WO1998008626A1 - Method and apparatus for removal of material utilizing near-blackbody radiation - Google Patents
Method and apparatus for removal of material utilizing near-blackbody radiation Download PDFInfo
- Publication number
- WO1998008626A1 WO1998008626A1 PCT/US1997/015068 US9715068W WO9808626A1 WO 1998008626 A1 WO1998008626 A1 WO 1998008626A1 US 9715068 W US9715068 W US 9715068W WO 9808626 A1 WO9808626 A1 WO 9808626A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- matenal
- radiant energy
- radiator
- radiant
- removal
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/16—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
- B44D3/166—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning by heating, e.g. by burning
- B44D3/168—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning by heating, e.g. by burning by electrically heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/16—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/16—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
- B44D3/166—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning by heating, e.g. by burning
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3226—Units using UV-light emitting lasers
Definitions
- the present invention relates to methods and apparatus for paint-stnpping, decoating and other mate ⁇ al-removing applications and more particularly to the use of a highly efficient flashlamp or other source of high peak power, high average power, broadband, continuum output radiation for rapidly and efficiently vaponzing the material to be removed, scrubbmg the vaporized matenal and physically displacing the remaining debris
- Decoating and paint stripping are specific examples of removing preselected types and amounts of matenals from a substrate or structure
- Removal of paint from buildings, automobiles, bndges, aircraft and other structures is a very large industry throughout the world Refurbishment of paint on aircraft, for example, is a matter of routine maintenance with an average coat of paint lasting typically between about 3 and about 5 years
- removal or rust and corrosion of all types, including fouling on the undersides of maritime boats and vessels is also time-consuming, expensive and difficult
- U S Patent No 5,281,798 to Hamm et al proposes a method and system for selectively removing a matenal coating from a substrate or structure usmg a flashlamp in conjunction with a photodetector circuit for sensmg reflected light back from the surface being ablated, thereby providing a feedback signal indicative of the reflected color intensity of the surface being ablated
- the method is dependent upon a boundary between the coatings or between the coating and the substrate or structure to be distinguished by a visible color change, requires additional optical and processmg means for photodetection and signal processing
- U S Patent No 5,194,723 to Cates et al proposes another method for controlling a pulsed light matenal removal system based upon detection of "photoacoustic signature signals" generated by the ablation of surface matenal
- the complicated method requires sophisticated robotics and sensitive photoacoustic hardware for calibration which involves initial scanning of a structure along a predetermmed path, detectm
- a near-blackbody radiator means for removal of matenal method and apparatus, said near-blackbody radiator means compnsing a highly efficient flashlamp or other type high peak power, high average power, broadband, continuum output radiation for rapidly and efficiently vaponzing the material to be removed
- Another drawback of the pnor art is that no control scheme based upon required pulse duration is available for removing paint, other coatings or other matenal from a structure It is an advantage and objective of the present invention to provide a method based on a pulse duration-control scheme for controllably removing predetermined thicknesses of matenal from a structure
- the present invention is an apparatus for removal of a layer or material coating a substrate or structure utilizing radiant electromagnetic energy
- the apparatus including flashlamp-type broadband, near black-body radiator means providing radiant electromagnetic energy in a pulsed mode, the light energy having a predetermined bandwidth which includes infrared and visible electromagnetic radiation, thereby causing photoablation of the layer of material to be removed by formation of vapor/plasma, which includes volatile organic compounds, and further photodissociation of the vaporized material produced thereby, and means for displacing residual constituents of photoablation and photodissociation from the substrate or structure
- the broadband radiator delivers radiant electromagnetic energy in a pulsed mode at a rate of between about 1 and about 15 pulses per second
- the broadband radiator delivers radiant electromagnetic energy at a rate of between about 15 and about 50 kW
- the flashlamp has a gas plasma temperature of between about 9,500°K and about 20,000°K
- the flashlamp has a gas plasma temperature of between about 9,500°K and about 1 1,
- the residual constituent removing means comp ⁇ ses flowing C0 2 pellets
- the residual constituent removmg means compnses flowing liquid mtrogen
- the residual constituent removing means compnse flowing liquid C0 2 , flowing liquid water, flow g crystalline water particles or snow, flowing compressed air or other compressed gases or liquids
- a preferred embodiment further compnses a scrubber means for removmg volatile organic compounds from the ablated and photodissociated matenal
- a preferred embodiment further comprises a filtration means for removing particulate
- the broadband radiator and the ultraviolet radiator means arc contained within a lamp head assembly, the lamp head assembly directing radiant electromagnetic energy onto the coating matenal to be removed, the lamp head assembly also directing ultraviolet radiation into the vapor/plasma to cause photodissociation of the matenal being removed, the lamp head assembly further comprismg vacuum means for displacing residual constituents of ablated and photodissociated material from the substrate or structure
- the vacuum means may also serve to capture and contain the flowm
- a method for removal of material from a substrate or structure utilizing radiant electromagnetic energy compnses the following steps (A) providing a flashlamp-type near blackbody radiator means to generate radiant electromagnetic energy with a predetermined radiation bandwidth including infrared and visible electromagnetic radiation. (B) delivenng predetermined amounts of both radiant electromagnetic energy and ultraviolet radiation to die at least one layer of matenal to be removed thereby causing ablation and photodissociation of the matenal to be removed, and (C) removmg the residual constituents of ablated and photodissociated matenal from the substrate or structure
- Another preferred method of the present mvention is based on a pulse duration-control scheme for controllably removing predetermmed thicknesses of matenal from a structure
- FIG 1 A is a radiation profile showing p ⁇ or art-radiator means spectral response curves corresponding to two selected plasma temperatures
- FIG IB is a radiation profile showing near-blackbody radiator means spectral response curves corresponding to three selected plasma temperatures
- FIG 2 is a representative perspective view of a preferred embodiment of the near- blackbody radiator means decoating system of the present mvention
- FIG 3 is a representative schematic view of a preferred embodiment of the lamp head assembly of the present mvention
- FIG 4 is a representative schematic view of a preferred embodiment of the lamp head assembly of the present invention
- FIGS 5-7 are representative cross section front, top and side views, respectively, of a preferred embodiment of the near black-body radiation means lamp head assembly of the present mvention
- FIG 8 is a flowchart of a preferred embodiment of the method of the present mvention
- FIG 9 is a typical timing diagram of a preferred method of decoatmg of the present invention DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT Near-Blackbody Radiator Means
- a near-blackbod ⁇ radiator means comprises a high peak power, high average power Xenon-gas filled flashlamp Such a radiator means is capable of delivenng up to 12 MW of peak power with average power up to 50 KW
- Xenon-gas plasma temperature can range between about 9,500°K and about 1 1,400 °K, or between about 9,500°K and about 20.000 °K
- the diameter of the plasma is kept relatively small so that conversion efficiencies, particularl ⁇ in the shorter wavelengths, are maximized
- blackbody denotes an ideal bodv which would, if it existed, absorb all and reflect none of the radiation falling upon it, its reflectivity would be zero and its absorptivity would be 100%
- Such a body would, when illuminated, appear perfectly black, and would be invisible except its outline might be revealed by the obscunng of objects beyond
- the chief interest attached to such a body lies in the character of the radiation emitted by it when heated and the laws which govern the relations of the flux density and the spectral energy distribution of that radiation with varying temperature
- E h ⁇ in which E is the value of the quantum m units of energy and v is the frequency of the radiation
- the constant of proportionality, h, is the elementary quantum of action, or Planck's constant
- Planck's radiation formula where E-d ⁇ is the intensity of radiation in the wavelength band between ⁇ and ( ⁇ + d ⁇ ), h is Planck ' s constant, c is the velocity of light, k is the Boltzmann constant and T is the absolute temperature
- E-d ⁇ is the intensity of radiation in the wavelength band between ⁇ and ( ⁇ + d ⁇ )
- h Planck ' s constant
- c is the velocity of light
- k is the Boltzmann constant
- T is the absolute temperature
- This formula describes the spectral distribution of the radiation from a complete radiator or blackbody
- This equation can be wntten in other forms, such as in terms of wavenumber instead of wavelength It may also be wntten in terms of wavenumber instead of wavelength intensity
- FIG 1 A is a radiation profile showing p ⁇ or art-radiator means spectral response curves corresponding to two selected plasma temperatures
- FIG IB is a radiation profile showing near-blackbody radiator means spectral response curves corresponding to three selected plasma temperatures It will be shown that the plasma temperatures are determined by pulse duration By specifying only the pulse duration, the spectral response and radiative intensities can be controlled Input energy' to the lamp can also be controlled By selectmg appropnate pulse duration and input energy, a selective decoating burst of energy can be attained for virtually any type of coating and substrate or structure
- the flashlamp-type near-blackbody radiator means of the present invention is designed to handle pulse durations m the range of about 250 ⁇ s to about 2000 ⁇ s
- the flashlamp is designed to withstand these pulse durations over a long life and providing pulse to pulse reliability
- the type of substrate or structure present will dictate the length of pulse most efficient and efficacious
- the area bound by the blackbody curves denotes the total blackbody lrradiance as a function of temperature, or R(7)
- the curves represent the followmg near-blackbody radiator plasma temperatures for the present invention
- total blackbody irradiance, R(7), is (1 189) 4 or about 2 times greater than the irradiance generated at 7e
- PPN pulse forming network
- ⁇ is the Stefan-Boltzman constant equivalent to 5 67 x 10 u watt/cm K 4
- FIG 2 is a representative perspective view of a preferred embodiment of the near- blackbody radiator means decoating system of the present invention
- the decoatmg system 100 is powered by power supply 102
- the power supply comprises an approximately 15 to 50 kilowatt charging supply , pulse forming network means, controller means, and electronics cooling system, all contained within a cabinet
- a power cable 104 leads to distribution box
- a source of residual constituents removal means 108 is connected to distribution box 106 via hose 110 It will be understood that such residual constituent removal means 108 includes, but is not limited to, flowing pelletized or liquid CO flowing liquid water, flowmg crystalline water particles or snow, flowmg compressed nitrogen, air or other compressed gases or liquids Additionally, other particles including plastic pellets, sand, or other conventionally used particles may be u sed Vacuum source/HEPA filter and VOC scrubber means 112 is connected to distnbution box 106 with vacuum hose 114 An integrated, central umbilical cable 116 leads from distribution box 106 to mounted or hand-held lamp head assembly 118
- FIG 3 is a representative schematic view of a preferred embodiment of the lamp head assembly 118 of the present invention
- Near-blackbody radiator means 200 such as an adapted flashlamp is the source of noncoherent, broadband light used to vaporize the coatmg matenal bemg removed
- the radiator means is controlled by flashlamp driver 202
- the radiator means produces radiation beams 204 which are directed onto the surface of the coatmg bemg removed
- a preferred embodiment of the radiator means compnses a flashlamp with
- jets 214 blast the residual constituents removal means mate ⁇ als 108, such as compressed air, gases, liquids, etc onto the work surface as well as onto the quart plate in the directions shown by arrows A to remove the layer of fine ash produced by the device
- a light buffing wheel 216 removes any remaining ash or soot or other debris created by the vapo ⁇ zed removed material which all eventually is sucked up m the direction shown by arrow B and removed completely through vacuum nozzle 218 which is supplied by vacuum source 112
- the coating of material to be removed 220 is vaponzed as the device is translated over the surface of the coatmg to be removed m the direction shown by arrow C leaving behind zero, one or more intermediate layers 222 which coat substrate or structure 224
- the device can be used to dccoat substrate or structures having one or more layers of coating matenal, one of more of these coatmg layers to be removed by the process, as desired
- FIG 4 is a representative schematic view of a preferred embodiment of the lamp head assembly 300 of the present invention
- a plurality of linear mercury vapor ultraviolet (UV) lamps 302 are placed at the bottom of the mam reflector cavity 304 so as to irradiate the vapor/plasma plume with UV radiation 306 continuously
- UV mercury vapor ultraviolet
- This adaptation will aid in the photochemical destruction of the large organic molecule vapors, plasma or particulate disrupted by the major high energy flux of flashlamp type or other broadband radiator 200
- An adapted quart plate 308 or other protective system is useful
- the hand-held lamp head assembly has one or more handles
- the lamp head assembly has two ergonomically designed handles, each with a lamp firing tngger Two t ⁇ ggers are used to msure that the system cannot fire accidentally if one tngger should be accidentally depressed
- On one or more handles or elsewhere on the assembly is a set of thumb or otherwise activated controls
- a preferred embodiment compnses a small annunciator panel located in the
- the followmg control can be provided by a number of different means, as desenbed above, including thumb switches
- Residual constituent matenal removal means flow - mterlock overnde control This switch, while depressed or otherwise activated, initiates flow of C0 2 pellets, compressed gases, liquids or other residual constituent matenals removal means regardless of the interlock state
- Vacuum control - ON/OFF With a default setting Off, the control is provided for convenience Typically, once the vacuum is turned OFF, then the flashlamp and constituent matenal removal means flow is disabled In use lamp shutters for the mercury UV lamps are closed 4 Mercury UV lamp ON/OFF Default setting is ON
- Lamp head assembly dwell - interlock override This feature enable the lamp head assembly to dwell over a certain surface area, while fully activated, when depressed or otherwise manually asserted
- the front of a preferred embodiment of the lamp head assembly has the vacuum nozzle and debns brush mounted directly to it In this configuration the lamp head assembly is designed to be drawn towards the operator rather than away
- the C0 2 pellets, compressed gases, liquids or other residual constituent matenals removal means 108 are directed at an angle towards the quartz plates while other nozzles are directed at the substrate or structure
- the C0 2 pellets, compressed gases, liquids or other residual constituent materials removal means 108 are applied in a senes of pulses in-between the flashlamp pulses This is to allow all wavelengths to reach the work surface with minimum attenuation
- the angle at which the quartz plates are placed relative to the incident light from the near flashlamp-type black-body radiation means must be considered in light of the wavelengths of light being generated and the mdex of refractivity of the plate itself
- the C0 2 pellets, compressed gases, liquids or other residual constituent matenals removal means 108 would otherwise pose no significant attenuation of the short UV wavelengths, they must be directed at the quartz plate m a predetermmed angle in order to prevent the build up of soot or other debns which would itself cause significant attenuation of all wavelengths generated m the process
- FIGS 5-7 are representative cross section front, top and side views, respectively, of a preferred embodiment of the near black-body radiation means lamp head assembly 400 of the present mvention
- the lamp tube 402 of the assembly sits mside the reflector cavity 404
- the lamp tube 402 is disposed within flow tube 406 Cooling water is circulated through the flow tube, entering the assembly through put ports 408 and exiting through output port 410.
- Anode lead 412 and cathode lead 414 extend from either end of the lamp tube and are directed around the assembly to the rear 416 of the assembly to avoid interference with operations at the front 418 of the assembly during operation
- Lamp tngger 420 can be placed as shown or elsewhere Nitrogen gas is pumped mto the reflector cavity 404 through input port 422 and is allowed to escape through output port 424
- Safety interlocks are provides to ensure that the vacuum and scrubber system is activated if the flashlamp and/or mercury vapor UV lamps are runmng so that dangerous levels of ozone or other contaminants do ⁇ not build up in the work area .An mterlock is provided to ensure that there are no ground faults present in the lamp head assembly or anywhere else Also, there is a monitormg system to reduce the applied energy or to stop the flashlamp entirely if the dwell time on a particular spot exceeds some preset reference value This system will protect the substrate or structure from overheat g. from cold stress or mechanical damage from excessive bombardment by C0 2 pellets, compressed gases, liquids or other residual constituent materials removal means 108 In one embodiment, the system measures the movement of the lamp head assembly from sensors in the tracks that the lamp head assembly glides on
- FIG 8 is a flowchart of a preferred embodiment of the method of the present mvention Du ⁇ ng the first step, sub-system parameters are input into the control means and the various sub-systems are initialized These individual sub-systems include the lamp d ⁇ vers, the C0 2 pellets, compressed gases, liquids or other residual constituent mate ⁇ als removal means 108 delivery system, the vacuum system, the VOC scrubber and dissociation system, ground fault interlocks and other system interlocks, as desenbed above and as will be expanded by those skilled in the art Subsequent to initialization, the system is ready for operation Control means ensure that both fi ⁇ ng buttons are depressed manually and simultaneously to ensure intentional operation Failure to depress both fi ⁇ ng buttons will allow the system to remain idle in a state according to default parameters
- the residual constituent vacuum and effluent gas scrubber and filtration systems are enabled If so equipped, the UV lamp shutters are opened Thereafter, the near black-body radiator flashlamp will fire at the selected power at a preset, predetermmed pulse rate for a predetermmed amount of time Following the fi ⁇ ng of the flashlamp, the subsystem controlling the C0 2 pellets, compressed gases, liquids or other residual constituent mate ⁇ als removal means will be enabled
- a timing circuit After allowing the lamp head assembly to dwell in a certain position for a predetermmed reference limit amount of time, a timing circuit disables the power supply to the flashlamp In one mode, the timing circuit disables the flashlamp d ⁇ vers after a preset reference limit In another mode, the timing circuit ensure contmuous motion at a predetermmed rate, thus controlling the power flux rate After the flashlamp d ⁇ vers are disabled, the C0 2 pellets, compressed gases, liquids or other residual constituent matenals removal means is also disabled A second timing circuit determines whether the lamp head has moved sufficiently to satisfy a minimum dwell threshold If not, the flashlamp and C0 2 pellets, compressed gases, liquids or other residual constituent mate ⁇ als removal means systems arc maintained m a disabled sate If so, the flashlamp and matenal removal systems are enabled agam and the first timing circuit is activated to determine lamp head dwelling in the position for the preset reference limit
- the radiator means delivers a pulse having a predetermmed duration, power rating and frequency spectrum
- a thin layer of the coating material or other matenal to be removed is vaporized or ablated by the radiation
- This thin layer is typically on the order of between about 3 and about 4 mils (thousandths of an inch) Radiant energy in the approximately 400 nm to approximately 10 ⁇ m wavelength range is used to vapo ⁇ ze the upper layer of material to be removed, and is therefore referred to as the vaporization bandwidth (VBW) energy
- VBW vaporization bandwidth
- a resultant vapor/plasma intermediate is produced In many cases this resultant intermediate will be opaque to VBW energy In such cases, further irradiation with VBW energy, as with subsequent pulses, will lead to an increase in the temperature of the vapor/plasma Care must be taken so as not to increase the temperature of this vapor/plasma excessively such that thermal energy in the form of heat is transfened to the substrate or structure or lower, non-removed layers
- the vapo ⁇ zation process is different for different coatings and substrate or structures
- temporal manipulations and in some cases manipulation of the mput energy levels mto the radiator means or flashlamp are usually all that need to
- FIG 9 is a typical timing diagram of a preferred method of decoating of the present invention
- Tl is the pulse duration of the flashlamp Typically, this pulse ranges from between about 300 ⁇ sec to about 600 ⁇ sec, depending on the surface to be decoated T2 represents the relative time that the C0 pellets, compressed gases, liquids or other residual constituent mate ⁇ als removal means are applied to the surface
- initiation of delivery of such removal means is delayed until just after or simultaneous with the termination of a lamp pulse Delivery of C0 2 pellets, compressed gases, liquids or other residual constituent materials removal means is sustained until just before the start of the next flashlamp pulse
- the interval T3 must be long enough to allow the vacuum system to evacuate the C0 2 pellets, compressed gases, liquids or other residual constituent matenals removal means from the surface to be ablated T3 is typically between about 10 milliseconds and about 200 milliseconds
- the pulse repetition or cyclmg rate T4 ranges from about 4 to about 15 pulses per second, or about 250 to about 66
- Phase II VOC Scrubbing In Phase II of a prefe ⁇ ed embodiment of the present mvention, further if not complete combustion of the volatile organic compounds (VOCs) is achieved by bombardment of the vapor/plasma layer with ultra-violet (UV) portions of lnadiation spectrum These portions are referred to as the scrubber bandwidth (SBW) which covers a range of between about 180 and about 390 nm
- SBW scrubber bandwidth
- the vapor/plasma layer which is otherwise partially opaque to VBW energy will be exposed to a high energy flux of UV light
- This vapor/plasma layer is at least partially transparent to UV light which will cause photodissociation of any organic compounds, mcludmg VOCs
- catalytic action on suspended metals such as Ti, Pb, Cr and their vanous oxides, etc will aid m the complete combustion of these compounds
- an auxiliary UV radiation means w simplify an otherwise more complicated radiation pulse/dissociation cycle protocol
- one or more linear mercury vapor UV lamps are placed at the bottom of the mam reflector cavity so as to irradiate the vapor/plasma plume continuously
- This adaptation aids m the photochemical destruction of the large organic compounds liberated dunng the ablative process
- the UV lamps are designed to produce discrete atomic line UV radiation
- the pnnciple bandwidth ranges from between about 150 nm to about 500 nm, which enhances the photodissociation of organic molecules released by ablation
- One mechanism of this photodissociation is based on catalytic reaction with the metallic substrate or structure, e.g solid-phase aluminum, or with suspended metallic and metallic oxide particulatc containing coating matenals when present
- These lamps also produce a great amount of ozone gas This gas production also aids in oxidation and other forms of degradation of organic molecules
- Phase II a layer which comprises a fine ash, soot or other essentially inert, inorganic and/or metallic debris is formed
- This fine ash or other form of residual constituents must be removed from the work surface as well as from the outer surface of the quartz plate This is achieved by blasting both surfaces with C0 2 pellets, compressed gases, liquids or other residual constituent mate ⁇ als removal means
- Individually oriented jets blast the quartz plate and the work surface and a buffing wheel followmg the blasting will effectively remove all significant amounts of this ash or other debns
- the debns can conveniently be displaced through capture by a vacuum system, the vacuum nozzle placed at the rear of the apparatus
- the debris or other effluents can then easily be sent through a stra er, filter, micro-filtration system and/or through an activated carbon scrubbing matrix, to trap the waste for disposal or reclamation
- the vacuum system in combination with the phase transition of the liquid or solid C0 2 or other matenal from solid to gas will safely remove the ozone gas from the work area
- UV lamps are efficient ozone producers Ozone, along with any contaminants and the other constituents of the ablated vapor/plasma plume, is then scrubbed by catalytic or other chemical methods m the high efficiency particulate arresting (HEPA) filter/vacuum system
- HEPA high efficiency particulate arresting
- the vacuum/plasma fume scrubber is interlocked with the lamp drivers This interlock system will prevent fi ⁇ ng of the flashlamp circuit without adequate vacuum operation and can be tied to electronics of the two systems, auxiliary sensors to monitor vacuum operation, or manually or otherwise
- Pulse Duration-Control Therefore, if the co ⁇ ect operating parameters of the flashlamp are selected, pulse duration can be used for independent control of the device
- a thin layer of unionized gas on the order of a few molecules thick exists between the un-affected structure and the "floor" of the hot gas/plasma layer (q v , vapor layer) This layer acts as an insulator on the surface of the structure, and the surface is actually somewhat "cooled” Additional cooling may be used, but in prefe ⁇ ed methods of the present invention, residual material is removed without heat generation in the structure itself Additional complications due to excessive cryogenic cooling of the structure can be avoided by interlocking cooling and radiant power agamst excessive dwell tune
- the novelty of the approach of the present mvention is based upon the use of pulse duration as the mdependent control of ablation depth
- independently controllmg pulse duration given a set of parameters including power and energy, etc , can be used to control ablation depth
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002263867A CA2263867A1 (en) | 1996-08-28 | 1997-08-27 | Method and apparatus for removal of material utilizing near-blackbody radiation |
AU42369/97A AU720629B2 (en) | 1996-08-28 | 1997-08-27 | Method and apparatus for removal of material utilizing near-blackbody radiation |
EP97940635A EP0923418A4 (en) | 1996-08-28 | 1997-08-27 | Method and apparatus for removal of material utilizing near-blackbody radiator means |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/703,977 US5789755A (en) | 1996-08-28 | 1996-08-28 | Method and apparatus for removal of material utilizing near-blackbody radiator means |
US08/703,977 | 1996-08-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1998008626A1 true WO1998008626A1 (en) | 1998-03-05 |
WO1998008626A9 WO1998008626A9 (en) | 1998-07-23 |
Family
ID=24827569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1997/015068 WO1998008626A1 (en) | 1996-08-28 | 1997-08-27 | Method and apparatus for removal of material utilizing near-blackbody radiation |
Country Status (5)
Country | Link |
---|---|
US (2) | US5789755A (en) |
EP (1) | EP0923418A4 (en) |
AU (1) | AU720629B2 (en) |
CA (1) | CA2263867A1 (en) |
WO (1) | WO1998008626A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001056760A1 (en) * | 2000-02-01 | 2001-08-09 | Messer Griesheim Gmbh | Method for recycling wood with a plastic coating |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7025831B1 (en) | 1995-12-21 | 2006-04-11 | Fsi International, Inc. | Apparatus for surface conditioning |
US5789755A (en) * | 1996-08-28 | 1998-08-04 | New Star Lasers, Inc. | Method and apparatus for removal of material utilizing near-blackbody radiator means |
JP2944569B2 (en) * | 1997-05-16 | 1999-09-06 | 九州日本電気株式会社 | Cleaning method for resin mold |
US6165273A (en) * | 1997-10-21 | 2000-12-26 | Fsi International Inc. | Equipment for UV wafer heating and photochemistry |
US6465374B1 (en) | 1997-10-21 | 2002-10-15 | Fsi International, Inc. | Method of surface preparation |
US6117335A (en) * | 1998-02-23 | 2000-09-12 | New Star Lasers, Inc. | Decontamination of water by photolytic oxidation/reduction utilizing near blackbody radiation |
US6751516B1 (en) * | 2000-08-10 | 2004-06-15 | Richardson Technologies, Inc. | Method and system for direct writing, editing and transmitting a three dimensional part and imaging systems therefor |
DE20020547U1 (en) * | 2000-09-29 | 2001-06-13 | Advanced Photonics Tech Ag | Device for producing a product free of surface contaminants |
TWI251506B (en) * | 2000-11-01 | 2006-03-21 | Shinetsu Eng Co Ltd | Excimer UV photo reactor |
US6761826B2 (en) | 2001-11-30 | 2004-07-13 | New Star Lasers, Inc. | Pulsed blackbody radiation flux enhancement |
FR2834244B1 (en) * | 2001-12-27 | 2005-02-25 | Maurice Bret | VERTICAL MILLING APPARATUS FOR LEAD PAINTS |
US7611629B2 (en) * | 2002-07-11 | 2009-11-03 | Pall Corporation | UV treated membranes |
GB2390972B (en) * | 2002-07-20 | 2006-04-05 | Carglass Luxembourg Sarl Zug | Method and apparatus for removing target material from a substrate |
DE50206486D1 (en) * | 2002-10-18 | 2006-05-24 | Plasma Treat Gmbh | Method and apparatus for removing a polymer-based paint layer |
US20040092913A1 (en) * | 2002-10-31 | 2004-05-13 | Hennings David R. | Endovenous closure of varicose veins with mid infrared laser |
US7921854B2 (en) * | 2002-10-31 | 2011-04-12 | Cooltouch Incorporated | Endovenous laser treatment for varicose veins |
US7147654B2 (en) * | 2003-01-24 | 2006-12-12 | Laserscope | Treatment Site Cooling System of Skin Disorders |
US8409183B2 (en) | 2003-10-30 | 2013-04-02 | Cooltouch Incorporated | Endovenous laser treatment generating reduced blood coagulation |
US20080021527A1 (en) * | 2003-10-30 | 2008-01-24 | Cooltouch Incorporated | Endovenous laser treatment generating reduced blood coagulation |
KR100963814B1 (en) * | 2005-10-07 | 2010-06-16 | 주식회사 코미코 | Method of removing particles on an object, apparatus for performing the removing method, method of measuring particles on an object and apparatus for performing the measuring method |
KR100933431B1 (en) * | 2005-07-26 | 2009-12-23 | 주식회사 코미코 | Particle removal method and apparatus, and particle measurement method and apparatus comprising the same |
US7654010B2 (en) * | 2006-02-23 | 2010-02-02 | Tokyo Electron Limited | Substrate processing system, substrate processing method, and storage medium |
US8448644B2 (en) | 2006-11-02 | 2013-05-28 | Cooltouch Incorporated | Sonic endovenous catheter |
ITMI20070985A1 (en) * | 2007-05-16 | 2008-11-17 | Adige Sala Spa | PROCEDURE AND DEVICE FOR CLEANING THE OUTSIDE CIRCUMFERENTIAL SURFACE OF WELDED METAL TUBES |
KR100884253B1 (en) | 2007-07-04 | 2009-02-17 | 주식회사 아이엠티 | Dry cleaning system and method |
US8357150B2 (en) | 2009-07-20 | 2013-01-22 | Syneron Medical Ltd. | Method and apparatus for fractional skin treatment |
US8604379B2 (en) * | 2009-02-08 | 2013-12-10 | Ap Solutions, Inc. | Plasma source with integral blade and method for removing materials from substrates |
DE102009001114A1 (en) * | 2009-02-24 | 2010-08-26 | Henkel Ag & Co. Kgaa | Gentle discoloration of paint dirt on hard and / or soft surfaces |
DE102009058962B4 (en) | 2009-11-03 | 2012-12-27 | Suss Microtec Photomask Equipment Gmbh & Co. Kg | Method and device for treating substrates |
US10112257B1 (en) * | 2010-07-09 | 2018-10-30 | General Lasertronics Corporation | Coating ablating apparatus with coating removal detection |
US9895771B2 (en) | 2012-02-28 | 2018-02-20 | General Lasertronics Corporation | Laser ablation for the environmentally beneficial removal of surface coatings |
US20170028358A1 (en) | 2015-07-31 | 2017-02-02 | Pall Corporation | Hydrophilizing ptfe membranes |
DE102015011229B4 (en) * | 2015-08-27 | 2020-07-23 | Süss Microtec Photomask Equipment Gmbh & Co. Kg | Device for applying a liquid medium exposed to UV radiation to a substrate |
US11235359B2 (en) * | 2019-02-11 | 2022-02-01 | The Boeing Company | Robotic laser and vacuum cleaning for environmental gains |
US11504996B2 (en) * | 2019-03-29 | 2022-11-22 | Nallen Holdings, Llc | Paint removal unit |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
US4867796A (en) * | 1982-04-05 | 1989-09-19 | Maxwell Laboratories, Inc. | Photodecontamination of surfaces |
US5099557A (en) * | 1988-07-08 | 1992-03-31 | Engelsberg Audrey C | Removal of surface contaminants by irradiation from a high-energy source |
US5194723A (en) * | 1991-12-24 | 1993-03-16 | Maxwell Laboratories, Inc. | Photoacoustic control of a pulsed light material removal process |
US5204517A (en) * | 1991-12-24 | 1993-04-20 | Maxwell Laboratories, Inc. | Method and system for control of a material removal process using spectral emission discrimination |
US5281798A (en) * | 1991-12-24 | 1994-01-25 | Maxwell Laboratories, Inc. | Method and system for selective removal of material coating from a substrate using a flashlamp |
US5328517A (en) * | 1991-12-24 | 1994-07-12 | Mcdonnell Douglas Corporation | Method and system for removing a coating from a substrate using radiant energy and a particle stream |
US5571335A (en) * | 1991-12-12 | 1996-11-05 | Cold Jet, Inc. | Method for removal of surface coatings |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD242760A1 (en) * | 1985-11-19 | 1987-02-11 | Akad Wissenschaften Ddr | METHOD FOR TESTING THE PURITY OF SUBSTRATE SURFACES AND CLEANING THE SAME |
US5613509A (en) * | 1991-12-24 | 1997-03-25 | Maxwell Laboratories, Inc. | Method and apparatus for removing contaminants and coatings from a substrate using pulsed radiant energy and liquid carbon dioxide |
US5656096A (en) * | 1993-05-25 | 1997-08-12 | Polygon Industries, Inc. | Method for photopyrolitically removing a contaminant |
US5789755A (en) * | 1996-08-28 | 1998-08-04 | New Star Lasers, Inc. | Method and apparatus for removal of material utilizing near-blackbody radiator means |
-
1996
- 1996-08-28 US US08/703,977 patent/US5789755A/en not_active Expired - Fee Related
-
1997
- 1997-08-21 US US08/915,814 patent/US6028316A/en not_active Expired - Fee Related
- 1997-08-27 AU AU42369/97A patent/AU720629B2/en not_active Ceased
- 1997-08-27 EP EP97940635A patent/EP0923418A4/en not_active Withdrawn
- 1997-08-27 WO PCT/US1997/015068 patent/WO1998008626A1/en not_active Application Discontinuation
- 1997-08-27 CA CA002263867A patent/CA2263867A1/en not_active Abandoned
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4867796A (en) * | 1982-04-05 | 1989-09-19 | Maxwell Laboratories, Inc. | Photodecontamination of surfaces |
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
US5099557A (en) * | 1988-07-08 | 1992-03-31 | Engelsberg Audrey C | Removal of surface contaminants by irradiation from a high-energy source |
US5571335A (en) * | 1991-12-12 | 1996-11-05 | Cold Jet, Inc. | Method for removal of surface coatings |
US5194723A (en) * | 1991-12-24 | 1993-03-16 | Maxwell Laboratories, Inc. | Photoacoustic control of a pulsed light material removal process |
US5204517A (en) * | 1991-12-24 | 1993-04-20 | Maxwell Laboratories, Inc. | Method and system for control of a material removal process using spectral emission discrimination |
US5281798A (en) * | 1991-12-24 | 1994-01-25 | Maxwell Laboratories, Inc. | Method and system for selective removal of material coating from a substrate using a flashlamp |
US5328517A (en) * | 1991-12-24 | 1994-07-12 | Mcdonnell Douglas Corporation | Method and system for removing a coating from a substrate using radiant energy and a particle stream |
Non-Patent Citations (1)
Title |
---|
See also references of EP0923418A4 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001056760A1 (en) * | 2000-02-01 | 2001-08-09 | Messer Griesheim Gmbh | Method for recycling wood with a plastic coating |
Also Published As
Publication number | Publication date |
---|---|
EP0923418A4 (en) | 2001-08-08 |
US5789755A (en) | 1998-08-04 |
EP0923418A1 (en) | 1999-06-23 |
CA2263867A1 (en) | 1998-03-05 |
AU4236997A (en) | 1998-03-19 |
AU720629B2 (en) | 2000-06-08 |
US6028316A (en) | 2000-02-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU720629B2 (en) | Method and apparatus for removal of material utilizing near-blackbody radiation | |
WO1998008626A9 (en) | Method and apparatus for removal of material utilizing near-blackbody radiation | |
US5656096A (en) | Method for photopyrolitically removing a contaminant | |
US20180161936A1 (en) | Laser ablation for the environmentally beneficial removal of surface coatings | |
US5782253A (en) | System for removing a coating from a substrate | |
US5613509A (en) | Method and apparatus for removing contaminants and coatings from a substrate using pulsed radiant energy and liquid carbon dioxide | |
US5571335A (en) | Method for removal of surface coatings | |
CA2188602C (en) | Laser peening process and apparatus | |
US5328517A (en) | Method and system for removing a coating from a substrate using radiant energy and a particle stream | |
US6693255B2 (en) | Laser ablation cleaning | |
US7451941B2 (en) | Dense fluid spray cleaning process and apparatus | |
US6195505B1 (en) | Method and apparatus for photopyrolitically removing a contaminant | |
US5970993A (en) | Pulsed plasma jet paint removal | |
JPH10502166A (en) | Pollution removal method | |
JP2007181830A (en) | Process and apparatus for cleaning or decontaminating object by ultraviolet laser beam | |
GB2061164A (en) | Method of and apparatus for removing rust | |
US20010004480A1 (en) | Laser-supported process for cleaning a surface | |
US5482561A (en) | Method for removing organic deposits from sand particles with laser beam | |
Litchfield et al. | Surface cleaning technologies for the removal of crosslinked epoxide resin | |
JP2615362B2 (en) | Method and apparatus for removing surface deposits by laser | |
Hontzopoulos et al. | Excimer laser in art restoration | |
WO2001074538A1 (en) | Dense fluid spray cleaning process and apparatus | |
US6277202B1 (en) | Method and apparatus for utilizing a laser-guided gas-embedded pinchlamp device | |
Bender | Self-contained decoating method utilizing a high-peak-power flashlamp | |
Schmidt et al. | Removal of chlorinated rubber coatings from concrete surfaces using a 120-W high power diode laser |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AM AT AU BB BG BR BY CA CH CN CZ DE DK EE ES FI GB GE HU JP KE KG KP KR KZ LK LR LT LU LV MD MG MN MW MX NO NZ PL PT RO RU SD SE SI SK TJ TT UA UZ VN |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH KE LS MW SD SZ UG ZW AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN ML MR NE SN TD TG |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
COP | Corrected version of pamphlet |
Free format text: PAGE 1, DESCRIPTION, REPLACED BY A NEW PAGE 1; PAGES 1/10-10/10, DRAWINGS, REPLACED BY NEW PAGES 1/10-10/10; DUE TO LATE TRANSMITTAL BY THE RECEIVING OFFICE (WITH AN UPDATED VERSION OF THE PAMPHLET FRONT PAGE) |
|
ENP | Entry into the national phase |
Ref document number: 2263867 Country of ref document: CA Ref country code: CA Ref document number: 2263867 Kind code of ref document: A Format of ref document f/p: F |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1997940635 Country of ref document: EP |
|
NENP | Non-entry into the national phase |
Ref country code: JP Ref document number: 1998511876 Format of ref document f/p: F |
|
WWP | Wipo information: published in national office |
Ref document number: 1997940635 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 1997940635 Country of ref document: EP |