WO2000035782A3 - Distributed control system architecture and method for a material transport system - Google Patents

Distributed control system architecture and method for a material transport system Download PDF

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Publication number
WO2000035782A3
WO2000035782A3 PCT/US1999/029692 US9929692W WO0035782A3 WO 2000035782 A3 WO2000035782 A3 WO 2000035782A3 US 9929692 W US9929692 W US 9929692W WO 0035782 A3 WO0035782 A3 WO 0035782A3
Authority
WO
WIPO (PCT)
Prior art keywords
injectors
adjacent
substrate
linear
wafer
Prior art date
Application number
PCT/US1999/029692
Other languages
French (fr)
Other versions
WO2000035782A2 (en
Inventor
Brian Wehrung
Clifford Holden
Original Assignee
Asyst Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asyst Technologies filed Critical Asyst Technologies
Priority to EP99966241A priority Critical patent/EP1141439B1/en
Priority to JP2000588055A priority patent/JP3989683B2/en
Priority to CA002354624A priority patent/CA2354624A1/en
Priority to AU21834/00A priority patent/AU2183400A/en
Publication of WO2000035782A2 publication Critical patent/WO2000035782A2/en
Publication of WO2000035782A3 publication Critical patent/WO2000035782A3/en
Priority to HK02100199.7A priority patent/HK1039162A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41815—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the cooperation between machine tools, manipulators and conveyor or other workpiece supply system, workcell
    • G05B19/4182—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the cooperation between machine tools, manipulators and conveyor or other workpiece supply system, workcell manipulators and conveyor only
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/4189—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the transport system
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P80/00—Climate change mitigation technologies for sector-wide applications
    • Y02P80/10—Efficient use of energy, e.g. using compressed air or pressurized fluid as energy carrier
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Control Of Conveyors (AREA)

Abstract

There is provided a chemical vapor deposition apparatus for depositing substantially uniform films or layers onto a substrate or wafer. The apparatus includes a chamber with an injector assembly including spaced linear injectors and a chemical vapor delivery system for delivering chemicals to said injectors to form spaced adjacent deposition regions. Translation means reciprocally move said substrate or wafer a predetermiend distance in a direction perpendicular to the long axis of the linear injectors while maintaing the substrate surface parallel and adjacent to the chemical delivery surface of the linear injector assembly whereby the deposition regions of adjacent injectors merge to form a film or layer of substantially uniform thickness.
PCT/US1999/029692 1998-12-14 1999-12-14 Distributed control system architecture and method for a material transport system WO2000035782A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP99966241A EP1141439B1 (en) 1998-12-14 1999-12-14 Distributed control system architecture and method for a material transport system
JP2000588055A JP3989683B2 (en) 1998-12-14 1999-12-14 Distributed control method for goods transportation system
CA002354624A CA2354624A1 (en) 1998-12-14 1999-12-14 Distributed control system architecture and method for a material transport system
AU21834/00A AU2183400A (en) 1998-12-14 1999-12-14 Distributed control system architecture and method for a material transport system
HK02100199.7A HK1039162A1 (en) 1998-12-14 2002-01-11 Distributed control system architecture and method for a material transport system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/212,002 US6240335B1 (en) 1998-12-14 1998-12-14 Distributed control system architecture and method for a material transport system
US09/212,002 1998-12-14

Publications (2)

Publication Number Publication Date
WO2000035782A2 WO2000035782A2 (en) 2000-06-22
WO2000035782A3 true WO2000035782A3 (en) 2000-10-12

Family

ID=22789151

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/029692 WO2000035782A2 (en) 1998-12-14 1999-12-14 Distributed control system architecture and method for a material transport system

Country Status (10)

Country Link
US (2) US6240335B1 (en)
EP (1) EP1141439B1 (en)
JP (1) JP3989683B2 (en)
KR (1) KR100437926B1 (en)
CN (1) CN1247423C (en)
AU (1) AU2183400A (en)
CA (1) CA2354624A1 (en)
HK (1) HK1039162A1 (en)
TW (1) TW452564B (en)
WO (1) WO2000035782A2 (en)

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TW452564B (en) 2001-09-01
WO2000035782A2 (en) 2000-06-22
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CN1247423C (en) 2006-03-29
EP1141439B1 (en) 2012-12-26
JP2002532892A (en) 2002-10-02
US6853876B2 (en) 2005-02-08
JP3989683B2 (en) 2007-10-10
EP1141439A2 (en) 2001-10-10
US20010023377A1 (en) 2001-09-20
CA2354624A1 (en) 2000-06-22
AU2183400A (en) 2000-07-03
HK1039162A1 (en) 2002-04-12
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KR100437926B1 (en) 2004-06-30
US6240335B1 (en) 2001-05-29

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