US20090065772A1 - Apparatus for detecting pattern alignment error - Google Patents
Apparatus for detecting pattern alignment error Download PDFInfo
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- US20090065772A1 US20090065772A1 US11/868,561 US86856107A US2009065772A1 US 20090065772 A1 US20090065772 A1 US 20090065772A1 US 86856107 A US86856107 A US 86856107A US 2009065772 A1 US2009065772 A1 US 2009065772A1
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- conductive pattern
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- alignment error
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4679—Aligning added circuit layers or via connections relative to previous circuit layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
- H05K1/0268—Marks, test patterns or identification means for electrical inspection or testing
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
- H05K2201/0969—Apertured conductors
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09909—Special local insulating pattern, e.g. as dam around component
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Structure Of Printed Boards (AREA)
Abstract
An apparatus for detecting pattern alignment error includes a first conductive pattern disposed over a first insulation member with a power source applied to the first conductive pattern; a second insulation member for covering the first conductive pattern; a second conductive pattern disposed on the second insulation member; a conductive via connected to the second conductive pattern and passing through the second insulation member; and an insulation pattern disposed in the first conductive pattern for detecting an alignment error in response to a position of the conductive via. The apparatus for detecting pattern alignment error can detect the alignment of lower wiring in a device with multi-layer wiring
Description
- The present application claims priority to Korean patent application number 10-2007-91798 filed on Sep. 10, 2007, which is incorporated herein by reference in its entirety.
- The present invention relates to an apparatus for detecting a pattern alignment error.
- Recent, developments in semiconductor device fabrication have led to a technology for fabricating a semiconductor package with a semiconductor device and a circuit board on which the semiconductor package is mounted.
- In the development, the semiconductor device, semiconductor package and circuit board may have a multi-layered wiring structure.
- For example, a circuit board may include wirings disposed on different layers in order to input or output various types of signals.
- In this technology, in order to form the wirings in different layers, a lower wiring is formed on a lower insulation member, and the lower wiring is insulated by an upper insulation member. Subsequently, an upper wiring is formed on the upper insulation member, and the upper wiring is then electrically connected to the lower wiring through a conductive via.
- However, when the wirings are disposed on different layers, they are often not aligned accurately, and the upper wiring and lower wiring end up not being connected to each other through the conductive via.
- An alignment error of the upper wiring can be easily recognized through a visual test while, but an alignment error of the lower wiring is hard to recognized through a visual test because the lower wiring has been covered by the upper insulation member.
- Embodiments of the present invention are directed to an apparatus for detecting pattern alignment error, and more specifically to an apparatus that is adapted to detect the alignment of the lower wiring of a device with multi-layered wiring.
- In one embodiment, an apparatus for detecting pattern alignment error may comprise a first conductive pattern disposed over a first insulation member with a power source applied to the first conductive pattern; a second insulation member covering the first conductive pattern; a second conductive pattern disposed on the second insulation layer; a conductive via connected to the second conductive pattern and passing through the second insulation member; and an insulation pattern disposed in the first conductive pattern for detecting an alignment error in response to a position of the conductive via.
- The insulation pattern may be a through hole passing through the first conductive pattern. Alternatively, the insulation pattern may be disposed over the first conductive pattern.
- The power source is a DC voltage. An area of the insulation pattern is about 105 to 200% of the area of the conductive via. The insulation pattern may have a circular shape when viewed from above with a diameter of 50 μm to 200 μm.
- The apparatus for detecting pattern alignment error may further comprise a third conductive pattern disposed over the second insulation member and an additional conductive via passing through the second insulation member that connects the third conductive pattern to the first conductive pattern; and a power line that is electrically connected to the third conductive pattern rather than the first conductive pattern and a power source applied to the power line.
- A plated layer may be formed on the second and third conductive patterns in a case where the conductive via is disposed over the first conductive pattern.
- The plated layer will be formed only on the third conductive pattern in a case where the conductive via is disposed over the insulation pattern rather than the first conductive pattern.
- The apparatus for detecting a pattern alignment error may include a number of second conductive patterns and insulation patterns corresponding to each second conductive pattern, and the insulation patterns may all be different sizes.
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FIG. 1 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a first embodiment of the present invention. -
FIG. 2 is a cross-sectional view taken along line I-I′ inFIG. 1 . -
FIG. 3 is a cross-sectional view illustrating that a first conductive pattern shown inFIG. 2 is disposed out of the alignment error range. -
FIG. 4 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a second embodiment of the present invention. -
FIG. 5 is a cross-sectional view taken along line II-II′ inFIG. 4 . -
FIG. 6 is a cross-sectional view illustrating that a first conductive pattern shown inFIG. 5 is disposed out of the alignment error range. -
FIG. 7 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a third embodiment of the present invention. -
FIG. 8 is a cross-sectional view taken along line III-III′ inFIG. 7 . -
FIG. 9 is a cross-sectional view illustrating that a first conductive pattern shown inFIG. 8 is disposed out of the alignment error range. -
FIG. 10 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a fourth embodiment of the present invention. -
FIG. 11 is a cross-sectional view taken along line IV-IV′ inFIG. 9 . -
FIG. 12 is a cross-sectional view illustrating that a first conductive pattern shown inFIG. 11 is disposed out of the alignment error range. - Hereafter, an apparatus for detecting a pattern alignment error in accordance with embodiments of the present invention will be described with reference to the attached drawings.
- The apparatus for detecting a pattern alignment error to be described herein after is disposed at a periphery of an active area on which a multi-layered wiring is formed. Also, a first conductive pattern of the apparatus for detecting a pattern alignment error is formed simultaneously with the lower wiring disposed at the active area. A second pattern is formed simultaneously with the upper wiring disposed at the active area.
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FIG. 1 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a first embodiment of the present invention.FIG. 2 is a cross-sectional view taken along line I-I′ inFIG. 1 showing a case where the first conductive layer is formed within the alignment error range.FIG. 3 shows a case where the first conductive layer is formed outside of the alignment error range. - Referring to
FIGS. 1 , 2, and 3, the pattern alignmenterror detecting apparatus 100 includes afirst insulation member 110, a firstconductive pattern 120 having aninsulation pattern 125, asecond insulation member 130, and a secondconductive pattern 150 having a conductive via 145. - The first
conductive pattern 120 is disposed over thefirst insulation member 110 which includes insulation material. The firstconductive pattern 120 may be electrically connected, for example, to a power line (not shown) through which a DC power source Vd is applied. - In the present embodiment, an example of material which may be used as the first
conductive pattern 120 and the power line include aluminum, aluminum alloy, copper, cooper alloy, metal alloy, etc. - The first
conductive pattern 120 includes theinsulation pattern 125. Theinsulation pattern 125 may be disposed, for example, in the center part of the firstconductive pattern 120. In the present embodiment, theinsulation pattern 125 may be a through hole that is formed in a portion of the firstconductive pattern 120. Theinsulation pattern 125 has a circular shape when viewed from above with a diameter D. For example, the diameter D of theinsulation pattern 125 may be about 50 μm to about 200 μm The diameter D of theinsulation pattern 125 may otherwise vary within the alignment error range. - The
second insulation member 130 is disposed over thefirst insulation member 110 and consequently covers the firstconductive pattern 120. Thesecond insulation member 130 includes insulation material. - A
via hole 132 passes through thesecond insulation member 130. In the present embodiment, when the firstconductive pattern 120 is formed within the alignment error range, thevia hole 132 is located at the portion corresponding to theinsulation pattern 125 of the first conductive pattern 120 (as shown inFIG. 2 ). When the firstconductive pattern 120 is formed outside of the alignment error range, thevia hole 132 will be located at a portion of the firstconductive pattern 120 adjacent to the insulation pattern 125 (as shown inFIG. 3 ). - A conductive via 145 is placed inside the
via hole 132 formed in thesecond insulation member 130. In the present embodiment, the conductive via 145 may have a cylindrical shape. The conductive via 145 having a cylindrical shape has a diameter D1 that is smaller than the diameter D of theinsulation pattern 125. In the present embodiment, the area of theinsulation pattern 125 may be about 105 to 200% of the area of the conductive via 145. - The second
conductive pattern 150 is disposed over thesecond insulation member 130. In the present embodiment, the conductive via 145 and the secondconductive pattern 150 may be formed integrally. - An examples of material that may be used as the conductive via 145 and the second
conductive pattern 150 include aluminum, aluminum alloy, copper, cooper alloy, and metal alloy, etc. - Hereinafter, the operation of the pattern alignment error detecting apparatus in accordance with the first embodiments of the present invention will be described with reference to the attached drawings.
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FIG. 2 shows the case where the firstconductive pattern 120 is disposed within the alignment error range. A plating solution may be applied to the secondconductive pattern 150. The conductive via 145 and the firstconductive pattern 120 are spaced apart from each other (i.e. they don't connect) and thus the DC voltage Vd applied to the firstconductive pattern 120 does not reach the secondconductive pattern 150 through the conductive via 145. - Therefore, when the first
conductive pattern 120 is disposed within the alignment error range, the secondconductive pattern 150 does not receive DC voltage Vd, and consequently a plated layer is not formed over the secondconductive pattern 150 even when the secondconductive pattern 150 comes into contact with a plating solution. When the plating area is not formed, the fact that the firstconductive pattern 120 is disposed within the alignment error range is confirmed. Alternatively, it is possible to confirm that the firstconductive pattern 120 is disposed within the alignment error range, by measuring the voltage of the secondconductive pattern 150 rather than applying a plating solution. -
FIG. 3 is a cross-sectional view illustrating that the first conductive pattern shown inFIG. 2 is disposed out of the alignment error range. -
FIG. 3 shows a case where the firstconductive pattern 120 is disposed out of the alignment error range. InFIG. 3 , the conductive via 145 is electrically connected to the firstconductive pattern 120. Therefore, the DC voltage Vd applied to the firstconductive pattern 120 is reaches the secondconductive pattern 150 through the conductive via 145. - Therefore, when the plating solution is applied to the second
conductive pattern 150 and the firstconductive pattern 120 is out of the alignment error range, the secondconductive pattern 150 receives DC voltage Vd and a platedlayer 155 is formed over the secondconductive pattern 150. Alternatively, it is possible to confirm easily that the disposition of the firstconductive pattern 120 is out of the alignment error range by measuring the voltage of the secondconductive pattern 150 rather than applying the plating solution. -
FIG. 4 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a second embodiment of the present invention.FIG. 5 is a cross-sectional view taken along line II-II′ inFIG. 4 showing a case where the first conductive layer is formed within the alignment error range.FIG. 6 shows a case where the first conductive layer is formed outside of the alignment error range. - Referring to
FIGS. 4 , 5, and 6, the pattern alignmenterror detecting apparatus 200 includes afirst insulation member 210, a firstconductive pattern 220 having aninsulation pattern 225, asecond insulation member 230, and a secondconductive pattern 250 having a conductive via 245. - The first
conductive pattern 220 is disposed over thefirst insulation member 210. The insulation member includes an insulation material. The firstconductive pattern 220 is electrically connected, for example, to a power line (not shown) through which a DC power source Vd is applied. - In the present embodiment, examples of material that may be used as the first
conductive pattern 220 and the power line include aluminum, aluminum alloy, copper, cooper alloy, metal alloy, etc. - The first
conductive pattern 220 includes theinsulation pattern 225. Theinsulation pattern 225 may be disposed, for example, on the center part of the firstconductive pattern 220. - In the present embodiment, the
insulation pattern 225 may be disposed over the firstconductive pattern 220. Theinsulation pattern 225 may be an insulation layer disposed over the firstconductive pattern 220, or alternatively, theinsulation pattern 225 may be a photoresist pattern disposed over the firstconductive pattern 220. - The
insulation pattern 225 disposed over the firstconductive pattern 220 has a disc shape with a diameter D when viewed from above. The diameter D of theinsulation pattern 225 may be about 50 μm to about 200 μm. The diameter D of theinsulation pattern 225 may otherwise vary within an alignment error range. - The
second insulation member 230 is disposed over thefirst insulation member 210 and consequently covers the firstconductive pattern 220. Thesecond insulation member 230 includes insulation material. - A via
hole 232 is located in thesecond insulation member 230. The viahole 232 passes through thesecond insulation member 230. In the present embodiment, when the first conductive pattern is formed within the alignment error range (as shown inFIG. 5 ), the viahole 232 is formed in the area of the second insulation layer that corresponds to theinsulation pattern 225 disposed over the firstconductive pattern 220. When the first conductive pattern is formed outside of the alignment error range (as shown inFIG. 6 ), the viahole 232 is formed on a portion of the firstconductive pattern 220 adjacent to theinsulation pattern 225. - A conductive via 245 is placed inside the via
hole 232 formed in thesecond insulation member 230. In the present embodiment, the conductive via 245 may have a cylindrical shape. The conductive via 245 having a cylindrical shape has a diameter D1 that is smaller than the diameter D of theinsulation pattern 225 disposed over the firstconductive pattern 220. In the present embodiment, the area of theinsulation pattern 225 may be about 105 to 200% of the area of the conductive via 245. - The second
conductive pattern 250 is disposed over thesecond insulation member 230. In the present embodiment, the conductive via 245 and the secondconductive pattern 250 may be formed integrally. - Examples of material that may be used as the conductive via 245 and the second
conductive pattern 250 include aluminum, aluminum alloy, copper, cooper alloy, metal alloy, etc. - Hereinafter, the operation of the pattern alignment error detecting apparatus in accordance with the second embodiments of the present invention will be described with reference to the attached drawings.
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FIG. 5 shows the case where the firstconductive pattern 220 is disposed within the alignment error range. In the pattern alignment error device, a plating solution may be applied to the second conductive pattern. When the firstconductive pattern 220 is disposed within the alignment error range, the conductive via 245 is disposed over theinsulation pattern 225 of the firstconductive pattern 220, and thus the DC voltage Vd applied to the firstconductive pattern 220 does not reach the secondconductive pattern 250 through the conductive via 245 due to theinsulation pattern 225. - Therefore, when the first
conductive pattern 220 is disposed within an alignment error range, the secondconductive pattern 250 does not receive the DC voltage Vd and consequently a plated layer does not form over the secondconductive pattern 250 even when the secondconductive pattern 250 comes into contact with a plating solution. When the plating area is not formed, the fact that the firstconductive pattern 120 is disposed within the alignment error range is confirmed. Alternatively, it is possible to confirm that the firstconductive pattern 220 is disposed within the alignment error range by measuring the voltage of the secondconductive pattern 250 rather than applying a plating solution. -
FIG. 6 is a cross-sectional view illustrating that the first conductive pattern shown inFIG. 5 is disposed out of the alignment error range. -
FIG. 6 shows a case where the firstconductive pattern 220 is disposed out of the alignment error range. The conductive via 245 is electrically connected to the firstconductive pattern 220. Therefore, the DC voltage Vd applied to the first conductive pattern reaches the secondconductive pattern 250 through the conductive via 245. - Therefore, when the plating solution is applied to the second conductive pattern and the the first
conductive pattern 220 is out of the alignment error range, the secondconductive pattern 250 receives DC voltage Vd and thus a platedlayer 255 is formed over the secondconductive pattern 250. Alternatively, it is possible to confirm easily that the disposition of the firstconductive pattern 220 is out of the alignment error range by measuring the voltage of the secondconductive pattern 250 rather than applying the plating solution. -
FIG. 7 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a third embodiment of the present invention.FIG. 8 is a cross-sectional view taken along line III-III′ inFIG. 7 showing a case where the first conductive layer is formed within the alignment error range.FIG. 9 shows a case where the first conductive layer is formed outside of the alignment error range. - Referring to
FIGS. 7 , 8, and 9, the pattern alignmenterror detecting apparatus 300 includes afirst insulation member 310, a firstconductive pattern 320 having aninsulation pattern 325, asecond insulation member 330, a secondconductive pattern 350 having a conductive via 345, and a thirdconductive pattern 370 having an additional conductive via 365. - The first
conductive pattern 320 is disposed over thefirst insulation member 310. Thefirst insulation member 310 includes insulation material. - The first
conductive pattern 320 includes theinsulation pattern 325. Theinsulation pattern 325 may be disposed, for example, at a center part of the firstconductive pattern 320. In the present embodiment, theinsulation pattern 325 may be a through hole that is formed in a portion of the firstconductive pattern 320. Theinsulation pattern 325 has a circular shape with a diameter D when view from above. The diameter D of theinsulation pattern 325 may be about 50 μm to 200 μm. The diameter D of theinsulation pattern 125 may otherwise vary within the alignment error range. Alternatively, the insulation pattern may instead be an insulation layer or a photoresist pattern disposed over the firstconductive pattern 320. - The
second insulation member 330 is disposed over thefirst insulation member 310 and consequently covers the firstconductive pattern 320. Thesecond insulation member 330 includes insulation material. - A via
hole 332 passes through thesecond insulation member 330. In the present embodiment, when the firstconductive pattern 320 is formed within the alignment error range, the viahole 332 is formed at a portion corresponding to theinsulation pattern 325 of the firstconductive pattern 320. When the firstconductive pattern 320 is formed outside of the alignment error range, the viahole 332 will be formed at a portion of the firstconductive pattern 320 adjacent to the insulation pattern 325 (as shown inFIG. 9 ). - A conductive via 345 is placed inside the via
hole 332 formed in thesecond insulation member 330. In the present embodiment, the conductive via 345 may have a cylindrical shape. The conductive via 345 having a cylindrical shape has a diameter D1 that is smaller than the diameter D of theinsulation pattern 325. In the present embodiment, the area of theinsulation pattern 325 may be about 105 to 200% of the area of the conductive via 345. - The second
conductive pattern 350 is disposed over thesecond insulation member 330. In the present embodiment, the conductive via 345 and the secondconductive pattern 350 may be formed integrally. - An examples of material that may be used as the conductive via 345 and the second
conductive pattern 350 include aluminum, aluminum alloy, copper, cooper alloy, and metal alloy, etc. - The
second insulation member 330 includes an additional viahole 363 that passes through thesecond insulation member 330. In the present embodiment, the additional viahole 363 is disposed at a portion of the firstconductive pattern 320 adjacent to theinsulation pattern 325. The additional conductive via 363 is placed inside the additional viahole 363, and the conductive via 363 contacts the firstconductive pattern 320. - The third
conductive pattern 370 is disposed over thesecond insulation member 330. In the present embodiment, the thirdconductive pattern 370 and the additional conductive via 365 may be formed integrally. The thirdconductive pattern 370 is electrically connected to apower line 380 that provides a DC voltage Vd to the thirdconductive pattern 370. - Hereinafter, the operation of the pattern alignment error detecting apparatus in accordance with the third embodiments of the present invention will be described with reference to the attached drawings.
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FIG. 8 shows the case where the firstconductive pattern 320 is disposed within the alignment error range. A plating solution may be applied to the secondconductive pattern 350 and the thirdconductive pattern 375. The thirdconductive pattern 370 is electrically connected to the firstconductive pattern 320 by the additional conductive via 365. However, the conductive via 345 is spaced apart from the firstconductive pattern 120. Therefore, the DC voltage Vd applied to the thirdconductive pattern 370 by thepower line 380, which in turn flows through the additional conductive via 365 and the firstconductive pattern 320, does not reach the secondconductive pattern 350 through the conductive via 345. - Therefore, when the first
conductive pattern 320 is disposed within the alignment error range, the secondconductive pattern 350 does not receive the DC voltage Vd, and consequently a plated layer is not formed over the secondconductive pattern 350 even when the secondconductive pattern 350 comes into contact with a plating solution. When the plating area is not formed, the fact that the firstconductive pattern 120 is disposed within the alignment error range is confirmed. Alternatively, it is possible to confirm that the firstconductive pattern 320 is disposed within the alignment error range by measuring the voltage of the secondconductive pattern 150, rather than applying a plating solution. When the plating solution is applied to the second and thirdconductive patterns layer 375 will form over the thirdconductive pattern 370. -
FIG. 9 is a cross-sectional view illustrating that the first conductive pattern shown inFIG. 8 is disposed out of the alignment error range. -
FIG. 9 shows a case where the firstconductive pattern 320 is disposed out of the alignment error range. InFIG. 9 , the conductive via 345 is electrically connected to the firstconductive pattern 320. Therefore, the DC voltage Vd applied to the thirdconductive pattern 370 by thepower line 380, which then travels through the additional conductive via 365 and the first conductive pattern, reaches the secondconductive pattern 350 through the conductive via 345. - Therefore, when the plating solution is applied to the second conductive pattern, and the first
conductive pattern 320 is out of the alignment error range, the secondconductive pattern 350 received DC voltage Vd and a platedlayer 355 is formed over the secondconductive pattern 350. Alternatively, it is possible to confirm easily that the the firstconductive pattern 320 is out of the alignment error range by measuring a voltage applied to the secondconductive pattern 350 rather than applying the plating solution. -
FIG. 10 is a plan view illustrating an apparatus for detecting pattern alignment error in accordance with a fourth embodiment of the present invention.FIG. 11 is a cross-sectional view taken along line IV-IV′ inFIG. 9 showing a case where the first conductive layer is formed within the alignment error range.FIG. 3 shows a case where the first conductive layer is formed outside of the alignment error range. - Referring to
FIGS. 10 , 11, and 12, the pattern alignmenterror detecting apparatus 400 includes afirst insulation member 410, a firstconductive pattern 420 having a plurality ofinsulation patterns 424, asecond insulation member 430, and a secondconductive pattern 450 having a plurality ofconductive vias 464. - The first
conductive pattern 420 is disposed over thefirst insulation member 410. Thefirst insulation member 410 includes insulation material. The firstconductive pattern 420 is electrically connected, for example, to a power line (not shown) through which a DC power source Vd is applied. - In the present embodiment, an example of materials that may be used as the first
conductive pattern 420 and the power line include aluminum, aluminum alloy, copper, cooper alloy, metal alloy, etc. - The first
conductive pattern 420 includes theinsulation patterns 424. In the present embodiment, theinsulation patterns 424 may be, for example, through holes that are formed in the firstconductive pattern 420. Theinsulation pattern 125 has a circular shape when view from above. For example, the diameter of eachinsulation pattern 424 may be 50 μm to 200 μm. The diameter of theinsulation pattern 424 may otherwise vary within the alignment error range. - The
insulation patterns 424 are disposed along the Y-axis shown inFIG. 10 . In the present embodiment, the number of theinsulation patterns 424 is five. Hereinafter, the five insulation patterns are referred to as afirst insulation pattern 425, asecond insulation pattern 426, athird insulation pattern 427, afourth insulation pattern 428, and afifth insulation pattern 429. - In the present embodiment, the first to
fifth insulation patterns 425 to 429 each have different sizes. For example, thefirst insulation pattern 425 has a first size, thesecond insulation pattern 426 has a second size, thethird insulation pattern 427 has a third size, thefourth insulation pattern 428 has a fourth size, and thefifth insulation pattern 429 has a fifth size. - The
second insulation member 430 is disposed over thefirst insulation member 410 and consequently covers the firstconductive pattern 420. Thesecond insulation member 430 includes insulation material. - The
second insulation member 430 includes a plurality of viaholes 435 that each pass through thesecond insulation member 430. In the present embodiment, when the firstconductive pattern 420 is formed within the alignment error range, the viaholes 435 are formed at portions of the second insulation member corresponding to therespective insulation patterns 425 to 429. When the firstconductive pattern 420 is formed outside of the alignment error range, the viaholes 435 may be formed at portions of the firstconductive pattern 420 adjacent to theinsulation patterns 425 to 429. - The
conductive vias second insulation member 430. In the present embodiment, theconductive vias 465 to 469 may have, for example, a cylindrical shape. - The
conductive vias 465 to 469 having the cylindrical shape have the same diameters. The diameter of theconductive vias 465 to 469 is smaller than the diameter of theinsulation patterns 425 to 429. In the present embodiment, areas of theinsulation patterns 425 to 429 may be 105 to 200% of the areas of theconductive vias 465 to 469 respectively. - The second
conductive patterns second insulation member 430. In the present embodiment, theconductive patterns 450 are formed integrally with the corresponding conductive via 465 to 469. - Hereinafter, the operation of the pattern alignment error detecting apparatus in accordance with the fourth embodiments of the present invention will be described with reference to the attached drawings.
-
FIG. 11 shows the case where the firstconductive pattern 420 is disposed within an alignment error range. A plating solution may be applied to the secondconductive patterns 450. Theconductive vias 145 and the firstconductive pattern 420 are spaced apart from each other (i.e. they don't connect) and thus the DC voltage Vd applied to the firstconductive pattern 420 does not reach the secondconductive patterns 450 through theconductive vias 465 to 469. - Therefore, when the first
conductive pattern 420 is disposed within the alignment error range, the secondconductive pattern 450 does not receive DC voltage Vd and consequently a plated layer is not formed over each secondconductive pattern 450 even when the secondconductive pattern 450 comes into contact with a plating solution. When the plating area is not formed, the fact that the firstconductive pattern 420 is disposed within the alignment error range is confirmed. Alternatively, it is possible to confirm that the firstconductive pattern 420 is disposed within the alignment error range by measuring the voltage of each secondconductive pattern 450, rather than applying the plating solution. -
FIG. 12 is a cross-sectional view illustrating that a first conductive pattern shown inFIG. 11 is disposed out of an alignment error range. -
FIG. 12 shows a case where the firstconductive pattern 420 is disposed out of the alignment error range. When the firstconductive pattern 420 is disposed out of the alignment error range, some of theconductive vias 465 to 469 may be electrically connected to the firstconductive pattern 420. For example, the conductive via 469 corresponding to thefifth insulation pattern 429 has a relatively small area, and thus is electrically connected to the firstconductive pattern 420. - Therefore, when the plating solution is applied to the second
conductive patterns 450, and the DC voltage Vd applied to the firstconductive pattern 420 reaches the secondconductive pattern 455 through the conductive via 469, a plated layer 480 is formed over the secondconductive pattern 455. Alternatively, it is possible to confirm easily that the disposition of the firstconductive pattern 420 is out of the alignment error range by measuring a voltage applied to the secondconductive patterns 451 to 455 rather than applying the plating solution. - In a case where the alignment error range of the first
conductive pattern 420 is small, the number of the secondconductive patterns 451 to 455 on which the plated layer is formed is small. In contrast, in a case that the alignment error range of the firstconductive pattern 420 is large, the number of the secondconductive patterns 451 to 455 on which the plated layer is formed increases. - The pattern alignment error detecting apparatus described above can be applied to various devices having multi-layered wiring. For example, the pattern alignment error detecting apparatus may be applied to a printed circuit board having multi-layered wiring, a semiconductor chip having multi-layered wiring, a semiconductor package having multi-layered wiring, etc.
- As is apparent from the above description, there is a major advantage in using the present invention, in that the alignment error of the lower wiring of a multi-layered wiring can be easily recognized.
- Although specific embodiments of the present invention have been described for illustrative purposes, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope and the spirit of the invention as disclosed in the accompanying claims.
Claims (10)
1. An apparatus for detecting a pattern alignment error, comprising:
a first conductive pattern disposed over a first insulation member, wherein a power source is applied to the first conductive pattern;
a second insulation member covering the first conductive pattern;
a second conductive pattern disposed on the second insulation layer;
a conductive via electrically connected to the second conductive pattern and passing through the second insulation member; and
an insulation pattern disposed in the first conductive pattern for detecting an alignment error in response to a position of the conductive via.
2. The apparatus for detecting a pattern alignment error according to claim 1 , wherein the insulation pattern is a through hole passing through the first conductive pattern.
3. The apparatus for detecting a pattern alignment error according to claim 1 , wherein the insulation pattern is disposed over the first conductive pattern.
4. The apparatus for detecting a pattern alignment error according to claim 1 , wherein the power source is a DC voltage.
5. The apparatus for detecting a pattern alignment error according to claim 1 , wherein an area of the insulation pattern is 105% to 200% of an area of the conductive via.
6. The apparatus for detecting a pattern alignment error according to claim 5 , wherein the insulation pattern has a circular shape when viewed from above and a diameter of the insulation pattern is 50 μm to 200 μm.
7. The apparatus for detecting a pattern alignment error according to claim 1 , further comprising:
a third conductive pattern disposed over the second insulation member;
an additional conductive via passing through the second insulation member, wherein the additional conductive via is electrically connected to the third conductive pattern and the first conductive pattern;
wherein the power source is electrically connected to the third conductive pattern rather than the first conductive pattern.
8. The apparatus for detecting a pattern alignment error according to claim 7 , wherein a plated layer is formed over the second and third conductive patterns when when the position of the conductive via is such that the conductive via is on the first conductive pattern.
9. The apparatus for detecting a pattern alignment error according to claim 7 , wherein a plating layer is formed over only the third conductive pattern when the position of the conductive via is such that the conductive via is over the insulation pattern.
10. The apparatus for detecting a pattern alignment error according to claim 1 , wherein a number of the second conductive pattern is at least two, and each insulation pattern corresponds to each second conductive pattern, and the insulation patterns have different sizes.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/098,764 US8315064B2 (en) | 2007-09-10 | 2011-05-02 | Apparatus for detecting pattern alignment error |
US13/644,184 US20130027076A1 (en) | 2007-09-10 | 2012-10-03 | Apparatus for detecting pattern alignment error |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070091798A KR100891531B1 (en) | 2007-09-10 | 2007-09-10 | Device for detecting alignment error of pattern |
KR10-2007-0091798 | 2007-09-10 |
Related Child Applications (1)
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US13/098,764 Division US8315064B2 (en) | 2007-09-10 | 2011-05-02 | Apparatus for detecting pattern alignment error |
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US20090065772A1 true US20090065772A1 (en) | 2009-03-12 |
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ID=40430860
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
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US11/868,561 Abandoned US20090065772A1 (en) | 2007-09-10 | 2007-10-08 | Apparatus for detecting pattern alignment error |
US13/098,764 Active US8315064B2 (en) | 2007-09-10 | 2011-05-02 | Apparatus for detecting pattern alignment error |
US13/644,184 Abandoned US20130027076A1 (en) | 2007-09-10 | 2012-10-03 | Apparatus for detecting pattern alignment error |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
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US13/098,764 Active US8315064B2 (en) | 2007-09-10 | 2011-05-02 | Apparatus for detecting pattern alignment error |
US13/644,184 Abandoned US20130027076A1 (en) | 2007-09-10 | 2012-10-03 | Apparatus for detecting pattern alignment error |
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US20160363542A1 (en) * | 2014-03-28 | 2016-12-15 | Intel Corporation | Inspection of microelectronic devices using near-infrared light |
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US10991666B2 (en) * | 2017-12-26 | 2021-04-27 | Sharp Kabushiki Kaisha | Location displacement detection method, location displacement detection device, and display device |
CN111584386A (en) * | 2020-05-29 | 2020-08-25 | 长江存储科技有限责任公司 | Test structure, test method and semiconductor structure |
Also Published As
Publication number | Publication date |
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KR20090026682A (en) | 2009-03-13 |
US20110203935A1 (en) | 2011-08-25 |
US20130027076A1 (en) | 2013-01-31 |
US8315064B2 (en) | 2012-11-20 |
KR100891531B1 (en) | 2009-04-03 |
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