WO2001036990A3 - Wafer level interposer - Google Patents
Wafer level interposer Download PDFInfo
- Publication number
- WO2001036990A3 WO2001036990A3 PCT/US2000/042200 US0042200W WO0136990A3 WO 2001036990 A3 WO2001036990 A3 WO 2001036990A3 US 0042200 W US0042200 W US 0042200W WO 0136990 A3 WO0136990 A3 WO 0136990A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- interposer
- wafer
- assembly
- testing
- wafer level
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
- G01R1/0408—Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
- G01R1/0416—Connectors, terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Abstract
An apparatus and method for manufacture and testing of semiconductor chips (14) is disclosed. The invention comprises the use of an interposer (22) having a plurality of electrical contact pads (26) on each surface connected by a plurality of conductors (32, 34). After assembly of the interposer (22) to a semiconductor wafer (12), the wafer-interposer assembly (10) is attached to a testing unit (46) wherein the semiconductor chips (14) on the wafer (12) are tested. After testing, the interposer-wafer assembly (10) is singulated into a plurality of chip assemblies (62), each chip assembly (62) comprising a silicon chip (64) and the permanently attached interposer (66).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/440,751 US6392428B1 (en) | 1999-11-16 | 1999-11-16 | Wafer level interposer |
US09/440,751 | 1999-11-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001036990A2 WO2001036990A2 (en) | 2001-05-25 |
WO2001036990A3 true WO2001036990A3 (en) | 2002-01-10 |
Family
ID=23750034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/042200 WO2001036990A2 (en) | 1999-11-16 | 2000-11-16 | Wafer level interposer |
Country Status (2)
Country | Link |
---|---|
US (2) | US6392428B1 (en) |
WO (1) | WO2001036990A2 (en) |
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US6392428B1 (en) * | 1999-11-16 | 2002-05-21 | Eaglestone Partners I, Llc | Wafer level interposer |
US6812048B1 (en) | 2000-07-31 | 2004-11-02 | Eaglestone Partners I, Llc | Method for manufacturing a wafer-interposer assembly |
US6537831B1 (en) | 2000-07-31 | 2003-03-25 | Eaglestone Partners I, Llc | Method for selecting components for a matched set using a multi wafer interposer |
US6815712B1 (en) * | 2000-10-02 | 2004-11-09 | Eaglestone Partners I, Llc | Method for selecting components for a matched set from a wafer-interposer assembly |
JP2002110856A (en) * | 2000-10-03 | 2002-04-12 | Sony Corp | Manufacturing method of semiconductor device |
US6686657B1 (en) * | 2000-11-07 | 2004-02-03 | Eaglestone Partners I, Llc | Interposer for improved handling of semiconductor wafers and method of use of same |
US6529022B2 (en) * | 2000-12-15 | 2003-03-04 | Eaglestone Pareners I, Llc | Wafer testing interposer for a conventional package |
US6524885B2 (en) * | 2000-12-15 | 2003-02-25 | Eaglestone Partners I, Llc | Method, apparatus and system for building an interposer onto a semiconductor wafer using laser techniques |
US6673653B2 (en) | 2001-02-23 | 2004-01-06 | Eaglestone Partners I, Llc | Wafer-interposer using a ceramic substrate |
DE10216874A1 (en) * | 2002-04-17 | 2003-07-10 | Infineon Technologies Ag | Semiconductor chip and process for laying down information on it forms wafer level package with contacts and has optically readable identification on each chip |
US6969909B2 (en) | 2002-12-20 | 2005-11-29 | Vlt, Inc. | Flip chip FET device |
US7038917B2 (en) * | 2002-12-27 | 2006-05-02 | Vlt, Inc. | Low loss, high density array interconnection |
US20040193989A1 (en) * | 2003-03-28 | 2004-09-30 | Sun Microsystems, Inc. | Test system including a test circuit board including through-hole vias and blind vias |
US7131047B2 (en) | 2003-04-07 | 2006-10-31 | Sun Microsystems, Inc. | Test system including a test circuit board including resistive devices |
JP2006210402A (en) * | 2005-01-25 | 2006-08-10 | Matsushita Electric Ind Co Ltd | Semiconductor device |
US20080018350A1 (en) * | 2006-07-21 | 2008-01-24 | Clinton Chao | Test probe for integrated circuits with ultra-fine pitch terminals |
US20140055159A1 (en) * | 2012-02-21 | 2014-02-27 | Nexus Technology | Interposer with Edge Probe Points |
US20130257423A1 (en) * | 2012-04-03 | 2013-10-03 | Isentek Inc. | Hybrid magnetic sensor |
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US20190013251A1 (en) | 2017-07-10 | 2019-01-10 | International Business Machines Corporation | Non-destructive testing of integrated circuit chips |
TWI827809B (en) * | 2019-04-04 | 2024-01-01 | 丹麥商卡普雷斯股份有限公司 | Method for measuring an electric property of a test sample, and multilayer test sample |
JP2021012041A (en) * | 2019-07-03 | 2021-02-04 | デクセリアルズ株式会社 | Inspection tool for inspecting electrical characteristics |
KR20220033655A (en) | 2020-09-09 | 2022-03-17 | 삼성전자주식회사 | semiconductor package |
US20230078663A1 (en) * | 2021-09-09 | 2023-03-16 | Kla Corporation | Method for Determining Material Parameters of a Multilayer Test Sample |
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US6483330B1 (en) * | 2000-09-11 | 2002-11-19 | Eaglestone Partners I, Llc | Method for selecting components for a matched set using wafer interposers |
US6529022B2 (en) | 2000-12-15 | 2003-03-04 | Eaglestone Pareners I, Llc | Wafer testing interposer for a conventional package |
US6524885B2 (en) | 2000-12-15 | 2003-02-25 | Eaglestone Partners I, Llc | Method, apparatus and system for building an interposer onto a semiconductor wafer using laser techniques |
US6440771B1 (en) | 2001-03-23 | 2002-08-27 | Eaglestone Partners I, Llc | Method for constructing a wafer interposer by using conductive columns |
-
1999
- 1999-11-16 US US09/440,751 patent/US6392428B1/en not_active Expired - Fee Related
-
2000
- 2000-11-16 WO PCT/US2000/042200 patent/WO2001036990A2/en active Application Filing
-
2002
- 2002-03-26 US US10/106,167 patent/US6825678B2/en not_active Expired - Lifetime
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US5206582A (en) * | 1988-05-18 | 1993-04-27 | Hewlett-Packard Company | Control system for automated parametric test equipment |
US5095267A (en) * | 1990-03-19 | 1992-03-10 | National Semiconductor Corporation | Method of screening A.C. performance characteristics during D.C. parametric test operation |
US5059899A (en) * | 1990-08-16 | 1991-10-22 | Micron Technology, Inc. | Semiconductor dies and wafers and methods for making |
EP0520841A1 (en) * | 1991-06-27 | 1992-12-30 | Motorola, Inc. | Composite flip chip semi-conductor device and method for making and burning-in the same |
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EP0918354A2 (en) * | 1997-11-20 | 1999-05-26 | Texas Instruments Incorporated | Wafer-scale assembly of chip-size packages |
Also Published As
Publication number | Publication date |
---|---|
US6825678B2 (en) | 2004-11-30 |
WO2001036990A2 (en) | 2001-05-25 |
US20020097063A1 (en) | 2002-07-25 |
US6392428B1 (en) | 2002-05-21 |
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