WO2004112077A3 - Rf current return path for a large area substrate plasma reactor - Google Patents
Rf current return path for a large area substrate plasma reactor Download PDFInfo
- Publication number
- WO2004112077A3 WO2004112077A3 PCT/US2004/017387 US2004017387W WO2004112077A3 WO 2004112077 A3 WO2004112077 A3 WO 2004112077A3 US 2004017387 W US2004017387 W US 2004017387W WO 2004112077 A3 WO2004112077 A3 WO 2004112077A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- large area
- return path
- plasma reactor
- area substrate
- current return
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2004800213619A CN1826679B (en) | 2003-06-12 | 2004-06-01 | RF current return path for a large area substrate plasma reactor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/460,916 | 2003-06-12 | ||
US10/460,916 US7083702B2 (en) | 2003-06-12 | 2003-06-12 | RF current return path for a large area substrate plasma reactor |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004112077A2 WO2004112077A2 (en) | 2004-12-23 |
WO2004112077A3 true WO2004112077A3 (en) | 2005-07-14 |
Family
ID=33511123
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/017387 WO2004112077A2 (en) | 2003-06-12 | 2004-06-01 | Rf current return path for a large area substrate plasma reactor |
Country Status (4)
Country | Link |
---|---|
US (2) | US7083702B2 (en) |
CN (1) | CN1826679B (en) |
TW (1) | TWI313574B (en) |
WO (1) | WO2004112077A2 (en) |
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Citations (5)
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EP1030345A2 (en) * | 1998-11-30 | 2000-08-23 | Alps Electric Co., Ltd. | Plasma treatment equipment and impedance measurement tool |
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US20030047281A1 (en) * | 2000-05-30 | 2003-03-13 | Jun Hirose | Gas introduction system for temperature adjustment of object to be processed |
US20030079691A1 (en) * | 2000-07-20 | 2003-05-01 | Applied Materials, Inc. | Method and apparatus for dechucking a substrate |
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-
2003
- 2003-06-12 US US10/460,916 patent/US7083702B2/en not_active Expired - Fee Related
-
2004
- 2004-06-01 WO PCT/US2004/017387 patent/WO2004112077A2/en active Application Filing
- 2004-06-01 CN CN2004800213619A patent/CN1826679B/en not_active Expired - Fee Related
- 2004-06-09 TW TW093116577A patent/TWI313574B/en not_active IP Right Cessation
-
2006
- 2006-06-21 US US11/425,679 patent/US8062717B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6221221B1 (en) * | 1998-11-16 | 2001-04-24 | Applied Materials, Inc. | Apparatus for providing RF return current path control in a semiconductor wafer processing system |
EP1030345A2 (en) * | 1998-11-30 | 2000-08-23 | Alps Electric Co., Ltd. | Plasma treatment equipment and impedance measurement tool |
US20030047281A1 (en) * | 2000-05-30 | 2003-03-13 | Jun Hirose | Gas introduction system for temperature adjustment of object to be processed |
US20030079691A1 (en) * | 2000-07-20 | 2003-05-01 | Applied Materials, Inc. | Method and apparatus for dechucking a substrate |
US20030029564A1 (en) * | 2001-08-09 | 2003-02-13 | Karl Brown | Pedestal with integral shield |
Also Published As
Publication number | Publication date |
---|---|
US7083702B2 (en) | 2006-08-01 |
US8062717B2 (en) | 2011-11-22 |
CN1826679A (en) | 2006-08-30 |
TWI313574B (en) | 2009-08-11 |
US20060231029A1 (en) | 2006-10-19 |
TW200505294A (en) | 2005-02-01 |
CN1826679B (en) | 2010-05-12 |
US20040250955A1 (en) | 2004-12-16 |
WO2004112077A2 (en) | 2004-12-23 |
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