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Publication numberWO2008024476 A3
Publication typeApplication
Application numberPCT/US2007/018752
Publication date13 Nov 2008
Filing date23 Aug 2007
Priority date23 Aug 2006
Also published asUS8162584, US20080050006, WO2008024476A2
Publication numberPCT/2007/18752, PCT/US/2007/018752, PCT/US/2007/18752, PCT/US/7/018752, PCT/US/7/18752, PCT/US2007/018752, PCT/US2007/18752, PCT/US2007018752, PCT/US200718752, PCT/US7/018752, PCT/US7/18752, PCT/US7018752, PCT/US718752, WO 2008/024476 A3, WO 2008024476 A3, WO 2008024476A3, WO-A3-2008024476, WO2008/024476A3, WO2008024476 A3, WO2008024476A3
InventorsDavid Michael, James Clark, Gang Liu
ApplicantCognex Corp, David Michael, James Clark, Gang Liu
Export CitationBiBTeX, EndNote, RefMan
External Links: Patentscope, Espacenet
Method and apparatus for semiconductor wafer alignment
WO 2008024476 A3
Abstract
The invention provides, in some aspects, a wafer alignment system comprising an image acquisition device, an illumination source, a rotatable wafer platform, and an image processor that includes functionality for mapping coordinates in an image of an article (such as a wafer) on the platform to a 'world' frame of reference at each of a plurality of angles of rotation of the platform.
Patent Citations
Cited PatentFiling datePublication dateApplicantTitle
US5978081 *22 Jun 19982 Nov 1999Cognex CorporationMultiple field of view calibration plate for use in semiconductor manufacturing
US5982132 *9 Oct 19979 Nov 1999Electroglas, Inc.Rotary wafer positioning system and method
Classifications
International ClassificationG06K9/00
Cooperative ClassificationG06T7/73, H01L21/681
European ClassificationG06T7/00P1, H01L21/68L
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