WO2005081060A3 - Device consisting of at least one optical element - Google Patents

Device consisting of at least one optical element Download PDF

Info

Publication number
WO2005081060A3
WO2005081060A3 PCT/EP2005/001985 EP2005001985W WO2005081060A3 WO 2005081060 A3 WO2005081060 A3 WO 2005081060A3 EP 2005001985 W EP2005001985 W EP 2005001985W WO 2005081060 A3 WO2005081060 A3 WO 2005081060A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
device consisting
freedom
actuator
degrees
Prior art date
Application number
PCT/EP2005/001985
Other languages
French (fr)
Other versions
WO2005081060A2 (en
Inventor
Yim-Bun Patrick Kwan
Michael Muehlbeyer
Johannes Lippert
Original Assignee
Zeiss Carl Smt Ag
Yim-Bun Patrick Kwan
Michael Muehlbeyer
Johannes Lippert
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Yim-Bun Patrick Kwan, Michael Muehlbeyer, Johannes Lippert filed Critical Zeiss Carl Smt Ag
Priority to JP2007500163A priority Critical patent/JP2007528125A/en
Priority to EP05764677A priority patent/EP1725910A2/en
Publication of WO2005081060A2 publication Critical patent/WO2005081060A2/en
Publication of WO2005081060A3 publication Critical patent/WO2005081060A3/en
Priority to US11/509,154 priority patent/US7603010B2/en
Priority to US12/555,269 priority patent/US7995884B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Abstract

An optical assembly comprises at least one optical element (1) movable in at least two degrees of freedom and at least one actuator (2, 3, 4) for adjusting the least one 5 optical element (1); at least one sensor (7, 8, 9) for sensing the position of the at least one element in at least two degrees of freedom and is characterised in that the at least one sensor (7, 8, 9) is located at least substantially diagonally opposite to the least one actuator (2, 3, 4).
PCT/EP2005/001985 2004-02-25 2005-02-25 Device consisting of at least one optical element WO2005081060A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007500163A JP2007528125A (en) 2004-02-25 2005-02-25 Equipment consisting of at least one optical component
EP05764677A EP1725910A2 (en) 2004-02-25 2005-02-25 Device consisting of at least one optical element
US11/509,154 US7603010B2 (en) 2004-02-25 2006-08-24 Device consisting of at least one optical element
US12/555,269 US7995884B2 (en) 2004-02-25 2009-09-08 Device consisting of at least one optical element

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US54812404P 2004-02-25 2004-02-25
US60/548,124 2004-02-25

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/509,154 Continuation-In-Part US7603010B2 (en) 2004-02-25 2006-08-24 Device consisting of at least one optical element

Publications (2)

Publication Number Publication Date
WO2005081060A2 WO2005081060A2 (en) 2005-09-01
WO2005081060A3 true WO2005081060A3 (en) 2006-02-02

Family

ID=34886316

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/001985 WO2005081060A2 (en) 2004-02-25 2005-02-25 Device consisting of at least one optical element

Country Status (4)

Country Link
US (2) US7603010B2 (en)
EP (1) EP1725910A2 (en)
JP (1) JP2007528125A (en)
WO (1) WO2005081060A2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1725910A2 (en) * 2004-02-25 2006-11-29 Carl Zeiss SMT AG Device consisting of at least one optical element
WO2006046507A1 (en) * 2004-10-26 2006-05-04 Nikon Corporation Optical system, lens barrel, exposure system, and production method for device
DE102006038455A1 (en) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optical system for semiconductor lithography, has adjusting unit positioning optical component, where contact points of adjusting unit at optical component is selected, such that no moments develop at optical component
JP2008112756A (en) * 2006-10-27 2008-05-15 Canon Inc Optical element driving device and control method thereof, exposure apparatus, and manufacturing method of device
US7468286B1 (en) * 2007-10-04 2008-12-23 Applied Optoelectronics, Inc. System and method for securing optoelectronic packages for mounting components at a mounting angle
US8792079B2 (en) 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
NL2003141A1 (en) * 2008-07-30 2010-02-02 Asml Holding Nv Actuator system using multiple piezoelectric actuators.
TWI391844B (en) * 2008-08-28 2013-04-01 Ind Tech Res Inst Multi-dimensional optical control device and a method thereof
JP5338449B2 (en) * 2009-04-22 2013-11-13 コニカミノルタ株式会社 Actuators and optical devices
DE102009019254A1 (en) * 2009-04-30 2010-06-10 Carl Zeiss Smt Ag Optical component e.g. projection lens, manufacturing method for microlithography to produce fine structures, involves determining distance to mirror arrangement by distance measuring system according to principle of laser triangulation
DE102011005885A1 (en) 2011-03-22 2012-09-27 Carl Zeiss Smt Gmbh lithography apparatus
DE102011114254B4 (en) * 2011-09-26 2014-11-27 Carl Zeiss Smt Gmbh Measuring device and optical system with such
WO2013050081A1 (en) * 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Method for controlling a motion of optical elements in lithography systems
US8889977B1 (en) * 2012-12-20 2014-11-18 David Rowland Gage Electrical pickup for stringed musical instrument
DE102013201082A1 (en) 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Arrangement for actuation of optical element e.g. mirror in microlithography projection exposure system, has actuators that are arranged in natural vibration mode of the optical element
GB2513927A (en) * 2013-05-10 2014-11-12 Zeiss Carl Smt Gmbh Optical element arrangement with an optical element split into optical sub-elements
DE102019209610A1 (en) * 2019-07-01 2021-01-07 Carl Zeiss Smt Gmbh Method and device for producing an adhesive connection between a first component and a second component

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5822133A (en) * 1995-08-07 1998-10-13 Canon Kabushiki Kaisha Optical structure and device manufacturing method using the same
EP1107068A2 (en) * 1999-11-30 2001-06-13 Asm Lithography B.V. Lithographic projection apparatus with system for positioning a reflector
EP1139175A2 (en) * 2000-03-31 2001-10-04 Nikon Corporation Optical element holding device for exposure apparatus
US20030090639A1 (en) * 2001-10-27 2003-05-15 Peter Vogt Method for applying a scale to a carrier

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0275995A2 (en) 1987-01-23 1988-07-27 Siemens Aktiengesellschaft Open-drain MOSFET circuit
US5428482A (en) * 1991-11-04 1995-06-27 General Signal Corporation Decoupled mount for optical element and stacked annuli assembly
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP2000286189A (en) * 1999-03-31 2000-10-13 Nikon Corp Projection aligner, exposure method, and device- manufacturing method
EP1124161A3 (en) 2000-02-10 2004-01-07 ASML Netherlands B.V. Lithographic projection apparatus having a temperature controlled heat shield
US7154684B2 (en) 2000-08-18 2006-12-26 Nikon Corporation Optical element holding apparatus
EP1182509B1 (en) 2000-08-24 2009-04-08 ASML Netherlands B.V. Lithographic apparatus, calibration method thereof and device manufacturing method
DE10134387A1 (en) 2001-07-14 2003-01-23 Zeiss Carl Optical system with several optical elements
JP4415674B2 (en) * 2002-01-29 2010-02-17 株式会社ニコン Image forming state adjusting system, exposure method, exposure apparatus, program, and information recording medium
JP2003337272A (en) * 2002-03-12 2003-11-28 Nikon Corp Device for holding optical system, method of positionally adjusting optical device, lens barrel, exposure device, and method of manufacturing device
US6946832B2 (en) * 2003-03-27 2005-09-20 Delphi Technologies, Inc. Speed and angular position sensing assembly
SE0301164D0 (en) * 2003-04-22 2003-04-22 Trimble Ab Improved high accuracy absolute optical encoder
EP1725910A2 (en) * 2004-02-25 2006-11-29 Carl Zeiss SMT AG Device consisting of at least one optical element
WO2006088845A2 (en) * 2005-02-15 2006-08-24 Walleye Technologies, Inc. Electromagnetic scanning imager
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5822133A (en) * 1995-08-07 1998-10-13 Canon Kabushiki Kaisha Optical structure and device manufacturing method using the same
EP1107068A2 (en) * 1999-11-30 2001-06-13 Asm Lithography B.V. Lithographic projection apparatus with system for positioning a reflector
EP1139175A2 (en) * 2000-03-31 2001-10-04 Nikon Corporation Optical element holding device for exposure apparatus
US20030090639A1 (en) * 2001-10-27 2003-05-15 Peter Vogt Method for applying a scale to a carrier

Also Published As

Publication number Publication date
JP2007528125A (en) 2007-10-04
US7603010B2 (en) 2009-10-13
US20070047876A1 (en) 2007-03-01
US7995884B2 (en) 2011-08-09
US20090324174A1 (en) 2009-12-31
WO2005081060A2 (en) 2005-09-01
EP1725910A2 (en) 2006-11-29

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