US20050061229A1 - Optical spinel articles and methods for forming same - Google Patents

Optical spinel articles and methods for forming same Download PDF

Info

Publication number
US20050061229A1
US20050061229A1 US10/802,160 US80216004A US2005061229A1 US 20050061229 A1 US20050061229 A1 US 20050061229A1 US 80216004 A US80216004 A US 80216004A US 2005061229 A1 US2005061229 A1 US 2005061229A1
Authority
US
United States
Prior art keywords
spinel
wavelength range
ratio
less
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/802,160
Inventor
Jennifer Stone-Sundberg
Milan Kokta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Ceramics and Plastics Inc
Original Assignee
Saint Gobain Ceramics and Plastics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Ceramics and Plastics Inc filed Critical Saint Gobain Ceramics and Plastics Inc
Priority to US10/802,160 priority Critical patent/US20050061229A1/en
Assigned to SAINT-GOBAIN CERAMICS & PLASTICS, INC. reassignment SAINT-GOBAIN CERAMICS & PLASTICS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KOKTA, MILAN, STONE-SUNDBERG, JENNIFER
Priority to JP2006528093A priority patent/JP2007506640A/en
Priority to AT04788859T priority patent/ATE491828T1/en
Priority to PCT/US2004/030803 priority patent/WO2005031047A1/en
Priority to DE602004030592T priority patent/DE602004030592D1/en
Priority to RU2006109202/15A priority patent/RU2336372C2/en
Priority to EP04788859A priority patent/EP1670976B1/en
Priority to TW093128872A priority patent/TWI261580B/en
Publication of US20050061229A1 publication Critical patent/US20050061229A1/en
Priority to IL174350A priority patent/IL174350A0/en
Priority to JP2011128276A priority patent/JP5562905B2/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • C30B29/24Complex oxides with formula AMeO3, wherein A is a rare earth metal and Me is Fe, Ga, Sc, Cr, Co or Al, e.g. ortho ferrites
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/21Circular sheet or circular blank

Definitions

  • the present invention is generally directed to materials and articles having a spinel crystal structure.
  • the present invention relates generally to spinel materials particularly useful for optical applications.
  • Aluminous materials have been used and/or evaluated for demanding optical applications. Such optical applications include, for example, high powered lasing applications, in which the optical material is utilized as a window or mirror, through which an optical laser beam may be passed or reflected.
  • Aluminous materials that have been under consideration include single crystal alumina, typically in the form of sapphire. Other materials are microstructurally distinct from alumina, but containing a substantial portion of alumina groups, including yittria alumina garnet (YAG), as well as spinel MgO ⁇ Al 2 O 3 ). While sapphire and YAG demonstrate certain levels of robustness, the art continually demands materials having superior performance. In addition, sapphire does not have an optically isotropic structure, and accordingly, careful attention must be paid during fabrication of components to properly align the microstructure with the intended axis of the light passing through the component.
  • extended cooling periods and annealing periods are carried out to remove residual internal mechanical strain and stress present in the boules following boule formation.
  • Such cooling rates may be unusually low, and cooling periods significantly long, affecting throughput and increasing thermal budget and cost.
  • the extended annealing times which may range into the hundreds of hours, further increase processing costs.
  • a single crystal spinel material having a non-stoichiometric composition and having a transparency window represented by absorptivity over a wavelength range, the wavelength range extending from about 400 nm to about 800 nm.
  • the transparency window is defined as the largest single absorptivity peak height along the wavelength range, the largest single peak height being not greater than 0.35 1/cm.
  • FIG. 1 illustrates the optical transmission (absorptivity) properties of a previously developed cobalt-doped inverse spinel used in Q-switching applications.
  • FIG. 2 illustrates the optical transmission (absorptivity) properties of an alumina rich spinel, according to an embodiment of the present invention.
  • FIG. 3 illustrates a portion of the curve shown in FIG. 2 .
  • single crystal spinel materials generally in the form of structural components.
  • the single crystal spinel material generally has a non-stoichiometric composition and, according to one embodiment, has a transparency window over a wavelength range.
  • the wavelength range generally extends along a transmission range from about 400 nm to about 800 nm.
  • the transparency window may be defined as the largest single absorptivity peak height along the wavelength range, generally not greater than about 0.35 cm ⁇ 1 .
  • the wavelength range is further extended, meaning that the transparency window is maintained over a wider frequency range.
  • the wavelength range may extend up to about 2000 nm such as 3000 nm, 3500 nm, or even 4000 nm.
  • transmittance (or absorption) properties are fairly flat over an extended wavelength range, indicating a lack of dependency of transmittance properties based upon wavelength or frequency.
  • optical transmittance data are taken from samples having a thickness within a range of about 5 to 10 mm, which samples are machined for parallelism, flatness and surface finish. Samples had a parallelism less than 10 seconds or 0.003 degrees, flatness of ⁇ fraction (1/10) ⁇ wave maximum deviation over 90% of aperture as measured with a 632.8 nm HeNe, and Mil spec, requiring scratch and dig specifications according to Mil-O-13830A, having a 20/10 finish.
  • the reported absorptivity data are intrinsically normalized for thickness of the sample, that is, are generally thickness independent.
  • FIG. 1 illustrates the optical transmission data taken from a MgO ⁇ Al 2 O 3 spinel having a b:a ratio of 3:1, doped with 0.01% of Co 2+ .
  • This particular material was formed according to an embodiment described in U.S. patent application Ser. No. 09/863,013, published as U.S. Ser. No. 2003/0007520, commonly owned by the present assignee. This particular material is used for Q-switching applications, generally distinct from the optical applications according to embodiments of the present invention.
  • the sample has a largest single absorptivity peak height of about 0.4 cm ⁇ 1 occurring at about 590 nm.
  • FIGS. 2 and 3 illustrate the optical transmission properties according to an embodiment of the present invention, namely an undoped aMgO ⁇ bAl 2 O 3 spinel having a b:a ratio of about 3:1.
  • the sample has a fairly wide transmission window extending from about 400 nm to about 3700 nm.
  • the largest single absorptivity peak is less than about 0.1 cm ⁇ 1 , occurring at about 800 nm, represents a much smaller optical transmission loss or absorption than the cobalt-doped sample illustrated in FIG. 1 .
  • a similar absorptivity peak occurs at about 3000 nm.
  • processing begins with the formation of a batch melt in a crucible.
  • the batch melt is generally provided to manifest a non-stoichiometric composition in the as-formed spinel material, generally in the form of a “boule,” describing a single crystal mass formed by melt processing, which includes ingots, cylinders and the like structures.
  • the boule has a general formula of aAD ⁇ bE 2 D 3 , wherein A is selected from the group consisting of Mg, Ca, Zn, Mn, Ba, Sr, Cd, Fe, and combinations thereof, E is selected from the group consisting Al, In, Cr, Sc, Lu, Fe, and combinations thereof, and D is selected from the group consisting O, S, Se, and combinations thereof, wherein a ratio b:a>1:1 such that the spinel is rich in E 2 D 3 .
  • A is Mg
  • D is O
  • E is Al
  • the single crystal spinel has the formula aMgO ⁇ bAl 2 O 3 .
  • MgO—Al 2 O 3 spinel based-compositions it is understood that the present disclosure more generally relates to a broader group of spinel compositions, having the generalized formula aAD ⁇ bE 2 D 3 , as described above.
  • E 2 D 3 -rich spinels are generally represented by a ratio b:a greater than 1:1
  • certain embodiments have a b:a ratio not less than about 1.2:1, such as not less than about 1.5:1.
  • Other embodiments have even higher proportions of E 2 D 3 relative to AD, such as not less than about 2.0:1, or even not less than about 2.5:1.
  • the relative content of E 2 D 3 is limited, so as to have a b:a ratio not greater than about 4:1.
  • Specific embodiments may have a b:a ratio of about 3:1 (e.g., 2.9:1).
  • the spinel single crystal boule is formed by one of various techniques such as the Czochralski pulling technique. While the Czochralski pulling technique has been utilized for formation of certain embodiments herein, it is understood that any one of a number of melt-based techniques, as distinct from flame-fusion techniques, may be utilized. Such melt-based techniques also include the Bridgman method, the liquefied encapsulated Bridgman method, the horizontal gradient freeze method, and edge-defined growth method, the Stockberger method, or the Kryopolus method. These melt-based techniques fundamentally differ from flame fusion techniques in that melt-based techniques grow a boule from a melt.
  • flame fusion does not create a batch melt from which a boule is grown, but rather, provides a constant flow of raw material (such as in powder form), to a hot flame, and the molten product is then projected against a receiving surface on which the molten product solidifies.
  • the single seed crystal is contacted with the melt, while rotating the batch melt and the seed crystal relative to each other.
  • the seed crystal is formed of stoichiometric spinel and has sufficiently high purity and crystallographic homogeneity to provide a suitable template for boule growth.
  • the seed crystal may be rotated relative to a fixed crucible, the crucible may be rotated relative to a fixed seed crystal, or both the crucible and the seed crystal may be rotated. During rotation, the seed crystal and the actively forming boule are drawn out of the melt.
  • the boule consists essentially of a single spinel phase, with no secondary phases.
  • the boule and the components processed therefrom are free of impurities and dopants.
  • Co is restricted from inclusion in the foregoing embodiment, which otherwise is a dopant for Q-switch applications.
  • a single crystal spinel boule is formed having desirable properties.
  • the boules, and components formed therefrom also generally have reduced mechanical stress and/or strain, as compared to stoichiometric articles having a b:a ratio of 1:1.
  • embodiments of the present invention provide desirably high yield rates in connection with formation of single crystal components that form integral parts of larger scale optical assemblies, and also provide improved processing features, discussed in more detail hereinbelow.
  • the boule may be cooled at relatively high cooling rates such as not less than about 50° C./hour. Even higher cooling rates may be utilized according to embodiments of the present invention, such as not less than about 100° C./hour, 200° C./hour and even at a rate of greater than about 300° C./hour.
  • the increased cooling rates desirably improve throughput of the fabrication process for forming single crystal boules and further reduce the thermal budget of the entire fabrication, and accordingly reduce costs.
  • Boules formed according to conventional processing generally are cooled at relatively low cooling rates, in an attempt to prevent fracture during the cooling process. However, according to embodiments of the present invention, the cooling rates may be substantially higher yet still provide intact boules in the as-cooled form. Generally, conventional cooling rates are on the order of 40° C./hour or less, requiring cooling periods on the order of days.
  • annealing of the boule, conventionally carried out subsequent to cooling is restricted to a relatively short time period.
  • the time period is not greater than about 50 hours, such as not greater than about 30 hours, or even 20 hours.
  • the annealing is restricted to a time period not greater than about 10 hours.
  • annealing may be substantially completely eliminated, thereby obviating post-forming heat treatment.
  • conventional boule forming technology generally requires use of substantial anneal periods in an attempt to mitigate residual internal stress and strain, responsible for low wafer yield rates as well as boule fracture. Without wishing to be tied to any particular theory, it is believed that the reduction and internal stress and strain in the boule according to embodiments herein permits such flexible processing conditions, including decreased or complete elimination of annealing periods, as well as increased cooling rates as noted above.
  • the reduction in internal mechanical stress and strain are quantified by yield rate, the number of intact components formed by machining the boule.
  • machining is carried out by any one of several slicing techniques, most notably wire sawing.
  • this yield rate is very low, such as on the order 10%.
  • the unacceptably low yield rate is a manifestation of excessive internal stresses and strain in the boule.
  • yield rates according to embodiments of the present invention are typically not less than about 25%, 30% or even 40%.
  • Other embodiments show increasingly high yield rates, such as not less than about 50, 60 or even 70%. Indeed, certain embodiments have demonstrated near 100% yield.
  • This reduce internal mechanical stress and/or strain as quantified above is not only present within the as-formed (raw) boules, but also the processed boules, the component machined from boules.
  • the foregoing description of processed boules generally denotes boules that have been subjected to post-cooling machining steps, such as grinding, lapping, polishing and cleaning.
  • the material may be in the form of a polygonal planar window such as a rectangle or square.
  • the component may be in the shape of a flat disc having a circular or oval outer periphery.
  • Certain specialized applications call for more complex shapes, such as in the form of a cone or dome.
  • Such components may be suitably utilized at the leading end of a laser guided missile, for example.
  • Still other manifestations include light tubes, akin to fiber optic components.
  • a particular application includes mirrors, having a highly polished surface oriented at a particular angle to reflect and/or transmit IR light, in applications such as in lasing devices, particularly including the laser cavity.
  • the material has a laser damage threshold of not less than about 3.00 GW/cm 2 at a wavelength of 1064 nm.
  • the laser damage threshold may even be higher, such as not less than about 3.25, or even 3.50 GW/cm 2 at a wavelength of 1064 nm
  • a first set of data was generated at a wavelength of 1064 nm.
  • the spot diameter (1/e 2 ) was 430 microns.
  • 80 sites were tested at a rate of 200 shots per site.
  • Table 1 summarizes the data of a 3:1 spinel according to an embodiment of the present invention, as contrasted against stoichimetric 1:1 spinel, as well as sapphire and YAG.
  • the 3:1 spinel demonstrates superior damage resistance to laser exposure, notably demonstrating an unexpected damage threshold of 4.00 GW/cm 2 .
  • Table 2 summarizes the data for various samples at 1540 nm. The testing was carried out in a manner similar to the 1064 nm data. Here, the spot diameter was 115 microns. For the cobalt-doped sample, the spot diameter was 170 microns and 50 shots per site were utilized rather than 200 shots per site.
  • damage threshold testing was carried out at a wavelength of 532 nm. Again, testing was carried out in a manner similar to the 1064 nm testing unless otherwise indicated. Here, a spot diameter of 300 microns was utilized, a pulse width of 18 ns and the number of sites was increased to 100, while carrying out 200 shots per site.
  • Table 4 summarizes testing at 2100 nm. Testing was carried out at a pulse width of 40 ns, a spot diameter of 140 ⁇ m. 50 sites were tested, at a density of 200 shots/site. TABLE 4 Damage Threshold @ Damage Threshold @ MATERIAL 2100 nm (J/cm 2 ) 2100 nm (GW/cm 2 ) Sapphire 35.0 1.75 YAG 53.0 2.65 1:1 Spinel 60.0 3.0 3:1 Spinel 50.0 2.5
  • testing was carried out at 3000 nm. Testing was carried out at a pulse width of 10 ns, a spot diameter of 110 ⁇ m. 40 sites were tested, at a density of 200 shots/site.
  • Crucible Charge Preparation 392.1 g of MgO were combined with 2876.5 g of Al 2 O 3 (aluminum oxide). The raw materials were mixed together and heated for 12 hrs. At 1100 degrees centigrade in ceramic crucible. After cooling, the mixture was red into an iridium crucible 100 mm in diameter and 150 mm tall.
  • the iridium crucible with the oxide mixture was placed in standard Czochralski crystal growth station, and heated to the melting point of the oxide mixture by means of radio frequency heating.
  • An inert ambient atmosphere consisting of nitrogen with a small addition of oxygen was used around the crucible.
  • a small seed crystal of the 1:1 spinel with ⁇ 111> orientation attached to the pulling rod was used to initiate the start of the crystal growth process.
  • a single crystal boule was grown utilizing the following process conditions, diameter 53 mm, length 150 mm, seed pulling rate 2 mm/hr, seed rotation rate 4 rpm, cool-down time 6 hrs, total time 123 hrs.
  • the crystal After cooling the crystal was visually inspected for bubbles, inclusions or any other visible defects. After visual inspection the top and bottom ends were removed, and crystal was subjected to an x-ray orientation check (Laue diffraction technique). After passing all inspection tests the crystal was ready for fabrication.
  • x-ray orientation check Liaue diffraction technique

Abstract

A single crystal spinel material is disclosed, the material having a non-stoichiometric composition and having a transparency window over a wavelength range of about 400 nm to about 800 nm. According to an embodiment, the transparency window is defined as the largest single absorptivity peak height along the wavelength range to be not greater than 0.35 cm−1.

Description

    CROSS-REFERENCE TO RELATED APPLICATION(S)
  • This application is a continuation-in-part of and claims priority to U.S. application Ser. No. 10/669,141, filed Sep. 23, 2003 (attorney docket number BI4282), and hereby incorporates by reference the subject matter of that application.
  • BACKGROUND
  • 1. Field of the Invention
  • The present invention is generally directed to materials and articles having a spinel crystal structure. In addition, the present invention relates generally to spinel materials particularly useful for optical applications.
  • 2. Description of the Related Art
  • Various aluminous materials have been used and/or evaluated for demanding optical applications. Such optical applications include, for example, high powered lasing applications, in which the optical material is utilized as a window or mirror, through which an optical laser beam may be passed or reflected. Aluminous materials that have been under consideration include single crystal alumina, typically in the form of sapphire. Other materials are microstructurally distinct from alumina, but containing a substantial portion of alumina groups, including yittria alumina garnet (YAG), as well as spinel MgO·Al2O3). While sapphire and YAG demonstrate certain levels of robustness, the art continually demands materials having superior performance. In addition, sapphire does not have an optically isotropic structure, and accordingly, careful attention must be paid during fabrication of components to properly align the microstructure with the intended axis of the light passing through the component.
  • Spinel-based materials have shown promise for use in demanding optical applications, such as military use of high powered lasers. However, such materials are not without drawbacks, including material fabrication/processing issues. In this regard, the industry has sought to develop single crystalline spinel material, such as in the form of boules, from melt-based process techniques including the so-called Czochralski technique among others. Here, generally a stoichiometric crystal (typically MgO·Al2O3, having an MgO:Al2O3 ratio of 1:1) is grown from a batch melt. While melt-based techniques have shown much promise for the creation of single-crystal spinel materials, the process is relatively difficult to control and suffers from undesirably low yield rates, thereby increasing costs. In addition, extended cooling periods and annealing periods are carried out to remove residual internal mechanical strain and stress present in the boules following boule formation. Such cooling rates may be unusually low, and cooling periods significantly long, affecting throughput and increasing thermal budget and cost. In a similar manner, the extended annealing times, which may range into the hundreds of hours, further increase processing costs.
  • Still further, even beyond the relatively high processing costs and despite the precautions taken in an attempt to address residual mechanical strain and stress in the crystal, oftentimes the wafers formed from boules tend to suffer from undesirably high failure rates, with frequently lower than 20% yield rates.
  • In view of the foregoing, it is generally desirable to provide improved spinel materials, well suited for optical applications, as well as improved methods for forming same.
  • SUMMARY
  • According to one aspect, a single crystal spinel material is provided, the material having a non-stoichiometric composition and having a transparency window represented by absorptivity over a wavelength range, the wavelength range extending from about 400 nm to about 800 nm. The transparency window is defined as the largest single absorptivity peak height along the wavelength range, the largest single peak height being not greater than 0.35 1/cm.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 illustrates the optical transmission (absorptivity) properties of a previously developed cobalt-doped inverse spinel used in Q-switching applications.
  • FIG. 2 illustrates the optical transmission (absorptivity) properties of an alumina rich spinel, according to an embodiment of the present invention.
  • FIG. 3 illustrates a portion of the curve shown in FIG. 2.
  • DETAILED DESCRIPTION
  • According to one aspect of the present invention, single crystal spinel materials, generally in the form of structural components, are provided. The single crystal spinel material generally has a non-stoichiometric composition and, according to one embodiment, has a transparency window over a wavelength range. The wavelength range generally extends along a transmission range from about 400 nm to about 800 nm. The transparency window may be defined as the largest single absorptivity peak height along the wavelength range, generally not greater than about 0.35 cm−1. According to certain embodiments, the wavelength range is further extended, meaning that the transparency window is maintained over a wider frequency range. For example, the wavelength range may extend up to about 2000 nm such as 3000 nm, 3500 nm, or even 4000 nm. The above-noted largest single absorptivity peak height in certain embodiments is even further reduced, representing even superior transmittance properties, such as a height not greater than about 0.33 cm−1, about 0.30 cm−1, about 0.25 cm−1, about 0.20 cm−1, about 0.15 cm−1, or even about 0.10 cm−1. Desirably, transmittance (or absorption) properties are fairly flat over an extended wavelength range, indicating a lack of dependency of transmittance properties based upon wavelength or frequency.
  • The actual optical transmittance measurements are dependent upon various parameters. Generally, optical transmittance data are taken from samples having a thickness within a range of about 5 to 10 mm, which samples are machined for parallelism, flatness and surface finish. Samples had a parallelism less than 10 seconds or 0.003 degrees, flatness of {fraction (1/10)} wave maximum deviation over 90% of aperture as measured with a 632.8 nm HeNe, and Mil spec, requiring scratch and dig specifications according to Mil-O-13830A, having a 20/10 finish. However, the reported absorptivity data are intrinsically normalized for thickness of the sample, that is, are generally thickness independent.
  • To clarify the foregoing optical properties, attention is drawn to the drawings herein. FIG. 1 illustrates the optical transmission data taken from a MgO·Al2O3 spinel having a b:a ratio of 3:1, doped with 0.01% of Co2+. This particular material was formed according to an embodiment described in U.S. patent application Ser. No. 09/863,013, published as U.S. Ser. No. 2003/0007520, commonly owned by the present assignee. This particular material is used for Q-switching applications, generally distinct from the optical applications according to embodiments of the present invention. As illustrated, the sample has a largest single absorptivity peak height of about 0.4 cm−1 occurring at about 590 nm.
  • In contrast, FIGS. 2 and 3 illustrate the optical transmission properties according to an embodiment of the present invention, namely an undoped aMgO·bAl2O3 spinel having a b:a ratio of about 3:1. As illustrated, the sample has a fairly wide transmission window extending from about 400 nm to about 3700 nm. The largest single absorptivity peak is less than about 0.1 cm−1, occurring at about 800 nm, represents a much smaller optical transmission loss or absorption than the cobalt-doped sample illustrated in FIG. 1. A similar absorptivity peak occurs at about 3000 nm.
  • Turning to fabrication of spinel materials, typically, processing begins with the formation of a batch melt in a crucible. The batch melt is generally provided to manifest a non-stoichiometric composition in the as-formed spinel material, generally in the form of a “boule,” describing a single crystal mass formed by melt processing, which includes ingots, cylinders and the like structures. According to one embodiment, the boule has a general formula of aAD·bE2D3, wherein A is selected from the group consisting of Mg, Ca, Zn, Mn, Ba, Sr, Cd, Fe, and combinations thereof, E is selected from the group consisting Al, In, Cr, Sc, Lu, Fe, and combinations thereof, and D is selected from the group consisting O, S, Se, and combinations thereof, wherein a ratio b:a>1:1 such that the spinel is rich in E2D3. For clarification, a stoichiometric composition is one in which the ratio of b:a=1:1, while non-stoichiometric compositions have a b:a ratio≠1:1.
  • According to certain embodiments, A is Mg, D is O and E is Al, such that the single crystal spinel has the formula aMgO·bAl2O3. While some of the disclosure contained herein makes reference to the MgO—Al2O3 spinel based-compositions, it is understood that the present disclosure more generally relates to a broader group of spinel compositions, having the generalized formula aAD·bE2D3, as described above.
  • While E2D3-rich spinels are generally represented by a ratio b:a greater than 1:1, certain embodiments have a b:a ratio not less than about 1.2:1, such as not less than about 1.5:1. Other embodiments have even higher proportions of E2D3 relative to AD, such as not less than about 2.0:1, or even not less than about 2.5:1. According to certain embodiments, the relative content of E2D3 is limited, so as to have a b:a ratio not greater than about 4:1. Specific embodiments may have a b:a ratio of about 3:1 (e.g., 2.9:1).
  • Following formation of a batch melt in a crucible, typically, the spinel single crystal boule is formed by one of various techniques such as the Czochralski pulling technique. While the Czochralski pulling technique has been utilized for formation of certain embodiments herein, it is understood that any one of a number of melt-based techniques, as distinct from flame-fusion techniques, may be utilized. Such melt-based techniques also include the Bridgman method, the liquefied encapsulated Bridgman method, the horizontal gradient freeze method, and edge-defined growth method, the Stockberger method, or the Kryopolus method. These melt-based techniques fundamentally differ from flame fusion techniques in that melt-based techniques grow a boule from a melt. In contrast, flame fusion does not create a batch melt from which a boule is grown, but rather, provides a constant flow of raw material (such as in powder form), to a hot flame, and the molten product is then projected against a receiving surface on which the molten product solidifies.
  • Generally, the single seed crystal is contacted with the melt, while rotating the batch melt and the seed crystal relative to each other. Typically, the seed crystal is formed of stoichiometric spinel and has sufficiently high purity and crystallographic homogeneity to provide a suitable template for boule growth. The seed crystal may be rotated relative to a fixed crucible, the crucible may be rotated relative to a fixed seed crystal, or both the crucible and the seed crystal may be rotated. During rotation, the seed crystal and the actively forming boule are drawn out of the melt.
  • Typically, the boule consists essentially of a single spinel phase, with no secondary phases. According to another feature, the boule and the components processed therefrom are free of impurities and dopants. For example, Co is restricted from inclusion in the foregoing embodiment, which otherwise is a dopant for Q-switch applications. In contrast to Q-switch applications, it is generally desired that a relatively pure spinel is utilized substantially free of dopants that affect the basic and novel properties of the device substrates.
  • According to embodiments of the present invention, a single crystal spinel boule is formed having desirable properties. In addition to desired optical properties, the boules, and components formed therefrom also generally have reduced mechanical stress and/or strain, as compared to stoichiometric articles having a b:a ratio of 1:1. In this regard, embodiments of the present invention provide desirably high yield rates in connection with formation of single crystal components that form integral parts of larger scale optical assemblies, and also provide improved processing features, discussed in more detail hereinbelow.
  • With respect to improved processing features, the boule may be cooled at relatively high cooling rates such as not less than about 50° C./hour. Even higher cooling rates may be utilized according to embodiments of the present invention, such as not less than about 100° C./hour, 200° C./hour and even at a rate of greater than about 300° C./hour. The increased cooling rates desirably improve throughput of the fabrication process for forming single crystal boules and further reduce the thermal budget of the entire fabrication, and accordingly reduce costs. Boules formed according to conventional processing generally are cooled at relatively low cooling rates, in an attempt to prevent fracture during the cooling process. However, according to embodiments of the present invention, the cooling rates may be substantially higher yet still provide intact boules in the as-cooled form. Generally, conventional cooling rates are on the order of 40° C./hour or less, requiring cooling periods on the order of days.
  • Still further, according to another embodiment of the present invention, annealing of the boule, conventionally carried out subsequent to cooling, is restricted to a relatively short time period. Typically, the time period is not greater than about 50 hours, such as not greater than about 30 hours, or even 20 hours. According to certain embodiments, the annealing is restricted to a time period not greater than about 10 hours. Indeed, annealing may be substantially completely eliminated, thereby obviating post-forming heat treatment. In contrast, conventional boule forming technology generally requires use of substantial anneal periods in an attempt to mitigate residual internal stress and strain, responsible for low wafer yield rates as well as boule fracture. Without wishing to be tied to any particular theory, it is believed that the reduction and internal stress and strain in the boule according to embodiments herein permits such flexible processing conditions, including decreased or complete elimination of annealing periods, as well as increased cooling rates as noted above.
  • According to another feature, the reduction in internal mechanical stress and strain are quantified by yield rate, the number of intact components formed by machining the boule. Typically, machining is carried out by any one of several slicing techniques, most notably wire sawing. As used herein, yield rate may be quantified by the formula ci/(ci+cf)×100%, wherein ci=the number of intact components processed from the boule, and cf=the number of fractured components from the boule due to internal mechanical stress or strain in the boule. Conventionally, this yield rate is very low, such as on the order 10%. The unacceptably low yield rate is a manifestation of excessive internal stresses and strain in the boule. In contrast, yield rates according to embodiments of the present invention are typically not less than about 25%, 30% or even 40%. Other embodiments show increasingly high yield rates, such as not less than about 50, 60 or even 70%. Indeed, certain embodiments have demonstrated near 100% yield. This reduce internal mechanical stress and/or strain as quantified above is not only present within the as-formed (raw) boules, but also the processed boules, the component machined from boules. In this regard, the foregoing description of processed boules generally denotes boules that have been subjected to post-cooling machining steps, such as grinding, lapping, polishing and cleaning.
  • Turning to the particular physical manifestation of the spinel materials, embodiments may have various geometric configurations. For example, the material may be in the form of a polygonal planar window such as a rectangle or square. Alternatively, the component may be in the shape of a flat disc having a circular or oval outer periphery. Certain specialized applications call for more complex shapes, such as in the form of a cone or dome. Such components may be suitably utilized at the leading end of a laser guided missile, for example. Still other manifestations include light tubes, akin to fiber optic components. A particular application includes mirrors, having a highly polished surface oriented at a particular angle to reflect and/or transmit IR light, in applications such as in lasing devices, particularly including the laser cavity.
  • Turning to durability testing, various materials were tested in a controlled environment to determine user damage thresholds. Damage testing was carried out by the so-called least fluence failure technique, utilizing a nominal pulse width (FWHM) of 20 ns, at an incidence angle of 0°. The number of sites utilized for testing was varied, generally within a range of 60 to 90. Shots per site were also varied, generally within a range of about 50 to 200. According to an embodiment of the present invention, typically, the material has a laser damage threshold of not less than about 3.00 GW/cm2 at a wavelength of 1064 nm. The laser damage threshold may even be higher, such as not less than about 3.25, or even 3.50 GW/cm2 at a wavelength of 1064 nm
  • A first set of data was generated at a wavelength of 1064 nm. The spot diameter (1/e2) was 430 microns. 80 sites were tested at a rate of 200 shots per site. Table 1 below summarizes the data of a 3:1 spinel according to an embodiment of the present invention, as contrasted against stoichimetric 1:1 spinel, as well as sapphire and YAG.
    TABLE 1
    Damage Threshold @ Damage Threshold @
    MATERIAL 1064 nm (J/cm2) 1064 nm (GW/cm2)
    Sapphire 38.6 1.93
    YAG 28.0 1.40
    1:1 Spinel 51.7 2.58
    3:1 Spinel 80.0 4.00
  • As illustrated, the 3:1 spinel demonstrates superior damage resistance to laser exposure, notably demonstrating an unexpected damage threshold of 4.00 GW/cm2.
  • Table 2 below summarizes the data for various samples at 1540 nm. The testing was carried out in a manner similar to the 1064 nm data. Here, the spot diameter was 115 microns. For the cobalt-doped sample, the spot diameter was 170 microns and 50 shots per site were utilized rather than 200 shots per site.
    TABLE 2
    Damage Threshold @ Damage Threshold @
    MATERIAL 1540 nm (J/cm2) 1540 nm (GW/cm2)
    Sapphire 36.7 1.8
    YAG 65.9 3.3
    1:1 Spinel 118.0 5.9
    3:1 Spinel 67.6 3.4
    1:3 Spinel Co2+ 63.5 3.2
  • Further, damage threshold testing was carried out at a wavelength of 532 nm. Again, testing was carried out in a manner similar to the 1064 nm testing unless otherwise indicated. Here, a spot diameter of 300 microns was utilized, a pulse width of 18 ns and the number of sites was increased to 100, while carrying out 200 shots per site.
    TABLE 3
    Damage Threshold @ Damage Threshold @
    MATERIAL 532 nm (J/cm2) 532 nm (GW/cm2)
    Sapphire 16.38 0.82
    YAG 15.61 0.78
    1:1 Spinel 44.97 2.25
    3:1 Spinel 10.0 0.50
  • Still further, Table 4 below summarizes testing at 2100 nm. Testing was carried out at a pulse width of 40 ns, a spot diameter of 140 μm. 50 sites were tested, at a density of 200 shots/site.
    TABLE 4
    Damage Threshold @ Damage Threshold @
    MATERIAL 2100 nm (J/cm2) 2100 nm (GW/cm2)
    Sapphire 35.0 1.75
    YAG 53.0 2.65
    1:1 Spinel 60.0 3.0
    3:1 Spinel 50.0 2.5
  • Still further, testing was carried out at 3000 nm. Testing was carried out at a pulse width of 10 ns, a spot diameter of 110 μm. 40 sites were tested, at a density of 200 shots/site.
    TABLE 5
    Damage Threshold @ Damage Threshold @
    MATERIAL 3200 nm (J/cm2) 3200 nm (GW/cm2)
    Sapphire 35.0 1.75
    YAG 48.8 2.44
    1:1 Spinel >55.0 >2.75
    3:1 Spinel >55.0 >2.75
  • EXAMPLE
  • Here, a specific process flow was utilized to create a single crystal spinel material according to an embodiment of the present invention.
  • Crucible Charge Preparation: 392.1 g of MgO were combined with 2876.5 g of Al2O3 (aluminum oxide). The raw materials were mixed together and heated for 12 hrs. At 1100 degrees centigrade in ceramic crucible. After cooling, the mixture was red into an iridium crucible 100 mm in diameter and 150 mm tall.
  • Crystal Growth: The iridium crucible with the oxide mixture was placed in standard Czochralski crystal growth station, and heated to the melting point of the oxide mixture by means of radio frequency heating. An inert ambient atmosphere consisting of nitrogen with a small addition of oxygen was used around the crucible.
  • After the mixture was liquid a small seed crystal of the 1:1 spinel with <111> orientation attached to the pulling rod was used to initiate the start of the crystal growth process. A single crystal boule was grown utilizing the following process conditions, diameter 53 mm, length 150 mm, seed pulling rate 2 mm/hr, seed rotation rate 4 rpm, cool-down time 6 hrs, total time 123 hrs.
  • After cooling the crystal was visually inspected for bubbles, inclusions or any other visible defects. After visual inspection the top and bottom ends were removed, and crystal was subjected to an x-ray orientation check (Laue diffraction technique). After passing all inspection tests the crystal was ready for fabrication.
  • The foregoing description has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the scope to the precise form or embodiments disclosed, and modifications and variations are possible in light of the above teachings, or may be acquired from practice of embodiments of the invention.

Claims (24)

1. A single crystal spinel material, the material having a non-stoichiometric composition and having a transparency window represented by absorptivity over a wavelength range, the wavelength range extending from about 400 nm to about 800 nm, the transparency window being defined as the largest single absorptivity peak height along said wavelength range, the largest single peak height being not greater than 0.35 cm−1.
2. The material of claim 1, wherein the wavelength range extends up to about 2000 nm.
3. The material of claim 1, wherein the wavelength range extends up to about 3000 nm.
4. The material of claim 1, wherein the wavelength range extends up to about 3500 nm.
5. The material of claim 1, wherein the wavelength range extends up to about 4000 nm.
6. The material of claim 1, wherein the height is not greater than about 0.30 cm−1.
7. The material of claim 1, wherein the height is not greater than about 0.25 cm−1.
8. The material of claim 1, wherein the height is not greater than about 0.20 cm−1.
9. The material of claim 1, wherein the material consists essentially of a single spinel phase, with substantially no secondary phases.
10. The material of claim 1, wherein the material has the general formula aAD·bE2D3, wherein A is selected from the group consisting of Mg, Ca, Zn, Mn, Ba, Sr, Cd, Fe, and combinations thereof, E is selected from the group consisting Al, In, Cr, Sc, Lu, Fe, and combinations thereof, and D is selected from the group consisting O, S, Se, and combinations thereof, wherein a ratio b:a>1:1 such that the material is rich in E2D3.
11. The material of claim 10, wherein A is Mg, D is O, and E is Al, such that the material has the formula aMgO·bAl2O3, the material consisting essentially of aMgO·bAl2O3.
12. The material of claim 11, wherein the ratio b:a is not less than about 1.2:1.
13. The material of claim 11, wherein the ratio b:a is not less than about 1.5:1.
14. The material of claim 11, wherein the ratio b:a is not less than about 2.0:1.
15. The material of claim 11, wherein the ratio b:a is not less than about 2.5:1.
16. The material of claim 11, wherein the ratio b:a is about 3:1.
17. The material of claim 11, wherein the ratio b:a is not greater than about 4:1.
18. The material of claim 11, wherein the material has a lower mechanical stress and strain compared to stoichiometric spinel.
19. The material of claim 1, wherein the material has a laser damage threshold of not less than about 3.00 GW/cm2, at a wavelength of 1064 nm.
20. The material of claim 1, wherein the material has a laser damage threshold of not less than about 3.25 GW/cm2, at a wavelength of 1064 nm.
21. The material of claim 1, wherein the material has a laser damage threshold of not less than about 3.50 GW/cm2, at a wavelength of 1064 nm.
22. The material of claim 1, wherein the material is in the form of an optical window.
23. The material of claim 1, wherein the material is in the form of an optical mirror.
24. The material of claim 1, wherein the material is in the form of a light pipe.
US10/802,160 2003-09-23 2004-03-17 Optical spinel articles and methods for forming same Abandoned US20050061229A1 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
US10/802,160 US20050061229A1 (en) 2003-09-23 2004-03-17 Optical spinel articles and methods for forming same
EP04788859A EP1670976B1 (en) 2003-09-23 2004-09-17 Spinel articles
DE602004030592T DE602004030592D1 (en) 2003-09-23 2004-09-17 SPINELL-OBJECTS
AT04788859T ATE491828T1 (en) 2003-09-23 2004-09-17 SPINEL ITEMS
PCT/US2004/030803 WO2005031047A1 (en) 2003-09-23 2004-09-17 Spinel articles and methods for forming same
JP2006528093A JP2007506640A (en) 2003-09-23 2004-09-17 Spinel article and manufacturing method thereof
RU2006109202/15A RU2336372C2 (en) 2003-09-23 2004-09-17 Items out of spinel
TW093128872A TWI261580B (en) 2003-09-23 2004-09-23 Spinel articles and methods for forming same
IL174350A IL174350A0 (en) 2003-09-23 2006-03-16 Spinel articles and methods for forming same
JP2011128276A JP5562905B2 (en) 2003-09-23 2011-06-08 Spinel article and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/669,141 US7045223B2 (en) 2003-09-23 2003-09-23 Spinel articles and methods for forming same
US10/802,160 US20050061229A1 (en) 2003-09-23 2004-03-17 Optical spinel articles and methods for forming same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/669,141 Continuation-In-Part US7045223B2 (en) 2003-09-23 2003-09-23 Spinel articles and methods for forming same

Publications (1)

Publication Number Publication Date
US20050061229A1 true US20050061229A1 (en) 2005-03-24

Family

ID=34313662

Family Applications (2)

Application Number Title Priority Date Filing Date
US10/669,141 Expired - Fee Related US7045223B2 (en) 2003-09-23 2003-09-23 Spinel articles and methods for forming same
US10/802,160 Abandoned US20050061229A1 (en) 2003-09-23 2004-03-17 Optical spinel articles and methods for forming same

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US10/669,141 Expired - Fee Related US7045223B2 (en) 2003-09-23 2003-09-23 Spinel articles and methods for forming same

Country Status (5)

Country Link
US (2) US7045223B2 (en)
JP (1) JP5562905B2 (en)
AT (1) ATE491828T1 (en)
DE (1) DE602004030592D1 (en)
IL (1) IL174350A0 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060087629A1 (en) * 2004-10-21 2006-04-27 Saint-Gobain Ceramics & Plastics, Inc. Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
DE102011080378A1 (en) * 2011-08-03 2013-02-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Transparent composite pane for security applications

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7326477B2 (en) * 2003-09-23 2008-02-05 Saint-Gobain Ceramics & Plastics, Inc. Spinel boules, wafers, and methods for fabricating same
US20050061230A1 (en) * 2003-09-23 2005-03-24 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same
US7045223B2 (en) * 2003-09-23 2006-05-16 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same
JP4525353B2 (en) * 2005-01-07 2010-08-18 住友電気工業株式会社 Method for manufacturing group III nitride substrate
US7919815B1 (en) * 2005-02-24 2011-04-05 Saint-Gobain Ceramics & Plastics, Inc. Spinel wafers and methods of preparation
US20090137097A1 (en) * 2007-11-26 2009-05-28 United Microelectronics Corp. Method for dicing wafer
US8207539B2 (en) 2009-06-09 2012-06-26 Epistar Corporation Light-emitting device having a thinned structure and the manufacturing method thereof

Citations (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424955A (en) * 1965-03-30 1969-01-28 Siemens Ag Method for epitaxial precipitation of semiconductor material upon a spineltype lattice substrate
US3625868A (en) * 1968-06-20 1971-12-07 Siemens Ag Thin semiconductor growth layer on alumina deficient, crucible-pulled magnesium aluminum spinel monocrystal as well as the method for producing the layer and producing the monocrystals
US3655439A (en) * 1968-06-19 1972-04-11 Siemens Ag Method of producing thin layer components with at least one insulating intermediate layer
US3658586A (en) * 1969-04-11 1972-04-25 Rca Corp Epitaxial silicon on hydrogen magnesium aluminate spinel single crystals
US3736158A (en) * 1971-03-19 1973-05-29 G Cullen Czochralski-grown spinel for use as epitaxial silicon substrate
US3753775A (en) * 1971-03-01 1973-08-21 Rca Corp Chemical polishing of sapphire
US3796597A (en) * 1970-11-02 1974-03-12 Texas Instruments Inc Method of producing semiconducting monocrystalline silicon on spinel substrates
US3808065A (en) * 1972-02-28 1974-04-30 Rca Corp Method of polishing sapphire and spinel
US3816906A (en) * 1969-06-20 1974-06-18 Siemens Ag Method of dividing mg-al spinel substrate wafers coated with semiconductor material and provided with semiconductor components
US3883313A (en) * 1972-12-14 1975-05-13 Rca Corp Modified czochralski-grown magnesium aluminate spinel and method of making same
US3885978A (en) * 1968-05-31 1975-05-27 Matsushita Electric Works Ltd Inorganic coating composition
US3898065A (en) * 1973-10-09 1975-08-05 Norman Dryer Co Inc Lint collector
US3950504A (en) * 1974-09-26 1976-04-13 Quigley Company, Inc. Process for producing magnesium aluminate spinel
US3964942A (en) * 1970-10-16 1976-06-22 International Business Machines Corporation Chemical polishing of single crystal dielectrics
US3990902A (en) * 1974-08-02 1976-11-09 Semiconductor Research Foundation Magnesium-titanate-comprising spinel single crystal substrate for semiconductor devices
US4000977A (en) * 1974-03-28 1977-01-04 Siemens Aktiengesellschaft Apparatus for producing monocrystals by the verneuil technique
US4177321A (en) * 1972-07-25 1979-12-04 Semiconductor Research Foundation Single crystal of semiconductive material on crystal of insulating material
US4347210A (en) * 1980-05-09 1982-08-31 Raytheon Company Method of forging spinel domes
US4370739A (en) * 1980-06-09 1983-01-25 Rca Corporation Spinel video disc playback stylus
US4493720A (en) * 1982-02-09 1985-01-15 Thomson-Csf Process for producing doped vitreous silica for preparing a preform for an optical fibre
US4627064A (en) * 1983-11-22 1986-12-02 L'etat Francais Represente Par Le Ministre Des P.T.T. (C.N.E.T.) Mixed oxides for tunable lasers
US4649070A (en) * 1984-12-14 1987-03-10 Ngk Spark Plug Co., Ltd. Substrate for an integrated circuit
US4657754A (en) * 1985-11-21 1987-04-14 Norton Company Aluminum oxide powders and process
US4755314A (en) * 1984-12-04 1988-07-05 Shin-Etsu Chemical Co., Ltd. Single crystal wafer of lithium tantalate
US4819167A (en) * 1987-04-20 1989-04-04 Applied Materials, Inc. System and method for detecting the center of an integrated circuit wafer
US4963520A (en) * 1986-04-07 1990-10-16 Uop Metal-containing spinel composition and process of using same
US5138298A (en) * 1989-11-02 1992-08-11 Sanken Electric Co., Ltd. Metallic oxide resistive bodies having a nonlinear volt-ampere characteristic and method of fabrication
US5530267A (en) * 1995-03-14 1996-06-25 At&T Corp. Article comprising heteroepitaxial III-V nitride semiconductor material on a substrate
US5557624A (en) * 1995-01-20 1996-09-17 Hughes Aircraft Company Laser system using U-doped crystal Q-switch
US5644400A (en) * 1996-03-29 1997-07-01 Lam Research Corporation Method and apparatus for determining the center and orientation of a wafer-like object
US5643044A (en) * 1994-11-01 1997-07-01 Lund; Douglas E. Automatic chemical and mechanical polishing system for semiconductor wafers
US5654973A (en) * 1995-05-05 1997-08-05 Hughes Electronics Laser system using Co2+ -doped crystal Q-switch
US5741724A (en) * 1996-12-27 1998-04-21 Motorola Method of growing gallium nitride on a spinel substrate
US5742026A (en) * 1995-06-26 1998-04-21 Corning Incorporated Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation
US5768335A (en) * 1997-02-10 1998-06-16 Lucent Technologies Inc. Apparatus and method for measuring the orientation of a single crystal surface
US5802083A (en) * 1995-12-11 1998-09-01 Milton Birnbaum Saturable absorber Q-switches for 2-μm lasers
US5822213A (en) * 1996-03-29 1998-10-13 Lam Research Corporation Method and apparatus for determining the center and orientation of a wafer-like object
US5825913A (en) * 1995-07-18 1998-10-20 Cognex Corporation System for finding the orientation of a wafer
US5850410A (en) * 1995-03-16 1998-12-15 Fujitsu Limited Semiconductor laser and method for fabricating the same
US5968267A (en) * 1996-01-25 1999-10-19 General Signal Technology Corporation Antivibration support for Czochralski crystal growing systems
US5982796A (en) * 1997-12-16 1999-11-09 Union Carbide Chemicals & Plastics 2.7 μM laser crystalline material utilizing multiple-channel optical pumping
US5989301A (en) * 1998-02-18 1999-11-23 Saint-Gobain Industrial Ceramics, Inc. Optical polishing formulation
US6021380A (en) * 1996-07-09 2000-02-01 Scanis, Inc. Automatic semiconductor wafer sorter/prober with extended optical inspection
US6023479A (en) * 1997-01-30 2000-02-08 Commissariat A L'energie Atomique Solid microlaser passively switched by a saturable absorber and its production process
US6048577A (en) * 1992-02-05 2000-04-11 Norton Company Nano-sized alpha alumina particles having a silica coating thereon
US6104529A (en) * 1999-03-08 2000-08-15 Lucent Technologies Inc. Optical fiber communication system employing wide band crystal alloy light generation devices
US6238450B1 (en) * 1999-06-16 2001-05-29 Saint-Gobain Industrial Ceramics, Inc. Ceria powder
US6258137B1 (en) * 1992-02-05 2001-07-10 Saint-Gobain Industrial Ceramics, Inc. CMP products
US6265089B1 (en) * 1999-07-15 2001-07-24 The United States Of America As Represented By The Secretary Of The Navy Electronic devices grown on off-axis sapphire substrate
US20010026950A1 (en) * 2000-03-29 2001-10-04 Nec Corporation Method of manufacturing a nitrogen-based semiconductor substrate and a semiconductor element by using the same
US20020028314A1 (en) * 1994-01-27 2002-03-07 Tischler Michael A. Bulk single crystal gallium nitride and method of making same
US20020030194A1 (en) * 2000-09-12 2002-03-14 Camras Michael D. Light emitting diodes with improved light extraction efficiency
US6364920B1 (en) * 2000-04-21 2002-04-02 Saint-Gobain Ceramics & Plastics, Inc. CMP formulations
US6366596B1 (en) * 2000-01-21 2002-04-02 Photonics Industries International, Inc. High power laser
US6391072B1 (en) * 2000-05-04 2002-05-21 Saint-Gobain Industrial Ceramics, Inc. Abrasive grain
US6406769B1 (en) * 1998-04-02 2002-06-18 Comadur S.A. Watch crystal including a lens and manufacturing method for such a lens
US6418921B1 (en) * 2001-01-24 2002-07-16 Crystal Systems, Inc. Method and apparatus for cutting workpieces
US20030007520A1 (en) * 2001-05-22 2003-01-09 Saint-Gobain Ceramics & Plastics, Inc. Cobalt-doped saturable absorber Q-switches and laser systems
US6533874B1 (en) * 1996-12-03 2003-03-18 Advanced Technology Materials, Inc. GaN-based devices using thick (Ga, Al, In)N base layers
US20030188678A1 (en) * 2002-04-03 2003-10-09 Saint-Gobain Ceramics & Plastics, Inc. Spinel substrate and heteroepitaxial growth of III-V materials thereon
US20030190770A1 (en) * 2002-04-09 2003-10-09 Oriol, Inc. Method of etching substrates
US20030213950A1 (en) * 2000-05-31 2003-11-20 Applied Optoelectronics, Inc. Alternative substrates for epitaxial growth
US20040063236A1 (en) * 2000-12-18 2004-04-01 Samsung Electro-Mechanics Co., Ltd. GaN based group III-V nitride semiconductor light-emitting diode and method for fabricating the same
USRE38489E1 (en) * 1997-01-30 2004-04-06 Commissariat A L'energie Atomique Solid microlaser passively switched by a saturable absorber and its production process
US6846434B2 (en) * 2001-12-04 2005-01-25 Landauer, Inc. Aluminum oxide material for optical data storage
US7045223B2 (en) * 2003-09-23 2006-05-16 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1471976A (en) 1965-03-30 1967-03-03 Siemens Ag Process for epitaxially depositing a semiconductor substance crystallizing in the diamond lattice or in that of the blende
US3898051A (en) * 1973-12-28 1975-08-05 Crystal Syst Crystal growing
JPS5343481A (en) 1976-10-01 1978-04-19 Matsushita Electric Ind Co Ltd Mirror surface etching method of sapphire substrate crystal
JPS5426873A (en) 1977-07-30 1979-02-28 Matsushita Electric Works Ltd Method of strengthing base material of paper for resin impregnation
JPS5890736A (en) 1981-11-25 1983-05-30 Toshiba Corp Sapphire substrate for semiconductor device
JPS58211736A (en) 1982-06-03 1983-12-09 Toshiba Corp Manufacture of lithium niobate single crystal element
JPS62123059A (en) 1985-11-25 1987-06-04 株式会社住友金属セラミックス Ceramic composition with surface smoothness
JPS62188325A (en) 1986-02-14 1987-08-17 Sumitomo Electric Ind Ltd Method and apparatus for forming orientation flat surface of compound semiconductor
JPH07235692A (en) 1993-12-30 1995-09-05 Sony Corp Compound semiconductor device and forming method thereof
JPH07307316A (en) 1994-05-12 1995-11-21 Sumitomo Electric Ind Ltd Iii-v compound semiconductor wafer and its machining method
US5426083A (en) 1994-06-01 1995-06-20 Amoco Corporation Absorbent and process for removing sulfur oxides from a gaseous mixture
JP3559315B2 (en) 1994-07-29 2004-09-02 京セラ株式会社 Film composition analysis method
JP3015261B2 (en) 1994-09-12 2000-03-06 科学技術振興事業団 Heat treatment method of sapphire single crystal substrate to improve surface characteristics
JP3329594B2 (en) 1994-09-28 2002-09-30 有限会社遠野精器 Method of manufacturing sapphire substrate for photomask
JPH09129651A (en) 1995-08-31 1997-05-16 Hewlett Packard Co <Hp> Thermal annealing method and device of sapphire substrate
JP2987111B2 (en) 1995-08-31 1999-12-06 株式会社東芝 Semiconductor device and manufacturing method thereof
JP2882355B2 (en) 1996-04-10 1999-04-12 住友電気工業株式会社 III-V compound semiconductor wafer and method of manufacturing the same
JP3652861B2 (en) 1997-11-27 2005-05-25 京セラ株式会社 Thin film growth substrate and light emitting device using the same
JP3805883B2 (en) 1997-12-26 2006-08-09 東芝電子エンジニアリング株式会社 Gallium nitride based semiconductor wafer, gallium nitride based semiconductor device, and manufacturing method thereof
JPH11235659A (en) 1998-02-18 1999-08-31 Ricoh Co Ltd Chemically removing processing method induced by friction and working device thereof
JP3338360B2 (en) 1998-03-23 2002-10-28 三洋電機株式会社 Gallium nitride based semiconductor wafer manufacturing method
EP0997445B1 (en) 1998-10-27 2004-03-10 Corning Incorporated Low expansion glass-ceramics
KR100304664B1 (en) 1999-02-05 2001-09-26 윤종용 Method for fabricating a GaN film
JP2000331940A (en) 1999-05-20 2000-11-30 Sony Corp Sapphire substrate, growing method for nitride iii-v compound semiconductor layer, and manufacture thereof
CN1154194C (en) 1999-08-30 2004-06-16 光磊科技股份有限公司 Base plate structure of LED
JP3768943B2 (en) 2001-09-28 2006-04-19 日本碍子株式会社 Group III nitride epitaxial substrate, group III nitride device epitaxial substrate, and group III nitride device
CN1167140C (en) 2002-05-17 2004-09-15 清华大学 Process for treating substrate of epitaxial chip for high-brightness gallium nitride-base LED
KR100499129B1 (en) 2002-09-02 2005-07-04 삼성전기주식회사 Light emitting laser diode and fabricatin method thereof
CN1227730C (en) 2003-04-30 2005-11-16 东莞市福地电子材料有限公司 Processing method of nano level saphire substrate and its special polishing liquid
CN1207756C (en) 2003-06-27 2005-06-22 中国科学院上海光学精密机械研究所 Preparation method of ZnAl*0*/alpha-Al*0*composite base material
CN1204598C (en) 2003-06-27 2005-06-01 中国科学院上海光学精密机械研究所 Preparation method of gamma-LiAl0*/alpha-Al*0*composite base material

Patent Citations (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424955A (en) * 1965-03-30 1969-01-28 Siemens Ag Method for epitaxial precipitation of semiconductor material upon a spineltype lattice substrate
US3885978A (en) * 1968-05-31 1975-05-27 Matsushita Electric Works Ltd Inorganic coating composition
US3655439A (en) * 1968-06-19 1972-04-11 Siemens Ag Method of producing thin layer components with at least one insulating intermediate layer
US3625868A (en) * 1968-06-20 1971-12-07 Siemens Ag Thin semiconductor growth layer on alumina deficient, crucible-pulled magnesium aluminum spinel monocrystal as well as the method for producing the layer and producing the monocrystals
US3658586A (en) * 1969-04-11 1972-04-25 Rca Corp Epitaxial silicon on hydrogen magnesium aluminate spinel single crystals
US3816906A (en) * 1969-06-20 1974-06-18 Siemens Ag Method of dividing mg-al spinel substrate wafers coated with semiconductor material and provided with semiconductor components
US3964942A (en) * 1970-10-16 1976-06-22 International Business Machines Corporation Chemical polishing of single crystal dielectrics
US3796597A (en) * 1970-11-02 1974-03-12 Texas Instruments Inc Method of producing semiconducting monocrystalline silicon on spinel substrates
US3753775A (en) * 1971-03-01 1973-08-21 Rca Corp Chemical polishing of sapphire
US3736158A (en) * 1971-03-19 1973-05-29 G Cullen Czochralski-grown spinel for use as epitaxial silicon substrate
US3808065A (en) * 1972-02-28 1974-04-30 Rca Corp Method of polishing sapphire and spinel
US4177321A (en) * 1972-07-25 1979-12-04 Semiconductor Research Foundation Single crystal of semiconductive material on crystal of insulating material
US3883313A (en) * 1972-12-14 1975-05-13 Rca Corp Modified czochralski-grown magnesium aluminate spinel and method of making same
US3898065A (en) * 1973-10-09 1975-08-05 Norman Dryer Co Inc Lint collector
US4000977A (en) * 1974-03-28 1977-01-04 Siemens Aktiengesellschaft Apparatus for producing monocrystals by the verneuil technique
US3990902A (en) * 1974-08-02 1976-11-09 Semiconductor Research Foundation Magnesium-titanate-comprising spinel single crystal substrate for semiconductor devices
US3950504A (en) * 1974-09-26 1976-04-13 Quigley Company, Inc. Process for producing magnesium aluminate spinel
US4347210A (en) * 1980-05-09 1982-08-31 Raytheon Company Method of forging spinel domes
US4370739A (en) * 1980-06-09 1983-01-25 Rca Corporation Spinel video disc playback stylus
US4493720A (en) * 1982-02-09 1985-01-15 Thomson-Csf Process for producing doped vitreous silica for preparing a preform for an optical fibre
US4627064A (en) * 1983-11-22 1986-12-02 L'etat Francais Represente Par Le Ministre Des P.T.T. (C.N.E.T.) Mixed oxides for tunable lasers
US4755314A (en) * 1984-12-04 1988-07-05 Shin-Etsu Chemical Co., Ltd. Single crystal wafer of lithium tantalate
US4649070A (en) * 1984-12-14 1987-03-10 Ngk Spark Plug Co., Ltd. Substrate for an integrated circuit
US4657754A (en) * 1985-11-21 1987-04-14 Norton Company Aluminum oxide powders and process
US4963520A (en) * 1986-04-07 1990-10-16 Uop Metal-containing spinel composition and process of using same
US4819167A (en) * 1987-04-20 1989-04-04 Applied Materials, Inc. System and method for detecting the center of an integrated circuit wafer
US5138298A (en) * 1989-11-02 1992-08-11 Sanken Electric Co., Ltd. Metallic oxide resistive bodies having a nonlinear volt-ampere characteristic and method of fabrication
US6258137B1 (en) * 1992-02-05 2001-07-10 Saint-Gobain Industrial Ceramics, Inc. CMP products
US6048577A (en) * 1992-02-05 2000-04-11 Norton Company Nano-sized alpha alumina particles having a silica coating thereon
US20020028314A1 (en) * 1994-01-27 2002-03-07 Tischler Michael A. Bulk single crystal gallium nitride and method of making same
US5643044A (en) * 1994-11-01 1997-07-01 Lund; Douglas E. Automatic chemical and mechanical polishing system for semiconductor wafers
US5557624A (en) * 1995-01-20 1996-09-17 Hughes Aircraft Company Laser system using U-doped crystal Q-switch
US5530267A (en) * 1995-03-14 1996-06-25 At&T Corp. Article comprising heteroepitaxial III-V nitride semiconductor material on a substrate
US5850410A (en) * 1995-03-16 1998-12-15 Fujitsu Limited Semiconductor laser and method for fabricating the same
US5654973A (en) * 1995-05-05 1997-08-05 Hughes Electronics Laser system using Co2+ -doped crystal Q-switch
US5742026A (en) * 1995-06-26 1998-04-21 Corning Incorporated Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation
US5825913A (en) * 1995-07-18 1998-10-20 Cognex Corporation System for finding the orientation of a wafer
US5802083A (en) * 1995-12-11 1998-09-01 Milton Birnbaum Saturable absorber Q-switches for 2-μm lasers
US5968267A (en) * 1996-01-25 1999-10-19 General Signal Technology Corporation Antivibration support for Czochralski crystal growing systems
US5644400A (en) * 1996-03-29 1997-07-01 Lam Research Corporation Method and apparatus for determining the center and orientation of a wafer-like object
US5822213A (en) * 1996-03-29 1998-10-13 Lam Research Corporation Method and apparatus for determining the center and orientation of a wafer-like object
US6021380A (en) * 1996-07-09 2000-02-01 Scanis, Inc. Automatic semiconductor wafer sorter/prober with extended optical inspection
US6533874B1 (en) * 1996-12-03 2003-03-18 Advanced Technology Materials, Inc. GaN-based devices using thick (Ga, Al, In)N base layers
US5741724A (en) * 1996-12-27 1998-04-21 Motorola Method of growing gallium nitride on a spinel substrate
US6023479A (en) * 1997-01-30 2000-02-08 Commissariat A L'energie Atomique Solid microlaser passively switched by a saturable absorber and its production process
USRE38489E1 (en) * 1997-01-30 2004-04-06 Commissariat A L'energie Atomique Solid microlaser passively switched by a saturable absorber and its production process
US5768335A (en) * 1997-02-10 1998-06-16 Lucent Technologies Inc. Apparatus and method for measuring the orientation of a single crystal surface
US5982796A (en) * 1997-12-16 1999-11-09 Union Carbide Chemicals & Plastics 2.7 μM laser crystalline material utilizing multiple-channel optical pumping
US5989301A (en) * 1998-02-18 1999-11-23 Saint-Gobain Industrial Ceramics, Inc. Optical polishing formulation
US6406769B1 (en) * 1998-04-02 2002-06-18 Comadur S.A. Watch crystal including a lens and manufacturing method for such a lens
US6104529A (en) * 1999-03-08 2000-08-15 Lucent Technologies Inc. Optical fiber communication system employing wide band crystal alloy light generation devices
US6238450B1 (en) * 1999-06-16 2001-05-29 Saint-Gobain Industrial Ceramics, Inc. Ceria powder
US6265089B1 (en) * 1999-07-15 2001-07-24 The United States Of America As Represented By The Secretary Of The Navy Electronic devices grown on off-axis sapphire substrate
US6366596B1 (en) * 2000-01-21 2002-04-02 Photonics Industries International, Inc. High power laser
US20010026950A1 (en) * 2000-03-29 2001-10-04 Nec Corporation Method of manufacturing a nitrogen-based semiconductor substrate and a semiconductor element by using the same
US6364920B1 (en) * 2000-04-21 2002-04-02 Saint-Gobain Ceramics & Plastics, Inc. CMP formulations
US6391072B1 (en) * 2000-05-04 2002-05-21 Saint-Gobain Industrial Ceramics, Inc. Abrasive grain
US20030213950A1 (en) * 2000-05-31 2003-11-20 Applied Optoelectronics, Inc. Alternative substrates for epitaxial growth
US20020030194A1 (en) * 2000-09-12 2002-03-14 Camras Michael D. Light emitting diodes with improved light extraction efficiency
US20040063236A1 (en) * 2000-12-18 2004-04-01 Samsung Electro-Mechanics Co., Ltd. GaN based group III-V nitride semiconductor light-emitting diode and method for fabricating the same
US6418921B1 (en) * 2001-01-24 2002-07-16 Crystal Systems, Inc. Method and apparatus for cutting workpieces
US6839362B2 (en) * 2001-05-22 2005-01-04 Saint-Gobain Ceramics & Plastics, Inc. Cobalt-doped saturable absorber Q-switches and laser systems
US20040089220A1 (en) * 2001-05-22 2004-05-13 Saint-Gobain Ceramics & Plastics, Inc. Materials for use in optical and optoelectronic applications
US20030007520A1 (en) * 2001-05-22 2003-01-09 Saint-Gobain Ceramics & Plastics, Inc. Cobalt-doped saturable absorber Q-switches and laser systems
US6846434B2 (en) * 2001-12-04 2005-01-25 Landauer, Inc. Aluminum oxide material for optical data storage
US20030188678A1 (en) * 2002-04-03 2003-10-09 Saint-Gobain Ceramics & Plastics, Inc. Spinel substrate and heteroepitaxial growth of III-V materials thereon
US6844084B2 (en) * 2002-04-03 2005-01-18 Saint-Gobain Ceramics & Plastics, Inc. Spinel substrate and heteroepitaxial growth of III-V materials thereon
US20030190770A1 (en) * 2002-04-09 2003-10-09 Oriol, Inc. Method of etching substrates
US7045223B2 (en) * 2003-09-23 2006-05-16 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060087629A1 (en) * 2004-10-21 2006-04-27 Saint-Gobain Ceramics & Plastics, Inc. Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
DE102011080378A1 (en) * 2011-08-03 2013-02-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Transparent composite pane for security applications
US9012045B2 (en) 2011-08-03 2015-04-21 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Transparent composite pane for safety applications

Also Published As

Publication number Publication date
JP2011236123A (en) 2011-11-24
ATE491828T1 (en) 2011-01-15
DE602004030592D1 (en) 2011-01-27
US7045223B2 (en) 2006-05-16
US20050064246A1 (en) 2005-03-24
JP5562905B2 (en) 2014-07-30
IL174350A0 (en) 2006-08-01

Similar Documents

Publication Publication Date Title
JP5562905B2 (en) Spinel article and manufacturing method thereof
EP2492378B1 (en) Oxide and magneto-optical device
CN108301045B (en) Calcium metaborate birefringent crystal, preparation method and application thereof
Nabokin et al. Floating zone growth of high-quality SrTiO3 single crystals
JPWO2004067813A1 (en) Magnetic garnet single crystal film forming substrate, optical element, and method for manufacturing the same
JPWO2002022920A6 (en) Rare earth-iron garnet single crystal, method for producing the same, and device using rare earth-iron garnet single crystal
JPWO2002022920A1 (en) Rare earth-iron garnet single crystal and method for producing the same
JP2014189472A (en) Bismuth-substituted rare earth iron garnet single crystal and production method thereof
CN108425152B (en) Strontium metaborate birefringent crystal, preparation method and application thereof
EP1670976B1 (en) Spinel articles
McGuigan et al. Effects of indium lattice hardening upon the growth and structural properties of large‐diameter, semi‐insulating GaAs crystals
CN111936677B (en) Quartz glass crucible
CN115504480B (en) Compound zinc barium borate and zinc barium borate birefringent crystal, and preparation method and application thereof
EP1670975B1 (en) Spinel boules, wafers, and methods for fabricating same
JPWO2004070091A1 (en) Magnetic garnet single crystal film forming substrate, manufacturing method thereof, optical element and manufacturing method thereof
CN109457296B (en) Preparation method and device of cerium doped lanthanum bromide
US20050061230A1 (en) Spinel articles and methods for forming same
JP2002348196A (en) Rare earth vanadate single crystal and method for making the same
Markgraf et al. Effect of starting components on the growth of PbMg13Nb23O3
JP6822109B2 (en) Bismuth-substituted rare earth iron garnet crystal film, its manufacturing method, and optical isolator
JP6035584B2 (en) Method for producing fluorite crystals
Biderman et al. Crystal Growth of Optical Materials by the Gradient Solidification Method
Deng et al. Investigation on improvement of laser quality of tunable Al2O3: Ti3+ crystals
CN116065237A (en) Method for producing single crystal sapphire seeds and sapphire single crystals, and external and functional components for watches and jewelry
Fiore High strength diffusion bonding of sapphire

Legal Events

Date Code Title Description
AS Assignment

Owner name: SAINT-GOBAIN CERAMICS & PLASTICS, INC., MASSACHUSE

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:STONE-SUNDBERG, JENNIFER;KOKTA, MILAN;REEL/FRAME:015119/0362

Effective date: 20040315

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION