USD797691S1 - Composite edge ring - Google Patents
Composite edge ring Download PDFInfo
- Publication number
- USD797691S1 USD797691S1 US29/561,163 US201629561163F USD797691S US D797691 S1 USD797691 S1 US D797691S1 US 201629561163 F US201629561163 F US 201629561163F US D797691 S USD797691 S US D797691S
- Authority
- US
- United States
- Prior art keywords
- edge ring
- composite edge
- view
- composite
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Description
The broken lines in the Figures form no part of the claimed design.
Claims (1)
- The ornamental design for a composite edge ring, as shown and described.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/561,163 USD797691S1 (en) | 2016-04-14 | 2016-04-14 | Composite edge ring |
TW105305534F TWD187824S (en) | 2016-04-14 | 2016-09-20 | A composite edge ring |
JPD2016-22122F JP1575876S (en) | 2016-04-14 | 2016-10-12 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/561,163 USD797691S1 (en) | 2016-04-14 | 2016-04-14 | Composite edge ring |
Publications (1)
Publication Number | Publication Date |
---|---|
USD797691S1 true USD797691S1 (en) | 2017-09-19 |
Family
ID=58645867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/561,163 Active USD797691S1 (en) | 2016-04-14 | 2016-04-14 | Composite edge ring |
Country Status (3)
Country | Link |
---|---|
US (1) | USD797691S1 (en) |
JP (1) | JP1575876S (en) |
TW (1) | TWD187824S (en) |
Cited By (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20170256435A1 (en) * | 2016-03-04 | 2017-09-07 | Applied Materials, Inc. | Universal process kit |
USD825504S1 (en) | 2015-04-21 | 2018-08-14 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD827592S1 (en) * | 2017-01-31 | 2018-09-04 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD836573S1 (en) * | 2017-01-31 | 2018-12-25 | Hitachi High-Technologies Corporation | Ring for a plasma processing apparatus |
USD836572S1 (en) * | 2016-09-30 | 2018-12-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD837755S1 (en) * | 2015-04-16 | 2019-01-08 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD840364S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD847982S1 (en) * | 2016-02-04 | 2019-05-07 | Atos Medical Ab | Heat exchanger base plate |
USD851613S1 (en) | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD862404S1 (en) * | 2016-10-25 | 2019-10-08 | Kokusai Electric Corporation | Sealing material ring for a semiconductor manufacturing apparatus |
USD868124S1 (en) | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD871609S1 (en) * | 2017-08-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Electrode plate peripheral ring for a plasma processing apparatus |
USD877101S1 (en) | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD889335S1 (en) * | 2018-10-03 | 2020-07-07 | Vaughn C Jewell | Disc |
USD891382S1 (en) * | 2019-02-08 | 2020-07-28 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
TWD208174S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208178S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208175S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208176S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208177S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD928732S1 (en) * | 2020-03-20 | 2021-08-24 | Yubico Ab | Bezel for attaching sensor to a printed circuit board in a security key |
TWD214021S (en) | 2020-07-27 | 2021-09-11 | 美商應用材料股份有限公司 | Edge ring |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD943539S1 (en) * | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
USD979524S1 (en) * | 2020-03-19 | 2023-02-28 | Applied Materials, Inc. | Confinement liner for a substrate processing chamber |
USD992615S1 (en) * | 2018-12-07 | 2023-07-18 | Tokyo Electron Limited | Focus ring |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD942516S1 (en) | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD404370S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Cap for use in a semiconductor wafer heat processing apparatus |
USD404372S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Ring for use in a semiconductor wafer heat processing apparatus |
US6039836A (en) | 1997-12-19 | 2000-03-21 | Lam Research Corporation | Focus rings |
USD427570S (en) * | 1997-01-31 | 2000-07-04 | Tokyo Electron Limited | Quartz fin heat retaining tube |
USD494551S1 (en) * | 2002-12-12 | 2004-08-17 | Tokyo Electron Limited | Exhaust ring for manufacturing semiconductors |
USD494552S1 (en) * | 2002-12-12 | 2004-08-17 | Tokyo Electron Limited | Exhaust ring for manufacturing semiconductors |
US6908540B2 (en) * | 2001-07-13 | 2005-06-21 | Applied Materials, Inc. | Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process |
US7025862B2 (en) * | 2002-10-22 | 2006-04-11 | Applied Materials | Plating uniformity control by contact ring shaping |
US7087144B2 (en) * | 2003-01-31 | 2006-08-08 | Applied Materials, Inc. | Contact ring with embedded flexible contacts |
US7138039B2 (en) * | 2003-01-21 | 2006-11-21 | Applied Materials, Inc. | Liquid isolation of contact rings |
USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD559993S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD559994S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
USD709536S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
USD709538S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
USD709539S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
-
2016
- 2016-04-14 US US29/561,163 patent/USD797691S1/en active Active
- 2016-09-20 TW TW105305534F patent/TWD187824S/en unknown
- 2016-10-12 JP JPD2016-22122F patent/JP1575876S/ja active Active
Patent Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD427570S (en) * | 1997-01-31 | 2000-07-04 | Tokyo Electron Limited | Quartz fin heat retaining tube |
USD404372S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Ring for use in a semiconductor wafer heat processing apparatus |
USD404370S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Cap for use in a semiconductor wafer heat processing apparatus |
US6039836A (en) | 1997-12-19 | 2000-03-21 | Lam Research Corporation | Focus rings |
US6908540B2 (en) * | 2001-07-13 | 2005-06-21 | Applied Materials, Inc. | Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process |
US7025862B2 (en) * | 2002-10-22 | 2006-04-11 | Applied Materials | Plating uniformity control by contact ring shaping |
USD494551S1 (en) * | 2002-12-12 | 2004-08-17 | Tokyo Electron Limited | Exhaust ring for manufacturing semiconductors |
USD494552S1 (en) * | 2002-12-12 | 2004-08-17 | Tokyo Electron Limited | Exhaust ring for manufacturing semiconductors |
US7138039B2 (en) * | 2003-01-21 | 2006-11-21 | Applied Materials, Inc. | Liquid isolation of contact rings |
US7087144B2 (en) * | 2003-01-31 | 2006-08-08 | Applied Materials, Inc. | Contact ring with embedded flexible contacts |
USD559993S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD559994S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
USD709536S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
USD709538S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
USD709539S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
Cited By (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD837755S1 (en) * | 2015-04-16 | 2019-01-08 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD825504S1 (en) | 2015-04-21 | 2018-08-14 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD847982S1 (en) * | 2016-02-04 | 2019-05-07 | Atos Medical Ab | Heat exchanger base plate |
US11049760B2 (en) * | 2016-03-04 | 2021-06-29 | Applied Materials, Inc. | Universal process kit |
US20170256435A1 (en) * | 2016-03-04 | 2017-09-07 | Applied Materials, Inc. | Universal process kit |
USD869409S1 (en) | 2016-09-30 | 2019-12-10 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD836572S1 (en) * | 2016-09-30 | 2018-12-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD862404S1 (en) * | 2016-10-25 | 2019-10-08 | Kokusai Electric Corporation | Sealing material ring for a semiconductor manufacturing apparatus |
USD827592S1 (en) * | 2017-01-31 | 2018-09-04 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD836573S1 (en) * | 2017-01-31 | 2018-12-25 | Hitachi High-Technologies Corporation | Ring for a plasma processing apparatus |
USD840364S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD871609S1 (en) * | 2017-08-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Electrode plate peripheral ring for a plasma processing apparatus |
USD851613S1 (en) | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD868124S1 (en) | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD877101S1 (en) | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
TWD208176S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208178S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208177S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208174S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
TWD208175S (en) | 2018-07-25 | 2020-11-11 | 日商日本碍子股份有限公司 | Wafer retainer for manufacturing semiconductor |
USD889335S1 (en) * | 2018-10-03 | 2020-07-07 | Vaughn C Jewell | Disc |
USD992615S1 (en) * | 2018-12-07 | 2023-07-18 | Tokyo Electron Limited | Focus ring |
USD891382S1 (en) * | 2019-02-08 | 2020-07-28 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD943539S1 (en) * | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
USD986190S1 (en) | 2020-03-19 | 2023-05-16 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
USD979524S1 (en) * | 2020-03-19 | 2023-02-28 | Applied Materials, Inc. | Confinement liner for a substrate processing chamber |
USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD928732S1 (en) * | 2020-03-20 | 2021-08-24 | Yubico Ab | Bezel for attaching sensor to a printed circuit board in a security key |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
TWD214021S (en) | 2020-07-27 | 2021-09-11 | 美商應用材料股份有限公司 | Edge ring |
US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Also Published As
Publication number | Publication date |
---|---|
TWD187824S (en) | 2018-01-11 |
JP1575876S (en) | 2017-05-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
USD797691S1 (en) | Composite edge ring | |
USD823643S1 (en) | Bowl | |
USD892622S1 (en) | Food container | |
USD859376S1 (en) | Antenna | |
USD870114S1 (en) | Adapter | |
USD793073S1 (en) | Shoe upper | |
USD801011S1 (en) | Footwear | |
USD833124S1 (en) | Footwear | |
USD828158S1 (en) | Lid with scoop retainer | |
USD903496S1 (en) | Bottle | |
USD841934S1 (en) | Glove palm | |
USD886254S1 (en) | Toilet seal | |
USD787830S1 (en) | Cap and holder assembly | |
USD787831S1 (en) | Cap and holder assembly | |
USD804311S1 (en) | Bottle base | |
USD903033S1 (en) | Bow string release | |
USD835394S1 (en) | Umbrella top | |
USD775236S1 (en) | Combined displacement pump and displacement pump housing | |
USD860427S1 (en) | Ring fan | |
USD755896S1 (en) | Cardholder stick | |
USD835448S1 (en) | Barbeque | |
USD818414S1 (en) | Vortex propeller | |
USD816088S1 (en) | Keyboard case with extension | |
USD815782S1 (en) | Litter scoop | |
USD796798S1 (en) | Footwear |