WO2000065331A3 - System for analyzing surface characteristics with self-calibrating capability - Google Patents
System for analyzing surface characteristics with self-calibrating capability Download PDFInfo
- Publication number
- WO2000065331A3 WO2000065331A3 PCT/US2000/010875 US0010875W WO0065331A3 WO 2000065331 A3 WO2000065331 A3 WO 2000065331A3 US 0010875 W US0010875 W US 0010875W WO 0065331 A3 WO0065331 A3 WO 0065331A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sample
- self
- ellipsometer
- radiation
- calibrating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000614020A JP5248722B2 (en) | 1999-04-22 | 2000-04-21 | Surface characteristic analysis system with self-calibration function |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/298,007 US6734968B1 (en) | 1999-02-09 | 1999-04-22 | System for analyzing surface characteristics with self-calibrating capability |
US09/298,007 | 1999-04-22 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2000065331A2 WO2000065331A2 (en) | 2000-11-02 |
WO2000065331A3 true WO2000065331A3 (en) | 2001-02-15 |
WO2000065331A9 WO2000065331A9 (en) | 2002-06-13 |
Family
ID=23148603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/010875 WO2000065331A2 (en) | 1999-04-22 | 2000-04-21 | System for analyzing surface characteristics with self-calibrating capability |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP5248722B2 (en) |
WO (1) | WO2000065331A2 (en) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0118981D0 (en) * | 2001-08-03 | 2001-09-26 | Renishaw Plc | Electron microscope and spectroscopy system |
US6515744B2 (en) | 2001-02-08 | 2003-02-04 | Therma-Wave, Inc. | Small spot ellipsometer |
DE60210431T2 (en) * | 2002-06-17 | 2006-08-31 | Horiba Jobin Yvon S.A.S. | Achromatic spectral ellipsometer with high spatial resolution |
US7369233B2 (en) | 2002-11-26 | 2008-05-06 | Kla-Tencor Technologies Corporation | Optical system for measuring samples using short wavelength radiation |
US7577076B2 (en) | 2003-03-14 | 2009-08-18 | Ricoh Company, Ltd. | Tilt sensor using diffraction grating |
JP2008275632A (en) * | 2003-05-20 | 2008-11-13 | Dainippon Screen Mfg Co Ltd | Spectroscopic ellipsometer |
US7564552B2 (en) | 2004-05-14 | 2009-07-21 | Kla-Tencor Technologies Corp. | Systems and methods for measurement of a specimen with vacuum ultraviolet light |
US7349079B2 (en) | 2004-05-14 | 2008-03-25 | Kla-Tencor Technologies Corp. | Methods for measurement or analysis of a nitrogen concentration of a specimen |
US7067819B2 (en) | 2004-05-14 | 2006-06-27 | Kla-Tencor Technologies Corp. | Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light |
US7359052B2 (en) | 2004-05-14 | 2008-04-15 | Kla-Tencor Technologies Corp. | Systems and methods for measurement of a specimen with vacuum ultraviolet light |
US7408641B1 (en) | 2005-02-14 | 2008-08-05 | Kla-Tencor Technologies Corp. | Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system |
JP4779124B2 (en) * | 2005-03-28 | 2011-09-28 | 国立大学法人東京農工大学 | Optical characteristic measuring apparatus and optical characteristic measuring method |
US7277172B2 (en) * | 2005-06-06 | 2007-10-02 | Kla-Tencor Technologies, Corporation | Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals |
WO2006134840A1 (en) * | 2005-06-13 | 2006-12-21 | National University Corporation Tokyo University Of Agriculture And Technology | Optical characteristic measuring device and optical characteristic measuring method |
US7298480B2 (en) * | 2005-12-23 | 2007-11-20 | Ecole Polytechnique | Broadband ellipsometer / polarimeter system |
WO2008008058A1 (en) * | 2006-07-11 | 2008-01-17 | J.A. Woollam Co., Inc. | Discrete polarization state rotatable compensator spectroscopic ellipsometer system, and method of calibration |
WO2008081374A2 (en) * | 2006-12-28 | 2008-07-10 | Koninklijke Philips Electronics N.V. | Reflection or single scattering spectroscopy and imaging |
JP5156306B2 (en) * | 2007-09-14 | 2013-03-06 | 大塚電子株式会社 | Optical anisotropy measuring apparatus and optical anisotropy measuring method |
JP2009103598A (en) * | 2007-10-24 | 2009-05-14 | Dainippon Screen Mfg Co Ltd | Spectroscopic ellipsometer and polarization analysis method |
JP2011524000A (en) * | 2008-05-09 | 2011-08-25 | ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド | Rapid sample height, AOI and POI alignment, such as in a mapping ellipsometer |
US8446584B2 (en) * | 2011-05-13 | 2013-05-21 | Kla-Tencor Corporation | Reconfigurable spectroscopic ellipsometer |
KR101704591B1 (en) | 2012-02-21 | 2017-02-08 | 에이에스엠엘 네델란즈 비.브이. | Inspection apparatus and method |
CN102879337B (en) * | 2012-09-29 | 2015-08-19 | 中国科学院微电子研究所 | A kind of calibration steps of ellipsometer test |
CN102878940B (en) * | 2012-09-29 | 2015-08-19 | 中国科学院微电子研究所 | A kind of calibration steps comprising the ellipsometer test of phase compensator |
JP7136958B1 (en) * | 2021-03-24 | 2022-09-13 | アンリツ株式会社 | Light source device for optical measuring instrument and optical spectrum analyzer |
CN113514400B (en) * | 2021-04-23 | 2022-10-11 | 长春理工大学 | Polarization measurement method of smoke particle Mueller matrix |
KR20230030346A (en) * | 2021-08-25 | 2023-03-06 | 삼성전자주식회사 | Polarization Measuring Device and method for fabricating semiconductor device using thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4306809A (en) * | 1979-03-26 | 1981-12-22 | The Board Of Regents Of The University Of Nebraska | Polarimeter |
US4893932A (en) * | 1986-05-02 | 1990-01-16 | Particle Measuring Systems, Inc. | Surface analysis system and method |
US5581350A (en) * | 1995-06-06 | 1996-12-03 | Tencor Instruments | Method and system for calibrating an ellipsometer |
US5608526A (en) * | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
WO1998039633A1 (en) * | 1997-03-03 | 1998-09-11 | J.A. Woollam Company Incorporated | Regression calibrated spectroscopic rotating compensator ellipsometer system with photo array detector |
WO2000047961A1 (en) * | 1999-02-09 | 2000-08-17 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2661913B2 (en) * | 1986-05-02 | 1997-10-08 | パ−テイクル、メジユアリング、システムズ インコ−ポレ−テツド | Surface analysis method and surface analysis device |
JPH07151674A (en) * | 1993-11-30 | 1995-06-16 | Shimadzu Corp | Quenching polarization measuring apparatus |
-
2000
- 2000-04-21 WO PCT/US2000/010875 patent/WO2000065331A2/en active Application Filing
- 2000-04-21 JP JP2000614020A patent/JP5248722B2/en not_active Expired - Lifetime
-
2011
- 2011-05-10 JP JP2011104901A patent/JP5368507B2/en not_active Expired - Lifetime
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4306809A (en) * | 1979-03-26 | 1981-12-22 | The Board Of Regents Of The University Of Nebraska | Polarimeter |
US4893932A (en) * | 1986-05-02 | 1990-01-16 | Particle Measuring Systems, Inc. | Surface analysis system and method |
US4893932B1 (en) * | 1986-05-02 | 1992-10-20 | Particle Measuring Syst | |
US5608526A (en) * | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
US5581350A (en) * | 1995-06-06 | 1996-12-03 | Tencor Instruments | Method and system for calibrating an ellipsometer |
WO1998039633A1 (en) * | 1997-03-03 | 1998-09-11 | J.A. Woollam Company Incorporated | Regression calibrated spectroscopic rotating compensator ellipsometer system with photo array detector |
WO2000047961A1 (en) * | 1999-02-09 | 2000-08-17 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
Non-Patent Citations (5)
Title |
---|
ASPNES D E ET AL: "ROTATING-COMPENSATOR/ANALYZER FIXED-ANALYZER ELLIPSOMETER: ANALYSIS AND COMPARISON TO OTHER AUTOMATIC ELLIPSOMETERS", JOURNAL OF THE OPTICAL SOCIETY OF AMERICA,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, vol. 66, no. 9, 1 September 1976 (1976-09-01), pages 949 - 954, XP002046559 * |
AZZAM R M A: "A SIMPLE FOURIER PHOTOPOLARIMETER WITH ROTATING POLARIZER AND ANALYZER FOR MEASURING JONES AND MUELLER MATRICES", OPTICS COMMUNICATIONS, vol. 25, no. 2, 1978, pages 137 - 140, XP002148902 * |
CHEN L-Y ET AL: "DESIGN OF A SCANNING ELLIPSOMETER BY SYNCHRONOUS ROTATION OF THE POLARIZER AND ANALYZER", APPLIED OPTICS,US,OPTICAL SOCIETY OF AMERICA,WASHINGTON, vol. 33, no. 7, 1 March 1994 (1994-03-01), pages 1299 - 1305, XP000434834, ISSN: 0003-6935 * |
COLLINS R W: "AUTOMATIC ROTATING ELEMENT ELLIPSOMETERS: CALIBRATION, OPERATION, AND REAL-TIME APPLICATIONS", REVIEW OF SCIENTIFIC INSTRUMENTS,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, vol. 61, no. 8, 1 August 1990 (1990-08-01), pages 2029 - 2062, XP000149453, ISSN: 0034-6748 * |
STRAAIJER A ET AL: "THE INFLUENCE OF CELL WINDOW IMPERFECTIONS ON THE CALIBRATION AND MEASURED DATA OF TWO TYPES OF ROTATING-ANALYZER ELLIPSOMETERS", SURFACE SCIENCE, vol. 96, 1980, pages 217 - 231, XP000951601 * |
Also Published As
Publication number | Publication date |
---|---|
JP2002543381A (en) | 2002-12-17 |
JP5248722B2 (en) | 2013-07-31 |
JP2011191311A (en) | 2011-09-29 |
JP5368507B2 (en) | 2013-12-18 |
WO2000065331A9 (en) | 2002-06-13 |
WO2000065331A2 (en) | 2000-11-02 |
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