WO2004114016A3 - Imprint lithography with improved monitoring and control and apparatus therefor - Google Patents

Imprint lithography with improved monitoring and control and apparatus therefor Download PDF

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Publication number
WO2004114016A3
WO2004114016A3 PCT/US2004/018344 US2004018344W WO2004114016A3 WO 2004114016 A3 WO2004114016 A3 WO 2004114016A3 US 2004018344 W US2004018344 W US 2004018344W WO 2004114016 A3 WO2004114016 A3 WO 2004114016A3
Authority
WO
WIPO (PCT)
Prior art keywords
block
control
imprint lithography
apparatus therefor
improved monitoring
Prior art date
Application number
PCT/US2004/018344
Other languages
French (fr)
Other versions
WO2004114016A2 (en
Inventor
Stephen Y Chou
Zhaoning Yu
Original Assignee
Princeton University Office Of
Stephen Y Chou
Zhaoning Yu
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Princeton University Office Of, Stephen Y Chou, Zhaoning Yu filed Critical Princeton University Office Of
Publication of WO2004114016A2 publication Critical patent/WO2004114016A2/en
Publication of WO2004114016A3 publication Critical patent/WO2004114016A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

A process of measuring or monitoring at least one parameter in an imprint lithography process inclubes the steps of providing a mold having a surface to imprint a test pattern (Block A), imprinting the test pattern on the moldable surface (Block B), illuminating the test pattern (Block C), measuring a component of the scattered, reflected or transmitted radiation to monitor a parameter of the imprinting (Block D) and, optionally, using the measured radiation component to control a process parameter (Block E).
PCT/US2004/018344 2003-06-09 2004-06-09 Imprint lithography with improved monitoring and control and apparatus therefor WO2004114016A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US47716103P 2003-06-09 2003-06-09
US60/477,161 2003-06-09

Publications (2)

Publication Number Publication Date
WO2004114016A2 WO2004114016A2 (en) 2004-12-29
WO2004114016A3 true WO2004114016A3 (en) 2005-05-26

Family

ID=33539063

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/018344 WO2004114016A2 (en) 2003-06-09 2004-06-09 Imprint lithography with improved monitoring and control and apparatus therefor

Country Status (2)

Country Link
CN (1) CN100526052C (en)
WO (1) WO2004114016A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7365103B2 (en) 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7261830B2 (en) 2003-10-16 2007-08-28 Molecular Imprints, Inc. Applying imprinting material to substrates employing electromagnetic fields
US7019835B2 (en) 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US7105452B2 (en) 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
US7282550B2 (en) 2004-08-16 2007-10-16 Molecular Imprints, Inc. Composition to provide a layer with uniform etch characteristics
US7241395B2 (en) 2004-09-21 2007-07-10 Molecular Imprints, Inc. Reverse tone patterning on surfaces having planarity perturbations
US7041604B2 (en) 2004-09-21 2006-05-09 Molecular Imprints, Inc. Method of patterning surfaces while providing greater control of recess anisotropy
US7252777B2 (en) 2004-09-21 2007-08-07 Molecular Imprints, Inc. Method of forming an in-situ recessed structure
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
WO2006135258A1 (en) * 2005-06-13 2006-12-21 Advanced Nano Imaging Limited Moulding
TWI526777B (en) * 2012-08-06 2016-03-21 Ａｓｍｌ荷蘭公司 Methods for providing lithography features on a substrate by self-assembly of block copolymers
JP6335948B2 (en) 2016-02-12 2018-05-30 キヤノン株式会社 Imprint apparatus and article manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography

Also Published As

Publication number Publication date
CN1832846A (en) 2006-09-13
WO2004114016A2 (en) 2004-12-29
CN100526052C (en) 2009-08-12

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