WO2006009626A3 - Imprinting lithography using the liquid/solid transition of metals and their alloys - Google Patents

Imprinting lithography using the liquid/solid transition of metals and their alloys Download PDF

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Publication number
WO2006009626A3
WO2006009626A3 PCT/US2005/020351 US2005020351W WO2006009626A3 WO 2006009626 A3 WO2006009626 A3 WO 2006009626A3 US 2005020351 W US2005020351 W US 2005020351W WO 2006009626 A3 WO2006009626 A3 WO 2006009626A3
Authority
WO
WIPO (PCT)
Prior art keywords
liquid
alloys
metals
solid transition
imprinting
Prior art date
Application number
PCT/US2005/020351
Other languages
French (fr)
Other versions
WO2006009626A2 (en
Inventor
Yong Chen
Original Assignee
Hewlett Packard Development Co
Yong Chen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Development Co, Yong Chen filed Critical Hewlett Packard Development Co
Priority to EP05757746A priority Critical patent/EP1756669B1/en
Priority to JP2007516564A priority patent/JP2008503873A/en
Priority to AT05757746T priority patent/ATE527576T1/en
Publication of WO2006009626A2 publication Critical patent/WO2006009626A2/en
Publication of WO2006009626A3 publication Critical patent/WO2006009626A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

A method is provided for imprinting a pattern (18a) having nanoscale features from a mold (10) into the patternable layer (18) on a substrate (14). The method comprises: providing the mold (10); forming the patternable layer (18) on the substrate (14); and imprinting the mold (10) into the patternable layer (18), wherein the patternable layer (18) comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.
PCT/US2005/020351 2004-06-16 2005-06-08 Imprinting lithography using the liquid/solid transition of metals and their alloys WO2006009626A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP05757746A EP1756669B1 (en) 2004-06-16 2005-06-08 Imprinting lithography using the liquid/solid transition of metals and their alloys
JP2007516564A JP2008503873A (en) 2004-06-16 2005-06-08 Imprint lithography using the liquid / solid transition of metals and their alloys
AT05757746T ATE527576T1 (en) 2004-06-16 2005-06-08 PRINT LITHOGRAPHY USING THE LIQUID/SOLID TRANSITION OF METALS AND THEIR ALLOYS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/870,664 2004-06-16
US10/870,664 US7141275B2 (en) 2004-06-16 2004-06-16 Imprinting lithography using the liquid/solid transition of metals and their alloys

Publications (2)

Publication Number Publication Date
WO2006009626A2 WO2006009626A2 (en) 2006-01-26
WO2006009626A3 true WO2006009626A3 (en) 2006-03-09

Family

ID=34978708

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/020351 WO2006009626A2 (en) 2004-06-16 2005-06-08 Imprinting lithography using the liquid/solid transition of metals and their alloys

Country Status (5)

Country Link
US (2) US7141275B2 (en)
EP (1) EP1756669B1 (en)
JP (1) JP2008503873A (en)
AT (1) ATE527576T1 (en)
WO (1) WO2006009626A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
CA2847260C (en) 2003-12-19 2016-06-21 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
WO2009041510A1 (en) * 2007-09-25 2009-04-02 Panasonic Electric Works Co., Ltd. Process for producing resin molded product, resin molded product produced by the process, optical device, microlens, microlens array, and microfluid device
JP5783714B2 (en) * 2010-12-17 2015-09-24 キヤノン株式会社 Optical element manufacturing method
DE102013111372B4 (en) * 2013-10-15 2016-06-30 Technische Universität Braunschweig Method for producing a surface-structured article

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB189717969A (en) * 1897-07-31 1898-06-04 New Press Printing Company Han A New Method of Embossing Paper, Boards, Leather, Tin, and like Substances.
WO1999064642A1 (en) * 1998-06-08 1999-12-16 Borealis Technical Limited Method for fabricating metal nanostructures
US6048623A (en) * 1996-12-18 2000-04-11 Kimberly-Clark Worldwide, Inc. Method of contact printing on gold coated films
EP1003078A2 (en) * 1998-11-17 2000-05-24 Corning Incorporated Replicating a nanoscale pattern
US20020093122A1 (en) * 2000-08-01 2002-07-18 Choi Byung J. Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US6432740B1 (en) * 2001-06-28 2002-08-13 Hewlett-Packard Company Fabrication of molecular electronic circuit by imprinting
US6680214B1 (en) * 1998-06-08 2004-01-20 Borealis Technical Limited Artificial band gap

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Publication number Priority date Publication date Assignee Title
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JPH1096808A (en) * 1996-09-24 1998-04-14 Nippon Telegr & Teleph Corp <Ntt> Formation of fine pattern
US5920848A (en) 1997-02-12 1999-07-06 Citibank, N.A. Method and system for using intelligent agents for financial transactions, services, accounting, and advice
US7074498B2 (en) * 2002-03-22 2006-07-11 Borealis Technical Limited Influence of surface geometry on metal properties
US6518156B1 (en) * 1999-03-29 2003-02-11 Hewlett-Packard Company Configurable nanoscale crossbar electronic circuits made by electrochemical reaction
US6165911A (en) * 1999-12-29 2000-12-26 Calveley; Peter Braden Method of patterning a metal layer
SE516194C2 (en) * 2000-04-18 2001-12-03 Obducat Ab Substrate for and process of fabrication of structures
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6946410B2 (en) * 2002-04-05 2005-09-20 E. I. Du Pont De Nemours And Company Method for providing nano-structures of uniform length
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
TW556031B (en) * 2003-01-17 2003-10-01 Chunghwa Picture Tubes Ltd Non-rubbing liquid crystal alignment method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB189717969A (en) * 1897-07-31 1898-06-04 New Press Printing Company Han A New Method of Embossing Paper, Boards, Leather, Tin, and like Substances.
US6048623A (en) * 1996-12-18 2000-04-11 Kimberly-Clark Worldwide, Inc. Method of contact printing on gold coated films
WO1999064642A1 (en) * 1998-06-08 1999-12-16 Borealis Technical Limited Method for fabricating metal nanostructures
US6680214B1 (en) * 1998-06-08 2004-01-20 Borealis Technical Limited Artificial band gap
EP1003078A2 (en) * 1998-11-17 2000-05-24 Corning Incorporated Replicating a nanoscale pattern
US20020093122A1 (en) * 2000-08-01 2002-07-18 Choi Byung J. Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US6432740B1 (en) * 2001-06-28 2002-08-13 Hewlett-Packard Company Fabrication of molecular electronic circuit by imprinting

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CHOU S Y ET AL: "IMPRINT LITHOGRAPHY WITH 25-NANOMETER RESOLUTION", SCIENCE, AMERICAN ASSOCIATION FOR THE ADVANCEMENT OF SCIENCE,, US, vol. 272, 5 April 1996 (1996-04-05), pages 85 - 87, XP000602257, ISSN: 0036-8075 *

Also Published As

Publication number Publication date
US7141275B2 (en) 2006-11-28
US20050282388A1 (en) 2005-12-22
EP1756669A2 (en) 2007-02-28
EP1756669B1 (en) 2011-10-05
US20050280147A1 (en) 2005-12-22
WO2006009626A2 (en) 2006-01-26
ATE527576T1 (en) 2011-10-15
JP2008503873A (en) 2008-02-07

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