WO2003009318A8 - Support with getter-material for microelectronic, microoptoelectronic or micromechanical device - Google Patents
Support with getter-material for microelectronic, microoptoelectronic or micromechanical deviceInfo
- Publication number
- WO2003009318A8 WO2003009318A8 PCT/IT2002/000466 IT0200466W WO03009318A8 WO 2003009318 A8 WO2003009318 A8 WO 2003009318A8 IT 0200466 W IT0200466 W IT 0200466W WO 03009318 A8 WO03009318 A8 WO 03009318A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- support
- microoptoelectronic
- microelectronic
- getter
- micromechanical device
- Prior art date
Links
- 238000004377 microelectronic Methods 0.000 title abstract 2
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00277—Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS
- B81C1/00285—Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
- H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
- H01L23/26—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device including materials for absorbing or reacting with moisture or other undesired substances, e.g. getters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/041—Mountings in enclosures or in a particular environment
- G01J5/045—Sealings; Vacuum enclosures; Encapsulated packages; Wafer bonding structures; Getter arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
Abstract
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002450412A CA2450412C (en) | 2001-07-20 | 2002-07-16 | Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
EP02755628A EP1412550B1 (en) | 2001-07-20 | 2002-07-16 | Support with getter-material for micromechanical device |
KR1020047000915A KR100611134B1 (en) | 2001-07-20 | 2002-07-16 | Support for microelectronic, microoptoelectronic or micromechanical devices |
DE60231715T DE60231715D1 (en) | 2001-07-20 | 2002-07-16 | CARRIER WITH GETTER MATERIAL FOR A MICROMECHANICAL CONSTRUCTION ELEMENT |
DK02755628T DK1412550T3 (en) | 2001-07-20 | 2002-07-16 | Support with getter material for micromechanical device |
AU2002321832A AU2002321832A1 (en) | 2001-07-20 | 2002-07-16 | Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
JP2003514572A JP4068555B2 (en) | 2001-07-20 | 2002-07-16 | Support for microelectronics, microoptoelectronics or micromechanics devices |
HK05105829.1A HK1073336A1 (en) | 2001-07-20 | 2005-07-11 | Support for microelectronic, microoptoelectronic or micromechanical devices |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2001MI001558A ITMI20011558A1 (en) | 2001-07-20 | 2001-07-20 | SUPPORT FOR MICRO-ELECTRONIC OR MICRO-ELECTRONIC OR MICROMECHANICAL DEVICES |
ITMI2001A001558 | 2001-07-20 | ||
ITMI2002A000688 | 2002-04-03 | ||
IT2002MI000688A ITMI20020688A1 (en) | 2002-04-03 | 2002-04-03 | SUPPORT FOR MICRO-ELECTRONIC OR MICRO-ELECTRONIC OR MICROMECHANICAL DEVICES |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2003009318A2 WO2003009318A2 (en) | 2003-01-30 |
WO2003009318A8 true WO2003009318A8 (en) | 2003-04-10 |
WO2003009318A3 WO2003009318A3 (en) | 2003-09-25 |
Family
ID=26332783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IT2002/000466 WO2003009318A2 (en) | 2001-07-20 | 2002-07-16 | Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
Country Status (15)
Country | Link |
---|---|
US (5) | US6897551B2 (en) |
EP (1) | EP1412550B1 (en) |
JP (5) | JP4068555B2 (en) |
KR (1) | KR100611134B1 (en) |
CN (1) | CN100503879C (en) |
AT (1) | ATE426688T1 (en) |
AU (1) | AU2002321832A1 (en) |
CA (1) | CA2450412C (en) |
DE (1) | DE60231715D1 (en) |
DK (1) | DK1412550T3 (en) |
ES (1) | ES2321913T3 (en) |
HK (1) | HK1073336A1 (en) |
MY (1) | MY135763A (en) |
TW (1) | TW533188B (en) |
WO (1) | WO2003009318A2 (en) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
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TW583049B (en) * | 2001-07-20 | 2004-04-11 | Getters Spa | Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
TW533188B (en) * | 2001-07-20 | 2003-05-21 | Getters Spa | Support for microelectronic, microoptoelectronic or micromechanical devices |
WO2005015637A1 (en) * | 2003-08-08 | 2005-02-17 | Matsushita Electric Industrial Co., Ltd. | Electronic device and method of producing the same |
ITMI20032209A1 (en) * | 2003-11-14 | 2005-05-15 | Getters Spa | PROCESS FOR THE PRODUCTION OF DEVICES THAT REQUIRE A NON-EVAPORABLE GETTER MATERIAL FOR THEIR OPERATION. |
ITMI20032208A1 (en) * | 2003-11-14 | 2005-05-15 | Getters Spa | CATODO WITH INTEGRATED AND LOW FUNCTION GETTER WORK FOR COLD CATO LAMPS. |
US7871660B2 (en) * | 2003-11-14 | 2011-01-18 | Saes Getters, S.P.A. | Preparation of getter surfaces using caustic chemicals |
US20060076634A1 (en) * | 2004-09-27 | 2006-04-13 | Lauren Palmateer | Method and system for packaging MEMS devices with incorporated getter |
US8124434B2 (en) | 2004-09-27 | 2012-02-28 | Qualcomm Mems Technologies, Inc. | Method and system for packaging a display |
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US7659150B1 (en) | 2007-03-09 | 2010-02-09 | Silicon Clocks, Inc. | Microshells for multi-level vacuum cavities |
US7595209B1 (en) | 2007-03-09 | 2009-09-29 | Silicon Clocks, Inc. | Low stress thin film microshells |
US7736929B1 (en) | 2007-03-09 | 2010-06-15 | Silicon Clocks, Inc. | Thin film microshells incorporating a getter layer |
US7923790B1 (en) * | 2007-03-09 | 2011-04-12 | Silicon Laboratories Inc. | Planar microshells for vacuum encapsulated devices and damascene method of manufacture |
ES2375407T3 (en) * | 2007-08-31 | 2012-02-29 | Technical University Of Denmark | SEPARATION OF IMPURITY PHASES OF ELECTROCHEMICAL DEVICES. |
US8349635B1 (en) | 2008-05-20 | 2013-01-08 | Silicon Laboratories Inc. | Encapsulated MEMS device and method to form the same |
FR2933389B1 (en) * | 2008-07-01 | 2010-10-29 | Commissariat Energie Atomique | STRUCTURE BASED ON SUSPENDED GETTER MATERIAL |
JP2010019933A (en) * | 2008-07-08 | 2010-01-28 | Seiko Epson Corp | Actuator, optical scanner and image forming apparatus |
ITMI20090410A1 (en) | 2009-03-18 | 2010-09-19 | Getters Spa | NON EVAPORABLE GETTER ALLOYS PARTICULARLY SUITABLE FOR HYDROGEN ABSORPTION |
FR2950877B1 (en) | 2009-10-07 | 2012-01-13 | Commissariat Energie Atomique | CAVITY STRUCTURE COMPRISING A BONDING INTERFACE BASED ON MATERIAL GETTER |
FR2950876B1 (en) | 2009-10-07 | 2012-02-10 | Commissariat Energie Atomique | METHOD FOR TREATING A GETTER MATERIAL AND METHOD FOR ENCAPSULATING SUCH A GETTER MATERIAL |
JP5298047B2 (en) | 2010-02-26 | 2013-09-25 | 日立オートモティブシステムズ株式会社 | Manufacturing method of composite sensor |
FR2967150A1 (en) | 2010-11-09 | 2012-05-11 | Commissariat Energie Atomique | PROCESS FOR PRODUCING A SUBSTRATE WITH BURNED LAYERS OF GETTER MATERIAL |
FR2967302B1 (en) | 2010-11-09 | 2012-12-21 | Commissariat Energie Atomique | ENCAPSULATION STRUCTURE OF A MICRO-DEVICE COMPRISING A GETTER MATERIAL |
US8395229B2 (en) | 2011-03-11 | 2013-03-12 | Institut National D'optique | MEMS-based getter microdevice |
JP5541306B2 (en) | 2011-05-27 | 2014-07-09 | 株式会社デンソー | Mechanical quantity sensor device and manufacturing method thereof |
US9491802B2 (en) | 2012-02-17 | 2016-11-08 | Honeywell International Inc. | On-chip alkali dispenser |
DE102012207165A1 (en) | 2012-04-30 | 2013-10-31 | Robert Bosch Gmbh | Micro-electromechanical device e.g. micro-electromechanical sensor such as inertial sensor, has electrically conductive metallization portion which is arranged on surface of substrate and is partially formed of chemically active getter |
EP2736071B8 (en) | 2012-11-22 | 2017-04-19 | Tronic's Microsystems S.A. | Wafer level package with getter |
US9018715B2 (en) | 2012-11-30 | 2015-04-28 | Silicon Laboratories Inc. | Gas-diffusion barriers for MEMS encapsulation |
US10160638B2 (en) | 2013-01-04 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for a semiconductor structure |
US9029773B2 (en) * | 2013-02-24 | 2015-05-12 | Vlad Novotny | Sealed infrared imagers |
WO2014129666A1 (en) * | 2013-02-25 | 2014-08-28 | 京セラ株式会社 | Package for housing electronic component and electronic device |
EP2813464B1 (en) | 2013-06-12 | 2018-08-08 | Tronic's Microsystems | Device with getter material |
EP2813465B1 (en) | 2013-06-12 | 2020-01-15 | Tronic's Microsystems | MEMS device with getter layer |
JP6106331B2 (en) | 2014-03-20 | 2017-03-29 | 京セラ株式会社 | User terminal and device |
US9422149B2 (en) | 2014-07-25 | 2016-08-23 | Semiconductor Manufacturing International (Shanghai) Corporation | Trapped sacrificial structures and methods of manufacturing same using thin-film encapsulation |
US11078075B2 (en) | 2015-12-31 | 2021-08-03 | Taiwan Semiconductor Manufacturing Company Ltd. | Packaging method and associated packaging structure |
WO2017130520A1 (en) * | 2016-01-25 | 2017-08-03 | 京セラ株式会社 | Measurement sensor package and measurement sensor |
DE102017210459A1 (en) | 2017-06-22 | 2018-12-27 | Robert Bosch Gmbh | Micromechanical device with a first cavity and a second cavity |
FR3072788B1 (en) | 2017-10-24 | 2020-05-29 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | MODULAR INFRARED RADIATION SOURCE |
FR3088319B1 (en) | 2018-11-08 | 2020-10-30 | Ulis | HERMETIC CASE INCLUDING A GETTER, OPTOELECTRONIC COMPONENT OR MEMS DEVICE INTEGRATING SUCH A HERMETIC CASE AND ASSOCIATED MANUFACTURING PROCESS |
WO2023186704A1 (en) * | 2022-04-01 | 2023-10-05 | Saes Getters S.P.A. | Substrate comprising a base and an integrated getter film for manufacturing microelectronic devices |
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-
2002
- 2002-07-12 TW TW091115738A patent/TW533188B/en not_active IP Right Cessation
- 2002-07-16 WO PCT/IT2002/000466 patent/WO2003009318A2/en active Application Filing
- 2002-07-16 CA CA002450412A patent/CA2450412C/en not_active Expired - Lifetime
- 2002-07-16 CN CNB028147103A patent/CN100503879C/en not_active Expired - Lifetime
- 2002-07-16 ES ES02755628T patent/ES2321913T3/en not_active Expired - Lifetime
- 2002-07-16 AU AU2002321832A patent/AU2002321832A1/en not_active Abandoned
- 2002-07-16 JP JP2003514572A patent/JP4068555B2/en not_active Expired - Lifetime
- 2002-07-16 DK DK02755628T patent/DK1412550T3/en active
- 2002-07-16 DE DE60231715T patent/DE60231715D1/en not_active Expired - Lifetime
- 2002-07-16 EP EP02755628A patent/EP1412550B1/en not_active Expired - Lifetime
- 2002-07-16 AT AT02755628T patent/ATE426688T1/en active
- 2002-07-16 KR KR1020047000915A patent/KR100611134B1/en active IP Right Grant
- 2002-07-18 MY MYPI20022726A patent/MY135763A/en unknown
- 2002-07-19 US US10/201,657 patent/US6897551B2/en not_active Ceased
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2005
- 2005-02-25 US US11/067,526 patent/US7534658B2/en not_active Expired - Lifetime
- 2005-03-01 US US11/070,728 patent/US7808091B2/en not_active Expired - Fee Related
- 2005-07-11 HK HK05105829.1A patent/HK1073336A1/en not_active IP Right Cessation
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2007
- 2007-10-31 US US11/982,279 patent/US7566957B2/en not_active Expired - Lifetime
- 2007-11-14 JP JP2007295918A patent/JP2008118147A/en not_active Withdrawn
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2008
- 2008-04-24 US US12/150,287 patent/USRE44255E1/en not_active Expired - Lifetime
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2011
- 2011-10-19 JP JP2011229923A patent/JP2012051106A/en not_active Withdrawn
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2013
- 2013-12-13 JP JP2013257638A patent/JP2014058040A/en active Pending
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2015
- 2015-12-09 JP JP2015240035A patent/JP6140259B2/en not_active Expired - Lifetime
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