WO1991014575A1 - Liquid injection recording head - Google Patents
Liquid injection recording head Download PDFInfo
- Publication number
- WO1991014575A1 WO1991014575A1 PCT/JP1991/000400 JP9100400W WO9114575A1 WO 1991014575 A1 WO1991014575 A1 WO 1991014575A1 JP 9100400 W JP9100400 W JP 9100400W WO 9114575 A1 WO9114575 A1 WO 9114575A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- jet recording
- recording head
- liquid
- liquid jet
- ion exchanger
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 196
- 238000002347 injection Methods 0.000 title claims abstract description 5
- 239000007924 injection Substances 0.000 title claims abstract description 5
- 239000010410 layer Substances 0.000 claims abstract description 88
- 239000011241 protective layer Substances 0.000 claims abstract description 61
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 238000007599 discharging Methods 0.000 claims abstract description 9
- 150000002500 ions Chemical class 0.000 claims description 49
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- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- 229910001415 sodium ion Inorganic materials 0.000 claims description 3
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 claims description 2
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- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229920002160 Celluloid Polymers 0.000 description 1
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
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- KEUKAQNPUBYCIC-UHFFFAOYSA-N ethaneperoxoic acid;hydrogen peroxide Chemical compound OO.CC(=O)OO KEUKAQNPUBYCIC-UHFFFAOYSA-N 0.000 description 1
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- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
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- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
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- AEHPWNBGTHHUOI-UHFFFAOYSA-N pyrimido[4,5-a]phenanthridine Chemical compound N1=CN=CC2=CC=C3C(=C12)C=1C=CC=CC=1C=N3 AEHPWNBGTHHUOI-UHFFFAOYSA-N 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
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- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052727 yttrium Inorganic materials 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
Definitions
- the present invention relates to a liquid jet recording head for discharging a recording liquid and recording an image such as a character using the discharged liquid.
- the present invention also relates to a liquid jet recording head substrate used for forming the above-mentioned head. Further, the present invention relates to a liquid jet recording apparatus having the head.
- Liquid jet recording method (hereinafter also referred to as âink-jet recording methodâ): Various methods have been proposed in the past. Among such proposals, for example, the liquid jet recording method described in U.S. Pat. No. 4,723,129 or U.S. Pat. Recently, it has attracted attention as a representative. In short, in this method, a recording liquid (hereinafter, also referred to as âinkâ) is discharged using thermal energy, and recording is performed using the discharged liquid.
- a recording liquid hereinafter, also referred to as âinkâ
- Such a liquid jet recording method enables high-density, high-precision recording and high-quality recording at a high speed, and also compares the compactness of a head device. It has the advantage of being easily achieved.
- FIGS. 1 (a) and 1 (b) show an example of a liquid jet recording head substrate used for forming such a liquid jet recording head.
- FIG. 1 (a) is a schematic plan view of a main part of an example of a substrate for a liquid jet recording head (partly shown in perspective for the sake of explanation), and FIG. FIG. 1 (a) is a schematic cross-sectional view of FIG. 1 (a) cut along a portion indicated by a one-point line XY.
- the substrate for liquid jet recording head 101 has a lower layer 106, a heating resistor layer 107, a pair on a support 105. Electrode layer 103, 104, the first upper protective layer 108, the second upper protective layer 109, and the third upper protective layer 110 are sequentially laminated. I have. The portion of the heating resistance layer 107 between the electrodes 103 and 104 serves as a heat generating part 111. For more information about each of these components,
- the material used to form the upper protective layer of such a liquid jet recording substrate 101 is suitable for the required properties such as heat resistance, liquid resistance, ripening conductivity and heat resistance. Are appropriately selected.
- the primary role of the first â upper protective layer 108 is to maintain the properties between the electrode 103 and the electrode 104.
- the primary role of the second upper protective layer is to enhance liquid resistance and mechanical strength.
- the main role of the third upper protective layer is to prevent liquid permeation and resist liquid.
- the first upper protective layer is made of an inorganic inorganic material
- the second upper protective layer is made of an inorganic material (particularly a metal material)
- the third upper protective layer is made of an inorganic material. Is often formed using an organic material.
- a liquid jet recording head having relatively high reliability is manufactured using a substrate for a node, and a liquid jet recording apparatus having the liquid jet recording head is commercially available.
- a main object of the present invention is to solve the above-mentioned technical problems, and to provide a liquid jet recording head having excellent durability and reliability even after frequent repetitive use or long-time continuous use. It is to be.
- Another object of the present invention is to solve the above-described technical problem and improve reliability by devising an upper protective layer of a liquid jet recording head of a type in which ink is discharged using thermal energy. Can be significantly improved Is to provide a hood for liquid jet recording.
- Still another object of the present invention is to provide a liquid jet recording head in which a plurality of electroripening transducers for generating a heat energy used for discharging a liquid are arranged on a substrate at high density.
- An object of the present invention is to provide a liquid jet recording head which can solve the above-mentioned technical problem with a relatively simple structure.
- Another object of the present invention is to provide a large number of ejection ports for ejecting liquid over the entire width of a recording area of the recording member on which recording is performed.
- the present inventor has conducted detailed investigations and studies in order to solve these problems and achieve these objects.
- the coverage with the upper protective layer is not always good at the step portion of the electrode layer in the form of a butterfly, or the liquid ejecting recording has a defect such as a pinhole in the upper protective layer.
- mobile ions such as sodium ion and chlorine ion contained in the recording liquid permeate into the upper protective layer, It has been found that corrosion reaches the electrothermal converter, such as an electrode, through the upper protective layer, and eventually the electrothermal converter appears to be corroded.
- the inventor has obtained the following knowledge.
- the electrode is provided so as to cover the support, an electrothermal converter provided on the support, a heat-generating resistor layer, and an electrode electrically connected to the heat-generating resistor layer.
- a liquid is discharged corresponding to the heat generating portion of the electrothermal converter on a liquid jet recording head having an upper protective layer having an ion exchanger and a A liquid passage communicating with the discharge port is provided.
- the present invention further includes a liquid jet 5 recording head substrate used for forming the head, and a liquid jet recording apparatus including the head.
- a liquid jet 5 recording head substrate used for forming the head
- a liquid jet recording apparatus including the head
- reference numeral 105 denotes a metal such as silicon, glass, ceramic, or the like. It is a support formed from. On this support 105, a lower layer 106 is provided for appropriately controlling the generated thermal energy so as to achieve 'uniformity' over the entire body.
- the lower layer 106 is formed of an insulating material such as silicon oxide.
- a heating resistance layer i07 for generating thermal energy used for extracting a liquid On the lower layer 106, there is provided a heating resistance layer i07 for generating thermal energy used for extracting a liquid.
- a material for forming the heat generating resistance layer 107 a material that generates desired heat when energized can be appropriately used. With such materials Specifically, tantalum nitride, nichrome, silver-palladium alloy, silicon semiconductor, or hafnium, lanthanum, zirconium, titanium, tantalum, tungsten, molybdenum, niobium, Metals such as chromium and vanadium, alloys thereof, and borides thereof can be mentioned.
- the heat generating resistive layer 107 can be formed by a gas phase reaction method such as a sputtering method, a CVD method, or a vapor deposition method.
- a pair of electrode layers 103 and 104 for providing the electric number i to the layer 107 is provided.
- the heating resistance layer 10 located between the pair of electrode layers 1.0 3 and 10 4 becomes a heat generating portion 11 1 that generates heat energy used for discharging the liquid.
- a material for forming the electrode layers 103 and 104 many commonly used electrode materials can be used. Specifically, for example, metals such as A, Ag, Au, Pt, and Cu can be mentioned.
- This electrode layer can be formed by a gas phase reaction method such as a sputtering method, a CVD method, and a vapor deposition method.
- various upper protective layers are provided on the electroripened converter.
- the material used to form the upper protective layer is appropriately selected according to the required properties such as heat resistance, liquid resistance, thermal conductivity, and heat resistance.
- the main role of the first upper protective layer 108 is to keep the connection between the electrodes 103 and 104 as described above.
- the first upper protective layer 108 is made of an inorganic inorganic material such as an inorganic oxide such as SiO 2 or an inorganic nitride such as Si 3 N 4 .
- the first upper protective layer 108 can be formed by a gas phase reaction method such as a sputtering method, a CVD method, or a vapor deposition method, or a liquid coating method.
- the main role of the second upper protective layer 109 is to provide reinforcement of liquid resistance and mechanical strength.
- the second upper protective layer 109 is sticky, has relatively excellent mechanical strength, and has the first upper protective layer 109.
- Adhesion to layer 108 for example, elements of group Ma of the periodic table such as Sc, Y, elements of group IVa such as Ti, Zr, Hf, V, b, Ta Group Va elements such as C r, M o, W etc.
- Group W elements such as F e, C o, N i, alloys of these metals, borides. Carbides , Silicides, nitrides and the like.
- the second upper protective layer 109 can be formed by a gas phase reaction method such as a sputtering method, a CVD method, and a vapor deposition method.
- the third upper protective layer 110 is formed of a material having an inorganic ion exchanger and an organic material as a main component, that is, an organic material substantially containing an inorganic ion exchanger. It is formed using materials. As a base material containing an ion exchanger, an organic material is more preferable than an inorganic material. The reason is that ion mobility is higher in organic materials than in inorganic materials.
- This third upper protective layer 110 can be formed by a liquid coating method or the like.
- the organic materials used for the trowel include, for example, silicone resin,
- V-based resin aromatic polyamide, addition-polymerized polyimide, polyimide, imidazole, metal chelate polymer, titanate ester, epoxy resin, phthalic acid resin , Thermosetting phenolic resin, P-vinyl phenol resin, silo resin, triazine resin, BT resin (triazine resin / bismaleimide addition polymer resin) ), Siloxane resin and its derivatives.
- polyimidone isoquinoquinazoline (trade name: 'PIQ', manufactured by Hitachi Chemical)
- polyimid resin (trade name: 'PYRALIN, manufactured by Dupont)
- Photopolymer resins such as butadiene resin (trade name: 'jSR-CBR', manufactured by Nippon Synthetic Rubber Co., Ltd.) and photonice (trade name, manufactured by Toray Industries, Inc.) are particularly excellent high-performance resins. It is preferably used because it has high precision and fine workability.
- the ion exchanger it is preferable to use an inorganic ion exchanger. Most of them are contained in a recording liquid and cause the above-mentioned inconvenience. This is because it is an inorganic mobile ion such as an ion or a chlorine ion. Examples of such inorganic ion exchangers include 'IXE',
- movable ions such as a stream ion and a chlorine ion that penetrate from the liquid flowing through the liquid path of the liquid jet recording head are also ion-exchanged. It is thought to have the effect of trapping in the upper protective layer containing itself by utilizing a reaction, etc., and suppressing the movable ion from reaching the lower layer. And by this action, the corrosion of the electrothermal converter can be prevented.
- Such ion exchangers are preferably occupied by 1 to 5 t.% In the upper protective layer where they are occupied. If the content is less than 1 wt.%, The trapping action of the movable ion will be insufficient, and the movable ion that has not been completely traversed may reach the electrothermal converter and cause corrosion. This is because. If it exceeds 5 wt.%, It will not be evenly dispersed in the base material and will be deflected, deteriorating properties such as hardness, strength and adhesion, and if the base material has photosensitivity, photosensitivity. This is because it may reduce
- a method for producing it a method of dispersing an ion exchanger in a solution and then hardening it in a layer, or dispersing the ion exchanger in a solid by adding and solidifying the ion exchanger in a melting medium, After that, there can be mentioned a method of forming a layer using a vapor deposition method, a sputtering method, or the like.
- the strength of the â , ion exchanger from the viewpoint of uniformity of dispersion in the layer and mass productivity. Therefore, the former manufacturing method is more preferable.
- an upper portion made of a material having an ion exchanger is provided in the vicinity of a heat energy generating portion of a liquid jet recording head in which mature energy is used as energy used for discharging a liquid.
- a protective layer is used, the effects of the present invention can be emphasized.
- the liquid which is one of the causes of corrosion of the electrothermal converter, is relatively hot near the heat energy generating part, so the movable ion of the liquid â is protected at the top. This is because it is easy to permeate and diffuse into the layer, and the trapping of the mobile ion by the ion exchanger is facilitated.
- the third upper protective layer 110 Has been described using an organic material having an ion exchanger, but the present invention is not limited to this embodiment. That is, in the present invention, at least a part of the upper protective layer provided so as to cover the electric heat exchanger is entirely made of a material containing the ion exchanger.
- the first upper protective layer 108 may be formed with a head formed using an inorganic material containing an ion exchanger.
- vitreous forming agent comprising a compound such as P, B, A £, As, Zn and Ti or an organic binder, for example, RnSi (0H) n; Si (0H ) 4, H n S i (0H), (R 0) n S i (0 H) 4 â n , etc.
- a vitreous forming agent comprising a compound such as P, B, A £, As, Zn and Ti or an organic binder, for example, RnSi (0H) n; Si (0H ) 4, H n S i (0H), (R 0) n S i (0 H) 4 â n , etc.
- a coating method such as subbing, roll coating, diving, spraying, or brush application.
- the layer structure of the upper protective layer and the materials used to form them are not limited to the above-described embodiments. Absent.
- the third upper protective layer 110 may be formed of an inorganic material having an ion exchanger, or the first upper protective layer 108 may be formed of an ion exchanger.
- the present invention is also applicable to the case of using an organic material having the above.
- only the first upper protective layer 108 formed by angling the material having the ion exchanger is provided as the upper protective layer covering the electrothermal converter. Anything is included in the present invention.
- the first-mentioned embodiment is the most preferable in the present invention.
- FIG. 2 is a schematic perspective view showing a main part of an example of a liquid jet recording head formed using the liquid jet recording head substrate described above.
- a wall 200 of a fluid path 201 is provided, and a top plate 205 is further provided thereon.
- the liquid is supplied to the common liquid chamber 20 through a liquid supply port 206 from a liquid reservoir (not shown).
- the liquid supplied to the common liquid chamber 20 is supplied to the liquid path 201 by a so-called capillary phenomenon, and forms a mechanism at the discharge port 202 communicating with the liquid path 201. It is kept stable.
- Liquid is discharged from 02.
- FIG. 3 is a schematic perspective view showing a main part of an example of a liquid jet recording apparatus provided with the liquid jet recording head shown in FIG.
- reference numeral 320 denotes a recording medium having a plurality of ink ejection ports facing a recording surface of a recording paper (not shown) conveyed on a platen 3224. It is a detachable head of a liquid storage unit integrated with a monolithic structure. Numeral 316 denotes a carriage for mounting the liquid rest recording head 322, and one of the drive belts 318 for transmitting the driving force of the driving motor 317. It is slidable with two guide shafts 32 9 A and 32 9 B which are connected to the section and arranged in parallel with each other. As a result, the liquid jet recording head 320 can be moved back and forth over the entire width of the recording paper.
- Reference numeral 326 denotes a recovery device for recovering and preventing liquid ejection failure from the liquid jet recording head 320, and is a predetermined portion of the moving range of the liquid jet recording head 320, for example, a home position. It is located at a position facing the phone.
- the recovery device 326 performs the cabin of the discharge port of the â:â nozzle 320 to the liquid ejection recording by the divided power of the motor 322 via the transmission mechanism 323.
- an appropriate device provided in the recovery device 32 6 is provided in connection with the cabining operation of the ejection port of the liquid ejection head 320 by the cap 32 A of the recovery device 32 6, an appropriate device provided in the recovery device 32 6 is provided.
- the liquid is sucked from the discharge port by a suction means (not shown), or the liquid is fed by an appropriate pressurizing means (not shown) provided in a liquid supply path to the liquid ejection head.
- a suction means not shown
- an appropriate pressurizing means not shown
- Reference numeral 330 denotes a blade provided on the side surface of the recovery device 326 as a wiving member made of silicone rubber.
- This blade 330 is held by a blade holding member 330A in a cantilever form, and is operated by a motor 3.22 and a transmission mechanism 3223 in the same manner as the recovery device 3226. Engagement of the liquid jet recording head '320 with the discharge port surface becomes possible.
- the liquid jet recording head 320 may be used.
- the blade 330 protrudes into the range of movement of the liquid jet recording head, and as the liquid jet recording head 320 moves, dew condensation and wetness adhered to the ejection port surface of the liquid jet recording head 320 Or dust, etc. Foreign substances can be removed.
- FIG. 4 is a schematic perspective view showing an outline of a liquid jet recording apparatus in which a head 32 is mounted on a full-line type liquid jet recording.
- reference numeral 65 denotes a transport belt for transporting a recording member such as paper.
- the transport belt 65 transports a recording member (not shown) as the transport roller 64 rotates.
- the lower surface of the liquid jet recording head 32 is a discharge port surface 31 having a plurality of discharge ports corresponding to the entire width of the recording area of the member to be recorded.
- the lower layer 106 (layer thickness) of Si 0 z is thermally oxidized on the support 105 made of a Si wafer. : 5 â m). Then, by performing the spatter-ring a H f B 2 (purity 9 9.9% or higher) as the data Ge' preparative vacuum tea Nba within one heating resistor layer on the lower portion layer 1 0 6 1 An HfBz layer (layer thickness: 1300 persons) was formed to be 0 7. What are the conditions for this spac ring? there were. Sputtering conditions
- Base dish 1 1 0 Pa or less
- a â layer (layer:!: 50,000 A) that becomes the electrode layers 103 and 10 was formed on the T i layer by electron beam evaporation.
- the conditions for this electron beam deposition were as follows.
- H f B z layer for T i layer and A £ layer, Roh due to non-O door Li Sogurafu I in the following manner, it was' turning.
- a photo resist (trade name: 0 FPR800, manufactured by Tokyo Ohkasha Co., Ltd.) is applied in a layer (layer thickness: 1.3 m) on the layer A, and a conventional method is applied thereto. Exposure, development, and baking were performed.
- a mixed solution of nitric acid, phosphoric acid, and nitric acid acetic acid 9% by weight, phosphoric acid 73% by weight, nitric acid 2% by weight, and the remaining 16% by weight
- the layer A was etched.
- Base presser 1 1 0 ' 3 Pa or less
- H f B 2 layer by performing the putter Jung T i layer and A layer, the heating resistor layer H f B z 1 0 7, T i adhesion layer (not shown) and A electrodes Layer 1031 was formed.
- the electrode layer 103 is used as a selection electrode, and the electrode layer 104 is used as a common electrode.
- the Ta is used as a second upper protective layer 109 by performing sputtering with a vacuum chamber meat serving as a target of Ta (purity of 99.9% or more) as a target.
- a layer (layer thickness: 0.3 m) was formed.
- reactive layering of the Ta layer is performed in the vacuum chamber, and a pattern is provided so as to cover the upper part of the heat generating portion 11 â shown in FIGS. 1) and 1 (b).
- a second upper protective layer 109 was formed.
- the conditions for this reactive etching were as follows.
- a photosensitive polymide (trade name: 'Photonice', manufactured by Toray Industries, Inc.) and an inorganic ion exchanger (trade name: 'Xigse') ', Manufactured by Toa Gosei Chemical Industry Co., Ltd.) was applied in a layered form (layer thickness: 3 m).
- a photosensitive polymide (trade name: 'Photonice', manufactured by Toray Industries, Inc.) and an inorganic ion exchanger (trade name: 'Xigse') ', Manufactured by Toa Gosei Chemical Industry Co., Ltd.) was applied in a layered form (layer thickness: 3 m).
- the conditions of exposure, development and baking after exposure and development and baking were respectively as follows.
- a wall member 200 forming a horizontal wall between the liquid passage 201 communicating with the discharge port 202 and the common liquid chamber 204 is provided. It is formed using a photo-resist layer of a photosensitive resin layer (layer! :: 50 â m), and further formed on the layer via an epoxy-based adhesive (not shown).
- a top plate made of stainless steel By providing a top plate made of stainless steel, a liquid jet recording head schematically shown in FIG. 2 was obtained.
- This liquid jet head has 64 discharge ports corresponding to the above-described heat generating portions.
- Reference numeral 206 denotes an ink supply port to the common liquid chamber 204.
- 100 liquid jet recording heads are manufactured in all cities.
- the formation of the inorganic material layer to be the upper protective layer 108 of the first and the photosensitive polyimide containing no inorganic ion exchanger as the material of the third upper protective layer 110 ( Product name: liquid jet recording head substrate and liquid jet device provided with the substrate in the same manner as in Example 1 except that (trade name: Photonice, manufactured by Toray Industries, Inc.) is used. Record head and Manufactured.
- the material of the third upper protective layer 110 it is assumed that a photosensitive polyimide (trade name: PHOTONESS, manufactured by Toray Industries Co., Ltd.), which does not have an inorganic ion exchanger, is used. Except for the above, a liquid jet recording head substrate and a liquid jet recording head provided with the substrate were manufactured in the same manner as in Example I described above. â Also in this comparative example, 100 liquid jet recording heads were manufactured in total. Comparative experiment
- Example 1 As a result, the occurrence rate of corrosion was significantly reduced on average in Example 1 as compared with the comparative example.
- each of the 100 liquid jet recording heads obtained in Examples 1 and 2 and the comparative example was mounted on the liquid jet recording apparatus main body shown in FIG. The recording was performed by discharging the liquid. .
- the sodium is 0.3 wt.% In the recording liquid.
- Triethylene glycol 10 0 w t%
- the liquid jet recording head according to Example 12 exhibited superior recording quality as compared with the comparative example. This is because the occurrence rate of corrosion of the electrothermal transducer including the electrode is reduced as described above, It is considered that the main reason is that the reliability of the liquid jet recording head according to 2 has been improved.
- the present invention has an excellent effect in a recording head and a recording apparatus in which ink is discharged using thermal energy.
- a liquid (ink) is ejected through the ejection opening by the growth and shrinkage of the bubble to form at least one droplet.
- the I-motion signal is formed into a pulse shape, the growth and shrinkage of the bubbles are performed immediately and appropriately, so that the ejection of a liquid (ink) having particularly excellent responsiveness can be achieved, which is more preferable.
- the drive signal having the pulse shape those described in U.S. Pat. Nos. 4,463,359 and 4,345,262 are suitable. ing. Further, if the conditions described in U.S. Pat. No. 4,313,124 of the invention relating to the temperature rise rate of the heat acting surface are adopted, more excellent recording can be performed. .
- the configuration of the head includes a combination of a discharge port, a liquid path, and an electrothermal converter (a linear liquid flow path or a right-angled liquid flow path) as disclosed in the above-mentioned respective specifications.
- U.S. Pat.No. 4,558,333 and U.S. Pat.No. 4,459,600 which disclose a configuration in which the heat acting portion is disposed in a bending region.
- the present invention is also applicable to the configuration using It is.
- Japanese Unexamined Patent Application Publication No. 129630/1990 discloses a configuration in which a common slit is used as a discharge section of an electrothermal converter for a plurality of electrothermal converters.
- the present invention is also effective as a configuration based on Japanese Patent Application Laid-Open No. 59-138461, which discloses a configuration in which an opening for absorbing a pressure wave of thermal energy is provided in the discharge section.
- a full-line type recording head having a length corresponding to the maximum recording medium width that can be recorded by a recording device a multi-recording head as disclosed in the above specification is used.
- a configuration in which the length is dropped or a configuration as a single integrally formed recording head may be used.
- the present invention can exhibit the above-described effect more effectively. it can.
- the recording head of a replaceable tip type that can be connected to the main body of the device to enable electrical connection with the main unit and supply of ink from the main unit.
- the present invention is also effective when a recording head of a trinoge type is provided integrally with the recording head itself.
- recovery means for the recording head it is preferable to add recovery means for the recording head, preliminary auxiliary means, and the like provided as a configuration of the recording apparatus of the present invention since the effects of the present invention can be further stabilized. It is.
- a recording head, a cleaning means, a pressurizing or suctioning means, an electrothermal converter or another heating element or a heating means for the recording head It is also effective to perform a pre-heating mode and a pre-ejection mode in which ejection is performed separately from recording by performing a pre-heating mode using these combinations to perform stable recording.
- the recording mode of the recording apparatus is not limited to the recording mode of only the mainstream color such as black, and the recording head may be formed integrally or by a combination of a plurality of recording heads.
- the present invention is also extremely effective for an apparatus provided with at least one of a multi-color or a full-color mixed color.
- the description is made using a liquid ink.
- the ink is a solid at room temperature, the ink is in a softened state at room temperature. Can be used.
- the ink itself is temperature-adjusted within a range of 30 to 70 ° C by controlling the temperature of the ink so that the viscosity of the ink is in a stable discharge range. Since the ink is generally used, it is only necessary that the ink be in a liquid state when the signal for use is given. In addition, the temperature rise due to aggressive energy can be prevented by using it as an energy to change the state of the ink from the solid state to the liquid state, or the ink can be left standing for the purpose of preventing the ink from evaporating.
- the ink is liquefied by application of heat energy according to the recording signal and is discharged as an ink liquid, or when the ink reaches the recording medium.
- the use of an ink having the property of being liquefied only by thermal energy, such as one that has already begun to solidify, is also applicable to the present invention.
- the ink may be provided by a porous sheet recess or recess as described in JP-A-54-56847 or JP-A-60-71260.
- a configuration may be adopted in which the liquid crystal is held in the through-hole as a liquid or a solid and faces the electrothermal converter.
- the most effective one for each of the above-mentioned inks is to execute the above-described film boiling method.
- FIG. 1 (a) is a schematic plan view of a main part of an example of a liquid jet recording head substrate, and FIG. 1 (W is indicated by a dashed line X-Y in FIG. 1 (a).
- FIG. 3 is a schematic cross-sectional view cut at a corner.
- FIG. 2 is a schematic perspective view showing a main part of an example of a liquid jet recording head formed using the liquid jet recording head substrate described above.
- FIG. 3 is a schematic perspective view showing a main part of an example of a liquid jet recording apparatus provided with the liquid jet recording head shown in FIG.
- FIG. 4 is a schematic perspective view schematically showing a liquid jet recording apparatus equipped with a full-line type liquid jet recording head.
Description
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP91906430A EP0477378B1 (en) | 1990-03-27 | 1991-03-27 | Liquid injection recording head |
DE69121156T DE69121156T2 (de) | 1990-03-27 | 1991-03-27 | Mit flÃŒssigkkeitsstrahl arbeitender aufzeichnungskopf |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2/75434 | 1990-03-27 | ||
JP7543490 | 1990-03-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1991014575A1 true WO1991014575A1 (en) | 1991-10-03 |
Family
ID=13576121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1991/000400 WO1991014575A1 (en) | 1990-03-27 | 1991-03-27 | Liquid injection recording head |
Country Status (5)
Country | Link |
---|---|
US (1) | US5187499A (ja) |
EP (1) | EP0477378B1 (ja) |
AT (1) | ATE140897T1 (ja) |
DE (1) | DE69121156T2 (ja) |
WO (1) | WO1991014575A1 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69328134T2 (de) * | 1992-06-23 | 2000-09-21 | Canon Kk | FlÃŒssigkeitsstrahlaufzeichnungskopf und Verfahren seiner Herstellung |
US6406740B1 (en) * | 1992-06-23 | 2002-06-18 | Canon Kabushiki Kaisha | Method of manufacturing a liquid jet recording apparatus and such a liquid jet recording apparatus |
US5334415A (en) * | 1992-09-21 | 1994-08-02 | Compaq Computer Corporation | Method and apparatus for film coated passivation of ink channels in ink jet printhead |
KR0131179B1 (ko) * | 1993-02-22 | 1998-04-14 | ìë»¬ìŽ ìŒë§ìëŒ | ì ìíë¡ ì ì¡°íë¡ìžì€ |
US5660739A (en) * | 1994-08-26 | 1997-08-26 | Canon Kabushiki Kaisha | Method of producing substrate for ink jet recording head, ink jet recording head and ink jet recording apparatus |
US5901425A (en) | 1996-08-27 | 1999-05-11 | Topaz Technologies Inc. | Inkjet print head apparatus |
JP3619036B2 (ja) * | 1997-12-05 | 2005-02-09 | ãã€ãã³æ ªåŒäŒç€Ÿ | ã€ã³ã¯ãžã§ããèšé²ãããã®è£œé æ¹æ³ |
US6142606A (en) * | 1997-12-22 | 2000-11-07 | Canon Kabushiki Kaisha | Ink jet recording head, substrate for use of such head, ink jet cartridge, and ink jet recording apparatus |
JP4298066B2 (ja) | 1999-06-09 | 2009-07-15 | ãã€ãã³æ ªåŒäŒç€Ÿ | ã€ã³ã¯ãžã§ããèšé²ãããã®è£œé æ¹æ³ãã€ã³ã¯ãžã§ããèšé²ãããããã³ã€ã³ã¯ãžã§ããèšé²è£ 眮 |
US8333459B2 (en) | 2008-04-29 | 2012-12-18 | Hewlett-Packard Development Company, L.P. | Printing device |
JP5350205B2 (ja) * | 2009-12-16 | 2013-11-27 | ãã€ãã³æ ªåŒäŒç€Ÿ | 液äœååºãããçšåºæ¿åã³æ¶²äœååºããããããã³ãã®è£œé æ¹æ³ |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62104763A (ja) * | 1985-10-31 | 1987-05-15 | Canon Inc | 液äœåŽå°èšé²ããã |
JPH01122443A (ja) * | 1987-11-07 | 1989-05-15 | Alps Electric Co Ltd | ã€ã³ã¯ãžã§ãããããåºæ¿ã®è£œé æ¹æ³ |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0624855B2 (ja) * | 1983-04-20 | 1994-04-06 | ãã€ãã³æ ªåŒäŒç€Ÿ | 液äœåŽå°èšé²ããã |
US4626875A (en) * | 1983-09-26 | 1986-12-02 | Canon Kabushiki Kaisha | Apparatus for liquid-jet recording wherein a potential is applied to the liquid |
JPS6422443A (en) * | 1987-07-17 | 1989-01-25 | Asano Seisakusho Kk | Manufacture of lock bolt |
US5010355A (en) * | 1989-12-26 | 1991-04-23 | Xerox Corporation | Ink jet printhead having ionic passivation of electrical circuitry |
-
1991
- 1991-03-27 AT AT91906430T patent/ATE140897T1/de not_active IP Right Cessation
- 1991-03-27 DE DE69121156T patent/DE69121156T2/de not_active Expired - Fee Related
- 1991-03-27 US US07/768,946 patent/US5187499A/en not_active Expired - Fee Related
- 1991-03-27 WO PCT/JP1991/000400 patent/WO1991014575A1/ja active IP Right Grant
- 1991-03-27 EP EP91906430A patent/EP0477378B1/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62104763A (ja) * | 1985-10-31 | 1987-05-15 | Canon Inc | 液äœåŽå°èšé²ããã |
JPH01122443A (ja) * | 1987-11-07 | 1989-05-15 | Alps Electric Co Ltd | ã€ã³ã¯ãžã§ãããããåºæ¿ã®è£œé æ¹æ³ |
Also Published As
Publication number | Publication date |
---|---|
EP0477378A1 (en) | 1992-04-01 |
DE69121156T2 (de) | 1996-12-12 |
DE69121156D1 (de) | 1996-09-05 |
EP0477378A4 (en) | 1992-06-10 |
EP0477378B1 (en) | 1996-07-31 |
US5187499A (en) | 1993-02-16 |
ATE140897T1 (de) | 1996-08-15 |
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