WO2004009877A3 - Reacteur electrolytique - Google Patents
Reacteur electrolytique Download PDFInfo
- Publication number
- WO2004009877A3 WO2004009877A3 PCT/FR2003/002261 FR0302261W WO2004009877A3 WO 2004009877 A3 WO2004009877 A3 WO 2004009877A3 FR 0302261 W FR0302261 W FR 0302261W WO 2004009877 A3 WO2004009877 A3 WO 2004009877A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- component
- reactor
- electrolytic reactor
- electrolyte
- recess
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03750816A EP1523589A2 (fr) | 2002-07-19 | 2003-07-17 | Reacteur electrolytique |
US10/519,847 US7361256B2 (en) | 2002-07-19 | 2003-07-17 | Electrolytic reactor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR02/09199 | 2002-07-19 | ||
FR0209199A FR2842536B1 (fr) | 2002-07-19 | 2002-07-19 | Reacteur electrolytique |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004009877A2 WO2004009877A2 (fr) | 2004-01-29 |
WO2004009877A3 true WO2004009877A3 (fr) | 2004-05-06 |
Family
ID=29797582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2003/002261 WO2004009877A2 (fr) | 2002-07-19 | 2003-07-17 | Reacteur electrolytique |
Country Status (4)
Country | Link |
---|---|
US (1) | US7361256B2 (fr) |
EP (1) | EP1523589A2 (fr) |
FR (1) | FR2842536B1 (fr) |
WO (1) | WO2004009877A2 (fr) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2861746B1 (fr) * | 2003-10-31 | 2007-03-09 | Commissariat Energie Atomique | Support de piece a revetir par depot electrolytique |
US8313634B2 (en) | 2009-01-29 | 2012-11-20 | Princeton University | Conversion of carbon dioxide to organic products |
US8500987B2 (en) | 2010-03-19 | 2013-08-06 | Liquid Light, Inc. | Purification of carbon dioxide from a mixture of gases |
US8721866B2 (en) | 2010-03-19 | 2014-05-13 | Liquid Light, Inc. | Electrochemical production of synthesis gas from carbon dioxide |
US8845877B2 (en) | 2010-03-19 | 2014-09-30 | Liquid Light, Inc. | Heterocycle catalyzed electrochemical process |
FR2958560B1 (fr) * | 2010-04-07 | 2014-05-02 | Snecma | Installation a circuit ferme pour traiter la surface de pieces a partir d'un bain liquide |
US8845878B2 (en) | 2010-07-29 | 2014-09-30 | Liquid Light, Inc. | Reducing carbon dioxide to products |
US8524066B2 (en) * | 2010-07-29 | 2013-09-03 | Liquid Light, Inc. | Electrochemical production of urea from NOx and carbon dioxide |
US8961774B2 (en) | 2010-11-30 | 2015-02-24 | Liquid Light, Inc. | Electrochemical production of butanol from carbon dioxide and water |
US8568581B2 (en) | 2010-11-30 | 2013-10-29 | Liquid Light, Inc. | Heterocycle catalyzed carbonylation and hydroformylation with carbon dioxide |
US9090976B2 (en) | 2010-12-30 | 2015-07-28 | The Trustees Of Princeton University | Advanced aromatic amine heterocyclic catalysts for carbon dioxide reduction |
US8562811B2 (en) | 2011-03-09 | 2013-10-22 | Liquid Light, Inc. | Process for making formic acid |
JP2014518335A (ja) | 2011-07-06 | 2014-07-28 | リキッド・ライト・インコーポレーテッド | 二酸化炭素のカルボン酸、グリコール、及びカルボキシレートへの還元 |
EP2729600A2 (fr) | 2011-07-06 | 2014-05-14 | Liquid Light, Inc. | Captage de dioxyde de carbone et conversion en produits organiques |
EP2746433B1 (fr) * | 2012-12-20 | 2016-07-20 | ATOTECH Deutschland GmbH | Dispositif pour métal galvanique vertical, de préférence du cuivre, dépôt sur un substrat et récipient adapté pour recevoir un tel dispositif |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000034599A (ja) * | 1998-07-14 | 2000-02-02 | Matsushita Electronics Industry Corp | めっき用電極およびめっき装置ならびにめっき方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1419246A (en) * | 1971-12-30 | 1975-12-24 | Nat Res Dev | Electrochemical cells |
JPH07145496A (ja) * | 1993-05-28 | 1995-06-06 | Enthone Omi Inc | 金属塩溶液から金属を回収する方法及び装置 |
US5516412A (en) * | 1995-05-16 | 1996-05-14 | International Business Machines Corporation | Vertical paddle plating cell |
US5980706A (en) * | 1996-07-15 | 1999-11-09 | Semitool, Inc. | Electrode semiconductor workpiece holder |
BR0008945A (pt) * | 1999-03-15 | 2001-12-26 | Bioelex Corp | Método e aparelho para tratamento de águaresidual contendo matéria orgânica |
US6365016B1 (en) * | 1999-03-17 | 2002-04-02 | General Electric Company | Method and apparatus for arc plasma deposition with evaporation of reagents |
US7087144B2 (en) * | 2003-01-31 | 2006-08-08 | Applied Materials, Inc. | Contact ring with embedded flexible contacts |
-
2002
- 2002-07-19 FR FR0209199A patent/FR2842536B1/fr not_active Expired - Fee Related
-
2003
- 2003-07-17 EP EP03750816A patent/EP1523589A2/fr not_active Withdrawn
- 2003-07-17 US US10/519,847 patent/US7361256B2/en not_active Expired - Fee Related
- 2003-07-17 WO PCT/FR2003/002261 patent/WO2004009877A2/fr active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000034599A (ja) * | 1998-07-14 | 2000-02-02 | Matsushita Electronics Industry Corp | めっき用電極およびめっき装置ならびにめっき方法 |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 05 14 September 2000 (2000-09-14) * |
Also Published As
Publication number | Publication date |
---|---|
WO2004009877A2 (fr) | 2004-01-29 |
EP1523589A2 (fr) | 2005-04-20 |
US20050247556A1 (en) | 2005-11-10 |
US7361256B2 (en) | 2008-04-22 |
FR2842536B1 (fr) | 2005-06-03 |
FR2842536A1 (fr) | 2004-01-23 |
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