WO2010017146A1 - Generator for foam to clean substrate - Google Patents

Generator for foam to clean substrate Download PDF

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Publication number
WO2010017146A1
WO2010017146A1 PCT/US2009/052609 US2009052609W WO2010017146A1 WO 2010017146 A1 WO2010017146 A1 WO 2010017146A1 US 2009052609 W US2009052609 W US 2009052609W WO 2010017146 A1 WO2010017146 A1 WO 2010017146A1
Authority
WO
WIPO (PCT)
Prior art keywords
foam
hollow cylinder
fluid
chamber
gas
Prior art date
Application number
PCT/US2009/052609
Other languages
French (fr)
Inventor
Arnold Kholodenko
Anwar Husain
Gregory A. Tomasch
Cheng-Yu Lin (Sean)
Original Assignee
Lam Research Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corporation filed Critical Lam Research Corporation
Priority to JP2011522146A priority Critical patent/JP2011530193A/en
Priority to CN200980130763.5A priority patent/CN102112241B/en
Publication of WO2010017146A1 publication Critical patent/WO2010017146A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/235Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids for making foam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/314Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit
    • B01F25/3141Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit with additional mixing means other than injector mixers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/314Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit
    • B01F25/3142Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit the conduit having a plurality of openings in the axial direction or in the circumferential direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/314Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit
    • B01F25/3142Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit the conduit having a plurality of openings in the axial direction or in the circumferential direction
    • B01F25/31425Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit the conduit having a plurality of openings in the axial direction or in the circumferential direction with a plurality of perforations in the axial and circumferential direction covering the whole surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • B01F25/42Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/434Mixing tubes comprising cylindrical or conical inserts provided with grooves or protrusions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • B01F25/42Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/434Mixing tubes comprising cylindrical or conical inserts provided with grooves or protrusions
    • B01F25/4341Mixing tubes comprising cylindrical or conical inserts provided with grooves or protrusions the insert being provided with helical grooves
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/0318Processes

Definitions

  • the high viscosity, non-Newtonian fluid is a foam created by mechanically mixing a gas (such as nitrogen) and a fluid (an aqueous solution with a surfactant such as a fatty acid capable of forming micelles) in the microchannels formed by a packet of thousands of sapphire beads (e.g., approximately 1 mm in diameter).
  • a gas such as nitrogen
  • a fluid an aqueous solution with a surfactant such as a fatty acid capable of forming micelles
  • sapphire beads e.g., approximately 1 mm in diameter
  • Example embodiments include apparatuses, systems, and methods directed to mechanically generating a foam to clean a substrate.
  • a device includes a female housing and a male plug.
  • the plug includes an aperture into which a fluid flows from another part of the cleaning system.
  • the plug includes a premix chamber which receives the fluid from the aperture and into which a gas such as nitrogen is injected to form an initial foam.
  • the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder.
  • the plug includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder.
  • the continuous helical indentation and the inner surface of the housing form a sealed helical channel through which the initial foam flows and is further mixed as the foam makes its way to another aperture which connects the plug to another component of the cleaning system, e.g., a proximity head where the final foam is applied to a semiconductor wafer.
  • the plug and the housing are proximate to the proximity head where the final foam is applied to the semiconductor wafer, e.g., the plug and housing are located at the point of use of the final foam.
  • the plug and housing are located away from the point of use of the final foam in another part of the cleaning system (e.g., in an onboard fluid delivery system).
  • Figure 1 is a diagram illustrating a perspective view of a male plug, in accordance with an example embodiment.
  • Figure 2 is a diagram illustrating a sectional view of a male plug, in accordance with an example embodiment.
  • Figure 3 is a diagram illustrating a cross-sectional view of a premix chamber in a male plug, in accordance with an example embodiment.
  • Figure 4 is a diagram illustrating a sectional view of a male plug and female housing, in accordance with an example embodiment.
  • Figure 5 is a diagram illustrating a sectional view of a male plug and female housing in a point-of-use system, in accordance with an example embodiment.
  • Figure 6A is a diagram illustrating a perspective view of a male plug and female housing in a point-of-use system, in accordance with an example embodiment.
  • Figure 6B is a simplified schematic diagram showing a pair of male plugs in a point-of-use system, in accordance with an example embodiment.
  • Figure 6C is a simplified schematic diagram showing a processing station, in accordance with an example embodiment.
  • Figure 7 is a diagram illustrating a perspective view of a male plug and female housing in an onboard fluid delivery system, in accordance with an example embodiment.
  • Figure 8 is a diagram illustrating two independent variables, channel cross section and channel length, which were tested in example embodiments.
  • Figure 9 is a table showing the results of the tests with respect to channel cross section and channel length, for example embodiments.
  • Figure 10 is a table showing a comparison of the foam generator with a plug and housing and a foam generator with a long bead pack.
  • Figure 11 is a plot of a time series showing back pressure for an example embodiment.
  • FIG. 1 is a diagram illustrating a perspective view of a male plug, in accordance with an example embodiment.
  • the male plug 101 includes an aperture 102 into which a fluid (e.g., P2) is input or pumped by a system for cleaning a substrate (e.g., a semiconductor wafer).
  • a fluid e.g., P2
  • the flow rate for the fluid might be 5 mL/m to 50 mL/m.
  • the fluid flows into a premix chamber 103, where the fluid is injected with a gas (e.g., N2 or nitrogen) to form an initial foam.
  • the flow rate for the injected gas might be 50 seem to 500 seem.
  • the initial foam flows through the continuous helical indentation 104 on an outer surface of the plug to the aperture 105, which outputs a final foam (e.g., P3) to the cleaning system.
  • P2 refers to the two phases of matter that are present in the input fluid, e.g., liquid water and solid surfactant.
  • P3 refers to the three phases of matter that are present in the output foam, e.g., liquid water, solid surfactant, and gaseous nitrogen. It will be appreciated that P3 is a high viscosity, non-Newtonian fluid.
  • the male plug might be made from a highly nonreactive thermoplastic such as polyvinylidene chloride (PVDF) or KYNAR (also called HYLAR or SYGEF).
  • PVDF polyvinylidene chloride
  • KYNAR also called HYLAR or SYGEF
  • the plug might be made of ethylene chlorotrifluoroethlyene (ECTFE) or halar. It will be appreciated that it might be beneficial to match the material used to make the male plug with the material used to make the female housing (e.g., the male plug and the female housing would then have the same coefficient of thermal expansion).
  • FIG. 2 is a diagram illustrating a sectional view of a male plug, in accordance with an example embodiment.
  • the male plug 101 includes a premix chamber 103 which has a hollow core and which contains numerous perforations 106 on the outside surface of the premix chamber 103, which permit the input of a gas (e.g., nitrogen), as described further below.
  • the male plug 101 also includes an aperture 102 into which a fluid (e.g., P2) enters the premix chamber 103 and an aperture 107 from which an initial foam (e.g., nitrogen and P2) exits the premix chamber 103. After exiting the premix chamber, the initial foam passes through the continuous helical indentation 104 on an outer surface of the plug.
  • a fluid e.g., P2
  • an initial foam e.g., nitrogen and P2
  • the plug beneath the continuous helical indentation is solid, to provide structural support.
  • the plug beneath the continuous helical indentation might also have a hollow core.
  • the final foam (e.g., P3) will maintain its mixture (e.g., its bubbles) for a relatively long period of time when confined in a sealed passageway (e.g., a tube) and the foam might be transported through such a passageway to a proximity head which is relatively distant from the plug 101 and housing (e.g., in an onboard fluid delivery system).
  • a sealed passageway e.g., a tube
  • the foam might be transported through such a passageway to a proximity head which is relatively distant from the plug 101 and housing (e.g., in an onboard fluid delivery system).
  • FIG. 3 is a diagram illustrating a cross-sectional view of a premix chamber in a male plug, in accordance with an example embodiment.
  • the male plug 101 includes aperture 102 which allows entry of a fluid (e.g., P2) to a premix chamber 103.
  • the premix chamber 103 has numerous small perforations which are channels for the injection of a gas (e.g., nitrogen) and which follow a specific pattern.
  • the pattern is created by rotating by 15 degrees a set of eight equidistant channels (e.g., with each channel 45 degrees from its two neighboring channels) which are coplanar in a cross-sectional plane.
  • Cross-section 108 (e.g., B-B from 103) shows eight equidistant channels prior to the rotation by 15 degrees.
  • Cross-section 109 (e.g., C- C from 103) shows eight equidistant channels after rotation by 15 degrees.
  • Cross-sections 108 and 109 also illustrate the hollow core of the premix chamber 103. It will be appreciated that the fluid (e.g., P2) flows through this hollow core. It will further be appreciated that the eight equidistant channels are located tangential to this hollow core, e.g., the arrangement between the hollow core and the channels is not akin to a hub and spokes.
  • the tangential location of the channels and the pattern facilitate the creation of a vortex within the premix chamber 103 and the vortex facilitates mixing of the fluid (e.g., P2) and gas (e.g., nitrogen).
  • the fluid e.g., P2
  • gas e.g., nitrogen
  • the pattern for the perforations might be created by rotating by 15 degrees a set of 6 or 10 equidistant channels, rather than 8.
  • the rotation might be more (e.g., 20-25 degrees) or less (e.g., 5-10 degrees) than 15 degrees.
  • Figure 4 is a diagram illustrating a sectional view of a male plug and female housing, in accordance with an example embodiment.
  • the male plug 101 fits tightly into the female housing 112, creating a sealed helical channel 113 which facilitates further mixing of the initial foam into a final foam (e.g., P3).
  • the cross-sectional dimensions of the sealed helical channel might be approximately .06 inch x .04 inch per section.
  • the cross- sectional dimensions of the sealed helical channel might be approximately .06 inch x .06 inch per section. It will be appreciated that a sealed helical channel with larger cross-sectional dimensions is more difficult to clog.
  • a tube 110 through which a fluid (e.g., P2) enters into the plug 101 and a tube 111 through which a gas (e.g., nitrogen) enters the premix chamber of the plug 101.
  • a gas e.g., nitrogen
  • a final foam leaves the plug 101 through another tube 114.
  • final foams e.g., P3 of different qualities are useful for different purposes, where quality might be defined as the volume of gas divided by the volume of gas and liquid on a scale that goes from 0% (no N2 and all P2) to 98% (100 seem N2 and 2.5 mL/m P2).
  • quality might be defined as the volume of gas divided by the volume of gas and liquid on a scale that goes from 0% (no N2 and all P2) to 98% (100 seem N2 and 2.5 mL/m P2).
  • the surface and bulk size of bubbles in the foam and the surface and bulk spacing of bubbles in the foam is a function of the length (or distance) of the helical channel, where a longer length tends to produce bubbles that are smaller in surface and bulk size and smaller in surface and bulk spacing (e.g., closer together) for a given quality.
  • Figure 5 is a diagram illustrating a sectional view of a male plug and female housing in a point-of-use system, in accordance with an example embodiment.
  • the male plug 101 fits tightly into female housing 112, from which the male plug 101 can be readily removed for cleaning (e.g., with deionized water) or other maintenance.
  • Figure 5 shows a premix chamber 103 with an inlet 115 for P2 and an inlet 116 for nitrogen, which are alternative inlets to the inlets depicted in Figure 4.
  • Figure 5 also shows the aperture 105 through which the final foam (e.g., P3) flows toward the proximity head which will be used to deposit the P3 on a substrate (e.g., a semiconductor wafer).
  • the final foam e.g., P3
  • FIG. 6A is a diagram illustrating a perspective view of a manifold with two male plugs in a point-of-use system, in accordance with an example embodiment.
  • manifold 117 includes two male plugs 101 which provide final foam (e.g., P3) to a proximity head which is to the upper right outside of Figure 6A.
  • Figure 6A also shows the transmission pipe 118 for the P2 fluid and the transmission pipe 119 for the nitrogen for the male plugs 101. It will be appreciated that this perspective view does not show the female housings for the male plugs 101, for purposes of exposition.
  • the arrangement of components in Figure 6A is similar to the arrangement of components in Figure 5.
  • FIG. 6B is a simplified schematic diagram showing a pair of male plugs in a point-of-use system, in accordance with an example embodiment.
  • the pair of male plugs 101 (the female housings are not shown) generate and transmit foam to upper and lower proximity heads 121, which are located nearby in a processing station 120.
  • the proximity heads 121 then deposit the foam, through the use of a meniscus 124, at a low velocity on a semiconductor wafer 122 carried by a wafer carrier 123.
  • the system transmits the foam only a short distance, which is advantageous since the foam might be a highly viscous, non-Newtonian fluid, in a particular example embodiment.
  • FIG. 6C is a simplified schematic diagram showing a processing station, in accordance with an example embodiment.
  • a male plug 101 is connected to a proximity head 121 (the female housing is not shown) in a processing station 120.
  • the male plug 101 is also connected to a fluid supply 125 and a gas supply 126, which are located in facilities which might be some distance away from the processing station 120, in a particular example embodiment.
  • the male plug 101 in Figure 6C is nonetheless a component in a point-of-use system, since it is located close to proximity head 121, where the foam generated by the male plug 101 will be delivered at low velocity to a semiconductor wafer.
  • FIG. 7 is a diagram illustrating a perspective view of a male plug and female housing in an onboard fluid delivery system, in accordance with an example embodiment.
  • the onboard fluid delivery system 127 includes numerous components, including two male plugs 101.
  • the onboard fluid delivery system might be located in a cabinet beneath the proximity head that delivers the final foam (e.g., P3) to the substrate.
  • the final foam e.g., P3
  • the foam could still have small surface and bulk bubble size and small surface and bulk bubble spacing, if so desired.
  • Figure 8 is a diagram illustrating two independent variables, channel cross section and channel length, which were tested in example embodiments.
  • test male plug 801 has a sealed helical channel with a cross section of .07 inch x .06 inch
  • test male plug 802 has a sealed helical channel with a cross section of .07 inch by .07 inch.
  • test male plug 803 has a sealed helical channel which is 1 inch longer than test male plug 804 (e.g., 2.25 inch of "non-helical tubing" - 1.25 inch of "non-helical tubing").
  • Figure 9 is a table showing the results of the tests with respect to channel cross section and channel length, for example embodiments.
  • a generator whose sealed helical channel is one-inch longer tends to make bubbles with smaller surface bubble size (e.g., 134 versus 171 micrometers) and bulk bubble size (e.g., 189 versus 193 micrometers).
  • a generator whose sealed helical channel is one-inch longer tends to make bubbles with smaller surface bubble spacing (e.g., 316 versus 525 micrometers) and bulk bubble spacing (e.g., 209 versus 234 micrometers).
  • Figure 10 is a table showing a comparison of the foam generator with a plug and housing and a foam generator with a long bead pack.
  • a foam quality e.g., 91%) and given amounts of gas and fluid (e.g., 400 seem of N2 and 40 mL/m of P2)
  • the foam generator with the plug and housing tends to make bubbles with an average surface bubble size that is comparable to the long bead pack (134 versus 131 micrometers).
  • the foam generator with a plug and housing tends to make bubbles with an average surface bubble spacing that is comparable to the long bead pack (318 versus 265 micrometers).
  • FIG 11 is a plot of a time series showing back pressure for an example embodiment.
  • the foam generator with a plug and housing tends to have a constant back pressure (e.g., PSI) as time progresses, which, in turn, tends to show that the foam generator has constant flow, e.g., the foam generator is not clogging. It will be recalled that clogging was a problem with the foam generator employing a bead pack.
  • the continuous helical indentation might be located on the female housing rather than the male plug, in alternative example embodiments.
  • the invention as described herein might be used in other applications involving mechanical foam generation (e.g., in applications involving foams for oil and gas well drilling, culinary foams, and cosmetic foams). Accordingly, the example embodiments are to be considered as illustrative and not restrictive, and the invention is not to be limited to the details given herein, but may be modified within the scope and equivalents of the appended claims.

Abstract

In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.

Description

GENERATOR FOR FOAM TO CLEAN SUBSTRATE by Inventors:
Arnold Kholodenko, Anwar Husain, Gregory A. Tomasch, and Cheng-Yu (Sean) Lin
BACKGROUND
[0001] As described in numerous published patent applications, a system has been developed for cleaning particles from a semiconductor wafer with a high viscosity, non- Newtonian fluid deposited at a low velocity. See e.g., U.S. Published Patent Application No. 2006/0283486 entitled "Method and Apparatus for Cleaning a Substrate Using Non-Newtonian Fluids," filed on June 15, 2005, U.S. Published Patent Application No. 2006/0128590 entitled "Method for Removing Contamination from a Substrate and for Making a Cleaning Solution," filed on February 3, 2006, and U.S. Published Patent Application No. 2006/0128600 entitled "Cleaning Compound and Method and System for Using the Cleaning Compound," filed on February 3, 2006, all of which are hereby incorporated by reference.
[0002] In particular implementations, the high viscosity, non-Newtonian fluid is a foam created by mechanically mixing a gas (such as nitrogen) and a fluid (an aqueous solution with a surfactant such as a fatty acid capable of forming micelles) in the microchannels formed by a packet of thousands of sapphire beads (e.g., approximately 1 mm in diameter). [0003] There are considerable drawbacks to such implementations. Sapphire beads are relatively expensive and react with the foam. Moreover, bead packets tend to clog fairly frequently and take considerable time and expense to clean.
[0004] As a result of these drawbacks, there is a need to provide an inexpensive, readily maintainable apparatus, method, and system for mechanically generating a foam to clean a substrate (e.g., a semiconductor wafer).
SUMMARY
[0005] Example embodiments include apparatuses, systems, and methods directed to mechanically generating a foam to clean a substrate. In one example embodiment, a device includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another part of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas such as nitrogen is injected to form an initial foam. In one particular example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. Additionally, the plug includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a sealed helical channel through which the initial foam flows and is further mixed as the foam makes its way to another aperture which connects the plug to another component of the cleaning system, e.g., a proximity head where the final foam is applied to a semiconductor wafer. In one particular example embodiment, the plug and the housing are proximate to the proximity head where the final foam is applied to the semiconductor wafer, e.g., the plug and housing are located at the point of use of the final foam. In another example embodiment, the plug and housing are located away from the point of use of the final foam in another part of the cleaning system (e.g., in an onboard fluid delivery system).
[0006] The advantages of the present invention will become apparent from the following detailed description, which taken in conjunction with the accompanying drawings, illustrates by way of example the principles of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
[0007] Figure 1 is a diagram illustrating a perspective view of a male plug, in accordance with an example embodiment.
[0008] Figure 2 is a diagram illustrating a sectional view of a male plug, in accordance with an example embodiment.
[0009] Figure 3 is a diagram illustrating a cross-sectional view of a premix chamber in a male plug, in accordance with an example embodiment.
[0010] Figure 4 is a diagram illustrating a sectional view of a male plug and female housing, in accordance with an example embodiment.
[0011] Figure 5 is a diagram illustrating a sectional view of a male plug and female housing in a point-of-use system, in accordance with an example embodiment. [0012] Figure 6A is a diagram illustrating a perspective view of a male plug and female housing in a point-of-use system, in accordance with an example embodiment. [0013] Figure 6B is a simplified schematic diagram showing a pair of male plugs in a point-of-use system, in accordance with an example embodiment.
[0014] Figure 6C is a simplified schematic diagram showing a processing station, in accordance with an example embodiment.
[0015] Figure 7 is a diagram illustrating a perspective view of a male plug and female housing in an onboard fluid delivery system, in accordance with an example embodiment. [0016] Figure 8 is a diagram illustrating two independent variables, channel cross section and channel length, which were tested in example embodiments.
[0017] Figure 9 is a table showing the results of the tests with respect to channel cross section and channel length, for example embodiments.
[0018] Figure 10 is a table showing a comparison of the foam generator with a plug and housing and a foam generator with a long bead pack.
[0019] Figure 11 is a plot of a time series showing back pressure for an example embodiment.
DETAILED DESCRIPTION
[0020] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the example embodiments. However, it will be apparent to one skilled in the art that the example embodiments may be practiced without some of these specific details. In other instances, implementation details and process operations have not been described in detail, if already well known.
[0021] Figure 1 is a diagram illustrating a perspective view of a male plug, in accordance with an example embodiment. In Figure 1, the male plug 101 includes an aperture 102 into which a fluid (e.g., P2) is input or pumped by a system for cleaning a substrate (e.g., a semiconductor wafer). In particular example embodiments, the flow rate for the fluid might be 5 mL/m to 50 mL/m. From the aperture 102, the fluid flows into a premix chamber 103, where the fluid is injected with a gas (e.g., N2 or nitrogen) to form an initial foam. In particular example embodiments, the flow rate for the injected gas might be 50 seem to 500 seem. From the premix chamber 103, the initial foam flows through the continuous helical indentation 104 on an outer surface of the plug to the aperture 105, which outputs a final foam (e.g., P3) to the cleaning system. In this figure, the term "P2" refers to the two phases of matter that are present in the input fluid, e.g., liquid water and solid surfactant. The term "P3" refers to the three phases of matter that are present in the output foam, e.g., liquid water, solid surfactant, and gaseous nitrogen. It will be appreciated that P3 is a high viscosity, non-Newtonian fluid. [0022] In particular example embodiments, the male plug might be made from a highly nonreactive thermoplastic such as polyvinylidene chloride (PVDF) or KYNAR (also called HYLAR or SYGEF). In other alternative example embodiments, the plug might be made of ethylene chlorotrifluoroethlyene (ECTFE) or halar. It will be appreciated that it might be beneficial to match the material used to make the male plug with the material used to make the female housing (e.g., the male plug and the female housing would then have the same coefficient of thermal expansion).
[0023] Figure 2 is a diagram illustrating a sectional view of a male plug, in accordance with an example embodiment. In Figure 2, the male plug 101 includes a premix chamber 103 which has a hollow core and which contains numerous perforations 106 on the outside surface of the premix chamber 103, which permit the input of a gas (e.g., nitrogen), as described further below. The male plug 101 also includes an aperture 102 into which a fluid (e.g., P2) enters the premix chamber 103 and an aperture 107 from which an initial foam (e.g., nitrogen and P2) exits the premix chamber 103. After exiting the premix chamber, the initial foam passes through the continuous helical indentation 104 on an outer surface of the plug. As depicted in Figure 2, the plug beneath the continuous helical indentation is solid, to provide structural support. However, in other example embodiments, the plug beneath the continuous helical indentation might also have a hollow core. Once the initial foam traverses the channel formed by the continuous helical indentation, the initial foam emerges as a final foam (e.g., P3) which enters the aperture 105 and proceeds to another component of the cleaning system, e.g., a proximity head where the foam is delivered at low velocity to a substrate. [0024] In particular example embodiments, such a proximity head is proximate to the male plug 101 and the housing for the plug. That is, the plug 101 and the housing generate a foam at the point of use of the foam. However, in particular example embodiments, the final foam (e.g., P3) will maintain its mixture (e.g., its bubbles) for a relatively long period of time when confined in a sealed passageway (e.g., a tube) and the foam might be transported through such a passageway to a proximity head which is relatively distant from the plug 101 and housing (e.g., in an onboard fluid delivery system).
[0025] Figure 3 is a diagram illustrating a cross-sectional view of a premix chamber in a male plug, in accordance with an example embodiment. In Figure 3, the male plug 101 includes aperture 102 which allows entry of a fluid (e.g., P2) to a premix chamber 103. As depicted in Figure 3, the premix chamber 103 has numerous small perforations which are channels for the injection of a gas (e.g., nitrogen) and which follow a specific pattern. As indicated in the annotation on the right side of Figure 3, the pattern is created by rotating by 15 degrees a set of eight equidistant channels (e.g., with each channel 45 degrees from its two neighboring channels) which are coplanar in a cross-sectional plane. The rotation is shown pictorially in the cross-sections 108 and 109 on the left side of Figure 3. Cross-section 108 (e.g., B-B from 103) shows eight equidistant channels prior to the rotation by 15 degrees. Cross-section 109 (e.g., C- C from 103) shows eight equidistant channels after rotation by 15 degrees. Cross-sections 108 and 109 also illustrate the hollow core of the premix chamber 103. It will be appreciated that the fluid (e.g., P2) flows through this hollow core. It will further be appreciated that the eight equidistant channels are located tangential to this hollow core, e.g., the arrangement between the hollow core and the channels is not akin to a hub and spokes. In particular example embodiments, the tangential location of the channels and the pattern (e.g., rotation by 15 degrees) facilitate the creation of a vortex within the premix chamber 103 and the vortex facilitates mixing of the fluid (e.g., P2) and gas (e.g., nitrogen).
[0026] In an alternative example embodiment, the pattern for the perforations might be created by rotating by 15 degrees a set of 6 or 10 equidistant channels, rather than 8. Similarly, in an alternative example embodiment, the rotation might be more (e.g., 20-25 degrees) or less (e.g., 5-10 degrees) than 15 degrees.
[0027] Figure 4 is a diagram illustrating a sectional view of a male plug and female housing, in accordance with an example embodiment. In Figure 4, the male plug 101 fits tightly into the female housing 112, creating a sealed helical channel 113 which facilitates further mixing of the initial foam into a final foam (e.g., P3). In particular example embodiments, the cross-sectional dimensions of the sealed helical channel might be approximately .06 inch x .04 inch per section. In alternative example embodiments, the cross- sectional dimensions of the sealed helical channel might be approximately .06 inch x .06 inch per section. It will be appreciated that a sealed helical channel with larger cross-sectional dimensions is more difficult to clog. Also depicted in Figure 4 is a tube 110 through which a fluid (e.g., P2) enters into the plug 101 and a tube 111 through which a gas (e.g., nitrogen) enters the premix chamber of the plug 101. A final foam (e.g., P3) leaves the plug 101 through another tube 114.
[0028] It will be appreciated that final foams (e.g., P3) of different qualities are useful for different purposes, where quality might be defined as the volume of gas divided by the volume of gas and liquid on a scale that goes from 0% (no N2 and all P2) to 98% (100 seem N2 and 2.5 mL/m P2). Further, as described below, for a given quality of foam (e.g., 80%), the surface and bulk size of bubbles in the foam and the surface and bulk spacing of bubbles in the foam is a function of the length (or distance) of the helical channel, where a longer length tends to produce bubbles that are smaller in surface and bulk size and smaller in surface and bulk spacing (e.g., closer together) for a given quality. [0029] Figure 5 is a diagram illustrating a sectional view of a male plug and female housing in a point-of-use system, in accordance with an example embodiment. In Figure 5, the male plug 101 fits tightly into female housing 112, from which the male plug 101 can be readily removed for cleaning (e.g., with deionized water) or other maintenance. Figure 5 shows a premix chamber 103 with an inlet 115 for P2 and an inlet 116 for nitrogen, which are alternative inlets to the inlets depicted in Figure 4. Figure 5 also shows the aperture 105 through which the final foam (e.g., P3) flows toward the proximity head which will be used to deposit the P3 on a substrate (e.g., a semiconductor wafer). In particular example embodiments which generate the final foam (e.g., P3) at the point of use of the foam, the proximity head might be located immediately to the left of Figure 5, as described further below. [0030] Figure 6A is a diagram illustrating a perspective view of a manifold with two male plugs in a point-of-use system, in accordance with an example embodiment. In Figure 6A, manifold 117 includes two male plugs 101 which provide final foam (e.g., P3) to a proximity head which is to the upper right outside of Figure 6A. Figure 6A also shows the transmission pipe 118 for the P2 fluid and the transmission pipe 119 for the nitrogen for the male plugs 101. It will be appreciated that this perspective view does not show the female housings for the male plugs 101, for purposes of exposition. However, the arrangement of components in Figure 6A is similar to the arrangement of components in Figure 5.
[0031] Figure 6B is a simplified schematic diagram showing a pair of male plugs in a point-of-use system, in accordance with an example embodiment. In Figure 6B, the pair of male plugs 101 (the female housings are not shown) generate and transmit foam to upper and lower proximity heads 121, which are located nearby in a processing station 120. The proximity heads 121 then deposit the foam, through the use of a meniscus 124, at a low velocity on a semiconductor wafer 122 carried by a wafer carrier 123. It will be appreciated that by generating the foam close to the foam's point of use in the meniscus 124, the system transmits the foam only a short distance, which is advantageous since the foam might be a highly viscous, non-Newtonian fluid, in a particular example embodiment.
[0032] Figure 6C is a simplified schematic diagram showing a processing station, in accordance with an example embodiment. In Figure 6C, a male plug 101 is connected to a proximity head 121 (the female housing is not shown) in a processing station 120. The male plug 101 is also connected to a fluid supply 125 and a gas supply 126, which are located in facilities which might be some distance away from the processing station 120, in a particular example embodiment. It will be appreciated that the male plug 101 in Figure 6C is nonetheless a component in a point-of-use system, since it is located close to proximity head 121, where the foam generated by the male plug 101 will be delivered at low velocity to a semiconductor wafer.
[0033] Figure 7 is a diagram illustrating a perspective view of a male plug and female housing in an onboard fluid delivery system, in accordance with an example embodiment. As shown in Figure 7, the onboard fluid delivery system 127 includes numerous components, including two male plugs 101. In particular example embodiments, the onboard fluid delivery system might be located in a cabinet beneath the proximity head that delivers the final foam (e.g., P3) to the substrate. It will be appreciated that in such a system the final foam (e.g., P3) is not generated at the point of use of the foam, though, as described above, the foam could still have small surface and bulk bubble size and small surface and bulk bubble spacing, if so desired.
[0034] Figure 8 is a diagram illustrating two independent variables, channel cross section and channel length, which were tested in example embodiments. In Figure 8, test male plug 801 has a sealed helical channel with a cross section of .07 inch x .06 inch, whereas test male plug 802 has a sealed helical channel with a cross section of .07 inch by .07 inch. In Figure 8, test male plug 803 has a sealed helical channel which is 1 inch longer than test male plug 804 (e.g., 2.25 inch of "non-helical tubing" - 1.25 inch of "non-helical tubing"). [0035] Figure 9 is a table showing the results of the tests with respect to channel cross section and channel length, for example embodiments. In this table, the column labeled "Generator, one inch shorter" corresponds to Figure 803 in Figure 8 and the column labeled "Generator, two inch shorter" corresponds to Figure 804 in Figure 8; that is, the column labeled "Generator, one inch shorter" corresponds to a sealed helical channel which is one inch longer. It will be appreciated that the table demonstrates that longer channel length (or distance) produces bubbles of smaller size (e.g., surface and bulk) and spacing (e.g., surface and bulk) through the forces (e.g., friction, pressure, etc.) acting upon the foam (e.g., water, surfactant, and nitrogen). For a given foam quality (e.g., 80%), a generator whose sealed helical channel is one-inch longer tends to make bubbles with smaller surface bubble size (e.g., 134 versus 171 micrometers) and bulk bubble size (e.g., 189 versus 193 micrometers). Also, for the same foam quality (e.g., 80%), a generator whose sealed helical channel is one-inch longer tends to make bubbles with smaller surface bubble spacing (e.g., 316 versus 525 micrometers) and bulk bubble spacing (e.g., 209 versus 234 micrometers).
[0036] Figure 10 is a table showing a comparison of the foam generator with a plug and housing and a foam generator with a long bead pack. For a given foam quality (e.g., 91%) and given amounts of gas and fluid (e.g., 400 seem of N2 and 40 mL/m of P2), the foam generator with the plug and housing tends to make bubbles with an average surface bubble size that is comparable to the long bead pack (134 versus 131 micrometers). For the same foam quality and amounts of gas and fluid, the foam generator with a plug and housing tends to make bubbles with an average surface bubble spacing that is comparable to the long bead pack (318 versus 265 micrometers).
[0037] Figure 11 is a plot of a time series showing back pressure for an example embodiment. As shown by this plot, the foam generator with a plug and housing tends to have a constant back pressure (e.g., PSI) as time progresses, which, in turn, tends to show that the foam generator has constant flow, e.g., the foam generator is not clogging. It will be recalled that clogging was a problem with the foam generator employing a bead pack. [0038] Although the foregoing example embodiments have been described in some detail for purposes of clarity of understanding, it will be apparent that certain changes and modifications may be practiced within the scope of the appended claims. For example, the continuous helical indentation might be located on the female housing rather than the male plug, in alternative example embodiments. Furthermore, the invention as described herein might be used in other applications involving mechanical foam generation (e.g., in applications involving foams for oil and gas well drilling, culinary foams, and cosmetic foams). Accordingly, the example embodiments are to be considered as illustrative and not restrictive, and the invention is not to be limited to the details given herein, but may be modified within the scope and equivalents of the appended claims.
What is claimed is:

Claims

Claims
1. An apparatus, comprising: a female housing having an inner surface; and a male plug, further comprising a first aperture into which a fluid flows, a chamber connected to the first aperture, wherein a gas is mixed with the fluid to form a foam, a solid cylinder connected to the chamber, wherein the solid cylinder has a helical indentation on an outside surface of the solid cylinder which forms a sealed channel with an inner surface of the female housing when the solid cylinder is resident in the female housing, the foam being able to flow from the chamber of the male plug to the sealed channel where the foam moves for a distance and is further mixed, and a second aperture connected to the solid cylinder out of which the foam flows.
2. The apparatus of claim 1, wherein the chamber further comprises a hollow cylinder through which the fluid flows and into which the gas is injected.
3. The apparatus of claim 2, wherein the chamber having the hollow cylinder includes injection channels for transmitting the gas into the chamber and facilitating creation of a vortex within the hollow cylinder.
4. The apparatus of claim 3, wherein the injection channels are tangential to the axis of the hollow cylinder.
5. The apparatus of claim 3, wherein the injection channels are defined in a pattern and wherein the pattern is oriented at a set degree of separation.
6. The apparatus of claim 5, wherein the degree of separation is between about 5 and 20 degrees.
7. The apparatus of claim 3, wherein each injection channel is equidistant from both adjacent injection channels and wherein all of the injection channels are coplanar in a cross- sectional plane of the hollow cylinder.
8. The apparatus of claim 1, wherein the fluid comprises water and a surfactant.
9. The apparatus of claim 1, wherein the apparatus is used to provide foam at the point of use of the foam.
10. The apparatus of claim 9, wherein the foam is used to clean a substrate.
11. The apparatus of claim 10, wherein the substrate is a semiconductor wafer.
12. A method for generating a foam, comprising: pumping a fluid into a premix chamber, wherein the premix chamber is a component of a male plug which fits into a female housing in a system for cleaning a substrate with the foam; injecting a gas into the premix chamber to initiate generation of the foam from the fluid; flowing the foam from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing; and outputting the foam from an exit end of the helical channel for delivery to a component of the cleaning system, wherein pumping the fluid and injecting the gas for a period of time causes the foam to travel a distance along the sealed helical channel so as to allow the foam to reach a desired state that is related to the distance travelled.
13. The method of claim 12, wherein the desired state is with respect to bubble size and bubble spacing, for a given quality of the foam.
14. The method of claim 12, wherein the premix chamber further comprises a hollow cylinder through which the fluid flows and into which the gas is injected.
15. The method of claim 14, wherein the gas is injected into the hollow cylinder through injection channels which facilitate the creation of a vortex within the hollow cylinder.
16. The method of claim 15, wherein the injection channels are tangential to the axis of the hollow cylinder.
17. The method of claim 15, wherein the injection channels are defined in a pattern.
18. The method of claim 17, wherein the pattern is oriented at a set degree of separation between about 5 and 20 degrees.
19. The method of claim 12, wherein the fluid comprises water and a surfactant.
20. The method of claim 12, wherein the method is used to provide foam at the point of use of the foam.
21. The method of claim 20, wherein the foam is used to clean a substrate.
22. The method of claim 21, wherein the substrate is a semiconductor wafer.
23. An apparatus, comprising: a female housing; and a male plug, wherein the male plug has a helical indentation on an outside surface of the male plug which forms a sealed channel with an inner surface of the female housing and wherein the sealed channel facilitates travel of a foam along a distance of the sealed channel to obtain a desired state for the foam with respect to bubble size and bubble spacing.
24. The apparatus of claim 23, wherein the foam comprises a non-Newtonian fluid.
25. The apparatus of claim 23, further comprising a chamber having a hollow cylinder connected to one end of the male plug, wherein the foam is initially generated from a fluid pumped into the hollow cylinder and a gas injected into the hollow cylinder.
26. The apparatus of claim 25, wherein the chamber having the hollow cylinder further comprises injection channels for transmitting the gas into the hollow cylinder and facilitating creation of a vortex within the hollow cylinder.
PCT/US2009/052609 2008-08-04 2009-08-03 Generator for foam to clean substrate WO2010017146A1 (en)

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JP2011522146A JP2011530193A (en) 2008-08-04 2009-08-03 Foam generator for cleaning substrates
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US12/185,780 US8161984B2 (en) 2008-08-04 2008-08-04 Generator for foam to clean substrate

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TW201018531A (en) 2010-05-16
KR20110052598A (en) 2011-05-18
CN102112241A (en) 2011-06-29
US8557051B2 (en) 2013-10-15
US20100024842A1 (en) 2010-02-04
TWI402109B (en) 2013-07-21
CN102112241B (en) 2014-06-04
US8161984B2 (en) 2012-04-24
JP2011530193A (en) 2011-12-15
KR101652882B1 (en) 2016-08-31

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