WO2007005414A3 - Alternative fuels for euv light source - Google Patents

Alternative fuels for euv light source Download PDF

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Publication number
WO2007005414A3
WO2007005414A3 PCT/US2006/024959 US2006024959W WO2007005414A3 WO 2007005414 A3 WO2007005414 A3 WO 2007005414A3 US 2006024959 W US2006024959 W US 2006024959W WO 2007005414 A3 WO2007005414 A3 WO 2007005414A3
Authority
WO
WIPO (PCT)
Prior art keywords
tin
euv light
light source
source material
laser beam
Prior art date
Application number
PCT/US2006/024959
Other languages
French (fr)
Other versions
WO2007005414A2 (en
Inventor
Norbert R Bowering
Oleh Khodykin
Alexander N Bykanov
Igor V Fomenkov
Original Assignee
Cymer Inc
Norbert R Bowering
Oleh Khodykin
Alexander N Bykanov
Igor V Fomenkov
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/174,442 external-priority patent/US7196342B2/en
Application filed by Cymer Inc, Norbert R Bowering, Oleh Khodykin, Alexander N Bykanov, Igor V Fomenkov filed Critical Cymer Inc
Priority to EP06774093.6A priority Critical patent/EP1915596B1/en
Priority to JP2008519480A priority patent/JP5489457B2/en
Publication of WO2007005414A2 publication Critical patent/WO2007005414A2/en
Priority to KR1020087001253A priority patent/KR101343805B1/en
Publication of WO2007005414A3 publication Critical patent/WO2007005414A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

Abstract

An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.
PCT/US2006/024959 2005-06-29 2006-06-27 Alternative fuels for euv light source WO2007005414A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP06774093.6A EP1915596B1 (en) 2005-06-29 2006-06-27 Alternative fuels for euv light source
JP2008519480A JP5489457B2 (en) 2005-06-29 2006-06-27 Alternative fuel for EUV light source
KR1020087001253A KR101343805B1 (en) 2005-06-29 2008-01-16 Alternative fuels for euv light source

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/174,442 US7196342B2 (en) 2004-03-10 2005-06-29 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US11/174,442 2005-06-29
US11/406,216 2006-04-17
US11/406,216 US7465946B2 (en) 2004-03-10 2006-04-17 Alternative fuels for EUV light source

Publications (2)

Publication Number Publication Date
WO2007005414A2 WO2007005414A2 (en) 2007-01-11
WO2007005414A3 true WO2007005414A3 (en) 2008-10-02

Family

ID=37604967

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/024959 WO2007005414A2 (en) 2005-06-29 2006-06-27 Alternative fuels for euv light source

Country Status (4)

Country Link
US (1) US7465946B2 (en)
EP (1) EP1915596B1 (en)
KR (1) KR101343805B1 (en)
WO (1) WO2007005414A2 (en)

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US20060249699A1 (en) 2006-11-09
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