WO2006110864A3 - Method for improving surface roughness during electro-polishing - Google Patents

Method for improving surface roughness during electro-polishing Download PDF

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Publication number
WO2006110864A3
WO2006110864A3 PCT/US2006/013804 US2006013804W WO2006110864A3 WO 2006110864 A3 WO2006110864 A3 WO 2006110864A3 US 2006013804 W US2006013804 W US 2006013804W WO 2006110864 A3 WO2006110864 A3 WO 2006110864A3
Authority
WO
WIPO (PCT)
Prior art keywords
stream
partial electrode
electrolyte
insulator wall
polishing
Prior art date
Application number
PCT/US2006/013804
Other languages
French (fr)
Other versions
WO2006110864A2 (en
Inventor
Hui Wang
Fredrick Ho
Jian Wang
Original Assignee
Acm Res Inc
Hui Wang
Fredrick Ho
Jian Wang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acm Res Inc, Hui Wang, Fredrick Ho, Jian Wang filed Critical Acm Res Inc
Publication of WO2006110864A2 publication Critical patent/WO2006110864A2/en
Publication of WO2006110864A3 publication Critical patent/WO2006110864A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00—Combined machining
    • B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
    • B23H5/08—Electrolytic grinding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Abstract

A surface is electropolished using a stream of electrolyte. A nozzle is used to apply the stream of electrolyte to the surface. The nozzle has an insulator wall and a partial electrode. The insulator wall and the partial electrode form a flow channel for the stream of electrolyte. The stream of electrolyte contacts the insulator wall and the partial electrode when the stream of electrolyte flows through the flow channel formed by the insulator wall and the partial electrode. The insulator wall is less electrically conductive than the partial electrode. A power supply is connected to the partial electrode. The power supply is configured to apply a charge to the stream of electrolyte through the partial electrode when the stream of electrolyte flows through the flow channel formed by the insulator wall and the partial electrode.
PCT/US2006/013804 2005-04-12 2006-04-12 Method for improving surface roughness during electro-polishing WO2006110864A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67211105P 2005-04-12 2005-04-12
US60/672,111 2005-04-12

Publications (2)

Publication Number Publication Date
WO2006110864A2 WO2006110864A2 (en) 2006-10-19
WO2006110864A3 true WO2006110864A3 (en) 2008-09-25

Family

ID=37087692

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/013804 WO2006110864A2 (en) 2005-04-12 2006-04-12 Method for improving surface roughness during electro-polishing

Country Status (1)

Country Link
WO (1) WO2006110864A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101891730B1 (en) 2012-03-30 2018-08-24 에이씨엠 리서치 (상하이) 인코포레이티드 Nozzle for stress-free polishing metal layers on semiconductor wafers
TWI639488B (en) * 2013-07-31 2018-11-01 盛美半導體設備（上海）有限公司 No-stress electrochemical polishing nozzle

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3485744A (en) * 1966-11-21 1969-12-23 Westinghouse Electric Corp Zirconium electrode for electro-chemical machining
US6395152B1 (en) * 1998-07-09 2002-05-28 Acm Research, Inc. Methods and apparatus for electropolishing metal interconnections on semiconductor devices

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3485744A (en) * 1966-11-21 1969-12-23 Westinghouse Electric Corp Zirconium electrode for electro-chemical machining
US6395152B1 (en) * 1998-07-09 2002-05-28 Acm Research, Inc. Methods and apparatus for electropolishing metal interconnections on semiconductor devices

Also Published As

Publication number Publication date
WO2006110864A2 (en) 2006-10-19

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