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Referenced by

Citing PatentFiling dateIssue dateOriginal AssigneeTitle
US399221111 Jun 197116 Nov 1976Trans-Metals CorporationElectroless plating composition
US40911288 Oct 197623 May 1978PPG Industries, Inc.Electroless gold plating bath
US435269017 Jul 19805 Oct 1982Schering AktiengesellschaftAcid gold bath for the electroless deposition of gold
US48306688 Dec 198716 May 1989W. C. Heraeus GmbHAcidic bath for electroless deposition of gold films
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US486376622 Jun 19875 Sep 1989General Electric CompanyElectroless gold plating composition and method for plating
US638326925 Jan 20007 May 2002Shipley Company, L.L.C.Electroless gold plating solution and process
US705674827 Oct 19996 Jun 2006Technion Research and Development Foundation Ltd.Method for gold deposition
US733219321 Mar 200519 Feb 2008Enthone, Inc.Cobalt and nickel electroless plating in microelectronic devices
US736492021 Dec 200529 Apr 2008Technion Research and Development Foundation Ltd.Method for gold deposition
US75890478 Jun 200615 Sep 2009Los Alamos National Security, LLCComposite materials and method of making
US785114911 Aug 200314 Dec 2010Method for gold deposition