Energy Lab Co Ltd Photoelectric conversion device
JP5174966B2 (en) * 2009-07-01 2013-04-03 三菱電機株式会社 Thin film solar cell and manufacturing method thereof
US8236118B2 (en) 2009-08-07 2012-08-07 Guardian Industries Corp. Debonding and transfer techniques for hetero-epitaxially grown graphene, and products including the same
DE102009051345B4 (en) * 2009-10-30 2013-07-25 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for producing a transparent electrode
US20110168252A1 (en) * 2009-11-05 2011-07-14 Guardian Industries Corp. Textured coating with etching-blocking layer for thin-film solar cells and/or methods of making the same
US20110100446A1 (en) * 2009-11-05 2011-05-05 Guardian Industries Corp. High haze transparent contact including ion-beam treated layer for solar cells, and/or method of making the same
US8895838B1 (en) 2010-01-08 2014-11-25 Magnolia Solar, Inc. Multijunction solar cell employing extended heterojunction and step graded antireflection structures and methods for constructing the same
JP5400180B2 (en) * 2010-02-05 2014-01-29 パナソニック株式会社 Photoelectric element
DE102010009558A1 (en) * 2010-02-26 2011-09-01 Von Ardenne Anlagentechnik Gmbh Method for manufacturing textured transparent conductive oxide layer utilized for manufacturing e.g. solar cell, involves forming transparent conductive oxide sacrificial layer on transparent conductive oxide layer before etching process
US8822259B2 (en) * 2010-04-21 2014-09-02 Applied Materials, Inc. Methods for enhancing light absorption during PV applications
CN102870230B (en) 2010-04-27 2016-04-20 费罗公司 For the method for gas-tight seal conducting feed throughs
EP2416370A1 (en) * 2010-08-06 2012-02-08 Applied Materials, Inc. Thin film solar fabrication process, deposition method for TCO layer, and solar cell precursor layer stack
TWI413130B (en) * 2010-11-16 2013-10-21 Nat Univ Tsing Hua Solar cells with positive transparent conductive oxide
KR101283140B1 (en) * 2011-01-26 2013-07-05 엘지이노텍 주식회사 Solar cell apparatus and method of fabricating the same
US20140000690A1 (en) * 2011-03-15 2014-01-02 Victor V. Plotnikov Intrinsically Semitransparent Solar Cell and Method of Making Same
DE102011005760B4 (en) * 2011-03-18 2016-02-04 Von Ardenne Gmbh Process for the preparation and treatment of an optically scattering TCO layer on a substrate
DE102011007683A1 (en) * 2011-04-15 2012-10-18 Von Ardenne Anlagentechnik Gmbh Method for patterning substrate used during manufacture of solar cell, involves irradiating light energy with respect to transparent conductive oxide layer through spacing between dot patterns of dot pattern structure of shadow mask
US20130019929A1 (en) * 2011-07-19 2013-01-24 International Business Machines Reduction of light induced degradation by minimizing band offset
ITMI20111559A1 (en) * 2011-08-30 2013-03-01 St Microelectronics Srl LAYER TCO OF FRONTAL CONTACT OF A SOLAR FILM WITH A THIN FILM WITH LAYER REFRACTORY METAL BARRIER AND MANUFACTURING PROCESS
US9397238B2 (en) 2011-09-19 2016-07-19 First Solar, Inc. Method of etching a semiconductor layer of a photovoltaic device
BR112014007369B1 (en) * 2011-09-30 2020-10-06 Siemens Concentrated Solar Power Ltd HEAT RECEIPT TUBE, PARABOLIC GUTTER COLLECTOR, METHOD FOR MANUFACTURING A GLASS TUBE OF A HEAT RECEIPT TUBE AND USE OF THE PARABOLIC GUTTER COLLECTOR
KR101777598B1 (en) * 2011-10-17 2017-09-14 한국전자통신연구원 method for manufacturing solar cell
US8557615B2 (en) * 2011-12-03 2013-10-15 Intermolecular, Inc. TCO materials for solar applications
US9082914B2 (en) 2012-01-13 2015-07-14 Gaurdian Industries Corp. Photovoltaic module including high contact angle coating on one or more outer surfaces thereof, and/or methods of making the same
EP2669952B1 (en) * 2012-06-01 2015-03-25 Roth & Rau AG Photovoltaic device and method of manufacturing same
US8524526B1 (en) * 2012-08-14 2013-09-03 Guardian Industries Corp. Organic light emitting diode with transparent electrode and method of making same
US9379259B2 (en) * 2012-11-05 2016-06-28 International Business Machines Corporation Double layered transparent conductive oxide for reduced schottky barrier in photovoltaic devices
US9198500B2 (en) 2012-12-21 2015-12-01 Murray W. Davis Portable self powered line mountable electric power line and environment parameter monitoring transmitting and receiving system
US20140272314A1 (en) * 2013-03-15 2014-09-18 Guardian Industries Corp. Coated article including broadband and omnidirectional anti-reflective transparent coating, and/or method of making the same
KR101534941B1 (en) * 2013-11-15 2015-07-07 현대자동차주식회사 a method for forming conductive electrode patterns and a method for manufacturing colar cells comprising thereof
WO2015071708A1 (en) * 2013-11-18 2015-05-21 Roth & Rau Ag Photovoltaic device and method of manufacturing same
US10822269B2 (en) * 2014-02-24 2020-11-03 Pilkington Group Limited Method of manufacture of a coated glazing
GB201403223D0 (en) * 2014-02-24 2014-04-09 Pilkington Group Ltd Coated glazing
CN106537300A (en) * 2014-03-25 2017-03-22 3M创新有限公司 Method of selectively etching metal layer from microstructure
JP6226858B2 (en) * 2014-11-28 2017-11-08 三菱電機株式会社 Thin film solar cell and manufacturing method thereof
US10145005B2 (en) 2015-08-19 2018-12-04 Guardian Glass, LLC Techniques for low temperature direct graphene growth on glass
FR3095523B1 (en) * 2019-04-25 2022-09-09 Centre Nat Rech Scient Mirror for photovoltaic cell, photovoltaic cell and module

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19713215A1 (en) * 1997-03-27 1998-10-08 Forschungszentrum Juelich Gmbh Solar cell with textured transparent conductive oxide layer
JP2002025350A (en) * 2000-07-11 2002-01-25 Sanyo Electric Co Ltd Substrate with transparent conductive film and manufacturing method of the same, etching method using the same, and light electromotive force device
US20070193624A1 (en) * 2006-02-23 2007-08-23 Guardian Industries Corp. Indium zinc oxide based front contact for photovoltaic device and method of making same

Family Cites Families (126)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL127148C (en) 1963-12-23
US4155781A (en) 1976-09-03 1979-05-22 Siemens Aktiengesellschaft Method of manufacturing solar cells, utilizing single-crystal whisker growth
US4162505A (en) 1978-04-24 1979-07-24 Rca Corporation Inverted amorphous silicon solar cell utilizing cermet layers
US4163677A (en) 1978-04-28 1979-08-07 Rca Corporation Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier
US4213798A (en) 1979-04-27 1980-07-22 Rca Corporation Tellurium schottky barrier contact for amorphous silicon solar cells
EP0309000B1 (en) 1981-07-17 1992-10-14 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Amorphous semiconductor and amorphous silicon photovoltaic device
US4378460A (en) 1981-08-31 1983-03-29 Rca Corporation Metal electrode for amorphous silicon solar cells
US4554727A (en) 1982-08-04 1985-11-26 Exxon Research & Engineering Company Method for making optically enhanced thin film photovoltaic device using lithography defined random surfaces
JPS59175166A (en) 1983-03-23 1984-10-03 Agency Of Ind Science & Technol Amorphous photoelectric conversion element
US4598306A (en) 1983-07-28 1986-07-01 Energy Conversion Devices, Inc. Barrier layer for photovoltaic devices
JPH0680837B2 (en) 1983-08-29 1994-10-12 通商産業省工業技術院長 Photoelectric conversion element with extended optical path
US4598396A (en) * 1984-04-03 1986-07-01 Itt Corporation Duplex transmission mechanism for digital telephones
US4689438A (en) 1984-10-17 1987-08-25 Sanyo Electric Co., Ltd. Photovoltaic device
JPS61108176A (en) 1984-11-01 1986-05-26 Fuji Electric Co Ltd Method for coarsening surface
DE3446807A1 (en) 1984-12-21 1986-07-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Thin-film solar cell having an n-i-p structure
US4663495A (en) 1985-06-04 1987-05-05 Atlantic Richfield Company Transparent photovoltaic module
GB2188924B (en) 1986-04-08 1990-05-09 Glaverbel Matted glass, process of producing matted glass, photo-voltaic cell incorporating a glass sheet, and process of manufacturing such a cell
DE3704880A1 (en) 1986-07-11 1988-01-21 Nukem Gmbh TRANSPARENT, CONDUCTIVE LAYER SYSTEM
AU616736B2 (en) 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
DE68927845T2 (en) 1988-09-30 1997-08-07 Kanegafuchi Chemical Ind Solar cell with a transparent electrode
US4940495A (en) 1988-12-07 1990-07-10 Minnesota Mining And Manufacturing Company Photovoltaic device having light transmitting electrically conductive stacked films
JP3117446B2 (en) 1989-06-15 2000-12-11 株式会社半導体エネルギー研究所 Method for forming oxide conductive film
DE4024308C2 (en) 1989-07-31 1993-12-02 Central Glass Co Ltd Thermal insulating glass with dielectric multilayer coating
DE69027590T2 (en) 1989-08-01 1996-12-05 Asahi Glass Co Ltd Process for the production of layers based on silicon dioxide using DC sputtering and target therefor
AU8872891A (en) 1990-10-15 1992-05-20 United Solar Systems Corporation Monolithic solar cell array and method for its manufacture
DE4126738A1 (en) 1990-12-11 1992-06-17 Claussen Nils ZR0 (DOWN ARROW) 2 (DOWN ARROW) CERAMIC MOLDED BODY
US5171411A (en) 1991-05-21 1992-12-15 The Boc Group, Inc. Rotating cylindrical magnetron structure with self supporting zinc alloy target
US5256858A (en) 1991-08-29 1993-10-26 Tomb Richard H Modular insulation electrically heated building panel with evacuated chambers
US5699035A (en) 1991-12-13 1997-12-16 Symetrix Corporation ZnO thin-film varistors and method of making the same
JP2974485B2 (en) 1992-02-05 1999-11-10 キヤノン株式会社 Manufacturing method of photovoltaic device
US5344718A (en) 1992-04-30 1994-09-06 Guardian Industries Corp. High performance, durable, low-E glass
US5650019A (en) 1993-09-30 1997-07-22 Canon Kabushiki Kaisha Solar cell module having a surface coating material of three-layered structure
JP3029178B2 (en) 1994-04-27 2000-04-04 キヤノン株式会社 Method of manufacturing thin film semiconductor solar cell
GB9500330D0 (en) 1995-01-09 1995-03-01 Pilkington Plc Coatings on glass
FR2730990B1 (en) 1995-02-23 1997-04-04 Saint Gobain Vitrage TRANSPARENT SUBSTRATE WITH ANTI-REFLECTIVE COATING
DE69629613T2 (en) 1995-03-22 2004-06-17 Toppan Printing Co. Ltd. Multi-layer, electrically conductive film, transparent electrode substrate and liquid crystal display using this
JP3431776B2 (en) 1995-11-13 2003-07-28 シャープ株式会社 Manufacturing method of solar cell substrate and solar cell substrate processing apparatus
US6433913B1 (en) 1996-03-15 2002-08-13 Gentex Corporation Electro-optic device incorporating a discrete photovoltaic device and method and apparatus for making same
GB9619134D0 (en) 1996-09-13 1996-10-23 Pilkington Plc Improvements in or related to coated glass
US6406639B2 (en) 1996-11-26 2002-06-18 Nippon Sheet Glass Co., Ltd. Method of partially forming oxide layer on glass substrate
US6123824A (en) 1996-12-13 2000-09-26 Canon Kabushiki Kaisha Process for producing photo-electricity generating device
JP3754815B2 (en) * 1997-02-19 2006-03-15 キヤノン株式会社 Photovoltaic element, photoelectric conversion element, method for producing photovoltaic element, and method for producing photoelectric conversion element
JP3805889B2 (en) 1997-06-20 2006-08-09 株式会社カネカ Solar cell module and manufacturing method thereof
JPH1146006A (en) 1997-07-25 1999-02-16 Canon Inc Photovoltaic element and manufacture thereof
US6365623B1 (en) * 1997-11-17 2002-04-02 Nicholas V. Perricone Treatment of acne using lipoic acid
US6222117B1 (en) 1998-01-05 2001-04-24 Canon Kabushiki Kaisha Photovoltaic device, manufacturing method of photovoltaic device, photovoltaic device integrated with building material and power-generating apparatus
EP1063317B1 (en) 1998-03-05 2003-07-30 Asahi Glass Company Ltd. Sputtering target, transparent conductive film, and method for producing the same
US6344608B2 (en) 1998-06-30 2002-02-05 Canon Kabushiki Kaisha Photovoltaic element
FR2781062B1 (en) 1998-07-09 2002-07-12 Saint Gobain Vitrage GLAZING WITH ELECTRICALLY CONTROLLED OPTICAL AND / OR ENERGY PROPERTIES
US6077722A (en) 1998-07-14 2000-06-20 Bp Solarex Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts
CA2341629A1 (en) 1998-08-26 2000-03-09 Hodaka Norimatsu Photovoltaic device
JP2000091084A (en) 1998-09-16 2000-03-31 Trustees Of Princeton Univ Positive hole injection performance improving electrode
FR2791147B1 (en) 1999-03-19 2002-08-30 Saint Gobain Vitrage ELECTROCHEMICAL DEVICE OF THE ELECTROCOMMANDABLE DEVICE TYPE WITH VARIABLE OPTICAL AND / OR ENERGY PROPERTIES
TW463528B (en) 1999-04-05 2001-11-11 Idemitsu Kosan Co Organic electroluminescence element and their preparation
NO314525B1 (en) 1999-04-22 2003-03-31 Thin Film Electronics Asa Process for the preparation of organic semiconductor devices in thin film
US6187824B1 (en) 1999-08-25 2001-02-13 Nyacol Nano Technologies, Inc. Zinc oxide sol and method of making
DE19958878B4 (en) 1999-12-07 2012-01-19 Saint-Gobain Glass Deutschland Gmbh Thin film solar cell
JP4434411B2 (en) 2000-02-16 2010-03-17 出光興産株式会社 Active drive type organic EL light emitting device and manufacturing method thereof
US6524647B1 (en) 2000-03-24 2003-02-25 Pilkington Plc Method of forming niobium doped tin oxide coatings on glass and coated glass formed thereby
US6660410B2 (en) 2000-03-27 2003-12-09 Idemitsu Kosan Co., Ltd. Organic electroluminescence element
US6576349B2 (en) 2000-07-10 2003-06-10 Guardian Industries Corp. Heat treatable low-E coated articles and methods of making same
US7267879B2 (en) 2001-02-28 2007-09-11 Guardian Industries Corp. Coated article with silicon oxynitride adjacent glass
US6963168B2 (en) 2000-08-23 2005-11-08 Idemitsu Kosan Co., Ltd. Organic EL display device having certain relationships among constituent element refractive indices
US6784361B2 (en) 2000-09-20 2004-08-31 Bp Corporation North America Inc. Amorphous silicon photovoltaic devices
JP2002260448A (en) 2000-11-21 2002-09-13 Nippon Sheet Glass Co Ltd Conductive film, method of making the same, substrate and photoelectric conversion device equipped with the same
JP2002170431A (en) 2000-11-29 2002-06-14 Idemitsu Kosan Co Ltd Electrode substrate and its manufacturing method
US7132666B2 (en) 2001-02-07 2006-11-07 Tomoji Takamasa Radiation detector and radiation detecting element
KR100768176B1 (en) 2001-02-07 2007-10-17 삼성에스디아이 주식회사 Functional film having an improved optical and electrical properties
US6774300B2 (en) 2001-04-27 2004-08-10 Adrena, Inc. Apparatus and method for photovoltaic energy production based on internal charge emission in a solid-state heterostructure
WO2002091483A2 (en) 2001-05-08 2002-11-14 Bp Corporation North America Inc. Improved photovoltaic device
US6589657B2 (en) 2001-08-31 2003-07-08 Von Ardenne Anlagentechnik Gmbh Anti-reflection coatings and associated methods
JP4162447B2 (en) 2001-09-28 2008-10-08 三洋電機株式会社 Photovoltaic element and photovoltaic device
US6936347B2 (en) 2001-10-17 2005-08-30 Guardian Industries Corp. Coated article with high visible transmission and low emissivity
FR2832706B1 (en) 2001-11-28 2004-07-23 Saint Gobain TRANSPARENT SUBSTRATE HAVING AN ELECTRODE
US6830817B2 (en) 2001-12-21 2004-12-14 Guardian Industries Corp. Low-e coating with high visible transmission
KR100835920B1 (en) 2001-12-27 2008-06-09 엘지디스플레이 주식회사 Liquid Crystal Display Panel Associated With Touch Panel
US7169722B2 (en) 2002-01-28 2007-01-30 Guardian Industries Corp. Clear glass composition with high visible transmittance
US7037869B2 (en) 2002-01-28 2006-05-02 Guardian Industries Corp. Clear glass composition
US7144837B2 (en) 2002-01-28 2006-12-05 Guardian Industries Corp. Clear glass composition with high visible transmittance
US6919133B2 (en) 2002-03-01 2005-07-19 Cardinal Cg Company Thin film coating having transparent base layer
KR100505536B1 (en) 2002-03-27 2005-08-04 스미토모 긴조쿠 고잔 가부시키가이샤 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device
FR2844136B1 (en) 2002-09-03 2006-07-28 Corning Inc MATERIAL USEFUL IN THE MANUFACTURE OF LUMINOUS DISPLAY DEVICES, PARTICULARLY ORGANIC ELECTROLUMINESCENT DIODES
FR2844364B1 (en) 2002-09-11 2004-12-17 Saint Gobain DIFFUSING SUBSTRATE
US7141863B1 (en) 2002-11-27 2006-11-28 University Of Toledo Method of making diode structures
TW583466B (en) 2002-12-09 2004-04-11 Hannstar Display Corp Structure of liquid crystal display
US6975067B2 (en) 2002-12-19 2005-12-13 3M Innovative Properties Company Organic electroluminescent device and encapsulation method
TWI232066B (en) 2002-12-25 2005-05-01 Au Optronics Corp Manufacturing method of organic light emitting diode for reducing reflection of external light
JP4241446B2 (en) 2003-03-26 2009-03-18 キヤノン株式会社 Multilayer photovoltaic device
WO2004102677A1 (en) 2003-05-13 2004-11-25 Asahi Glass Company, Limited Transparent conductive substrate for solar battery and method for producing same
US20040244829A1 (en) 2003-06-04 2004-12-09 Rearick Brian K. Coatings for encapsulation of photovoltaic cells
US7153579B2 (en) 2003-08-22 2006-12-26 Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A, (C.R.V.C.) Heat treatable coated article with tin oxide inclusive layer between titanium oxide and silicon nitride
US7087309B2 (en) 2003-08-22 2006-08-08 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Coated article with tin oxide, silicon nitride and/or zinc oxide under IR reflecting layer and corresponding method
JP4761706B2 (en) 2003-12-25 2011-08-31 京セラ株式会社 Method for manufacturing photoelectric conversion device
US8524051B2 (en) 2004-05-18 2013-09-03 Centre Luxembourg de Recherches pour le Verre et al Ceramique S. A. (C.R.V.C.) Coated article with oxidation graded layer proximate IR reflecting layer(s) and corresponding method
US20050257824A1 (en) 2004-05-24 2005-11-24 Maltby Michael G Photovoltaic cell including capping layer
US7700869B2 (en) 2005-02-03 2010-04-20 Guardian Industries Corp. Solar cell low iron patterned glass and method of making same
US7531239B2 (en) 2005-04-06 2009-05-12 Eclipse Energy Systems Inc Transparent electrode
US7743630B2 (en) 2005-05-05 2010-06-29 Guardian Industries Corp. Method of making float glass with transparent conductive oxide (TCO) film integrally formed on tin bath side of glass and corresponding product
US7700870B2 (en) 2005-05-05 2010-04-20 Guardian Industries Corp. Solar cell using low iron high transmission glass with antimony and corresponding method
US8093491B2 (en) 2005-06-03 2012-01-10 Ferro Corporation Lead free solar cell contacts
US7597964B2 (en) 2005-08-02 2009-10-06 Guardian Industries Corp. Thermally tempered coated article with transparent conductive oxide (TCO) coating
JP2007067194A (en) 2005-08-31 2007-03-15 Fujifilm Corp Organic photoelectric conversion device and stacked photoelectric conversion device
US20070184573A1 (en) 2006-02-08 2007-08-09 Guardian Industries Corp., Method of making a thermally treated coated article with transparent conductive oxide (TCO) coating for use in a semiconductor device
US7557053B2 (en) 2006-03-13 2009-07-07 Guardian Industries Corp. Low iron high transmission float glass for solar cell applications and method of making same
US8648252B2 (en) 2006-03-13 2014-02-11 Guardian Industries Corp. Solar cell using low iron high transmission glass and corresponding method
US20080047602A1 (en) 2006-08-22 2008-02-28 Guardian Industries Corp. Front contact with high-function TCO for use in photovoltaic device and method of making same
US20080047603A1 (en) 2006-08-24 2008-02-28 Guardian Industries Corp. Front contact with intermediate layer(s) adjacent thereto for use in photovoltaic device and method of making same
US7601558B2 (en) * 2006-10-24 2009-10-13 Applied Materials, Inc. Transparent zinc oxide electrode having a graded oxygen content
US20080302414A1 (en) 2006-11-02 2008-12-11 Den Boer Willem Front electrode for use in photovoltaic device and method of making same
US8076571B2 (en) 2006-11-02 2011-12-13 Guardian Industries Corp. Front electrode for use in photovoltaic device and method of making same
US8203073B2 (en) 2006-11-02 2012-06-19 Guardian Industries Corp. Front electrode for use in photovoltaic device and method of making same
US20080105299A1 (en) 2006-11-02 2008-05-08 Guardian Industries Corp. Front electrode with thin metal film layer and high work-function buffer layer for use in photovoltaic device and method of making same
US8012317B2 (en) 2006-11-02 2011-09-06 Guardian Industries Corp. Front electrode including transparent conductive coating on patterned glass substrate for use in photovoltaic device and method of making same
US7964788B2 (en) 2006-11-02 2011-06-21 Guardian Industries Corp. Front electrode for use in photovoltaic device and method of making same
US20080178932A1 (en) 2006-11-02 2008-07-31 Guardian Industries Corp. Front electrode including transparent conductive coating on patterned glass substrate for use in photovoltaic device and method of making same
US20080105298A1 (en) 2006-11-02 2008-05-08 Guardian Industries Corp. Front electrode for use in photovoltaic device and method of making same
US20080105293A1 (en) 2006-11-02 2008-05-08 Guardian Industries Corp. Front electrode for use in photovoltaic device and method of making same
US8334452B2 (en) 2007-01-08 2012-12-18 Guardian Industries Corp. Zinc oxide based front electrode doped with yttrium for use in photovoltaic device or the like
US20080169021A1 (en) 2007-01-16 2008-07-17 Guardian Industries Corp. Method of making TCO front electrode for use in photovoltaic device or the like
US20080223430A1 (en) 2007-03-14 2008-09-18 Guardian Industries Corp. Buffer layer for front electrode structure in photovoltaic device or the like
US20080223436A1 (en) 2007-03-15 2008-09-18 Guardian Industries Corp. Back reflector for use in photovoltaic device
US20080308145A1 (en) 2007-06-12 2008-12-18 Guardian Industries Corp Front electrode including transparent conductive coating on etched glass substrate for use in photovoltaic device and method of making same
US20080308146A1 (en) 2007-06-14 2008-12-18 Guardian Industries Corp. Front electrode including pyrolytic transparent conductive coating on textured glass substrate for use in photovoltaic device and method of making same
US7888594B2 (en) 2007-11-20 2011-02-15 Guardian Industries Corp. Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index
US20090194155A1 (en) 2008-02-01 2009-08-06 Guardian Industries Corp. Front electrode having etched surface for use in photovoltaic device and method of making same
US20090194157A1 (en) 2008-02-01 2009-08-06 Guardian Industries Corp. Front electrode having etched surface for use in photovoltaic device and method of making same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19713215A1 (en) * 1997-03-27 1998-10-08 Forschungszentrum Juelich Gmbh Solar cell with textured transparent conductive oxide layer
JP2002025350A (en) * 2000-07-11 2002-01-25 Sanyo Electric Co Ltd Substrate with transparent conductive film and manufacturing method of the same, etching method using the same, and light electromotive force device
US20070193624A1 (en) * 2006-02-23 2007-08-23 Guardian Industries Corp. Indium zinc oxide based front contact for photovoltaic device and method of making same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
KLUTH O ET AL: "Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 351, no. 1-2, 30 August 1999 (1999-08-30), pages 247 - 253, XP004183103, ISSN: 0040-6090 *

Also Published As

Publication number Publication date
US20100089444A1 (en) 2010-04-15
WO2010045041A2 (en) 2010-04-22
US8022291B2 (en) 2011-09-20
BRPI0920344A2 (en) 2016-03-01
EP2351110A2 (en) 2011-08-03

Similar Documents

Publication Publication Date Title
WO2010045041A3 (en) Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device
WO2010039341A3 (en) Front electrode having etched surface for use in photovoltaic device and method of making same
WO2009156640A3 (en) Photovoltaic cell, and substrate for same
WO2009019400A3 (en) Photovoltaic cell front face substrate and use of a substrate for a photovoltaic cell front face
MX2009011383A (en) Method for cleaning a solar cell surface opening made with a solar etch paste.
WO2010003066A3 (en) Transparent conducting electrode
WO2008024205A3 (en) Front contact with high work-function tco for use in photovoltaic device and method of making same
WO2009077605A3 (en) Method for obtaining high performance thin film devices deposited on highly textured substrates
RU2011101221A (en) CAPACITIVE TOUCH SENSOR INTEGRATED WITH THE WINDOW PANEL AND METHOD FOR ITS MANUFACTURE
WO2009099509A3 (en) Transparent front electrode for use in photovoltaic device and method of making same
WO2011050291A3 (en) Materials and device stack for market viable electrochromic devices
WO2009099517A3 (en) Front electrode having etched surface for use in photovoltaic device and metod of making same
EP2306524A3 (en) In chamber sodium doping process and system for large scale fabrication of cigs based thin film photovoltaic materials
WO2008143885A3 (en) Protection layer for fabricating a solar cell
WO2012129033A3 (en) Conductive foils having multiple layers and methods of forming same
Kim et al. Highly flexible Al-doped ZnO/Ag/Al-doped ZnO multilayer films deposited on PET substrates at room temperature
US20110088771A1 (en) Process of manufacturing tco substrate with light trapping feature and the device thereof
RU2011144649A (en) LOW EMISSION GLASS AND METHOD FOR ITS PRODUCTION
EP2296195A3 (en) Rapid thermal method and device for thin film tandem cell
WO2011131388A3 (en) Method for producing a solar cell and solar cell produced according to this method
WO2010001013A3 (en) Photovoltaic cell, and substrate for same
US20180247726A1 (en) Sputtered transparent conductive aluminum doped zinc oxide films
WO2009019373A3 (en) Front face substrate of a plasma screen, use of same and production method thereof
WO2011160814A3 (en) Method for creating a passivated boron-doped region, especially during production of a solar cell, and solar cell with passivated boron-diffused region
WO2010144357A3 (en) Method for forming transparent conductive oxide

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09793298

Country of ref document: EP

Kind code of ref document: A2

DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
WWE Wipo information: entry into national phase

Ref document number: 717/DELNP/2011

Country of ref document: IN

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2009793298

Country of ref document: EP

ENP Entry into the national phase

Ref document number: PI0920344

Country of ref document: BR

Kind code of ref document: A2

Effective date: 20110415