WO2009144072A1 - Arrangement for coating a substrate - Google Patents
Arrangement for coating a substrate Download PDFInfo
- Publication number
- WO2009144072A1 WO2009144072A1 PCT/EP2009/054218 EP2009054218W WO2009144072A1 WO 2009144072 A1 WO2009144072 A1 WO 2009144072A1 EP 2009054218 W EP2009054218 W EP 2009054218W WO 2009144072 A1 WO2009144072 A1 WO 2009144072A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- arrangement
- crucible
- chamber
- vaporizer
- valve
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/139—Processes of manufacture
- H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
- H01M4/381—Alkaline or alkaline earth metals elements
- H01M4/382—Lithium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M6/00—Primary cells; Manufacture thereof
- H01M6/40—Printed batteries, e.g. thin film batteries
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the invention relates to an arrangement for coating a substrate according to the preamble of patent claim 1.
- Li + ions are exchanged between a graphite (Li x Ce) anode and a layered oxide (Lii -x T M ⁇ 2) cathode, T M being a transition metal - cobalt, nickel or occasionally manganese.
- T M being a transition metal - cobalt, nickel or occasionally manganese.
- the energy density is approximately 180 Whkg "1 , which is approximately the fivefold of the considerably older lead-acid battery.
- Li + batteries which comprise an oxygen cathode and a lithium anode (M. Armand and J.-M. Tarascon: Building Better Batteries, Nature, Vol. 451 , 7 Febr. 2008, pp. 652 - 657).
- Lithium batteries are also produced as thin-layer batteries (WO 02/099910 A1 , p. 1 , lines 17 - 20).
- the application of the thin layers takes place by sputtering.
- ions for example of lithium orthophosphate are deposited on a substrate.
- electrolyte layer of Li x P y ON z can be applied.
- PECVD Plasma Enhanced Chemical Vapor Deposition
- a film formation source for use in a film formation apparatus having a film formation chamber in which a vacuum or a depressurized state is formed and a sublimated or evaporated film formation material is formed into a film on a substrate (EP 1 584 705 A).
- This film formation source further comprises a discharge outlet disposed within the film formation chamber for discharging the film formation material towards a film formation surface of the substrate, a material accommodating section disposed outside the film formation chamber and including a material container containing the film formation material.
- a discharge passage air- tightly communicating the discharge outlet with the material accommodating section is also provided in the film formation source.
- the invention addresses the problem of providing an arrangement for coating a substrate, wherein the coating material can also be a member of the group of chemically reactive alkali- and alkaline earth-metals.
- the advantage attained with the invention comprises in particular that a vaporizer crucible can readily be replenished or exchanged free of risks. This is of significance in particular for highly reactive materials to be vaporized, for example lithium, since these must not be contacted nor be exposed to normal atmosphere, oxygen or water.
- the invention consequently relates to an arrangement for the coating of a substrate by means of a vapor distributor.
- This vapor distributor is connected with a vaporizer crucible via a feed system. Between the crucible and the feed system at least one valve is disposed.
- the vaporizer crucible is located in a chamber which can be evacuated or flooded via a vacuum valve by means of a gas supply and a vacuum pump.
- Fig. 1 a vapor feed system with the separating valve closed
- Fig. 2 the vapor feed system according to Figure 1 with a PID controller with the separating valve open
- Fig. 3 a vapor feed system with two separating valves
- Fig. 4 the vapor feed system according to Figure 3, in which the separating valves are closed and a vaporizer crucible is laterally shifted.
- Figure 1 shows a vapor feed system 1 for a vacuum chamber. Of the vacuum chamber only the chamber wall 2 is evident. In Figures 1 to 3 of DE 102 24 908 A1 such a vacuum chamber is shown in detail.
- the vapor feed system 1 comprises a vertically oriented vaporizer tube 3, opposite to which is disposed a substrate 4 to be coated.
- the vaporizer tube 3, which is provided with several, linearly vertically disposed vaporizer nozzles, is connected with an inlet tube 5 which is directed at right angles to the vaporizer tube 3.
- This vaporizer tube 3, consequently, serves as a vapor distributor.
- Parallel to the vaporizer tube 3 and perpendicularly to the inlet tube 5 is provided a cylindrical vaporizer crucible 7, which is located in a crucible housing 8. If reactive materials, for example lithium, are vaporized, the crucible 7 is, for example, comprised of stainless steel, titanium or molybdenum.
- a cylinder 9 Beneath the vaporizer crucible 7 is located a cylinder 9 with a piston 10.
- the vaporizer crucible 7, which in Figure 1 is in its lower position, can be raised and lowered by means of the piston 10.
- a vacuum valve 11 Laterally to the piston 10 is provided a vacuum valve 11 , via which a crucible chamber 12 can be evacuated or be flooded, for example with protective gas.
- the entire vapor feed system must be comprised of a material that is inert relative to these reactive materials.
- a linear guide 31 which contributes to the stabilization of the crucible chamber 12.
- a guide element 32 that is connected to the vaporizer crucible 7.
- the inlet tube 5 includes a downwardly directed connection fitting 14.
- the connection fitting 14 can be closed by means of an end piece 16 of a piston 17.
- This connection fitting 14 comprises furthermore a calotte-shaped part 19 into which the upper part 18 of the vaporizer crucible 7 can engage.
- Piston 17 is connected with a cylinder by means of which the piston 17 can be moved.
- the cylinder 35 can be a pneumatically operated cylinder.
- thermocouple 44 is wound from a vacuum-tight power feedthrough 50 in a spiral about the holding arrangement 36 and terminates in an indentation 51 located in the bottom of crucible 7.
- the spiral winding of the thermocouple 44 that, on the one hand, is fastened on the power feedthrough 50 and, on the other hand, on the holding arrangement 36, permits the necessary lift of crucible 7 from a lower into an upper position. This is illustrated in Figure 2.
- the thermocouple 44 can be moved in the direction of arrows 33 and 34, respectively, by means of piston 10.
- Figure 1 is also evident a wall 6 of a glovebox 40, which encompasses the vaporizer crucible 7 and the vaporizer chamber 12. It becomes thereby possible to exchange the vaporizer crucible 7 under protective gas or to fill it with material.
- protective gas can serve, for example, argon.
- Figure 1 shows the glovebox 40 only segment-wise and schematically.
- Figure 1 shows further a pressure gauge head 38 for measuring the pressure in the vaporizer crucible 7.
- the separating valve 13 is either opened or closed by means of a control not depicted in Figure 1.
- cooling means port 37 in Figure 1 shown only as a segment.
- This cooling means port 37 is connected with a supply unit, not shown in Figure 1 , for a cooling means, for example H 2 O. If needed, the housing 41 is cooled with this cooling means.
- the cooling means port 37 can be connected to the supply unit via an element, for example a tubing of rubber, not shown in Figure 1. If the cooling means is H 2 O, the supply unit can be a conventional water connection.
- Figure 2 shows the same arrangement as Figure 1 , wherein, however, the vaporizer crucible 7 is raised by the piston 10 and specifically so far that the uppermost part 18 of vaporizer crucible 7 is inserted into the lowermost part 19 of connection fitting 14.
- the upper part 18 of the vaporizer crucible 7 is here formed spherically while the lower part of connection fitting 14 is implemented in the form of a calotte.
- the separating valve 13 is herein opened.
- a crucible heating system that encompasses the vaporizer crucible 7.
- This crucible heating system 20 is connected with a PID controller 21 which, in turn, is connected with a rate acquisition 22.
- This rate acquisition 22 can be provided with a measuring instrument 23, for example an oscillating crystal or an emission spectroscope.
- This measuring instrument 23 acquires the vaporization rate of the material which reaches the substrate 4 from the vaporizer tube 3.
- a special nozzle 24 is provided which generates a rate signal that is proportional to the coating rate on the substrate 4. Through this nozzle 24 streams the vapor onto the measuring instrument 23.
- the crucible heating system 20 can be regulated as a function of the coating rate.
- the PID controller 21 can also be set a nominal value. Instead of a PID controller, another controller can also be provided.
- the PID controller involves the general basic type of a controller comprised of the parallel circuit of PD controllers and I controllers, whose properties - early detection of disturbances, rapid correction and elimination of regulation deviation - it combines. If the regulated process contains dead times, the PID controller cannot be utilized due to its D component.
- the vapor exiting the vaporizer tube 3 through the perpendicularly linearly disposed holes is shown symbolically by arrows 26.
- the holes are laid out such that high vaporization rates and uniform coating are attained. For example, they have a diameter of 1 mm to 4 mm and a distance of 5 mm to 30 mm.
- the holes or nozzle bores can here be located more closely to one another and, for example, only have half the distance from one another.
- elongated holes or other forms of openings are also conceivable.
- Figure 3 shows the same arrangement as Figure 1 , however, with two separating valves 13 and 27, both of which are closed.
- the two separating valves 13 and 27 permit an even better exchange of the vaporizer crucible 7 under protective gas.
- the upper separating valve 13 separates the coating chamber 28 from atmospheric pressure 29, while the lower separating valve 27 separates the crucible chamber 8, fillable with protective gas, from atmospheric pressure 29.
- This separating valve 27 is disposed on the spacer ring 25.
- the housing of the separating valve 27 must be implemented such that it is vacuum tight, however, the gate of the valve only needs to be diffusion-tight against gases. Since after flooding of crucible 7 to atmospheric pressure, no pressure difference with respect to the ambient air exists, the gate of the valve 27 does not need to absorb any vacuum forces.
- the vaporizer crucible 7 is located in its lower position.
- the crucible chamber 12 can be separately evacuated or flooded, for example with a protective gas.
- a protective gas for example, argon.
- the gas supply as well as the vacuum pump can optionally be connected via, for example, a T-piece and appropriately disposed valves with the flexible corrugated tubing leading to the valve 11.
- the chamber is flooded.
- the vaporizer crucible 7 can refilled or exchanged, respectively.
- the glovebox 40 is herein under protective gas, for example argon.
- the vaporizer crucible 7 is brought along a rail 30 into a position remote from the vaporization chamber. This takes place by movement of the vaporizer chamber 12 in the direction of arrow 39. Preferably in this position is the vaporizer crucible 7 exchanged or refilled.
- the upper separating valve 13 is herein closed such that the vaporizer chamber continues to be under vacuum. Herewith the vacuum is not broken.
- the vaporizer crucible 7 is located in its lower position. Via the vacuum valve 11 the crucible chamber 12 can be evacuated or flooded independently of the vacuum chamber. The vaporizer crucible 7, together with the crucible chamber 12, is introduced into the glovebox 40. Here the vaporizer crucible 7 is removed and replaced by a new vaporizer crucible or is refilled.
- the separating valve 27 is closed and the crucible chamber 12 is evacuated. Subsequently crucible chamber 12 and vaporizer crucible 7 move along rail 30 back into their rearward position by moving in the direction of arrow 42. After the separating valves 13 and 27 have been connected vacuum-tight with one another and the crucible chamber 12 has been evacuated, the separating valves 13, 27 can be opened. The vaporizer crucible 7 is subsequently brought into the upper position by movement in the direction of arrow 33.
- the glovebox 40 can be located spaced apart from the coating installation.
- the crucible 7 under protective gas is removed with the valve 27 closed in the pulled-out position shown in Figure 4 from the crucible chamber 12 together with the spacer ring 25 and a suitable, also not shown, locking mechanism, i.e. lifted from the rail 30.
- This locking mechanism fixes the crucible 7 on the spacer ring 25 or on the flange fastened on spacer ring 25.
- the crucible 7 in the closed state can be transported to the glovebox 40 located apart.
- the crucible 7 can optionally be cleaned, refilled again and closed with valve 27.
- flexible substrates of synthetic material or metal can also be worked in an installation, such as for example depicted in Figure 3 of EP 1 589 130 A1.
- this known installation only the vapor distributor tube and the vapor exit nozzle would need to be disposed horizontally and parallel to the sheeting.
- cooling means port pressure gauge head arrow glovebox housing arrow thermocouple feedth rough indentation
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011510916A JP5512660B2 (en) | 2008-05-30 | 2009-04-08 | Equipment for coating substrates |
KR1020107029839A KR101682348B1 (en) | 2008-05-30 | 2009-04-08 | Arrangement for coating a substrate |
CN200980120088.8A CN102046832B (en) | 2008-05-30 | 2009-04-08 | Arrangement for coating a substrate |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08009926.0 | 2008-05-30 | ||
EP20080009926 EP2128303B1 (en) | 2008-05-30 | 2008-05-30 | Arrangement for coating a substrate |
US12/130,118 | 2008-05-30 | ||
US12/130,118 US20090293810A1 (en) | 2008-05-30 | 2008-05-30 | Arrangement for coating a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009144072A1 true WO2009144072A1 (en) | 2009-12-03 |
Family
ID=40673452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/054218 WO2009144072A1 (en) | 2008-05-30 | 2009-04-08 | Arrangement for coating a substrate |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP5512660B2 (en) |
KR (1) | KR101682348B1 (en) |
CN (1) | CN102046832B (en) |
TW (1) | TWI527925B (en) |
WO (1) | WO2009144072A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2746423B1 (en) * | 2012-12-20 | 2019-12-18 | Applied Materials, Inc. | Deposition arrangement, deposition apparatus and method of operation thereof |
EP3102715A1 (en) | 2014-02-04 | 2016-12-14 | Applied Materials, Inc. | Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material |
Citations (5)
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US4401052A (en) * | 1979-05-29 | 1983-08-30 | The University Of Delaware | Apparatus for continuous deposition by vacuum evaporation |
US5522955A (en) * | 1994-07-07 | 1996-06-04 | Brodd; Ralph J. | Process and apparatus for producing thin lithium coatings on electrically conductive foil for use in solid state rechargeable electrochemical cells |
DE10224908A1 (en) * | 2001-06-11 | 2003-01-16 | Applied Films Gmbh & Co Kg | Device for coating a flat substrate used in the production of flat TV screens with organic illuminating diodes comprises a fixed vaporizer source for vaporizing materials |
EP1584705A1 (en) * | 2004-03-30 | 2005-10-12 | Tohoku Pioneer Corporation | Vapor source for film formation apparatus |
US20060155557A1 (en) * | 2005-01-11 | 2006-07-13 | Eastman Kodak Company | Customized one time use vapor deposition source |
Family Cites Families (19)
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FR2549857B1 (en) * | 1983-07-26 | 1985-10-04 | Allovon Michel | VACUUM EVAPORATION DEVICE |
JPS61284576A (en) * | 1985-06-12 | 1986-12-15 | Mitsubishi Heavy Ind Ltd | Method for controlling vacuum evaporating apparatus |
JP2811004B2 (en) * | 1988-05-23 | 1998-10-15 | 日本電信電話株式会社 | Metal thin film growth method and apparatus |
JP3758253B2 (en) * | 1996-09-18 | 2006-03-22 | スズキ株式会社 | Vapor deposition source for lithium |
JPH10195632A (en) * | 1997-01-06 | 1998-07-28 | Hisao Izumi | Circulation type vacuum multistage multivessel vapor deposition system |
JP3580101B2 (en) * | 1997-09-24 | 2004-10-20 | スズキ株式会社 | Method and apparatus for producing negative electrode material for lithium ion battery |
JP2002206160A (en) | 2001-01-09 | 2002-07-26 | Sumitomo Electric Ind Ltd | Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus |
JP2002310960A (en) * | 2001-04-18 | 2002-10-23 | Canon Inc | Pre-processing apparatus and method for non- electroconductive sample |
TWI262034B (en) * | 2002-02-05 | 2006-09-11 | Semiconductor Energy Lab | Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device |
US20030168013A1 (en) * | 2002-03-08 | 2003-09-11 | Eastman Kodak Company | Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device |
US6749906B2 (en) * | 2002-04-25 | 2004-06-15 | Eastman Kodak Company | Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
JP2004269948A (en) * | 2003-03-07 | 2004-09-30 | Sony Corp | Film deposition apparatus, film deposition method, and method for manufacturing display device |
JP2007500794A (en) * | 2003-05-16 | 2007-01-18 | エスブイティー アソーシエイツ インコーポレイテッド | Thin film evaporation evaporator |
JP4436664B2 (en) * | 2003-12-24 | 2010-03-24 | 日立造船株式会社 | Vapor deposition equipment |
DE502004003533D1 (en) * | 2004-03-15 | 2007-05-31 | Applied Materials Gmbh & Co Kg | Vacuum treatment plant with convertible maintenance valve |
DE102004041846B4 (en) * | 2004-04-27 | 2007-08-02 | Von Ardenne Anlagentechnik Gmbh | Evaporation device and method for evaporating coating material |
JP4545028B2 (en) * | 2005-03-30 | 2010-09-15 | 日立造船株式会社 | Vapor deposition equipment |
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-
2009
- 2009-04-08 CN CN200980120088.8A patent/CN102046832B/en not_active Expired - Fee Related
- 2009-04-08 KR KR1020107029839A patent/KR101682348B1/en active IP Right Grant
- 2009-04-08 JP JP2011510916A patent/JP5512660B2/en not_active Expired - Fee Related
- 2009-04-08 WO PCT/EP2009/054218 patent/WO2009144072A1/en active Application Filing
- 2009-05-14 TW TW098116042A patent/TWI527925B/en not_active IP Right Cessation
-
2014
- 2014-03-26 JP JP2014062914A patent/JP5932867B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US4401052A (en) * | 1979-05-29 | 1983-08-30 | The University Of Delaware | Apparatus for continuous deposition by vacuum evaporation |
US5522955A (en) * | 1994-07-07 | 1996-06-04 | Brodd; Ralph J. | Process and apparatus for producing thin lithium coatings on electrically conductive foil for use in solid state rechargeable electrochemical cells |
DE10224908A1 (en) * | 2001-06-11 | 2003-01-16 | Applied Films Gmbh & Co Kg | Device for coating a flat substrate used in the production of flat TV screens with organic illuminating diodes comprises a fixed vaporizer source for vaporizing materials |
EP1584705A1 (en) * | 2004-03-30 | 2005-10-12 | Tohoku Pioneer Corporation | Vapor source for film formation apparatus |
US20060155557A1 (en) * | 2005-01-11 | 2006-07-13 | Eastman Kodak Company | Customized one time use vapor deposition source |
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Title |
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LIU ET AL: "A sequential thin-film deposition equipment for in-situ fabricating all-solid-state thin film lithium batteries", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 515, no. 7-8, 15 February 2007 (2007-02-15), pages 4045 - 4048, XP005890836, ISSN: 0040-6090 * |
MARTIN M ET AL: "A multilayer semi-industrial vacuum deposition equipment for producing ultrathin batteries", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 398-399, 1 November 2001 (2001-11-01), pages 572 - 574, XP004328737, ISSN: 0040-6090 * |
Also Published As
Publication number | Publication date |
---|---|
JP2011522118A (en) | 2011-07-28 |
KR20110020878A (en) | 2011-03-03 |
JP5932867B2 (en) | 2016-06-08 |
JP2014169501A (en) | 2014-09-18 |
TW201005115A (en) | 2010-02-01 |
TWI527925B (en) | 2016-04-01 |
CN102046832B (en) | 2014-07-23 |
JP5512660B2 (en) | 2014-06-04 |
KR101682348B1 (en) | 2016-12-12 |
CN102046832A (en) | 2011-05-04 |
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