US5919601A - Radiation-sensitive compositions and printing plates - Google Patents
Radiation-sensitive compositions and printing plates Download PDFInfo
- Publication number
- US5919601A US5919601A US08/745,534 US74553496A US5919601A US 5919601 A US5919601 A US 5919601A US 74553496 A US74553496 A US 74553496A US 5919601 A US5919601 A US 5919601A
- Authority
- US
- United States
- Prior art keywords
- composition
- printing plate
- poly
- alkoxymethyl
- polymers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Abstract
Description
Claims (65)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/745,534 US5919601A (en) | 1996-11-12 | 1996-11-12 | Radiation-sensitive compositions and printing plates |
EP97946526A EP0938413B1 (en) | 1996-11-12 | 1997-11-06 | Radiation-sensitive compositions and printing plates |
DE69727959T DE69727959T2 (en) | 1996-11-12 | 1997-11-06 | RADIATION SENSITIVE COMPOSITIONS AND PRESSURE PLATES |
PCT/US1997/020138 WO1998021038A1 (en) | 1996-11-12 | 1997-11-06 | Radiation-sensitive compositions and printing plates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/745,534 US5919601A (en) | 1996-11-12 | 1996-11-12 | Radiation-sensitive compositions and printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
US5919601A true US5919601A (en) | 1999-07-06 |
Family
ID=24997091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/745,534 Expired - Lifetime US5919601A (en) | 1996-11-12 | 1996-11-12 | Radiation-sensitive compositions and printing plates |
Country Status (4)
Country | Link |
---|---|
US (1) | US5919601A (en) |
EP (1) | EP0938413B1 (en) |
DE (1) | DE69727959T2 (en) |
WO (1) | WO1998021038A1 (en) |
Cited By (108)
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---|---|---|---|---|
US6051361A (en) * | 1997-09-18 | 2000-04-18 | Konica Corporation | Light sensitive composition and image forming material |
US6114085A (en) * | 1998-11-18 | 2000-09-05 | Clariant Finance (Bvi) Limited | Antireflective composition for a deep ultraviolet photoresist |
US6143464A (en) * | 1997-07-28 | 2000-11-07 | Fuji Photo Film Co., Ltd. | Positive-working photosensitive composition for use with infrared laser |
US6165676A (en) * | 1997-04-22 | 2000-12-26 | Konica Corporation | Light sensitive composition, image forming material and image forming material manufacturing method |
US6242155B1 (en) * | 1998-08-14 | 2001-06-05 | Fuji Photo Film Co., Ltd. | Method of making lithographic printing plate and photopolymer composition |
US6248505B1 (en) * | 1998-03-13 | 2001-06-19 | Kodak Polychrome Graphics, Llc | Method for producing a predetermined resist pattern |
EP1170123A2 (en) * | 2000-07-07 | 2002-01-09 | Fuji Photo Film Co., Ltd. | Negative-working planographic printing plate |
US6436601B1 (en) | 2001-06-25 | 2002-08-20 | Citiplate, Inc. | Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
US6451502B1 (en) | 2000-10-10 | 2002-09-17 | Kodak Polychrome Graphics Llc | manufacture of electronic parts |
US6458511B1 (en) | 2000-06-07 | 2002-10-01 | Kodak Polychrome Graphics Llc | Thermally imageable positive-working lithographic printing plate precursor and method for imaging |
US6489078B1 (en) * | 1996-07-19 | 2002-12-03 | Agfa-Gevaert | IR radiation-sensitive imaging element and a method for producing lithographic plates therewith |
WO2003065122A1 (en) * | 2002-01-31 | 2003-08-07 | Scandinavian Micro Biodevices A/S | Method of joining a workpiece and a microstructure by light exposure |
US6627384B1 (en) * | 1999-10-29 | 2003-09-30 | Hyundai Electronics Industries Co., Ltd. | Photoresist composition for resist flow process and process for forming a contact hole using the same |
US6627386B2 (en) * | 1999-12-21 | 2003-09-30 | Fuji Photo Film Co., Ltd. | Image forming method |
US6638679B2 (en) | 2001-07-12 | 2003-10-28 | Kodak Polychrome Graphics, Llc | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds |
US20030224284A1 (en) * | 2002-05-30 | 2003-12-04 | Ting Tao | Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements |
US6692890B2 (en) * | 2001-04-04 | 2004-02-17 | Kodak Polychrome Graphics Llc | Substrate improvements for thermally imageable composition and methods of preparation |
US20040063034A1 (en) * | 2002-09-30 | 2004-04-01 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
US20040072101A1 (en) * | 2002-09-30 | 2004-04-15 | Fuji Photo Film Co., Ltd. | Polymerizable composition and planographic printing plate precursor |
US6723495B2 (en) | 2002-01-24 | 2004-04-20 | Kodak Polychrome Graphics Llc | Water-developable negative-working ultraviolet and infrared imageable element |
WO2004036314A2 (en) * | 2002-05-24 | 2004-04-29 | Kodak Polychrome Graphics Llc | Acid generating agents and their use in processes for imaging radiation-sensitive elements |
US20040131973A1 (en) * | 2003-01-03 | 2004-07-08 | Ting Tao | Method for forming a lithographic printing plate |
US20040131971A1 (en) * | 2002-09-30 | 2004-07-08 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
US20040137369A1 (en) * | 2002-12-18 | 2004-07-15 | Fuji Photo Film Co., Ltd. | Polymerizable composition and lithographic printing plate precursor |
US20040144277A1 (en) * | 2003-01-27 | 2004-07-29 | Jeffrey Collins | Infrared absorbing compounds and their use in imageable elements |
US20040170920A1 (en) * | 2003-02-20 | 2004-09-02 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
US20040170922A1 (en) * | 2003-02-21 | 2004-09-02 | Fuji Photo Film Co., Ltd. | Photosensitive composition and planographic printing plate precursor using the same |
US20040175648A1 (en) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co., Ltd. | Photosensitive composition and planographic printing plate precursor using the same |
US20040180283A1 (en) * | 2003-03-10 | 2004-09-16 | Ting Tao | Imageable elements with improved dot stability |
US20040180285A1 (en) * | 2003-03-10 | 2004-09-16 | Ting Tao | Infra red absorbing compounds and their use in photoimageable elements |
US20040180291A1 (en) * | 2003-03-10 | 2004-09-16 | Jeffrey Collins | Method for forming images using negative working imageable elements |
US6794431B1 (en) * | 2000-08-18 | 2004-09-21 | Veil Corporation | Near infrared electromagnetic radiation absorbing composition and method of use |
US6800426B2 (en) | 2001-12-13 | 2004-10-05 | Kodak Polychrome Graphics Llc | Process for making a two layer thermal negative plate |
US20040197697A1 (en) * | 2003-04-07 | 2004-10-07 | Lee Korionoff | Thermally imageable elements imageable at several wavelengths |
US6806020B2 (en) | 2001-08-21 | 2004-10-19 | Kodak Polychrome Graphics Llc | Negative working imageable composition containing sulfonic acid |
US20040223042A1 (en) * | 2003-01-14 | 2004-11-11 | Fuji Photo Film Co., Ltd. | Image forming method |
US20040244619A1 (en) * | 2003-02-21 | 2004-12-09 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
US6838222B2 (en) | 2001-02-22 | 2005-01-04 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
US20050005795A1 (en) * | 2003-07-08 | 2005-01-13 | Ray Kevin Barry | Ink-jet imaging method |
US20050026082A1 (en) * | 2003-07-29 | 2005-02-03 | Fuji Photo Film Co., Ltd. | Polymerizable composition and image-recording material using the same |
US20050064332A1 (en) * | 2003-09-24 | 2005-03-24 | Fuji Photo Film Co., Ltd. | Photosensitive composition and planographic printing plate precursor |
US20050069807A1 (en) * | 2003-09-29 | 2005-03-31 | Hynix Semiconductor Inc. | Photoresist composition |
US20050079439A1 (en) * | 2001-08-21 | 2005-04-14 | Kodak Polychrome Graphics Llc | Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
US20050085385A1 (en) * | 2003-10-20 | 2005-04-21 | Swihart Donald L. | Laser-generated ultraviolet radiation mask |
US20050129915A1 (en) * | 2003-12-15 | 2005-06-16 | Ting Tao | Imageable element comprising sulfated polymers |
US6921620B2 (en) | 2001-08-21 | 2005-07-26 | Kodak Polychrome Graphics Llc | Imageable composition containing colorant having a counter anion derived from a non-volatile acid |
US6933093B1 (en) * | 1998-09-21 | 2005-08-23 | Ibf Industria Brasileira De Filmes S/A | Radiation sensitive coating composition useful for lithographic printing plates and the like |
US6939663B2 (en) | 2003-07-08 | 2005-09-06 | Kodak Polychrome Graphics Llc | Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins |
US20050221215A1 (en) * | 2004-03-30 | 2005-10-06 | Ting Tao | Infrared absorbing compounds and their use in imageable elements |
US6972167B2 (en) * | 2000-05-17 | 2005-12-06 | Fuji Photo Film Co., Ltd. | Planographic printing plate |
US20050277053A1 (en) * | 2004-06-01 | 2005-12-15 | Anocoil Corporation | Increased sensitivity, IR, and UV imageable photographic elements |
US20050277051A1 (en) * | 2004-06-01 | 2005-12-15 | Anocoil Corporation | Increased sensitivity, UV imageable photographic elements |
WO2006001515A1 (en) | 2004-06-28 | 2006-01-05 | Canon Kabushiki Kaisha | Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head |
US7005234B2 (en) | 2001-03-26 | 2006-02-28 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor and planographic printing method |
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US20080206670A1 (en) * | 2007-02-27 | 2008-08-28 | Fujifilm Corporation | Infrared laser-sensitive planographic printing plate precursor |
US20080261154A1 (en) * | 2005-11-18 | 2008-10-23 | Agfa Graphics Nv | Method of Making a Lithographic Printing Plate |
US20080280228A1 (en) * | 2005-03-30 | 2008-11-13 | Koji Hayashi | Photosensitive Planographic Printing Plate |
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US20090246698A1 (en) * | 2008-03-28 | 2009-10-01 | Ray Kevin B | Methods for imaging and processing negative-working imageable elements |
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---|---|---|---|---|
US6068963A (en) * | 1997-01-20 | 2000-05-30 | Fuji Photo Film Co., Ltd. | Negative-type image recording materials |
US6261740B1 (en) * | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
WO1999011457A1 (en) * | 1997-09-02 | 1999-03-11 | Kodak Polychrome Graphics Llc | Processless, laser imageable lithographic printing plate |
US6323287B1 (en) * | 1999-03-12 | 2001-11-27 | Arch Specialty Chemicals, Inc. | Hydroxy-amino thermally cured undercoat for 193 NM lithography |
KR100574482B1 (en) * | 1999-09-07 | 2006-04-27 | 주식회사 하이닉스반도체 | Organic polymer for anti-reflective coating layer and preparation thereof |
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Also Published As
Publication number | Publication date |
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EP0938413A1 (en) | 1999-09-01 |
DE69727959D1 (en) | 2004-04-08 |
EP0938413B1 (en) | 2004-03-03 |
DE69727959T2 (en) | 2005-06-02 |
WO1998021038A1 (en) | 1998-05-22 |
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