WO2007038191A3 - Microbolometer ir focal plane array (fpa) with in-situ micro vacuum sensor and method of fabrication - Google Patents
Microbolometer ir focal plane array (fpa) with in-situ micro vacuum sensor and method of fabrication Download PDFInfo
- Publication number
- WO2007038191A3 WO2007038191A3 PCT/US2006/036788 US2006036788W WO2007038191A3 WO 2007038191 A3 WO2007038191 A3 WO 2007038191A3 US 2006036788 W US2006036788 W US 2006036788W WO 2007038191 A3 WO2007038191 A3 WO 2007038191A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vacuum
- microbolometer
- fpa
- variability
- fabrication
- Prior art date
Links
- 238000011065 in-situ storage Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000000717 retained effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/10—Vacuum gauges by measuring variations in the heat conductivity of the medium, the pressure of which is to be measured
- G01L21/12—Vacuum gauges by measuring variations in the heat conductivity of the medium, the pressure of which is to be measured measuring changes in electric resistance of measuring members, e.g. of filaments; Vacuum gauges of the Pirani type
Abstract
A microbolometer IR FPA is provided with in-situ vacuum sensing capability by realizing that the IR sensor microbolometer pixel element itself may be used as a vacuum sensor. The application of an electrical signal to the resistive element heats the bolometer material thereby producing a variable resistance related to vacuum level. The degree of variability for a given material depends on the efficiency of heat transfer from the material to the surrounding environment. In a good vacuum, heat transfer is poor, and thus heat will be retained in the material to produce a relatively large temperature increase and the resistance variability will be large. In a poor vacuum, heat is readily transferred to the environment and the temperature rise will be relatively small and thus resistance variability will be small. Consequently, the variable resistance magnitude can be readout to determine the vacuum level.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/162,849 | 2005-09-26 | ||
US11/162,849 US7385199B2 (en) | 2005-09-26 | 2005-09-26 | Microbolometer IR focal plane array (FPA) with in-situ mirco vacuum sensor and method of fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007038191A2 WO2007038191A2 (en) | 2007-04-05 |
WO2007038191A3 true WO2007038191A3 (en) | 2008-01-03 |
Family
ID=37892716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/036788 WO2007038191A2 (en) | 2005-09-26 | 2006-09-19 | Microbolometer ir focal plane array (fpa) with in-situ micro vacuum sensor and method of fabrication |
Country Status (2)
Country | Link |
---|---|
US (1) | US7385199B2 (en) |
WO (1) | WO2007038191A2 (en) |
Families Citing this family (23)
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US6889568B2 (en) * | 2002-01-24 | 2005-05-10 | Sensarray Corporation | Process condition sensing wafer and data analysis system |
US7757574B2 (en) * | 2002-01-24 | 2010-07-20 | Kla-Tencor Corporation | Process condition sensing wafer and data analysis system |
US8604361B2 (en) * | 2005-12-13 | 2013-12-10 | Kla-Tencor Corporation | Component package for maintaining safe operating temperature of components |
US7470904B1 (en) | 2006-03-20 | 2008-12-30 | Flir Systems, Inc. | Infrared camera packaging |
EP2015046A1 (en) * | 2007-06-06 | 2009-01-14 | Infineon Technologies SensoNor AS | Vacuum Sensor |
US7786440B2 (en) * | 2007-09-13 | 2010-08-31 | Honeywell International Inc. | Nanowire multispectral imaging array |
DE102008005167A1 (en) * | 2008-01-19 | 2009-07-23 | Testo Ag | Thermal camera |
JP5255873B2 (en) * | 2008-03-17 | 2013-08-07 | 浜松ホトニクス株式会社 | Photodetector |
WO2010023654A1 (en) * | 2008-08-28 | 2010-03-04 | Opgal Optronic Industries Ltd. | Method for detecting changes in a vacuum state in a detector of a thermal camera |
JP2010071816A (en) * | 2008-09-18 | 2010-04-02 | Toshiba Corp | Electronic device |
US8117898B2 (en) * | 2008-12-19 | 2012-02-21 | Institut National D'optique | Method for sensing gas composition and pressure |
EP2359116B1 (en) | 2008-12-19 | 2019-02-27 | Institut National d'Optique | Micro-thermistor gas pressure sensor |
CA2746335C (en) * | 2008-12-19 | 2014-05-13 | Institut National D'optique | Method for sensing gas composition and pressure |
US8171801B2 (en) * | 2008-12-19 | 2012-05-08 | Institut National D'optique | Micro-thermistor gas pressure sensor |
US8471206B1 (en) | 2009-07-14 | 2013-06-25 | Flir Systems, Inc. | Infrared detector vacuum test systems and methods |
US8546757B2 (en) * | 2010-04-28 | 2013-10-01 | L-3 Communications Corporation | Pixel structure for microbolometer detector |
US8681493B2 (en) | 2011-05-10 | 2014-03-25 | Kla-Tencor Corporation | Heat shield module for substrate-like metrology device |
US8748808B2 (en) | 2012-05-16 | 2014-06-10 | Institut National D'optique | Detection and correction of a loss of calibration of microbolometer thermal imaging radiometers |
EP3035015B1 (en) | 2014-12-15 | 2017-04-12 | Melexis Technologies NV | Ir sensor for ir sensing based on power control |
CN106482892A (en) * | 2016-10-21 | 2017-03-08 | 云南北方昆物光电科技发展有限公司 | Non-refrigerated infrared focal plane probe inner vacuum method of testing |
CN107144356B (en) * | 2017-06-26 | 2019-06-04 | 电子科技大学 | Non-refrigerated infrared focal plane probe array thermal Response Time Test System and method |
KR101842955B1 (en) | 2017-09-28 | 2018-03-29 | ㈜시리우스 | Micro bolometer manufacturing method using selective etching and micro bolometer manufactrued thereby |
US20220399394A1 (en) * | 2021-06-11 | 2022-12-15 | Raytheon Company | Thin film obscurant for microelectronics |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5729019A (en) * | 1995-12-29 | 1998-03-17 | Honeywell Inc. | Split field-of-view uncooled infrared sensor |
US5801383A (en) * | 1995-11-22 | 1998-09-01 | Masahiro Ota, Director General, Technical Research And Development Institute, Japan Defense Agency | VOX film, wherein X is greater than 1.875 and less than 2.0, and a bolometer-type infrared sensor comprising the VOX film |
US20050176179A1 (en) * | 2002-12-27 | 2005-08-11 | Kimiya Ikushima | Electronic device and method of manufacturing the same |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6453748B1 (en) * | 1999-12-15 | 2002-09-24 | Wayne State University | Boron nitride piezoresistive device |
US6952530B2 (en) * | 2003-12-19 | 2005-10-04 | The Aerospace Corporation | Integrated glass ceramic systems |
-
2005
- 2005-09-26 US US11/162,849 patent/US7385199B2/en active Active
-
2006
- 2006-09-19 WO PCT/US2006/036788 patent/WO2007038191A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5801383A (en) * | 1995-11-22 | 1998-09-01 | Masahiro Ota, Director General, Technical Research And Development Institute, Japan Defense Agency | VOX film, wherein X is greater than 1.875 and less than 2.0, and a bolometer-type infrared sensor comprising the VOX film |
US5729019A (en) * | 1995-12-29 | 1998-03-17 | Honeywell Inc. | Split field-of-view uncooled infrared sensor |
US20050176179A1 (en) * | 2002-12-27 | 2005-08-11 | Kimiya Ikushima | Electronic device and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
US7385199B2 (en) | 2008-06-10 |
US20070069133A1 (en) | 2007-03-29 |
WO2007038191A2 (en) | 2007-04-05 |
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