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Referenced by

Citing PatentFiling dateIssue dateOriginal AssigneeTitle
US672318724 Jul 200120 Apr 2004Honeywell International Inc.Methods of fabricating articles and sputtering targets
US687825016 Dec 199912 Apr 2005Honeywell International Inc.Sputtering targets formed from cast materials
US710144730 Oct 20015 Sep 2006Honeywell International Inc.Tantalum sputtering target with fine grains and uniform texture and method of manufacture
US751741712 Jan 200614 Apr 2009Honeywell International Inc.Tantalum PVD component producing methods