WO2001028049A3 - Low-noise, high-power optical amplifier - Google Patents

Low-noise, high-power optical amplifier Download PDF

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Publication number
WO2001028049A3
WO2001028049A3 PCT/US2000/027994 US0027994W WO0128049A3 WO 2001028049 A3 WO2001028049 A3 WO 2001028049A3 US 0027994 W US0027994 W US 0027994W WO 0128049 A3 WO0128049 A3 WO 0128049A3
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WO
WIPO (PCT)
Prior art keywords
stage
soa
medium
noise
gain
Prior art date
Application number
PCT/US2000/027994
Other languages
French (fr)
Other versions
WO2001028049A2 (en
WO2001028049A9 (en
Inventor
Sol P Dijaili
Jeffrey D Walker
Original Assignee
Genoa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Genoa Corp filed Critical Genoa Corp
Priority to AU32617/01A priority Critical patent/AU3261701A/en
Publication of WO2001028049A2 publication Critical patent/WO2001028049A2/en
Publication of WO2001028049A3 publication Critical patent/WO2001028049A3/en
Publication of WO2001028049A9 publication Critical patent/WO2001028049A9/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/50Amplifier structures not provided for in groups H01S5/02 - H01S5/30
    • H01S5/5027Concatenated amplifiers, i.e. amplifiers in series or cascaded
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1028Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
    • H01S5/1032Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004Confining in the direction perpendicular to the layer structure
    • H01S5/2018Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
    • H01S5/2027Reflecting region or layer, parallel to the active layer, e.g. to modify propagation of the mode in the laser or to influence transverse modes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/50Amplifier structures not provided for in groups H01S5/02 - H01S5/30
    • H01S5/5063Amplifier structures not provided for in groups H01S5/02 - H01S5/30 operating above threshold
    • H01S5/5072Gain clamping, i.e. stabilisation by saturation using a further mode or frequency
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/02ASE (amplified spontaneous emission), noise; Reduction thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0265Intensity modulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0607Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
    • H01S5/0608Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch
    • H01S5/0609Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch acting on an absorbing region, e.g. wavelength convertors
    • H01S5/0611Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch acting on an absorbing region, e.g. wavelength convertors wavelength convertors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14External cavity lasers
    • H01S5/141External cavity lasers using a wavelength selective device, e.g. a grating or etalon
    • H01S5/142External cavity lasers using a wavelength selective device, e.g. a grating or etalon which comprises an additional resonator
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18302Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] comprising an integrated optical modulator
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18305Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18358Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] containing spacer layers to adjust the phase of the light wave in the cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/2205Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
    • H01S5/2214Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
    • H01S5/2215Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides using native oxidation of semiconductor layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2231Buried stripe structure with inner confining structure only between the active layer and the upper electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4031Edge-emitting structures
    • H01S5/4056Edge-emitting structures emitting light in more than one direction

Abstract

A multi-stage lasing semiconductor optical amplifier (SOA) (100) device amplifies an optical signal. The multi-stage SOA (100) includes at least two SOA stages (110A-110N) coupled in series. Each SOA stage (110) includes a semiconductor gain medium (120) and a laser cavity (140) including the semiconductor gain medium (120). The medium is pumped above a lasing threshold for the laser cavity, which clamps the gain of the medium. An optical signal propagating through the medium is amplified by the gain-clamped medium. The SOA stages (110) are characterized by a design parameter which varies from stage to stage. In a preferred embodiment, the design parameter includes a noise figure and a saturable power, with both parameters increasing as the optical signal propagates from stage to stage. As a result, the multi-stage SOA (100) can achieve better noise performance and higher power outputs compared to comparable SOAs of constant noise figure and saturable power.
PCT/US2000/027994 1999-10-12 2000-10-10 Low-noise, high-power optical amplifier WO2001028049A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU32617/01A AU3261701A (en) 1999-10-12 2000-10-10 Low-noise, high-power optical amplifier

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/416,817 US6512629B1 (en) 1999-03-22 1999-10-12 Low-noise, high-power optical amplifier
US09/416,817 1999-10-12

Publications (3)

Publication Number Publication Date
WO2001028049A2 WO2001028049A2 (en) 2001-04-19
WO2001028049A3 true WO2001028049A3 (en) 2001-11-22
WO2001028049A9 WO2001028049A9 (en) 2002-05-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/027994 WO2001028049A2 (en) 1999-10-12 2000-10-10 Low-noise, high-power optical amplifier

Country Status (3)

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US (2) US6512629B1 (en)
AU (1) AU3261701A (en)
WO (1) WO2001028049A2 (en)

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US6891664B2 (en) * 1999-03-22 2005-05-10 Finisar Corporation Multistage tunable gain optical amplifier
US6647041B1 (en) * 2000-05-26 2003-11-11 Finisar Corporation Electrically pumped vertical optical cavity with improved electrical performance
DE10108079A1 (en) * 2000-05-30 2002-09-12 Osram Opto Semiconductors Gmbh Optically-pumped surface-emitting semiconductor laser device, has edge-emitting structure of pumping source and radiation-emitting quantum pot type structure applied to common substrate
US6853658B1 (en) 2000-12-14 2005-02-08 Finisar Corporation Optical logical circuits based on lasing semiconductor optical amplifiers
US6711194B2 (en) * 2001-02-08 2004-03-23 The Furukawa Electric Co., Ltd. High output power semiconductor laser diode
US6909536B1 (en) * 2001-03-09 2005-06-21 Finisar Corporation Optical receiver including a linear semiconductor optical amplifier
JP3991615B2 (en) * 2001-04-24 2007-10-17 日本電気株式会社 Semiconductor optical amplifier and semiconductor laser
US6597497B2 (en) 2001-10-04 2003-07-22 Shih-Yuan Wang Semiconductor optical amplifier with transverse laser cavity intersecting optical signal path and method of fabrication thereof
US6714344B2 (en) 2001-10-04 2004-03-30 Gazillion Bits, Inc. Reducing output noise in a ballast-powered semiconductor optical amplifier
US6836357B2 (en) 2001-10-04 2004-12-28 Gazillion Bits, Inc. Semiconductor optical amplifier using laser cavity energy to amplify signal and method of fabrication thereof
US7116851B2 (en) 2001-10-09 2006-10-03 Infinera Corporation Optical signal receiver, an associated photonic integrated circuit (RxPIC), and method improving performance
US6721087B2 (en) 2001-12-13 2004-04-13 Intel Corporation Optical amplifier with distributed evanescently-coupled pump
US7130111B2 (en) 2001-12-13 2006-10-31 Intel Corporation Optical amplifier with transverse pump
US6888668B2 (en) 2001-12-13 2005-05-03 Intel Corporation Optical amplifier with multiple wavelength pump
US6791746B2 (en) * 2002-02-12 2004-09-14 Finisar Corporation Extended bandwidth semiconductor optical amplifier
US6671086B1 (en) * 2002-02-19 2003-12-30 Finisar Corporation Semiconductor optical amplifiers with broadened gain spectrum
GB2390475A (en) * 2002-07-02 2004-01-07 Kamelian Ltd Control of the Gain of a Semiconductor Optical Amplifier
KR20050009584A (en) * 2003-07-18 2005-01-25 삼성전자주식회사 Semiconductor optical amplifier and optical amplifier module
US7079310B2 (en) * 2004-01-08 2006-07-18 Chih-Hsiao Chen Gain-clamped optical amplifier
US20050168247A1 (en) * 2004-01-30 2005-08-04 The Regents Of The University Of California Electrical transient sampling system using a regenerative gain-clamped fiber optic delay line
KR100579512B1 (en) * 2004-12-08 2006-05-15 삼성전자주식회사 The wavelength converter which generates the wavelength tunable laser optical source in itself
JP2008529316A (en) * 2005-02-02 2008-07-31 コヴェガ・インコーポレーテッド Semiconductor optical amplifier with non-uniform injection current density.
JP2009135555A (en) * 2009-03-25 2009-06-18 Mitsubishi Electric Corp Semiconductor optical amplifier, and manufacturing method thereof
US8102887B2 (en) * 2009-05-26 2012-01-24 Corning Incorporated Edge bonded optical packages
US20110044359A1 (en) * 2009-08-18 2011-02-24 Douglas Llewellyn Butler Intracavity Conversion Utilizing Narrow Band Reflective SOA
US8111452B2 (en) * 2010-02-22 2012-02-07 Corning Incorporated Wavelength conversion device with microlens and optical package incorporating the same
CN102299474B (en) * 2011-07-05 2012-09-05 北京工业大学 Method for precisely aligning multi-rod serial connection solid laser crystal rods
US9608398B2 (en) * 2014-02-20 2017-03-28 LGS Innovations LLC Apparatus for protecting powered optical amplifiers
US9923634B2 (en) * 2015-09-23 2018-03-20 Fujitsu Limited Harmonic generation and phase sensitive amplification using a bragg reflection waveguide
US11929592B2 (en) * 2020-09-17 2024-03-12 Marvell Asia Pte Ltd. Silicon-photonics-based semiconductor optical amplifier with N-doped active layer

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US6704138B2 (en) 2004-03-09
WO2001028049A2 (en) 2001-04-19
US6512629B1 (en) 2003-01-28
US20030095326A1 (en) 2003-05-22
AU3261701A (en) 2001-04-23
WO2001028049A9 (en) 2002-05-10

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