WO2005029192A2 - Surface triangulation and profiling through a thin film coating - Google Patents
Surface triangulation and profiling through a thin film coating Download PDFInfo
- Publication number
- WO2005029192A2 WO2005029192A2 PCT/US2004/030051 US2004030051W WO2005029192A2 WO 2005029192 A2 WO2005029192 A2 WO 2005029192A2 US 2004030051 W US2004030051 W US 2004030051W WO 2005029192 A2 WO2005029192 A2 WO 2005029192A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- ofthe
- optical path
- spatial
- pattern
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02087—Combining two or more images of the same region
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/30—Grating as beam-splitter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Mathematical Physics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Transplanting Machines (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006526408A JP2007506070A (en) | 2003-09-15 | 2004-09-15 | Triangulation method and system for determining surface shape through thin film coating |
DE602004019231T DE602004019231D1 (en) | 2003-09-15 | 2004-09-15 | SURFACE TRIANGULATION AND PROFILING |
EP04784044A EP1664931B1 (en) | 2003-09-15 | 2004-09-15 | Surface triangulation and profiling |
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US50293203P | 2003-09-15 | 2003-09-15 | |
US50293303P | 2003-09-15 | 2003-09-15 | |
US50290703P | 2003-09-15 | 2003-09-15 | |
US50293003P | 2003-09-15 | 2003-09-15 | |
US60/502,932 | 2003-09-15 | ||
US60/502,933 | 2003-09-15 | ||
US60/502,907 | 2003-09-15 | ||
US60/502,930 | 2003-09-15 | ||
US53943704P | 2004-01-26 | 2004-01-26 | |
US60/539,437 | 2004-01-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005029192A2 true WO2005029192A2 (en) | 2005-03-31 |
WO2005029192A3 WO2005029192A3 (en) | 2005-09-29 |
Family
ID=34382261
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/030051 WO2005029192A2 (en) | 2003-09-15 | 2004-09-15 | Surface triangulation and profiling through a thin film coating |
PCT/US2004/030196 WO2005029193A2 (en) | 2003-09-15 | 2004-09-15 | Interferometric analysis of surfaces. |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/030196 WO2005029193A2 (en) | 2003-09-15 | 2004-09-15 | Interferometric analysis of surfaces. |
Country Status (8)
Country | Link |
---|---|
US (7) | US7289224B2 (en) |
EP (3) | EP1664931B1 (en) |
JP (3) | JP5340539B2 (en) |
KR (3) | KR101185473B1 (en) |
AT (1) | ATE421716T1 (en) |
DE (1) | DE602004019231D1 (en) |
TW (4) | TWI331210B (en) |
WO (2) | WO2005029192A2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1526408A1 (en) * | 2003-10-22 | 2005-04-27 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method, and measurement systems |
WO2006097645A2 (en) * | 2005-03-18 | 2006-09-21 | Sagem Defense Securite | Optical measuring device using optical triangulation |
WO2007044786A2 (en) * | 2005-10-11 | 2007-04-19 | Zygo Corporation | Interferometry method and system including spectral decomposition |
WO2007062808A1 (en) * | 2005-11-29 | 2007-06-07 | Carl Zeiss Smt Ag | Projection illumination system |
WO2008035685A1 (en) * | 2006-09-19 | 2008-03-27 | Olympus Medical Systems Corporation | Polarization measuring device |
JP2008175803A (en) * | 2006-12-22 | 2008-07-31 | Canon Inc | System and method for measuring shape, and exposure system |
WO2008151266A2 (en) * | 2007-06-05 | 2008-12-11 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
WO2019143561A1 (en) * | 2018-01-16 | 2019-07-25 | Illumina, Inc. | Dual optical grating slide structured illumination imaging |
Families Citing this family (130)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6359144A (en) * | 1986-08-29 | 1988-03-15 | Canon Inc | Line supervisory system for local area network |
US7057741B1 (en) * | 1999-06-18 | 2006-06-06 | Kla-Tencor Corporation | Reduced coherence symmetric grazing incidence differential interferometer |
WO2003038518A1 (en) | 2001-10-30 | 2003-05-08 | Pixelligent Technologies Llc | Advanced exposure techniques for programmable lithography |
US7139081B2 (en) * | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
US6623995B1 (en) * | 2002-10-30 | 2003-09-23 | Taiwan Semiconductor Manufacturing Company | Optimized monitor method for a metal patterning process |
US7271918B2 (en) * | 2003-03-06 | 2007-09-18 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US7106454B2 (en) * | 2003-03-06 | 2006-09-12 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US7324214B2 (en) * | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
US7289224B2 (en) * | 2003-09-15 | 2007-10-30 | Zygo Corporation | Low coherence grazing incidence interferometry for profiling and tilt sensing |
TWI335417B (en) | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
US7930206B2 (en) | 2003-11-03 | 2011-04-19 | Google Inc. | System and method for enabling an advertisement to follow the user to additional web pages |
GB0415766D0 (en) * | 2004-07-14 | 2004-08-18 | Taylor Hobson Ltd | Apparatus for and a method of determining a characteristic of a layer or layers |
US20060012582A1 (en) * | 2004-07-15 | 2006-01-19 | De Lega Xavier C | Transparent film measurements |
US7777499B2 (en) * | 2004-08-05 | 2010-08-17 | Little Jr Jack R | High-resolution, nondestructive imaging of dielectric materials |
US7170584B2 (en) * | 2004-11-17 | 2007-01-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102004062256A1 (en) * | 2004-12-23 | 2006-07-13 | Basf Ag | Highly sensitive method for detecting differences between the physically measurable properties of a sample and a reference |
US7428057B2 (en) * | 2005-01-20 | 2008-09-23 | Zygo Corporation | Interferometer for determining characteristics of an object surface, including processing and calibration |
US7884947B2 (en) * | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
DE112006000392T5 (en) * | 2005-02-18 | 2008-01-10 | Hoya Corp. | Test method for translucent object |
US7321431B2 (en) * | 2005-05-19 | 2008-01-22 | Zygo Corporation | Method and system for analyzing low-coherence interferometry signals for information about thin film structures |
US7330258B2 (en) * | 2005-05-27 | 2008-02-12 | Innovative Technical Solutions, Inc. | Spectrometer designs |
US7411667B2 (en) * | 2005-06-03 | 2008-08-12 | Asml Netherlands B.V. | Method for correcting disturbances in a level sensor light path |
US7595891B2 (en) * | 2005-07-09 | 2009-09-29 | Kla-Tencor Corporation | Measurement of the top surface of an object with/without transparent thin films in white light interferometry |
US20070042510A1 (en) * | 2005-08-19 | 2007-02-22 | Wafermasters, Incorporated | In situ process monitoring and control |
JP2007067165A (en) * | 2005-08-31 | 2007-03-15 | Matsushita Electric Ind Co Ltd | Method of extracting optical irradiation condition, optical irradiation condition extractor and soldering apparatus |
DE102006016131A1 (en) * | 2005-09-22 | 2007-03-29 | Robert Bosch Gmbh | Interferometric measuring device |
WO2007033851A1 (en) * | 2005-09-22 | 2007-03-29 | Robert Bosch Gmbh | Interferometric determination of a layer thickness |
US20070118361A1 (en) * | 2005-10-07 | 2007-05-24 | Deepen Sinha | Window apparatus and method |
US7492450B2 (en) * | 2005-10-24 | 2009-02-17 | General Electric Company | Methods and apparatus for inspecting an object |
US7408649B2 (en) * | 2005-10-26 | 2008-08-05 | Kla-Tencor Technologies Corporation | Method and apparatus for optically analyzing a surface |
JP2009516171A (en) * | 2005-11-15 | 2009-04-16 | ザイゴ コーポレーション | Interferometer and method for measuring properties of optically unprocessed surface features |
EP1793243A1 (en) * | 2005-12-05 | 2007-06-06 | Leica Geosystems AG | Method for resolving a phase ambiguity |
US7542148B2 (en) * | 2005-12-06 | 2009-06-02 | Tokyo Electron Limited | Method for measuring physical quantity of measurement object in substrate processing apparatus and storage medium storing program for implementing the method |
US7697137B2 (en) * | 2006-04-28 | 2010-04-13 | Corning Incorporated | Monolithic Offner spectrometer |
TWI428559B (en) * | 2006-07-21 | 2014-03-01 | Zygo Corp | Compensation of systematic effects in low coherence interferometry |
WO2008055060A2 (en) * | 2006-10-27 | 2008-05-08 | Zygo Corporation | Vibration resistant interferometry |
US7616328B2 (en) * | 2006-11-07 | 2009-11-10 | Rudolph Technologies, Inc. | Method and system for providing a high definition triangulation system |
CN1975386B (en) * | 2006-11-16 | 2010-10-13 | 南京大学 | Multiple transmission-reflection measuring attachement for infrared spectrum instrument |
US7704565B2 (en) * | 2006-11-22 | 2010-04-27 | The Boeing Company | Method of making a layered component with vector discrimination in a variable deposition rate process |
WO2008064470A1 (en) * | 2006-11-27 | 2008-06-05 | Roctest Ltée | High selectivity band-pass interferometer with tuning capabilities |
JP5502491B2 (en) * | 2006-12-22 | 2014-05-28 | ザイゴ コーポレーション | Apparatus and method for characterization of surface features |
US7684050B2 (en) * | 2006-12-22 | 2010-03-23 | Canon Kabushiki Kaisha | Shape measuring apparatus, shape measuring method, and exposure apparatus |
US7889355B2 (en) * | 2007-01-31 | 2011-02-15 | Zygo Corporation | Interferometry for lateral metrology |
JP5013968B2 (en) * | 2007-02-21 | 2012-08-29 | キヤノン株式会社 | Signal processing device, program, and measuring device |
JP2008309638A (en) * | 2007-06-14 | 2008-12-25 | National Institute Of Advanced Industrial & Technology | Dimension measuring device and dimension measuring method |
JP4936287B2 (en) * | 2007-06-14 | 2012-05-23 | 独立行政法人産業技術総合研究所 | Inner diameter measuring device |
US7619746B2 (en) * | 2007-07-19 | 2009-11-17 | Zygo Corporation | Generating model signals for interferometry |
US8072611B2 (en) * | 2007-10-12 | 2011-12-06 | Zygo Corporation | Interferometric analysis of under-resolved features |
US7720004B2 (en) * | 2007-11-13 | 2010-05-18 | Avaya Inc. | Interfering packet streams in packet networks |
WO2009064670A2 (en) * | 2007-11-13 | 2009-05-22 | Zygo Corporation | Interferometer utilizing polarization scanning |
US7720005B2 (en) * | 2007-11-13 | 2010-05-18 | Avaya Inc. | Estimating network-layer topology using end-to-end measurements |
US7961647B2 (en) * | 2007-11-13 | 2011-06-14 | Avaya Inc. | Detecting interfering packet streams in packet networks |
EP2232195B1 (en) | 2007-12-14 | 2015-03-18 | Zygo Corporation | Analyzing surface structure using scanning interferometry |
TWI454655B (en) * | 2007-12-31 | 2014-10-01 | Ind Tech Res Inst | Spectral image processing method |
KR100988454B1 (en) | 2008-01-31 | 2010-10-18 | 에스엔유 프리시젼 주식회사 | Method for measuring thickness |
TWI485642B (en) * | 2008-02-26 | 2015-05-21 | Epistar Corp | A customized manufacturing method for an optoelectrical device |
JP5084558B2 (en) * | 2008-02-28 | 2012-11-28 | キヤノン株式会社 | Surface shape measuring apparatus, exposure apparatus, and device manufacturing method |
US7847954B2 (en) * | 2008-05-15 | 2010-12-07 | Kla-Tencor Corporation | Measuring the shape and thickness variation of a wafer with high slopes |
JP5268425B2 (en) * | 2008-05-16 | 2013-08-21 | キヤノン株式会社 | Surface shape measuring apparatus and exposure apparatus |
KR101010189B1 (en) * | 2008-06-30 | 2011-01-21 | 에스엔유 프리시젼 주식회사 | Method for measuring thickness or surface profile |
US8120781B2 (en) | 2008-11-26 | 2012-02-21 | Zygo Corporation | Interferometric systems and methods featuring spectral analysis of unevenly sampled data |
US8654344B2 (en) * | 2008-12-04 | 2014-02-18 | Ecole Polytechnique | Device for generating a secondary source by laser-material interaction comprising an optical device for controlling the orientation and the position of a surface in movement |
FR2941780B1 (en) * | 2009-01-30 | 2011-04-01 | Commissariat Energie Atomique | MEASUREMENT METHOD AND METHOD FOR VISUALIZATION OF WAVE SURFACE BY SPECTROPHOTOMETRY. |
US8107084B2 (en) * | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
US20100245829A1 (en) * | 2009-03-31 | 2010-09-30 | Nikon Corporation | System and method for compensating instability in an autofocus system |
US8675205B2 (en) * | 2009-06-15 | 2014-03-18 | Artur G. Olszak | Optical coherence tomography using spectrally controlled interferometry |
JP2011040547A (en) * | 2009-08-10 | 2011-02-24 | Canon Inc | Measurement apparatus, exposure apparatus, and method of manufacturing device |
US8426119B2 (en) * | 2009-10-21 | 2013-04-23 | GM Global Technology Operations LLC | Dynamic projection method for micro-truss foam fabrication |
US8934104B2 (en) * | 2010-01-22 | 2015-01-13 | Universitaet Stuttgart | Method and arrangement for robust interferometry for detecting a feature of an object |
US20120008150A1 (en) | 2010-04-23 | 2012-01-12 | Nikon Corporation | Autofocus system and method |
US8462349B1 (en) | 2010-07-20 | 2013-06-11 | Science Applications International Corporation | System and method for a self-referencing interferometer |
JP5663758B2 (en) * | 2010-08-17 | 2015-02-04 | 株式会社ミツトヨ | Shape measuring method and shape measuring apparatus |
US20120045855A1 (en) * | 2010-08-20 | 2012-02-23 | Beck Markus E | Position-sensitive metrology system |
US8854628B2 (en) * | 2010-09-22 | 2014-10-07 | Zygo Corporation | Interferometric methods for metrology of surfaces, films and underresolved structures |
DE102010041558A1 (en) * | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projection exposure apparatus for microlithography and method for microlithographic exposure |
DE102010041556A1 (en) | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projection exposure apparatus for microlithography and method for microlithographic imaging |
JP5699221B2 (en) * | 2010-11-15 | 2015-04-08 | ザイゴ コーポレーションZygo Corporation | Interferometer with virtual reference plane |
TWI479160B (en) * | 2010-12-20 | 2015-04-01 | Hon Hai Prec Ind Co Ltd | Test apparatus and method |
EP2482031A1 (en) * | 2011-01-26 | 2012-08-01 | Mitutoyo Research Center Europe B.V. | Method and apparatus for performing film thickness measurements using white light scanning interferometry |
US8804129B2 (en) | 2011-01-26 | 2014-08-12 | Mitutoyo Corporation | Method and apparatus for performing film thickness measurements using white light scanning interferometry |
DE102011111900A1 (en) * | 2011-08-30 | 2013-02-28 | Dr. Johannes Heidenhain Gmbh | Apparatus for interferometric distance determination |
NL2009273A (en) * | 2011-08-31 | 2013-03-04 | Asml Netherlands Bv | Level sensor arrangement for lithographic apparatus, lithographic apparatus and device manufacturing method. |
JP5959104B2 (en) * | 2011-09-27 | 2016-08-02 | 芝浦メカトロニクス株式会社 | Bonded plate inspection apparatus and method |
US8982362B2 (en) * | 2011-10-04 | 2015-03-17 | First Solar, Inc. | System and method for measuring layer thickness and depositing semiconductor layers |
DE102011085599B3 (en) * | 2011-11-02 | 2012-12-13 | Polytec Gmbh | Apparatus and method for interferometric measurement of an object |
DE102012002174B4 (en) * | 2012-02-07 | 2014-05-15 | Schott Ag | Apparatus and method for detecting defects within the volume of a transparent pane and using the apparatus |
US10112258B2 (en) * | 2012-03-30 | 2018-10-30 | View, Inc. | Coaxial distance measurement via folding of triangulation sensor optics path |
DE102013203211A1 (en) * | 2012-06-15 | 2013-12-19 | Dr. Johannes Heidenhain Gmbh | Device for interferential distance measurement |
EP2677271B1 (en) * | 2012-06-18 | 2017-04-26 | Mitutoyo Corporation | Broadband interferometer for determining a property of a thin film |
GB2508874B (en) | 2012-12-13 | 2017-09-20 | Univ Of Huddersfield | Interferometric apparatus and sample characteristic determining apparatus using such apparatus |
US10054423B2 (en) * | 2012-12-27 | 2018-08-21 | Nova Measuring Instruments Ltd. | Optical method and system for critical dimensions and thickness characterization |
RU2522775C1 (en) * | 2013-02-12 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Новосибирский национальный исследовательский государственный университет" (Новосибирский государственный университет, НГУ) | Method for passive location of edges of metal rectangular parallelepiped in infrared radiation |
US20160004058A1 (en) * | 2013-03-15 | 2016-01-07 | Leonard Rodenhausen Wayne | Lightsheet microscopy with rotational-shear interferometry |
US20140268314A1 (en) * | 2013-03-15 | 2014-09-18 | Robert H. Dueck | Three-beam Coherent Beam Combining System |
WO2014209987A1 (en) * | 2013-06-26 | 2014-12-31 | Zygo Corporation | Coherence scanning interferometry using phase shifted interferometrty signals |
US9377292B2 (en) | 2013-08-06 | 2016-06-28 | Zygo Corporation | Interferometry employing refractive index dispersion broadening of interference signals |
DE102014211004A1 (en) * | 2014-06-10 | 2015-12-17 | Dr. Johannes Heidenhain Gmbh | Optical position measuring device |
JP6322069B2 (en) * | 2014-07-02 | 2018-05-09 | Dmg森精機株式会社 | Displacement detector |
US9500468B2 (en) | 2014-08-25 | 2016-11-22 | Board Of Trustees Of Michigan State University | Scanning interferometry technique for through-thickness evaluation in multi-layered transparent structures |
JP6779203B2 (en) | 2014-10-27 | 2020-11-04 | ケーエルエー コーポレイション | Quality estimation and improvement of imaging measurement targets |
US10030964B2 (en) * | 2014-12-12 | 2018-07-24 | Sunedison Semiconductor Limited (Uen201334164H) | Systems and methods for performing phase shift interferometry while a wafer is vibrating |
WO2016124399A1 (en) * | 2015-02-06 | 2016-08-11 | Asml Netherlands B.V. | A method and apparatus for improving measurement accuracy |
JP7197270B2 (en) * | 2015-02-25 | 2022-12-27 | ザ・チャールズ・スターク・ドレイパ・ラボラトリー・インコーポレイテッド | Zero optical path difference optical phased array |
JP6702666B2 (en) * | 2015-07-28 | 2020-06-03 | 株式会社ミツトヨ | Displacement detection device |
TWI582382B (en) * | 2015-10-16 | 2017-05-11 | 高準精密工業股份有限公司 | Optical device |
US20180373016A1 (en) * | 2015-11-11 | 2018-12-27 | Scopio Labs Ltd. | Microscope having a refractive index matching material |
DE102016103605A1 (en) * | 2016-03-01 | 2017-09-07 | Heidelberg Engineering Gmbh | A method for signal processing in optical coherence tomography with a tunable light source |
US10563973B2 (en) * | 2016-03-28 | 2020-02-18 | Kla-Tencor Corporation | All surface film metrology system |
US10739277B2 (en) * | 2016-04-21 | 2020-08-11 | Nova Measuring Instruments Ltd. | Optical system and method for measurements of samples |
US10234694B2 (en) | 2016-07-15 | 2019-03-19 | Canon U.S.A., Inc. | Spectrally encoded probes |
JP6762608B2 (en) * | 2016-09-06 | 2020-09-30 | 株式会社日立ハイテクサイエンス | Three-dimensional shape measurement method using a scanning white interference microscope |
US10571248B2 (en) * | 2017-01-09 | 2020-02-25 | Kla-Tencor Corporation | Transparent film error correction pattern in wafer geometry system |
JP6853572B2 (en) * | 2017-03-31 | 2021-03-31 | 株式会社日立ハイテクサイエンス | Three-dimensional shape measurement method using a scanning white interference microscope |
JP6876576B2 (en) * | 2017-08-17 | 2021-05-26 | 日本電子株式会社 | 3D image construction method |
US11346747B2 (en) * | 2017-10-27 | 2022-05-31 | Harris Corporation | QTIP—quantitative test interferometric plate |
US10529096B2 (en) * | 2018-03-02 | 2020-01-07 | Synaptive Medical (Barbados) Inc. | System and method for characterizing tissue organization using polarization sensitive optical coherence tomography |
WO2020004544A1 (en) * | 2018-06-29 | 2020-01-02 | 株式会社荏原製作所 | Bump height measurement device, substrate processing device, bump height measurement method, and storage medium |
WO2020021411A1 (en) * | 2018-07-18 | 2020-01-30 | Nova Measuring Instruments Ltd. | Time-domain optical metrology and inspection of semiconductor devices |
TWI685640B (en) * | 2018-12-26 | 2020-02-21 | 財團法人工業技術研究院 | Optical coherence tomography device and optical interferometer thereof |
US10976151B2 (en) | 2018-12-26 | 2021-04-13 | Industrial Technology Research Institute | Optical interferometer with reference arm longer than sample arm |
TWI682150B (en) | 2018-12-27 | 2020-01-11 | 財團法人工業技術研究院 | Automatic calibration optical interferometer and automatic calibration method of optical interferometer |
US11035665B2 (en) * | 2019-07-30 | 2021-06-15 | Kla Corporation | System and method for enhancing data processing throughput using less effective pixel while maintaining wafer warp coverage |
JP7283324B2 (en) * | 2019-09-18 | 2023-05-30 | 株式会社島津製作所 | Defect inspection equipment |
US11150195B2 (en) * | 2019-09-25 | 2021-10-19 | Onto Innovation Inc. | Sample surface polarization modification in interferometric defect inspection |
CN111406198B (en) | 2020-02-24 | 2021-02-19 | 长江存储科技有限责任公司 | System and method for semiconductor chip surface topography metrology |
WO2021168613A1 (en) | 2020-02-24 | 2021-09-02 | Yangtze Memory Technologies Co., Ltd. | Systems and methods for semiconductor chip surface topography metrology |
WO2021168611A1 (en) | 2020-02-24 | 2021-09-02 | Yangtze Memory Technologies Co., Ltd. | Systems and methods for semiconductor chip surface topography metrology |
CN111386441B (en) * | 2020-02-24 | 2021-02-19 | 长江存储科技有限责任公司 | System for measuring surface topography of semiconductor chip |
CN113654653B (en) * | 2021-08-13 | 2023-06-09 | 中国工程物理研究院激光聚变研究中心 | Single measurement method for ultrafast laser space-time coupling characteristic |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USH1972H1 (en) * | 1998-10-06 | 2001-07-03 | Nikon Corporation | Autofocus system using common path interferometry |
US6259521B1 (en) * | 1999-10-05 | 2001-07-10 | Advanced Micro Devices, Inc. | Method and apparatus for controlling photolithography parameters based on photoresist images |
US6500591B1 (en) * | 1991-03-04 | 2002-12-31 | Lucent Technologies Inc. | Method of averaging focus through scattered energy determination |
US6507405B1 (en) * | 1999-05-17 | 2003-01-14 | Ultratech Stepper, Inc. | Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt |
Family Cites Families (177)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2612074A (en) | 1949-03-30 | 1952-09-30 | Prec Mecanique Paris Soc | Interferometer |
US4199219A (en) * | 1977-04-22 | 1980-04-22 | Canon Kabushiki Kaisha | Device for scanning an object with a light beam |
US4188122A (en) * | 1978-03-27 | 1980-02-12 | Rockwell International Corporation | Interferometer |
US4340306A (en) * | 1980-02-04 | 1982-07-20 | Balasubramanian N | Optical system for surface topography measurement |
US4355903A (en) * | 1980-02-08 | 1982-10-26 | Rca Corporation | Thin film thickness monitor |
DE3173451D1 (en) * | 1981-09-17 | 1986-02-20 | Ibm Deutschland | Method for interferometric surface topography |
DE3145633A1 (en) * | 1981-11-17 | 1983-08-11 | Byk-Mallinckrodt Chemische Produkte Gmbh, 4230 Wesel | DEVICE FOR MEASURING COLORS |
US4576479A (en) | 1982-05-17 | 1986-03-18 | Downs Michael J | Apparatus and method for investigation of a surface |
US4523846A (en) * | 1982-09-10 | 1985-06-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Integrated optics in an electrically scanned imaging Fourier transform spectrometer |
JPS59105508A (en) * | 1982-12-08 | 1984-06-18 | Canon Inc | Measurement of whith interference film thickness |
JPS60127403A (en) * | 1983-12-13 | 1985-07-08 | Anritsu Corp | Thickness measuring apparatus |
US4626103A (en) * | 1984-03-29 | 1986-12-02 | At&T Bell Laboratories | Focus tracking system |
US4618262A (en) * | 1984-04-13 | 1986-10-21 | Applied Materials, Inc. | Laser interferometer system and method for monitoring and controlling IC processing |
US4710642A (en) | 1985-08-20 | 1987-12-01 | Mcneil John R | Optical scatterometer having improved sensitivity and bandwidth |
US4639139A (en) * | 1985-09-27 | 1987-01-27 | Wyko Corporation | Optical profiler using improved phase shifting interferometry |
US4818110A (en) | 1986-05-06 | 1989-04-04 | Kla Instruments Corporation | Method and apparatus of using a two beam interference microscope for inspection of integrated circuits and the like |
US4794550A (en) * | 1986-10-15 | 1988-12-27 | Eastman Kodak Company | Extended-range moire contouring |
JPS63263404A (en) * | 1987-04-21 | 1988-10-31 | Nikon Corp | Method and device for measuring fine depth |
US4806018A (en) * | 1987-07-06 | 1989-02-21 | The Boeing Company | Angular reflectance sensor |
JPH0654217B2 (en) * | 1987-08-28 | 1994-07-20 | 株式会社日立製作所 | Interference film thickness measurement method |
US4869593A (en) | 1988-04-22 | 1989-09-26 | Zygo Corporation | Interferometric surface profiler |
US4923301A (en) * | 1988-05-26 | 1990-05-08 | American Telephone And Telegraph Company | Alignment of lithographic system |
US4964726A (en) | 1988-09-27 | 1990-10-23 | General Electric Company | Apparatus and method for optical dimension measurement using interference of scattered electromagnetic energy |
US4948253A (en) * | 1988-10-28 | 1990-08-14 | Zygo Corporation | Interferometric surface profiler for spherical surfaces |
GB8903725D0 (en) * | 1989-02-18 | 1989-04-05 | Cambridge Consultants | Coherent tracking sensor |
US5489986A (en) * | 1989-02-28 | 1996-02-06 | Nikon Corporation | Position detecting apparatus |
US5042949A (en) * | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
US5042951A (en) * | 1989-09-19 | 1991-08-27 | Therma-Wave, Inc. | High resolution ellipsometric apparatus |
US4999014A (en) | 1989-05-04 | 1991-03-12 | Therma-Wave, Inc. | Method and apparatus for measuring thickness of thin films |
US5073018A (en) | 1989-10-04 | 1991-12-17 | The Board Of Trustees Of The Leland Stanford Junior University | Correlation microscope |
DE3942896A1 (en) | 1989-12-23 | 1991-06-27 | Zeiss Carl Fa | INTERFEROMETRIC SENSOR FOR MEASURING DISTANCE CHANGES IN A SMALL AREA |
US5112129A (en) * | 1990-03-02 | 1992-05-12 | Kla Instruments Corporation | Method of image enhancement for the coherence probe microscope with applications to integrated circuit metrology |
US5135307A (en) * | 1990-05-30 | 1992-08-04 | Hughes Danbury Optical System, Inc. | Laser diode interferometer |
US5158991A (en) | 1990-08-24 | 1992-10-27 | General Electric Company | Epoxy-functionalized siloxane resin copolymers as controlled release additives |
US5241369A (en) | 1990-10-01 | 1993-08-31 | Mcneil John R | Two-dimensional optical scatterometer apparatus and process |
US5129724A (en) * | 1991-01-29 | 1992-07-14 | Wyko Corporation | Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample |
US5164790A (en) | 1991-02-27 | 1992-11-17 | Mcneil John R | Simple CD measurement of periodic structures on photomasks |
DE4108944A1 (en) | 1991-03-19 | 1992-09-24 | Haeusler Gerd | Contactless measurement of surface shape of diffusely scattering objects e.g. semiconductor wafers - using interferometric arrangement for three=dimensional measurement with minimal coherence length and illumination aperture angle less than observation aperture angle |
US5153669A (en) | 1991-03-27 | 1992-10-06 | Hughes Danbury Optical Systems, Inc. | Three wavelength optical measurement apparatus and method |
US5194918A (en) * | 1991-05-14 | 1993-03-16 | The Board Of Trustees Of The Leland Stanford Junior University | Method of providing images of surfaces with a correlation microscope by transforming interference signals |
US5173746A (en) | 1991-05-21 | 1992-12-22 | Wyko Corporation | Method for rapid, accurate measurement of step heights between dissimilar materials |
US5204734A (en) | 1991-06-12 | 1993-04-20 | Wyko Corporation | Rough surface profiler and method |
US5133601A (en) | 1991-06-12 | 1992-07-28 | Wyko Corporation | Rough surface profiler and method |
JPH05304627A (en) | 1991-08-19 | 1993-11-16 | Fuji Photo Film Co Ltd | Side grip for video camera |
US5392749A (en) * | 1991-10-11 | 1995-02-28 | Caterpillar Inc. | Hydraulically-actuated fuel injector system having separate internal actuating fluid and fuel passages |
US5181080A (en) | 1991-12-23 | 1993-01-19 | Therma-Wave, Inc. | Method and apparatus for evaluating the thickness of thin films |
US5390023A (en) * | 1992-06-03 | 1995-02-14 | Zygo Corporation | Interferometric method and apparatus to measure surface topography |
US5402234A (en) * | 1992-08-31 | 1995-03-28 | Zygo Corporation | Method and apparatus for the rapid acquisition of data in coherence scanning interferometry |
US5539571A (en) * | 1992-09-21 | 1996-07-23 | Sdl, Inc. | Differentially pumped optical amplifer and mopa device |
US5384717A (en) * | 1992-11-23 | 1995-01-24 | Ford Motor Company | Non-contact method of obtaining dimensional information about an object |
US5398113A (en) * | 1993-02-08 | 1995-03-14 | Zygo Corporation | Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms |
US5777742A (en) * | 1993-03-11 | 1998-07-07 | Environmental Research Institute Of Michigan | System and method for holographic imaging with discernible image of an object |
DE4309056B4 (en) | 1993-03-20 | 2006-05-24 | Häusler, Gerd, Prof. Dr. | Method and device for determining the distance and scattering intensity of scattering points |
US5386119A (en) | 1993-03-25 | 1995-01-31 | Hughes Aircraft Company | Apparatus and method for thick wafer measurement |
JPH074922A (en) * | 1993-06-21 | 1995-01-10 | Jasco Corp | Apparatus and method for measurement of film thickness of semiconductor multilayer thin film |
EP0767361B1 (en) | 1993-07-22 | 2000-02-23 | Applied Spectral Imaging Ltd. | Method and apparatus for spectral imaging |
US5856871A (en) * | 1993-08-18 | 1999-01-05 | Applied Spectral Imaging Ltd. | Film thickness mapping using interferometric spectral imaging |
US5481811A (en) * | 1993-11-22 | 1996-01-09 | The Budd Company | Universal inspection workpiece holder |
US5483064A (en) | 1994-01-21 | 1996-01-09 | Wyko Corporation | Positioning mechanism and method for providing coaxial alignment of a probe and a scanning means in scanning tunneling and scanning force microscopy |
US5459564A (en) * | 1994-02-18 | 1995-10-17 | Chivers; James T. | Apparatus and method for inspecting end faces of optical fibers and optical fiber connectors |
US5471303A (en) | 1994-04-29 | 1995-11-28 | Wyko Corporation | Combination of white-light scanning and phase-shifting interferometry for surface profile measurements |
US5633714A (en) * | 1994-12-19 | 1997-05-27 | International Business Machines Corporation | Preprocessing of image amplitude and phase data for CD and OL measurement |
US5555471A (en) * | 1995-05-24 | 1996-09-10 | Wyko Corporation | Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shifting interferometry |
US5589938A (en) | 1995-07-10 | 1996-12-31 | Zygo Corporation | Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration |
US5703692A (en) | 1995-08-03 | 1997-12-30 | Bio-Rad Laboratories, Inc. | Lens scatterometer system employing source light beam scanning means |
US5602643A (en) * | 1996-02-07 | 1997-02-11 | Wyko Corporation | Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface |
US5640270A (en) * | 1996-03-11 | 1997-06-17 | Wyko Corporation | Orthogonal-scanning microscope objective for vertical-scanning and phase-shifting interferometry |
GB9610471D0 (en) | 1996-05-18 | 1996-07-24 | Univ Nottingham | Optical measurement |
US5880838A (en) * | 1996-06-05 | 1999-03-09 | California Institute Of California | System and method for optically measuring a structure |
US5923423A (en) * | 1996-09-12 | 1999-07-13 | Sentec Corporation | Heterodyne scatterometer for detecting and analyzing wafer surface defects |
US5956141A (en) | 1996-09-13 | 1999-09-21 | Olympus Optical Co., Ltd. | Focus adjusting method and shape measuring device and interference microscope using said focus adjusting method |
US5757502A (en) * | 1996-10-02 | 1998-05-26 | Vlsi Technology, Inc. | Method and a system for film thickness sample assisted surface profilometry |
JP3735426B2 (en) * | 1996-12-11 | 2006-01-18 | 株式会社東芝 | Nonvolatile semiconductor memory device and manufacturing method thereof |
US5973784A (en) * | 1997-01-08 | 1999-10-26 | Electro-Optical Sciences, Inc. | Common path, interferometric systems and methods using a birefringent material for topographic imaging |
US5774224A (en) | 1997-01-24 | 1998-06-30 | International Business Machines Corporation | Linear-scanning, oblique-viewing optical apparatus |
US5777740A (en) * | 1997-02-27 | 1998-07-07 | Phase Metrics | Combined interferometer/polarimeter |
US5867276A (en) * | 1997-03-07 | 1999-02-02 | Bio-Rad Laboratories, Inc. | Method for broad wavelength scatterometry |
US5784164A (en) * | 1997-03-20 | 1998-07-21 | Zygo Corporation | Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means |
JPH1123229A (en) * | 1997-07-08 | 1999-01-29 | Tokyo Seimitsu Co Ltd | Measuring method for film thickness |
US6665078B1 (en) | 1997-09-22 | 2003-12-16 | Candela Instruments | System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers |
US6031615A (en) | 1997-09-22 | 2000-02-29 | Candela Instruments | System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness |
US6392749B1 (en) | 1997-09-22 | 2002-05-21 | Candela Instruments | High speed optical profilometer for measuring surface height variation |
US20020015146A1 (en) * | 1997-09-22 | 2002-02-07 | Meeks Steven W. | Combined high speed optical profilometer and ellipsometer |
US5912741A (en) * | 1997-10-10 | 1999-06-15 | Northrop Grumman Corporation | Imaging scatterometer |
US5963329A (en) | 1997-10-31 | 1999-10-05 | International Business Machines Corporation | Method and apparatus for measuring the profile of small repeating lines |
US5923425A (en) * | 1997-11-20 | 1999-07-13 | Tropel Corporation | Grazing incidence interferometry for measuring transparent plane-parallel plates |
US5900633A (en) * | 1997-12-15 | 1999-05-04 | On-Line Technologies, Inc | Spectrometric method for analysis of film thickness and composition on a patterned sample |
US6124141A (en) | 1998-01-07 | 2000-09-26 | International Business Machines Corporation | Non-destructive method and device for measuring the depth of a buried interface |
US5953124A (en) | 1998-01-19 | 1999-09-14 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
US6028670A (en) * | 1998-01-19 | 2000-02-22 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
US6483580B1 (en) * | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
DE19814057B4 (en) * | 1998-03-30 | 2009-01-02 | Carl Zeiss Meditec Ag | Arrangement for optical coherence tomography and coherence topography |
US6242739B1 (en) * | 1998-04-21 | 2001-06-05 | Alexander P. Cherkassky | Method and apparatus for non-destructive determination of film thickness and dopant concentration using fourier transform infrared spectrometry |
US6275297B1 (en) | 1998-08-19 | 2001-08-14 | Sc Technology | Method of measuring depths of structures on a semiconductor substrate |
JP2000121317A (en) | 1998-10-12 | 2000-04-28 | Hitachi Electronics Eng Co Ltd | Interference phase detecting system for optical interferometer |
US6159073A (en) * | 1998-11-02 | 2000-12-12 | Applied Materials, Inc. | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing |
US6615072B1 (en) | 1999-02-04 | 2003-09-02 | Olympus Optical Co., Ltd. | Optical imaging device |
US6184984B1 (en) | 1999-02-09 | 2001-02-06 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
TW490596B (en) * | 1999-03-08 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus |
KR100290086B1 (en) | 1999-03-23 | 2001-05-15 | 윤덕용 | Method and Apparatus for Three Dimensional Thickness Profile Measurement of Transparent Dielectric Thin-Film by White-Light Scanning Interferometry |
US6449066B1 (en) | 1999-04-29 | 2002-09-10 | Kaiser Optical Systems, Inc. | Polarization insensitive, high dispersion optical element |
US6888638B1 (en) * | 1999-05-05 | 2005-05-03 | Zygo Corporation | Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
TW477897B (en) * | 1999-05-07 | 2002-03-01 | Sharp Kk | Liquid crystal display device, method and device to measure cell thickness of liquid crystal display device, and phase difference plate using the method thereof |
US6249351B1 (en) * | 1999-06-03 | 2001-06-19 | Zygo Corporation | Grazing incidence interferometer and method |
US6381009B1 (en) | 1999-06-29 | 2002-04-30 | Nanometrics Incorporated | Elemental concentration measuring methods and instruments |
US6195168B1 (en) | 1999-07-22 | 2001-02-27 | Zygo Corporation | Infrared scanning interferometry apparatus and method |
US6160621A (en) | 1999-09-30 | 2000-12-12 | Lam Research Corporation | Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
US6545761B1 (en) | 1999-11-30 | 2003-04-08 | Veeco Instruments, Inc. | Embedded interferometer for reference-mirror calibration of interferometric microscope |
DE10195052B3 (en) | 2000-01-25 | 2015-06-18 | Zygo Corp. | Method and devices for determining a geometric property of a test object and optical profile measuring system |
US6429943B1 (en) | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
LU90580B1 (en) * | 2000-05-08 | 2001-11-09 | Europ Economic Community | Method of identifying an object |
US6597460B2 (en) * | 2000-05-19 | 2003-07-22 | Zygo Corporation | Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum |
US6417109B1 (en) | 2000-07-26 | 2002-07-09 | Aiwa Co., Ltd. | Chemical-mechanical etch (CME) method for patterned etching of a substrate surface |
US6775009B2 (en) | 2000-07-27 | 2004-08-10 | Zetetic Institute | Differential interferometric scanning near-field confocal microscopy |
US7317531B2 (en) | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
US6891627B1 (en) | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
US7196782B2 (en) * | 2000-09-20 | 2007-03-27 | Kla-Tencor Technologies Corp. | Methods and systems for determining a thin film characteristic and an electrical property of a specimen |
US6694284B1 (en) | 2000-09-20 | 2004-02-17 | Kla-Tencor Technologies Corp. | Methods and systems for determining at least four properties of a specimen |
US6798511B1 (en) | 2000-10-18 | 2004-09-28 | Regents Of The University Of Minnesota | Imaging ellipsometry |
EP1332332B1 (en) * | 2000-11-02 | 2010-04-14 | Zygo Corporation | Height scanning interferometry method and apparatus including phase gap analysis |
US6633389B1 (en) | 2000-11-28 | 2003-10-14 | Nanometrics Incorporated | Profiling method |
JP4583611B2 (en) * | 2001-01-11 | 2010-11-17 | 富士フイルム株式会社 | Oblique incidence interferometer device |
US6909509B2 (en) * | 2001-02-20 | 2005-06-21 | Zygo Corporation | Optical surface profiling systems |
US6721094B1 (en) * | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
KR100393429B1 (en) | 2001-04-09 | 2003-08-02 | 한국과학기술원 | Two-wavelength white-light interferometry and interferometer for measuring steps of different metallic materials |
DE10297689B4 (en) | 2001-05-01 | 2007-10-18 | The General Hospital Corp., Boston | Method and device for the determination of atherosclerotic coating by measurement of optical tissue properties |
US6624894B2 (en) * | 2001-06-25 | 2003-09-23 | Veeco Instruments Inc. | Scanning interferometry with reference signal |
US7382447B2 (en) * | 2001-06-26 | 2008-06-03 | Kla-Tencor Technologies Corporation | Method for determining lithographic focus and exposure |
US6741357B2 (en) * | 2001-08-14 | 2004-05-25 | Seagate Technology Llc | Quadrature phase shift interferometer with unwrapping of phase |
EP1430270A4 (en) | 2001-09-21 | 2006-10-25 | Kmac | Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional reflectometry and method of measuring the same |
US6714307B2 (en) * | 2001-10-16 | 2004-03-30 | Zygo Corporation | Measurement of complex surface shapes using a spherical wavefront |
KR100437024B1 (en) * | 2001-10-18 | 2004-06-23 | 엘지전자 주식회사 | The inspection method of thin film and the same apparatus |
US6630982B2 (en) * | 2001-10-18 | 2003-10-07 | Motorola, Inc. | Color and intensity tunable liquid crystal device |
US7030995B2 (en) * | 2001-12-10 | 2006-04-18 | Zygo Corporation | Apparatus and method for mechanical phase shifting interferometry |
US6856384B1 (en) | 2001-12-13 | 2005-02-15 | Nanometrics Incorporated | Optical metrology system with combined interferometer and ellipsometer |
US6934035B2 (en) * | 2001-12-18 | 2005-08-23 | Massachusetts Institute Of Technology | System and method for measuring optical distance |
CN1623085A (en) * | 2002-01-24 | 2005-06-01 | 通用医疗公司 | Apparatus and method for ranging and noise reduction of low coherence interferometry LCI and optical coherence tomography OCT signals by parallel detection of spectral bands |
DE10229818A1 (en) * | 2002-06-28 | 2004-01-15 | Carl Zeiss Smt Ag | Focus detection method and imaging system with focus detection system |
AU2003214404A1 (en) | 2002-03-14 | 2003-09-29 | Taylor Hobson Limited | Surface profiling apparatus |
GB2385417B (en) | 2002-03-14 | 2004-01-21 | Taylor Hobson Ltd | Surface profiling apparatus |
US7068376B2 (en) * | 2002-04-19 | 2006-06-27 | Zygo Corporation | Interferometry method and apparatus for producing lateral metrology images |
JP2005524832A (en) * | 2002-05-02 | 2005-08-18 | ザイゴ コーポレーション | Phase shift analysis for scanning interferometers |
DE10392828T5 (en) * | 2002-06-17 | 2005-07-21 | Zygo Corp., Middlefield | Interferometry methods and systems with coupled cavity geometry for use with an extended source |
AU2003276755A1 (en) * | 2002-06-17 | 2003-12-31 | Zygo Corporation | Interferometric optical system and methods providing simultaneously scanned optical path length and focus |
WO2004003463A2 (en) * | 2002-07-01 | 2004-01-08 | Lightgage, Inc. | Interferometer system of compact configuration |
KR20050057279A (en) | 2002-09-09 | 2005-06-16 | 지고 코포레이션 | Interferometry method for ellipsometry, relectometry, and scatterometry measurements, including characterization of thin film structure |
US7139081B2 (en) | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US6925860B1 (en) | 2003-02-21 | 2005-08-09 | Nanometrics Incorporated | Leveling a measured height profile |
US7106454B2 (en) * | 2003-03-06 | 2006-09-12 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US7271918B2 (en) | 2003-03-06 | 2007-09-18 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US7324214B2 (en) * | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
US6985232B2 (en) | 2003-03-13 | 2006-01-10 | Tokyo Electron Limited | Scatterometry by phase sensitive reflectometer |
US7049156B2 (en) * | 2003-03-19 | 2006-05-23 | Verity Instruments, Inc. | System and method for in-situ monitor and control of film thickness and trench depth |
US6999180B1 (en) * | 2003-04-02 | 2006-02-14 | Kla-Tencor Technologies Corporation | Optical film topography and thickness measurement |
JP2004340680A (en) * | 2003-05-14 | 2004-12-02 | Toray Eng Co Ltd | Method for measuring surface profile and/or film thickness, and its apparatus |
US7102761B2 (en) | 2003-06-13 | 2006-09-05 | Zygo Corporation | Scanning interferometry |
US7061623B2 (en) * | 2003-08-25 | 2006-06-13 | Spectel Research Corporation | Interferometric back focal plane scatterometry with Koehler illumination |
US7289224B2 (en) * | 2003-09-15 | 2007-10-30 | Zygo Corporation | Low coherence grazing incidence interferometry for profiling and tilt sensing |
TWI335417B (en) * | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
JP4790632B2 (en) | 2004-01-06 | 2011-10-12 | ザイゴ コーポレーション | Multi-axis interferometer and method and system using multi-axis interferometer |
US20050179911A1 (en) | 2004-02-17 | 2005-08-18 | Digital Optics Corporation | Aspheric diffractive reference for interferometric lens metrology |
US7492469B2 (en) | 2004-03-15 | 2009-02-17 | Zygo Corporation | Interferometry systems and methods using spatial carrier fringes |
US7177030B2 (en) * | 2004-04-22 | 2007-02-13 | Technion Research And Development Foundation Ltd. | Determination of thin film topography |
US7277183B2 (en) | 2004-04-22 | 2007-10-02 | Zygo Corporation | Vibration resistant interferometry |
WO2005114096A2 (en) | 2004-05-18 | 2005-12-01 | Zygo Corporation | Methods and systems for determining optical properties using low-coherence interference signals |
US7119909B2 (en) | 2004-06-16 | 2006-10-10 | Veeco Instruments, Inc. | Film thickness and boundary characterization by interferometric profilometry |
US20060012582A1 (en) * | 2004-07-15 | 2006-01-19 | De Lega Xavier C | Transparent film measurements |
US20060066842A1 (en) * | 2004-09-30 | 2006-03-30 | Saunders Winston A | Wafer inspection with a customized reflective optical channel component |
US7884947B2 (en) * | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
US7428057B2 (en) * | 2005-01-20 | 2008-09-23 | Zygo Corporation | Interferometer for determining characteristics of an object surface, including processing and calibration |
US7321431B2 (en) | 2005-05-19 | 2008-01-22 | Zygo Corporation | Method and system for analyzing low-coherence interferometry signals for information about thin film structures |
US7595891B2 (en) * | 2005-07-09 | 2009-09-29 | Kla-Tencor Corporation | Measurement of the top surface of an object with/without transparent thin films in white light interferometry |
WO2007044786A2 (en) * | 2005-10-11 | 2007-04-19 | Zygo Corporation | Interferometry method and system including spectral decomposition |
US7408649B2 (en) * | 2005-10-26 | 2008-08-05 | Kla-Tencor Technologies Corporation | Method and apparatus for optically analyzing a surface |
US20070127036A1 (en) * | 2005-12-07 | 2007-06-07 | Chroma Ate Inc. | Interference measurement system self-alignment method |
US7612891B2 (en) * | 2005-12-15 | 2009-11-03 | Veeco Instruments, Inc. | Measurement of thin films using fourier amplitude |
TWI428559B (en) * | 2006-07-21 | 2014-03-01 | Zygo Corp | Compensation of systematic effects in low coherence interferometry |
-
2004
- 2004-09-15 US US10/941,631 patent/US7289224B2/en not_active Expired - Fee Related
- 2004-09-15 EP EP04784044A patent/EP1664931B1/en not_active Not-in-force
- 2004-09-15 TW TW093127841A patent/TWI331210B/en active
- 2004-09-15 KR KR1020067007376A patent/KR101185473B1/en active IP Right Grant
- 2004-09-15 KR KR1020127005506A patent/KR101295207B1/en active IP Right Grant
- 2004-09-15 JP JP2006526427A patent/JP5340539B2/en active Active
- 2004-09-15 US US10/941,651 patent/US7289225B2/en not_active Expired - Fee Related
- 2004-09-15 WO PCT/US2004/030051 patent/WO2005029192A2/en active Application Filing
- 2004-09-15 EP EP10177299.4A patent/EP2275868B1/en active Active
- 2004-09-15 US US10/941,649 patent/US7298494B2/en active Active
- 2004-09-15 EP EP04788766.6A patent/EP1664932B1/en active Active
- 2004-09-15 TW TW093127843A patent/TWI358614B/en not_active IP Right Cessation
- 2004-09-15 TW TW093127842A patent/TWI334921B/en active
- 2004-09-15 WO PCT/US2004/030196 patent/WO2005029193A2/en active Application Filing
- 2004-09-15 JP JP2006526408A patent/JP2007506070A/en active Pending
- 2004-09-15 DE DE602004019231T patent/DE602004019231D1/en active Active
- 2004-09-15 TW TW093127851A patent/TWI331211B/en not_active IP Right Cessation
- 2004-09-15 US US10/941,622 patent/US7292346B2/en not_active Expired - Fee Related
- 2004-09-15 AT AT04784044T patent/ATE421716T1/en not_active IP Right Cessation
- 2004-09-15 KR KR1020067005257A patent/KR20060084852A/en not_active Application Discontinuation
-
2007
- 2007-11-19 US US11/942,166 patent/US7456975B2/en active Active
-
2008
- 2008-10-31 US US12/262,375 patent/US7586620B2/en active Active
-
2009
- 2009-09-02 US US12/552,452 patent/US8107085B2/en active Active
-
2011
- 2011-04-27 JP JP2011099328A patent/JP5587241B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6500591B1 (en) * | 1991-03-04 | 2002-12-31 | Lucent Technologies Inc. | Method of averaging focus through scattered energy determination |
USH1972H1 (en) * | 1998-10-06 | 2001-07-03 | Nikon Corporation | Autofocus system using common path interferometry |
US6507405B1 (en) * | 1999-05-17 | 2003-01-14 | Ultratech Stepper, Inc. | Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt |
US6259521B1 (en) * | 1999-10-05 | 2001-07-10 | Advanced Micro Devices, Inc. | Method and apparatus for controlling photolithography parameters based on photoresist images |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1526408A1 (en) * | 2003-10-22 | 2005-04-27 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method, and measurement systems |
US7616327B2 (en) | 2005-03-18 | 2009-11-10 | Sagem Defense Sécurité | Optical measuring device using optical triangulation |
WO2006097645A2 (en) * | 2005-03-18 | 2006-09-21 | Sagem Defense Securite | Optical measuring device using optical triangulation |
WO2006097645A3 (en) * | 2005-03-18 | 2006-12-28 | Sagem Defense Securite | Optical measuring device using optical triangulation |
WO2007044786A2 (en) * | 2005-10-11 | 2007-04-19 | Zygo Corporation | Interferometry method and system including spectral decomposition |
WO2007044786A3 (en) * | 2005-10-11 | 2008-01-10 | Zygo Corp | Interferometry method and system including spectral decomposition |
US8228485B2 (en) | 2005-11-29 | 2012-07-24 | Carl Zeiss Smt Gmbh | Projection illumination system |
JP2009517871A (en) * | 2005-11-29 | 2009-04-30 | カール・ツァイス・エスエムティー・アーゲー | Projection irradiation system |
WO2007062808A1 (en) * | 2005-11-29 | 2007-06-07 | Carl Zeiss Smt Ag | Projection illumination system |
WO2008035685A1 (en) * | 2006-09-19 | 2008-03-27 | Olympus Medical Systems Corporation | Polarization measuring device |
JP5011302B2 (en) * | 2006-09-19 | 2012-08-29 | オリンパスメディカルシステムズ株式会社 | Polarimeter |
JP2008175803A (en) * | 2006-12-22 | 2008-07-31 | Canon Inc | System and method for measuring shape, and exposure system |
WO2008151266A2 (en) * | 2007-06-05 | 2008-12-11 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
WO2008151266A3 (en) * | 2007-06-05 | 2010-01-14 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
WO2019143561A1 (en) * | 2018-01-16 | 2019-07-25 | Illumina, Inc. | Dual optical grating slide structured illumination imaging |
US11226475B2 (en) | 2018-01-16 | 2022-01-18 | Illumina, Inc. | Dual optical grating slide structured illumination imaging |
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1664931B1 (en) | Surface triangulation and profiling | |
US7130056B2 (en) | System and method of using a side-mounted interferometer to acquire position information | |
US7636168B2 (en) | Interferometry method and system including spectral decomposition | |
US7321431B2 (en) | Method and system for analyzing low-coherence interferometry signals for information about thin film structures | |
US7869057B2 (en) | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis | |
US7522288B2 (en) | Compensation of systematic effects in low coherence interferometry | |
US6847458B2 (en) | Method and apparatus for measuring the shape and thickness variation of polished opaque plates | |
US7403289B2 (en) | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures | |
US8107084B2 (en) | Interference microscope with scan motion detection using fringe motion in monitor patterns | |
KR20100122123A (en) | Interferometry method for ellipsometry, relectometry, and scatterometry measurements, including characterization of thin film structure | |
JPH01235807A (en) | Depth measuring instrument |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BW BY BZ CA CH CN CO CR CU CZ DK DM DZ EC EE EG ES FI GB GD GE GM HR HU ID IL IN IS JP KE KG KP KZ LC LK LR LS LT LU LV MA MD MK MN MW MX MZ NA NI NO NZ PG PH PL PT RO RU SC SD SE SG SK SY TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ NA SD SZ TZ UG ZM ZW AM AZ BY KG MD RU TJ TM AT BE BG CH CY DE DK EE ES FI FR GB GR HU IE IT MC NL PL PT RO SE SI SK TR BF CF CG CI CM GA GN GQ GW ML MR SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2006526408 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2004784044 Country of ref document: EP Ref document number: 1020067005257 Country of ref document: KR |
|
CFP | Corrected version of a pamphlet front page | ||
CR1 | Correction of entry in section i |
Free format text: IN PCT GAZETTE 13/2005 UNDER (72, 75) REPLACE "KUTCHEL" BY "KUCHEL" |
|
WWP | Wipo information: published in national office |
Ref document number: 2004784044 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1020067005257 Country of ref document: KR |