WO2006017847A3 - Silicon-insulator thin-film structures for optical modulators and methods of manufacture - Google Patents
Silicon-insulator thin-film structures for optical modulators and methods of manufacture Download PDFInfo
- Publication number
- WO2006017847A3 WO2006017847A3 PCT/US2005/028391 US2005028391W WO2006017847A3 WO 2006017847 A3 WO2006017847 A3 WO 2006017847A3 US 2005028391 W US2005028391 W US 2005028391W WO 2006017847 A3 WO2006017847 A3 WO 2006017847A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- silicon
- optical modulators
- manufacture
- methods
- film structures
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/131—Integrated optical circuits characterised by the manufacturing method by using epitaxial growth
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction
- G02F1/025—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction in an optical waveguide structure
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05810130A EP1779190A2 (en) | 2004-08-10 | 2005-08-10 | Silicon-insulator thin-film structures for optical modulators and methods of manufacture |
IL181259A IL181259A0 (en) | 2004-08-10 | 2007-02-11 | Silicon-insulator thin-film structures for optical modulators and methods of manufacture |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/915,299 US7177489B2 (en) | 2004-03-18 | 2004-08-10 | Silicon-insulator-silicon thin-film structures for optical modulators and methods of manufacture |
US10/915,299 | 2004-08-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006017847A2 WO2006017847A2 (en) | 2006-02-16 |
WO2006017847A3 true WO2006017847A3 (en) | 2006-05-18 |
Family
ID=35709159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/028391 WO2006017847A2 (en) | 2004-08-10 | 2005-08-10 | Silicon-insulator thin-film structures for optical modulators and methods of manufacture |
Country Status (4)
Country | Link |
---|---|
US (1) | US7177489B2 (en) |
EP (1) | EP1779190A2 (en) |
IL (1) | IL181259A0 (en) |
WO (1) | WO2006017847A2 (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7672558B2 (en) * | 2004-01-12 | 2010-03-02 | Honeywell International, Inc. | Silicon optical device |
US7217584B2 (en) * | 2004-03-18 | 2007-05-15 | Honeywell International Inc. | Bonded thin-film structures for optical modulators and methods of manufacture |
US20050214989A1 (en) * | 2004-03-29 | 2005-09-29 | Honeywell International Inc. | Silicon optoelectronic device |
US20070101927A1 (en) * | 2005-11-10 | 2007-05-10 | Honeywell International Inc. | Silicon based optical waveguide structures and methods of manufacture |
US7362443B2 (en) | 2005-11-17 | 2008-04-22 | Honeywell International Inc. | Optical gyro with free space resonator and method for sensing inertial rotation rate |
US7463360B2 (en) | 2006-04-18 | 2008-12-09 | Honeywell International Inc. | Optical resonator gyro with integrated external cavity beam generator |
US20070274655A1 (en) * | 2006-04-26 | 2007-11-29 | Honeywell International Inc. | Low-loss optical device structure |
US7454102B2 (en) | 2006-04-26 | 2008-11-18 | Honeywell International Inc. | Optical coupling structure |
US7535576B2 (en) | 2006-05-15 | 2009-05-19 | Honeywell International, Inc. | Integrated optical rotation sensor and method for sensing rotation rate |
US8290325B2 (en) * | 2008-06-30 | 2012-10-16 | Intel Corporation | Waveguide photodetector device and manufacturing method thereof |
US8450186B2 (en) * | 2009-09-25 | 2013-05-28 | Intel Corporation | Optical modulator utilizing wafer bonding technology |
KR101683770B1 (en) * | 2010-07-28 | 2016-12-08 | 삼성전자주식회사 | Method for manufacturing photodetector structure |
KR101768676B1 (en) * | 2010-10-22 | 2017-08-16 | 삼성전자주식회사 | Silicon phase shifter, electro-optic modulator and photonic integrated circuit employing the same |
KR20140140339A (en) * | 2013-05-29 | 2014-12-09 | 삼성전자주식회사 | Fabricating method of semiconductor device |
FR3011346A1 (en) * | 2013-10-02 | 2015-04-03 | St Microelectronics Sa | ELECTRO-OPTICAL DEHASTER WITH OXIDE CAPABILITY |
TWI634716B (en) | 2013-10-22 | 2018-09-01 | 美國麻省理工學院 | Waveguide formation using cmos fabrication techniques |
FR3054926B1 (en) * | 2016-08-08 | 2018-10-12 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | METHOD FOR MANUFACTURING PROPAGATION LOSS MODULATOR AND PROPAGATION INDEX OF OPTICAL SIGNAL |
EP3673324B1 (en) * | 2017-08-22 | 2022-06-29 | Rockley Photonics Limited | Optical modulator and method of fabricating an optical modulator |
CN113193382B (en) * | 2021-05-20 | 2022-11-25 | 山东大学 | Wave absorber and electronic equipment |
US20230030971A1 (en) * | 2021-07-28 | 2023-02-02 | Cisco Technology, Inc. | Silicon germanium-based semiconductor-insulator-semiconductor capacitor (siscap) modulator |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6323985B1 (en) * | 1998-12-30 | 2001-11-27 | Intel Corporation | Mosfet through silicon modulator and method |
WO2004088394A2 (en) * | 2003-03-25 | 2004-10-14 | Sioptical, Inc. | High-speed silicon-based electro-optic modulator |
Family Cites Families (69)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4886345A (en) | 1988-08-05 | 1989-12-12 | Harris Corporation | Electro-optical phase modulator |
GB2221999B (en) | 1988-08-16 | 1992-09-16 | Plessey Co Plc | Optical phase modulator |
US5383048A (en) | 1993-02-03 | 1995-01-17 | Seaver; George | Stress-optical phase modulator and modulation system and method of use |
KR960011653B1 (en) | 1993-04-16 | 1996-08-24 | 현대전자산업 주식회사 | Dram cell and the method |
US5696662A (en) | 1995-08-21 | 1997-12-09 | Honeywell Inc. | Electrostatically operated micromechanical capacitor |
US5841931A (en) * | 1996-11-26 | 1998-11-24 | Massachusetts Institute Of Technology | Methods of forming polycrystalline semiconductor waveguides for optoelectronic integrated circuits, and devices formed thereby |
SG87916A1 (en) | 1997-12-26 | 2002-04-16 | Canon Kk | Sample separating apparatus and method, and substrate manufacturing method |
US6108212A (en) | 1998-06-05 | 2000-08-22 | Motorola, Inc. | Surface-mount device package having an integral passive component |
JP2000124092A (en) | 1998-10-16 | 2000-04-28 | Shin Etsu Handotai Co Ltd | Manufacture of soi wafer by hydrogen-ion implantation stripping method and soi wafer manufactured thereby |
US6546538B1 (en) | 2000-03-10 | 2003-04-08 | Lsi Logic Corporation | Integrated circuit having on-chip capacitors for supplying power to portions of the circuit requiring high-transient peak power |
JP4961634B2 (en) | 2000-07-07 | 2012-06-27 | Kddi株式会社 | Optical gate device |
US6674108B2 (en) | 2000-12-20 | 2004-01-06 | Honeywell International Inc. | Gate length control for semiconductor chip design |
US6890450B2 (en) * | 2001-02-02 | 2005-05-10 | Intel Corporation | Method of providing optical quality silicon surface |
US6603166B2 (en) | 2001-03-14 | 2003-08-05 | Honeywell International Inc. | Frontside contact on silicon-on-insulator substrate |
US6646747B2 (en) | 2001-05-17 | 2003-11-11 | Sioptical, Inc. | Interferometer apparatus and associated method |
US6748125B2 (en) | 2001-05-17 | 2004-06-08 | Sioptical, Inc. | Electronic semiconductor control of light in optical waveguide |
US6912330B2 (en) | 2001-05-17 | 2005-06-28 | Sioptical Inc. | Integrated optical/electronic circuits and associated methods of simultaneous generation thereof |
US6625348B2 (en) | 2001-05-17 | 2003-09-23 | Optron X, Inc. | Programmable delay generator apparatus and associated method |
US6608945B2 (en) | 2001-05-17 | 2003-08-19 | Optronx, Inc. | Self-aligning modulator method and associated apparatus |
US6760498B2 (en) | 2001-05-17 | 2004-07-06 | Sioptical, Inc. | Arrayed waveguide grating, and method of making same |
US6603889B2 (en) | 2001-05-17 | 2003-08-05 | Optronx, Inc. | Optical deflector apparatus and associated method |
US6738546B2 (en) | 2001-05-17 | 2004-05-18 | Sioptical, Inc. | Optical waveguide circuit including multiple passive optical waveguide devices, and method of making same |
US6947615B2 (en) | 2001-05-17 | 2005-09-20 | Sioptical, Inc. | Optical lens apparatus and associated method |
US6658173B2 (en) | 2001-05-17 | 2003-12-02 | Optronx, Inc. | Interferometer and method of making same |
US6690844B2 (en) | 2001-05-17 | 2004-02-10 | Optronx, Inc. | Optical fiber apparatus and associated method |
US6891685B2 (en) | 2001-05-17 | 2005-05-10 | Sioptical, Inc. | Anisotropic etching of optical components |
US6963118B2 (en) | 2001-05-17 | 2005-11-08 | Sioptical, Inc. | Hybrid active and electronic circuit with evanescent coupling |
US6493502B1 (en) | 2001-05-17 | 2002-12-10 | Optronx, Inc. | Dynamic gain equalizer method and associated apparatus |
US6654511B2 (en) | 2001-05-17 | 2003-11-25 | Sioptical, Inc. | Optical modulator apparatus and associated method |
US6842546B2 (en) | 2001-05-17 | 2005-01-11 | Sioptical, Inc. | Polyloaded optical waveguide device in combination with optical coupler, and method for making same |
US6690863B2 (en) | 2001-05-17 | 2004-02-10 | Si Optical, Inc. | Waveguide coupler and method for making same |
US6526187B1 (en) | 2001-05-17 | 2003-02-25 | Optronx, Inc. | Polarization control apparatus and associated method |
US6891985B2 (en) | 2001-05-17 | 2005-05-10 | Sioptical, Inc. | Polyloaded optical waveguide devices and methods for making same |
US6898352B2 (en) | 2001-05-17 | 2005-05-24 | Sioptical, Inc. | Optical waveguide circuit including passive optical waveguide device combined with active optical waveguide device, and method for making same |
JP3755588B2 (en) | 2001-10-03 | 2006-03-15 | 日本電気株式会社 | Light control device |
US6580863B2 (en) * | 2001-10-31 | 2003-06-17 | Intel Corporation | System and method for providing integrated optical waveguide device |
US6879751B2 (en) | 2002-01-30 | 2005-04-12 | Sioptical, Inc. | Method and apparatus for altering the effective mode index of an optical waveguide |
JP3955764B2 (en) | 2002-02-08 | 2007-08-08 | 富士通株式会社 | Optical modulator equipped with an element that changes the optical phase by electro-optic effect |
IL148716A0 (en) | 2002-03-14 | 2002-09-12 | Yissum Res Dev Co | Control of optical signals by mos (cosmos) device |
US6743662B2 (en) | 2002-07-01 | 2004-06-01 | Honeywell International, Inc. | Silicon-on-insulator wafer for RF integrated circuit |
US6919238B2 (en) * | 2002-07-29 | 2005-07-19 | Intel Corporation | Silicon on insulator (SOI) transistor and methods of fabrication |
US6888219B2 (en) | 2002-08-29 | 2005-05-03 | Honeywell International, Inc. | Integrated structure with microwave components |
US7118682B2 (en) | 2003-03-28 | 2006-10-10 | Sioptical, Inc. | Low loss SOI/CMOS compatible silicon waveguide and method of making the same |
US6993225B2 (en) | 2004-02-10 | 2006-01-31 | Sioptical, Inc. | Tapered structure for providing coupling between external optical device and planar optical waveguide and method of forming the same |
US6897498B2 (en) | 2003-03-31 | 2005-05-24 | Sioptical, Inc. | Polycrystalline germanium-based waveguide detector integrated on a thin silicon-on-insulator (SOI) platform |
US7020364B2 (en) * | 2003-03-31 | 2006-03-28 | Sioptical Inc. | Permanent light coupling arrangement and method for use with thin silicon optical waveguides |
US6934444B2 (en) | 2003-04-10 | 2005-08-23 | Sioptical, Inc. | Beam shaping and practical methods of reducing loss associated with mating external sources and optics to thin silicon waveguides |
US7000207B2 (en) | 2003-04-10 | 2006-02-14 | Sioptical, Inc. | Method of using a Manhattan layout to realize non-Manhattan shaped optical structures |
US6980720B2 (en) | 2003-04-11 | 2005-12-27 | Sioptical, Inc. | Mode transformation and loss reduction in silicon waveguide structures utilizing tapered transition regions |
JP2006525677A (en) | 2003-04-21 | 2006-11-09 | シオプティカル インコーポレーテッド | CMOS compatible integration of silicon-based optical devices with electronic devices |
CN100495094C (en) | 2003-04-23 | 2009-06-03 | 斯欧普迪克尔股份有限公司 | Sub-micron planar lightwave devices formed on an SOI optical platform |
KR20060018827A (en) | 2003-04-28 | 2006-03-02 | 시옵티컬 인코포레이티드 | Arrangements for reducing wavelength sensitivity in prism-coupled soi-based optical systems |
KR100794817B1 (en) | 2003-05-08 | 2008-01-15 | 시옵티컬 인코포레이티드 | High speed, silicon-based electro-optic modulator |
WO2005024470A2 (en) | 2003-09-04 | 2005-03-17 | Sioptical, Inc | External grating structures for interfacing wavelength-division-multiplexed optical sources with thin optical waveguides |
WO2005024469A2 (en) | 2003-09-04 | 2005-03-17 | Sioptical, Inc. | Interfacing multiple wavelength sources to thin optical waveguides utilizing evanescent coupling |
KR20060130045A (en) | 2003-11-20 | 2006-12-18 | 시옵티컬 인코포레이티드 | Silicon-based schottky barrier infrared optical detector |
WO2005057253A2 (en) | 2003-12-04 | 2005-06-23 | Sioptical, Inc. | Planar waveguide optical isolator in thin silicon-on-isolator (soi) structure |
US20050135727A1 (en) | 2003-12-18 | 2005-06-23 | Sioptical, Inc. | EMI-EMC shield for silicon-based optical transceiver |
US7672558B2 (en) * | 2004-01-12 | 2010-03-02 | Honeywell International, Inc. | Silicon optical device |
US7013067B2 (en) | 2004-02-11 | 2006-03-14 | Sioptical, Inc. | Silicon nanotaper couplers and mode-matching devices |
US7298949B2 (en) | 2004-02-12 | 2007-11-20 | Sioptical, Inc. | SOI-based photonic bandgap devices |
CN101142505B (en) | 2004-02-26 | 2010-05-05 | 斯欧普迪克尔股份有限公司 | Active manipulation of light in a silicon-on-insulator (SOI) structure |
JP4847440B2 (en) | 2004-03-08 | 2011-12-28 | シオプティカル インコーポレーテッド | Opto-electronic test apparatus and method at wafer level |
WO2005094530A2 (en) | 2004-03-24 | 2005-10-13 | Sioptical, Inc. | Optical crossover in thin silicon |
US20050236619A1 (en) | 2004-04-21 | 2005-10-27 | Vipulkumar Patel | CMOS-compatible integration of silicon-based optical devices with electronic devices |
KR100648670B1 (en) * | 2004-05-18 | 2006-11-23 | 삼성에스디아이 주식회사 | A switching control circuit for a data driver of light emitting device, and a method thereof |
US7269809B2 (en) | 2004-06-23 | 2007-09-11 | Sioptical, Inc. | Integrated approach for design, simulation and verification of monolithic, silicon-based opto-electronic circuits |
US20060018597A1 (en) | 2004-07-23 | 2006-01-26 | Sioptical, Inc. | Liquid crystal grating coupling |
CA2584564A1 (en) | 2004-10-19 | 2006-04-27 | Sioptical, Inc. | Optical detector configuration and utilization as feedback control in monolithic integrated optic and electronic arrangements |
-
2004
- 2004-08-10 US US10/915,299 patent/US7177489B2/en not_active Expired - Fee Related
-
2005
- 2005-08-10 WO PCT/US2005/028391 patent/WO2006017847A2/en active Application Filing
- 2005-08-10 EP EP05810130A patent/EP1779190A2/en not_active Withdrawn
-
2007
- 2007-02-11 IL IL181259A patent/IL181259A0/en unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6323985B1 (en) * | 1998-12-30 | 2001-11-27 | Intel Corporation | Mosfet through silicon modulator and method |
WO2004088394A2 (en) * | 2003-03-25 | 2004-10-14 | Sioptical, Inc. | High-speed silicon-based electro-optic modulator |
Non-Patent Citations (5)
Title |
---|
AHMED S S ET AL: "Nitrided thermal SiO2 for thin buried gate insulators in dual gate SOI-MOSFET", UNIVERSITY/GOVERNMENT/INDUSTRY MICROELECTRONICS SYMPOSIUM, 1999. PROCEEDINGS OF THE THIRTEENTH BIENNIAL MINNEAPOLIS, MN, USA 20-23 JUNE 1999, PISCATATWAY, NJ, USA,IEEE, US, 20 June 1999 (1999-06-20), pages 43 - 46, XP010345902, ISBN: 0-7803-5240-8 * |
AHMED S S ET AL: "Nitrided thermal SiO2 for use as top and bottom gate insulators in self-aligned double gate silicon-on-insulator metal-oxide-semiconductor field effect transistor", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (MICROELECTRONICS AND NANOMETER STRUCTURES) AIP FOR AMERICAN VACUUM SOC USA, vol. 19, no. 3, May 2001 (2001-05-01), pages 800 - 806, XP012008790, ISSN: 0734-211X * |
LIU A ET AL: "A HIGH-SPEED SILICON OPTICAL MODULATOR BASED ON A METAL-OXIDE-SEMICONDUCTOR CAPACITOR", NATURE, NATURE PUBLISHING GROUP, LONDON, GB, vol. 427, 12 February 2004 (2004-02-12), pages 615 - 618, XP001188890, ISSN: 0028-0836 * |
LIU A ET AL: "Fast silicon optical modulator", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 5357, July 2004 (2004-07-01), pages 35 - 44, XP002332586, ISSN: 0277-786X * |
PNG C E ET AL: "Development of small silicon modulators in silicon-on-insulator (SOI)", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 4997, 2003, pages 190 - 197, XP002329756, ISSN: 0277-786X * |
Also Published As
Publication number | Publication date |
---|---|
EP1779190A2 (en) | 2007-05-02 |
US20050207691A1 (en) | 2005-09-22 |
IL181259A0 (en) | 2007-07-04 |
US7177489B2 (en) | 2007-02-13 |
WO2006017847A2 (en) | 2006-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2006017847A3 (en) | Silicon-insulator thin-film structures for optical modulators and methods of manufacture | |
TW200736682A (en) | Silicon based optical waveguide structures and methods of manufacture | |
WO2007098215A3 (en) | Method for growth of semipolar (al,in,ga,b)n optoelectronic devices | |
DE602005007592D1 (en) | METHOD FOR PRODUCING SEPARATED SILICON-ON-INSOLATOR STRUCTURES AND RELATED SILICON-ON-INSULATOR STRUCTURES MADE THEREFOR | |
WO2007103249A3 (en) | Methods of forming thermoelectric devices using islands of thermoelectric material and related structures | |
WO2007016070A3 (en) | Method of fabricating ge or sige/si waveguide or photonic crystal structures by selective growth | |
EP1892323A4 (en) | Silicon single crystal growing method, silicon wafer and soi substrate using such silicon wafer | |
TW200711148A (en) | Stressed field effect transistors on hybrid orientation substrate | |
WO2005027201A8 (en) | Method of fabrication and device comprising elongated nanosize elements | |
WO2003096385A3 (en) | Silicon-on-insulator structures and methods | |
WO2009129391A3 (en) | Low temperature thin film transistor process, device property, and device stability improvement | |
WO2003069658A3 (en) | Strained si based layer made by uhv-cvd, and devices therein | |
WO2006130696A3 (en) | Technique for the growth and fabrication of semipolar (ga,al,in,b)n thin films, heterostructures, and devices | |
WO2012040075A3 (en) | Non-planar device having uniaxially strained fin and method of making same | |
WO2005010964A3 (en) | Silicon crystallization using self-assembled monolayers | |
EP1785511A4 (en) | Silicon wafer, process for producing the same and method of growing silicon single crystal | |
FR2910700B1 (en) | METHOD FOR MANUFACTURING SOI SUBSTRATE COMBINING SILICON BASED ZONES AND GaAs ZONES | |
DE602005024611D1 (en) | Process for producing dual strained SOI substrates | |
EP2388802A4 (en) | Inside reforming substrate for epitaxial growth; crystal film forming element, device, and bulk substrate produced using the same; and method for producing the same | |
WO2007133271A3 (en) | Methods for oriented growth of nanowires on patterned substrates | |
TW200610063A (en) | Dual SIMOX hybrid orientation technology (hot) substrates | |
TW200729343A (en) | Method for fabricating controlled stress silicon nitride films | |
WO2005050711A3 (en) | A method for fabricating semiconductor devices using strained silicon bearing material | |
WO2006034189A3 (en) | High-mobility bulk silicon pfet | |
EP1790759A4 (en) | NITRIDE SEMICONDUCTOR SINGLE CRYSTAL INCLUDING Ga, METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE AND DEVICE USING THE CRYSTAL |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
DPEN | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed from 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2005810130 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 181259 Country of ref document: IL |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWP | Wipo information: published in national office |
Ref document number: 2005810130 Country of ref document: EP |