WO2000004612A1 - High pulse rate pulse power system - Google Patents
High pulse rate pulse power system Download PDFInfo
- Publication number
- WO2000004612A1 WO2000004612A1 PCT/US1999/014312 US9914312W WO0004612A1 WO 2000004612 A1 WO2000004612 A1 WO 2000004612A1 US 9914312 W US9914312 W US 9914312W WO 0004612 A1 WO0004612 A1 WO 0004612A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pulse
- pulse power
- pulses
- capacitor
- power source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/80—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used using non-linear magnetic devices; using non-linear dielectric devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
- H03K3/57—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Definitions
- the prior art includes pulse power systems supplying very high voltage short pulses for industrial gas discharge lasers such as excimer lasers at pulse rates in the range of 1,000 Hz. These lasers need to operate reliably 24 hours per day for many weeks with only short down times for routine maintenance. There is a need for pulse power systems with increased reliability which can operate at pulse rates in the range of 2,000 Hz to 5 ,000 Hz or greater.
- a preferred embodiment of the present invention useful for providing electrical pulses for excimer lasers provides pulses of up to 5.5 Joules per pulse at pulse rates up to 2000 Hz or greater.
- a peaking capacitor is charged with up to 5.5 Joules from zero voltage to a discharge voltage in the range of 16,000 volts in about 100 ns.
- FIG. 3 is a combination block diagram, circuit diagram of a high voltage power supply which is part of the above preferred embodiment.
- FIG. 5 is a drawing of a primary winding of a pulse transformer used in the above preferred embodiment.
- FIG 9 is a circuit drawing showing a resonance power supply.
- FIGS. 10A and 10B shows the mounting of a compression lead in a preferred embodiment.
- FIG. 2 A simplified combination block and circuit diagram of this preferred embodiment is shown in FIG. 2.
- the diagrams show a preferred embodiment built and tested by the Applicants for converting 208 volt three phase standard plant alternating current into 0.5 Joule to 6 Joule, 12 kv to 22 kv electrical pulses on a peaking capacitor of the excimer laser at pulse rates in the range of 2,000 Hz or greater.
- a system description is first provided below followed by a more detailed description of some of the important details of the individual modules and components of the system.
- High Voltage Power Supply Module High voltage power supply module 20 comprises a 300 volt rectifier 22 for converting the 208 volt three phase plant power from source 10 to 300 volt DC.
- Inverter 24 converts the output of rectifier 22 to high frequency 300 volt pulses in the range 100 kHz to 200 kHz.
- the frequency and the on period of inverter 24 are controlled by the HV power supply control board 21 in order to provide course regulation of the ultimate output pulse energy of the system.
- the output of inverter 24 is stepped up to about 1200 volts in step-up transformer 26.
- the output of transformer 26 is converted to 1200 volts DC by rectifier 28 which includes a standard bridge rectifier circuit 30 and a filter capacitor 32.
- DC electrical energy from circuit 30 charges 8.1 ⁇ F Co charging capacitor 42 in commutator module 40 as directed by HV power supply control board 21 which controls the operation of inverter 24 as shown in FIG. 1.
- Set points within HV power supply control board 21 are set by laser system control board 100. The reader should note that in this embodiment as shown in FIG.
- Commutator module 40 comprises Co charging capacitor 42, which in this embodiment is a bank of capacitors connected in parallel to provide a total capacitance of 8.1 ⁇ F.
- Voltage divider 44 provides a feedback voltage signal to the HV power supply control board 21 which is used by control board 21 to limit the charging of capacitor 42 to the voltage (called the "control voltage") which when formed into an electrical pulse and compressed and amplified in commutator 40 and compression head 60 will produce the desired discharge voltage on peaking capacitor 82 and across electrodes 83 and 84.
- the charge on charging capacitor 42 is thus switched onto C, 8.5 ⁇ F capacitor 52 in about 5 ⁇ s as shown on FIG. 6B.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000560639A JP3557398B2 (en) | 1998-07-18 | 1999-06-24 | High pulse repetition rate pulsed power systems |
AU47151/99A AU4715199A (en) | 1998-07-18 | 1999-06-24 | High pulse rate pulse power system |
EP99930661A EP1101258B1 (en) | 1998-07-18 | 1999-06-24 | High pulse rate pulse power system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/118,773 US5936988A (en) | 1997-12-15 | 1998-07-18 | High pulse rate pulse power system |
US09/118,773 | 1998-07-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000004612A1 true WO2000004612A1 (en) | 2000-01-27 |
Family
ID=22380652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1999/014312 WO2000004612A1 (en) | 1998-07-18 | 1999-06-24 | High pulse rate pulse power system |
Country Status (6)
Country | Link |
---|---|
US (1) | US5936988A (en) |
EP (1) | EP1101258B1 (en) |
JP (1) | JP3557398B2 (en) |
KR (1) | KR100421273B1 (en) |
AU (1) | AU4715199A (en) |
WO (1) | WO2000004612A1 (en) |
Cited By (2)
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---|---|---|---|---|
WO2001097377A2 (en) * | 2000-06-15 | 2001-12-20 | Lambda Emi | Very high repetition rate power supply system and method |
US6839590B2 (en) | 2001-10-22 | 2005-01-04 | Medtronic Physio-Control Corp. | Average current mode controlled energy storage in a defibrillator |
Families Citing this family (89)
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US6020723A (en) | 1997-02-14 | 2000-02-01 | Lambada Physik Gmbh | Magnetic switch controlled power supply isolator and thyristor commutating circuit |
US5936988A (en) * | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US6815700B2 (en) | 1997-05-12 | 2004-11-09 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
US6744060B2 (en) | 1997-05-12 | 2004-06-01 | Cymer, Inc. | Pulse power system for extreme ultraviolet and x-ray sources |
US6566667B1 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
US6586757B2 (en) | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
US6151346A (en) * | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
WO1999031773A1 (en) * | 1997-12-15 | 1999-06-24 | Cymer, Inc. | High pulse rate pulse power system |
US6424666B1 (en) | 1999-06-23 | 2002-07-23 | Lambda Physik Ag | Line-narrowing module for high power laser |
US6381256B1 (en) | 1999-02-10 | 2002-04-30 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
US6490307B1 (en) | 1999-03-17 | 2002-12-03 | Lambda Physik Ag | Method and procedure to automatically stabilize excimer laser output parameters |
US6442181B1 (en) * | 1998-07-18 | 2002-08-27 | Cymer, Inc. | Extreme repetition rate gas discharge laser |
US6477193B2 (en) * | 1998-07-18 | 2002-11-05 | Cymer, Inc. | Extreme repetition rate gas discharge laser with improved blower motor |
US6067311A (en) * | 1998-09-04 | 2000-05-23 | Cymer, Inc. | Excimer laser with pulse multiplier |
US6389052B2 (en) | 1999-03-17 | 2002-05-14 | Lambda Physik Ag | Laser gas replenishment method |
US6546037B2 (en) | 1999-02-10 | 2003-04-08 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
US6965624B2 (en) * | 1999-03-17 | 2005-11-15 | Lambda Physik Ag | Laser gas replenishment method |
US6421365B1 (en) | 1999-11-18 | 2002-07-16 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser having an output coupling interferometer |
US6463086B1 (en) | 1999-02-10 | 2002-10-08 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
US6700915B2 (en) | 1999-03-12 | 2004-03-02 | Lambda Physik Ag | Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
US6727731B1 (en) | 1999-03-12 | 2004-04-27 | Lambda Physik Ag | Energy control for an excimer or molecular fluorine laser |
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JP6692545B2 (en) * | 2016-08-25 | 2020-05-13 | 株式会社末松電子製作所 | Pulse generator |
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US5936988A (en) * | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
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1998
- 1998-07-18 US US09/118,773 patent/US5936988A/en not_active Expired - Lifetime
-
1999
- 1999-06-24 EP EP99930661A patent/EP1101258B1/en not_active Expired - Lifetime
- 1999-06-24 AU AU47151/99A patent/AU4715199A/en not_active Abandoned
- 1999-06-24 WO PCT/US1999/014312 patent/WO2000004612A1/en active IP Right Grant
- 1999-06-24 KR KR10-2001-7000557A patent/KR100421273B1/en not_active IP Right Cessation
- 1999-06-24 JP JP2000560639A patent/JP3557398B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US5936988A (en) * | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
Non-Patent Citations (1)
Title |
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See also references of EP1101258A4 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001097377A2 (en) * | 2000-06-15 | 2001-12-20 | Lambda Emi | Very high repetition rate power supply system and method |
WO2001097377A3 (en) * | 2000-06-15 | 2002-12-27 | Lambda Emi | Very high repetition rate power supply system and method |
US6763049B1 (en) | 2000-06-15 | 2004-07-13 | Lambda Emi | Very high repetition rate power supply system and method |
US6839590B2 (en) | 2001-10-22 | 2005-01-04 | Medtronic Physio-Control Corp. | Average current mode controlled energy storage in a defibrillator |
Also Published As
Publication number | Publication date |
---|---|
EP1101258A1 (en) | 2001-05-23 |
AU4715199A (en) | 2000-02-07 |
KR100421273B1 (en) | 2004-03-09 |
KR20010071890A (en) | 2001-07-31 |
JP2002520887A (en) | 2002-07-09 |
EP1101258A4 (en) | 2002-09-18 |
EP1101258B1 (en) | 2005-05-11 |
US5936988A (en) | 1999-08-10 |
JP3557398B2 (en) | 2004-08-25 |
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