US20050059157A1 - Systems and methods for measuring nitrate levels - Google Patents

Systems and methods for measuring nitrate levels Download PDF

Info

Publication number
US20050059157A1
US20050059157A1 US10/895,240 US89524004A US2005059157A1 US 20050059157 A1 US20050059157 A1 US 20050059157A1 US 89524004 A US89524004 A US 89524004A US 2005059157 A1 US2005059157 A1 US 2005059157A1
Authority
US
United States
Prior art keywords
gas
sample
coupled
particles
nitrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/895,240
Inventor
George Allen
Petros Koutrakis
Yiming Ding
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US10/895,240 priority Critical patent/US20050059157A1/en
Publication of US20050059157A1 publication Critical patent/US20050059157A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/005Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods investigating the presence of an element by oxidation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/02Devices for withdrawing samples
    • G01N1/22Devices for withdrawing samples in the gaseous state
    • G01N1/2202Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling
    • G01N1/2205Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling with filters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004Gaseous mixtures, e.g. polluted air
    • G01N33/0009General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0036Specially adapted to detect a particular component
    • G01N33/0037Specially adapted to detect a particular component for NOx
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/40Concentrating samples
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/02Devices for withdrawing samples
    • G01N1/22Devices for withdrawing samples in the gaseous state
    • G01N1/2202Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling
    • G01N2001/222Other features
    • G01N2001/2223Other features aerosol sampling devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00Chemistry: analytical and immunological testing
    • Y10T436/17Nitrogen containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00Chemistry: analytical and immunological testing
    • Y10T436/17Nitrogen containing
    • Y10T436/173076Nitrite or nitrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00Chemistry: analytical and immunological testing
    • Y10T436/17Nitrogen containing
    • Y10T436/176152Total nitrogen determined
    • Y10T436/176921As part of an elemental analysis

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Pathology (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Molecular Biology (AREA)
  • Biomedical Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

The systems and methods described herein relate to the measurement of nitrate levels in a sample of gas, for example, air, exhaust, or other sources of gas. Moreover, the systems and methods described herein are capable of operating using short sample collection periods, permitting rapid data collection and finely time-resolved nitrate monitoring over a span of time. Additionally, ambient nitrate can effectively be distinguished from other airborne particles, such as sulfate and carbon.

Description

  • This application is based on U.S. Provisional Application No. 60/158861, filed Oct. 12, 1999, the specification of which is hereby incorporated by reference.
  • BACKGROUND OF THE INVENTION
  • Particulates are tiny clumps of soot, dirt, and various chemicals that have been linked to a wide variety of health problems—asthma, and higher rates of disease affecting the cardiovascular system or lungs. Since 1987, EPA standards have governed all particulates under 10 micrometers in diameter. This category of particulate matter is called PM10. Recently, however, studies have suggested that the most dangerous particles are actually the smaller ones, which penetrate deeper in the lungs' aereoles. Thus, new regulations will build in a separate standard for particles less than 2.5 micrometers in diameter—PM2.5.
  • While PM10 contains a lot of wind-blown soil, PM2.5 is derived mainly from burning fossil fuels. PM2.5 typically contains a mixture of elemental carbon, organic carbon, sulfate and nitrate particles, and acid droplets. It is unlikely that all components of PM2.5 contribute equally to the observed health effects, yet the present lack of sufficient data quantifying the individual components prevents the EPA from separately regulating these components. Because regulating PM2.5 collectively is not a cost-effective solution, the agency is under great scientific, industrial, and political pressure to specifically identify sources of the observed particle health-effects. Thus, interest in measuring the individual components of PM2.5 has increased dramatically over the last few years.
  • A number of methods are known for measuring atmospheric nitrate levels. Koutrakis et al., Environ. Sci. Technol. 22:1463, 1988 disclose an integrated sampling method (Harvard/EPA Annular Denuder System (HEADS)) which is designed to measure various atmospheric components including particulate nitrate. The method provides a non-quantitative conversion of particulate nitrate to nitric acid vapor by collection of atmospheric fine particles on a Teflon filter, with a sodium carbonate-coated filter downstream to collect nitric acid vapor produced by volatization of ammonium nitrate and by the reaction of ammonium nitrate with acidic sulfate particles.
  • Wendt et al., “Continuous monitoring of atmospheric nitric oxide and nitrogen dioxide by chemiluminescence” in Methods of Air Sampling and Analysis, editor, J. P. Lodge Jr., Lewis Publishers, Chelsea, Mich., pp 415-421 (1989), disclose a continuous chemiluminescent NOx detection method. Yamamoto et al., Anal. Chem., 1994, 66, 362-367, describe a nitrate analysis method relying on chemiluminescent NOx detection. NOx generally refers to NO2 and NO taken together.
  • Brauer et al., Environ. Sci. Technol. 24:1521, 1990 disclose a method for the continuous measurement of nitrous acid and nitric acid vapors which does not distinguish between the two species. Klockow et al., Atmospheric Environment, 1989, 23, 1131-1138, disclose thermodenuder systems for the discontinuous measurement of nitric acid vapor and ammonium nitrate. Buhr et al., Atmospheric Environment, 1995, 29, 2609-2624, teach a denuder for sampling nitric acid, nitrate, and sulfate. Wolfson et al., U.S. Pat. No. 5,854,077, present a continuous differential nitrate measurement method.
  • Many of these and other existing methods for nitrate measurement require labor-intensive, manual collection of 24-hour integrated samples and laboratory analysis of the collected components. Not only are such samples expensive to collect, but the lengthy collection period prevents the detection of cycles and patterns which occur over the course of a day. Convenient techniques which offer improved temporal resolution and are capable of unifying the collection and analysis processes are badly needed now to reveal these daily patterns, both for epidemiological research and for regulatory monitoring.
  • SUMMARY OF THE INVENTION
  • The systems and methods described herein relate to the measurement of nitrate in gas samples by collection and analyzing samples by a technique which permits a short cycling time. Thus, in one aspect, the invention provides a system for measuring nitrate levels having a sample inlet for receiving a sample of gas, a collection body coupled to said sample inlet, a filter mounted within said body to collect particles from said sample of gas, a heater coupled to the body to heat the body, a gas inlet coupled to said body to provide a flow of gas through said body, and a detector coupled to said body to measure an NOx concentration.
  • In a certain embodiment, the system further comprises a source of gas coupled to said gas inlet. The gas may be nitrogen or another gas which is substantially free of oxygen.
  • In another embodiment, the system also includes a catalyst, coupled to said body and to said detector, capable of reducing NO2 to NO. The catalyst may comprise molybdenum, carbon, or ferrous sulfate.
  • In certain embodiments, the detector included in the system has a light sensor, and may further include an ozone generator, for example, for the detection of the chemiluminescent oxidation of NO. In another embodiment, the detector includes an infrared sensor. In yet another embodiment, the detector includes a material which reversibly binds NO.
  • In one embodiment, the filter comprises quartz fibers.
  • In yet another embodiment, the system includes an extractor coupled to the sample inlet and to the collection body to substantially remove NO2 from the gas sample. The extractor may comprise a hydroxyl-bearing solvent and a base, e.g., glycerol and an organic base, e.g., an amine, such as triethanolamine.
  • In yet another embodiment, the system also includes a selection platform, situated between the sample inlet and the extractor, to substantially remove particles larger than about 2.5 microns. The selection platform may be a filter, an inertial impactor, or any other suitable device.
  • In one embodiment, the system further includes a cooling system to cool the collection body.
  • In yet another aspect, the invention relates to a method for measuring a level of nitrate by receiving a gas sample, collecting nitrate particles from the gas sample on a filter, passing a stream of gas substantially free of oxygen over the collected particles, volatilizing the collected particles by heating to generate NOx, and measuring a level of NOx.
  • In one embodiment, the method further includes substantially removing NO2 prior to collecting nitrate particles, e.g., by passing the received sample over a hydroxyl-bearing solvent and a base, e.g., an organic base such as triethanolamine.
  • In another embodiment, the method further includes removing particles larger than about 2.5 microns from the received gas sample, e.g., by passing the received sample through an inertial impactor or by passing the received sample through a filter.
  • In one embodiment of the method, passing a stream of gas includes passing a stream of nitrogen over the collected particles.
  • In yet another embodiment, the method further comprises reducing generated NO2 to NO using a metal catalyst, e.g., by contacting the NO2 with a molybdenum catalyst.
  • In certain embodiments, measuring a level of NOx includes reacting NO with ozone. In yet another embodiment, measuring a level of NOx includes detecting infrared absorption. In certain other embodiments, measuring a level of NOx includes adsorbing NOx on a conductive material.
  • In one embodiment, collecting nitrate particles comprises collecting nitrate particles on a filter comprising quartz fibers.
  • In another embodiment, volatilizing the collected particles includes rapidly heating the collected particles to at least 300° C.
  • In yet another aspect, the invention provides a system for measuring nitrate levels, including a'sample inlet to receive a sample of gas, an extractor coupled to said sample inlet to substantially remove NO2 from the gas sample, a collection body coupled to said sample inlet, an inertial impactor mounted within said body to collect particles from the gas sample, a current source coupled to the inertial impactor to heat the inertial impactor and generate NOx, and a detector coupled to said catalyst to measure an NOx concentration.
  • In yet another aspect, the invention relates to a method for measuring a level of nitrate by receiving a gas sample, substantially removing NO2 from the gas sample, collecting nitrate particles from the gas sample with an inertial impactor, passing a stream of gas substantially free of oxygen over the collected particles, volatilizing the collected particles by heating to generate NOx, and measuring a level of NOx generated by the heated particles.
  • In yet another aspect, the invention provides a system for measuring nitrate levels having means for receiving a sample of gas, support means coupled to the means for receiving, means for collecting particles coupled to the support means, means coupled to the support means, for heating the support means to generate NOx, means, coupled to the support means, for flowing a stream of gas through the support means, and means for measuring an NOx concentration coupled to the support means.
  • In one embodiment, such a system also includes means for substantially removing NO2 from the sample of gas, coupled to said means for receiving and said support means.
  • In another embodiment, such a system further includes means for reducing NO2 to NO, coupled to the support means and to the means for measuring.
  • In yet another aspect, the invention relates to a method of manufacturing a nitrate measurement apparatus by providing a sample inlet for receiving a sample of gas, coupling a collection body to the sample inlet, disposing a filter within the body, coupling a heater to the body, coupling a gas inlet to the body, and coupling an NOx detector to the body.
  • In one embodiment, the method further comprises disposing an NO2 extractor between said sample inlet and said collection body.
  • In another embodiment, the invention further comprises disposing a catalyst capable of reducing NO2 to NO between said collection body and said NOx detector.
  • BRIEF DESCRIPTION OF THE FIGURES
  • The following figures depict certain illustrative embodiments of the invention in which like reference numerals refer to like elements. These depicted embodiments are to be understood as illustrative of the invention and not as limiting in any way.
  • FIG. 1 depicts a system for measuring nitrate levels as described herein.
  • FIG. 2 illustrates the accuracy of a method for measuring nitrate levels as described herein.
  • FIG. 3 shows the effect of atmospheric conditions on the method described herein.
  • FIG. 4 demonstrates a method of distinguishing between nitrate and NO2 in a sample of gas using the systems and methods described herein.
  • FIGS. 5A and B present nitrate measurement results obtained over a 72-hour period.
  • DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS
  • The description below pertains to several illustrative embodiments of the invention. Although many variations of the invention may be envisioned by one skilled in the art, such variations and improvements are intended to fall within the compass of this disclosure. Thus, the scope of the invention is not to be limited in any way by the disclosure below.
  • The systems and methods disclosed herein are useful for measuring nitrate levels, for example, in the atmosphere, and may be capable of performing sample collection and analysis within about ten minutes. Thus, variability of nitrate levels can be determined over relatively short intervals, e.g., for use in epidemiological studies, regulatory monitoring, or other research. Furthermore, the system can be assembled or manufactured using convenient, commercially available components.
  • An exemplary system 100 for measuring nitrate levels is depicted in FIG. 1. The system 100 includes a sample inlet 105, an extractor 110, a collection body 115, a filter 120, a heater 125, a cooling system 130, a catalyst 135, a detector 140, a gas inlet 145, and a gas source 150. Other components, such as a control system, a data acquisition and recording system, or a second independent heater may optionally be included. Variations on the depicted system which are capable of functioning as described herein will be apparent to those of ordinary skill in the art and are intended to be encompassed by this disclosure.
  • A sample of gas, such as a sample of air or exhaust, may be received by the system using sample inlet 105. The sample of gas may be forced into the system 100, for example, by passing an exhaust stream through the system 100. Alternatively, the sample of gas may be drawn into the system 100 by a vacuum, e.g., by providing a vacuum beyond the detector 140, or by utilizing the Bernoulli effect, e.g., by passing a stream of gas rapidly past the inlet 105, e.g., using the gas inlet 145. The sample inlet 105 may include a selection platform for removing particles larger than about 2.5 microns, such as an inertial impactor or a filter, as is well known in the art. The sample of gas may then pass into the extractor 110 to remove contaminant gases. The extractor 110 may be a denuder, such as the honeycomb denuder described in U.S. Pat. No. 5,302,191 or an annular denuder, another diffusion denuder, or any other system known in the art for removing gases from a sample of gas. For example, the extractor 110 may include an acidic material, such as citric acid or sulfiric acid, to trap basic compounds, such as ammonia. In one embodiment, the extractor 110 is selected to remove at least 50%, or at least 90%, or even at least 95% of the gaseous NO2 from the sample of gas, as gaseous NO2 may introduce error into the nitrate measurement. Such an extractor may include a hydroxyl-bearing solvent, such as ethylene glycol, propylene glycol, glycerol, benzyl alcohol, or another hydroxylic solvent, and a base, including an inorganic base, such as a metal carbonate, bicarbonate, hydroxide, or phosphate, e.g., sodium hydroxide or potassium carbonate, and/or an organic base, such as an amine, e.g., 1,8-bis(dimethylamino)-naphthalene, diazabicyclooctane, diazabicyclononane, triethanolamine, diethanolamine, N,N-dimethyl-2-hydroxymethylaniline, or another organic base. In certain embodiments, the hydroxyl-bearing solvent and the organic base are selected to have low vapor pressures at atmospheric pressure, e.g., less than 50 Torr, or less than 10 Torr. Other systems for removing NO2 or other selected contaminants are known in the art, and may be used alone or in any combination to remove any such compounds from the sample of gas.
  • The sample of gas may then pass into the collection body 115 and through filter 120. The filter 120 may then trap nitrate particles, in addition to other particles of similar size, e.g., about 2.5 microns or less, while allowing gaseous compounds to pass through. The collection body may be composed of any material capable of withstanding sufficient heat to perform the method as described herein, such as metal, ceramic, glass, quartz, or other heat-resistant material. For example, the collection body may be composed of steel, molybdenum, or an alloy comprising either material. The filter may be composed of any suitable material, e.g., quartz fibers, glass fibers, metal, or other material capable of withstanding temperatures sufficient to volatilize the trapped particles. A stream of gas substantially free of oxygen, e.g., including less than about 5% or less than about 1% oxygen, such as nitrogen gas, helium, or argon, may then be passed over the trapped particles. This procedure helps to reduce unwanted oxidation of ammonia or other low oxidation state nitrogen-containing compounds, such as ammonium sulfate, during heating. The gas may be introduced using gas inlet 145 from gas source 150.
  • The heater 125 may then heat the filter 120 or the collection body 115 to volatilize the trapped particles. The heater may perform this function by any means known in the art. For example, the heater 125 may generate heat itself, such as with a heating element, e.g., a nichrome wire or a heat lamp, used to heat the collection body or filter, or it may apply current to the filter 120 or the collection body 115 to heat that element by resistance, or it may heat the sample by any other means known in the art. In addition to heating the collection body 115 and/or the filter 120, the heater 125 or a second heater may heat all or a portion of the path between the collection body 115 and the catalyst 135. Upon volatilization, nitrate may be converted to species such as HNO3, NO2, and NO which are carried by the stream of gas to the catalyst 135.
  • In certain embodiments, for example, wherein an extractor 110 is not used to remove NO2 from the gas sample, a portion of the gaseous NO2 in the sample of gas may be adsorbed by material on the filter, such as soot or other particulate matter, rather than passing through the filter. Upon heating such NO2 may be desorbed at a temperature below that at which nitrate begins to substantially volatilize. In such embodiments, it may be advantageous to heat the collection body 115 and filter 120 gradually in order to release this unwanted NO2 prior to detection and measurement of the NOx species liberated by volatilization of nitrate. NOx, as used herein, refers generally to NO and NO2. By this method, more accurate nitrate determinations may be measured. Rapid heating, however, may permit more rapid cycling between collection and analysis phases. Similarly, cooling system 130 may cool the collection body 115 and/or filter 120 by any means, such as by passing an unheated fluid, e.g., air or water, over the exterior surface of the apparatus, to further enable more rapid cycling between collection and analysis phases. Thus, the speed of heating may be adjusted to balance cycling time with measurement accuracy, depending on the needs of a particular situation and the relative importance of accounting for NO2 in the sample of gas.
  • The catalyst 135 may be any material, such as a molybdenum or carbon converter, ferrous sulfate, or any other material capable of reducing NO2 to NO, as is known in the art. In embodiments where a detector 140 is used which is capable of simultaneously detecting NO2 and NO, a catalyst 135 need not be included in the system, and the stream of gas may flow directly from the collection body 115 and filter 120 to the detector 140.
  • The detector 140 may be any component capable of detecting the amount of NO, in the stream of gas. A number of methods are known for detecting NOx in flowing gas streams. Perhaps the most well known and widely used process involves instruments using the chemiluminescent reaction of nitric oxide (NO) and ozone. The process operates by the reaction of ozone and nitric oxide within a reaction chamber having a transmissive window, allowing light produced by the chemiluminescent reaction to be monitored by a detector. Typical components using this process may be found in U.S. Pat. Nos. 3,967,933 to Etess et al.; 4,236,895 to Stahl; 4,257,777 to Dymond; 4,315,753 to Bruckenstein et al.; 4,657,744 to Howard; 4,765,961 to Schiff; and 4,822,564 to Howard. The use of a chemiluminescent nitrogen oxide monitoring device in controlling a nitrogen oxide removal unit placed on the outlet of a boiler is shown in U.S. Pat. No. 4,188,190 to Muraki et al. Because these systems are typically not capable of detecting NO2 in the gas stream, a catalyst 135 may be employed in conjunction with such a detector.
  • Another procedure involves the use of an infrared beam, detector, and a comparator chamber. In U.S. Pat. No. 4,647,777 to Meyer, a beam of infrared light is passed through a gas sample and into a selective infrared detector. The beam is split and one portion passes through a chamber containing a fluid that absorbs the spectral wavelengths of the selected gas. The two beams are compared and the difference between the two beams gives an indication of the amount of a selected gas in the sample.
  • A semiconductor NO, sensor is described in U.S. Pat. No. 5,863,503. The resistance of this sensor is altered by the absorption of NO and NO2. Such a detector 140 may thus simultaneously measure NO and NO2 levels, and therefore may function accurately in the absence of a catalyst 135.
  • One of the above detectors, or any other detector capable of measuring NO or NO2 concentrations, may be employed as detector 140. In the case of a detector which is capable of detection NO2 but not NO, it may be advantageous to oxidize NO in the stream of gas to NO2, for example, using an ozone generator or other source of oxidant. The detector 140 may include or may be coupled to a processor, plotter, or other recording apparatus for displaying, recording, or storing data collected by the detector 140.
  • In certain embodiments, the filter 120 may be replaced by an inertial impactor, which is also known to be useful for collecting particulate matter from a stream of gas. In order to volatilize the collected sample, the inertial impactor may be heated directly, or indirectly, as described above for a filter embodiment. Otherwise, the system is analogous to the system described above. Thus, in one embodiment, an inertial impactor is used in a system as described above which uses an NO2 extractor, such as a diffusion denuder, as described above.
  • A system 100 as described above may be manufactured by coupling a sample inlet to a collection body, disposing a filter in said collection body, coupling said collection body to an NOx detector, and coupling a gas inlet to said body. In certain embodiments, the method may further include coupling an extractor, such as an NO2 extractor as described above, between said sample inlet and said filter. When the detector employed does not adequately detect NO2, a catalyst may be disposed between said detector and said collection body to reduce NO2 to NO. Alternatively, if the detector employed does not adequately detect NO, an oxidizer may be disposed between said detector and said collection body. The components included in such a system may be any of the components set forth above or components that function equivalently or analogously.
  • The following examples are provided solely to further illustrate the nature and advantages of one embodiment of the present invention and are not intended to limit the scope of the invention in any way.
  • Exemplification
  • A system as described above and depicted in FIG. 1 was tested to determine the accuracy and utility of the measurements recorded thereby.
  • FIG. 2 shows that as nitrate concentration in the gas sample increases, instrument response increases in turn. Furthermore, the very linear fit indicates that the instrument provides a linear response and should measure nitrate levels accurately over a broad range of concentrations.
  • FIG. 3 shows that the introduction of species, such as water (relative humidity (RH) saturated) or ammonia, into the sample of gas does not significantly affect the nitrate level readings of the instrument. In all cases, the peak area is relatively similar.
  • FIG. 4 illustrates how NO2 in the gas sample as collected and NO2 released from volatilization of nitrate particles can be distinguished using the present method, even in the absence of an extractor.
  • FIGS. 5A and 5B present data collected from atmospheric air samples over three-day periods. Considerable variation can be seen within a given 24-hour period, and these variations can be elucidated because of the relatively short collection-analysis cycles possible using the systems and methods disclosed above.
  • All articles, patents, and other references set forth above are hereby incorporated by reference. While the invention has been disclosed in connection with the embodiments shown and described in detail, various equivalents, modifications, and improvements will be apparent to one of ordinary skill in the art from the above description. Such equivalents, modifications, and improvements are intended to be encompassed by the following claims.

Claims (43)

1. A system for measuring nitrate levels, comprising
a sample inlet for receiving a sample of gas,
a collection body coupled to said sample inlet,
a filter mounted within said body to collect particles from said sample of gas,
a heater coupled to the body to heat the body,
a gas inlet coupled to said body to provide a flow of gas through said body, and
a detector coupled to said body to measure an NOx concentration.
2. The system of claim 1, further comprising
a source of gas coupled to said gas inlet.
3. The system of claim 2, wherein said gas is nitrogen.
4. The system of claim 2, wherein said gas is substantially free of oxygen.
5. The system of claim 1, further comprising
a catalyst, coupled to said body and to said detector, capable of reducing NO2 to NO.
6. The system of claim 5, wherein said catalyst comprises molybdenum.
7. The system of claim 1, wherein said detector includes a light sensor.
8. The system of claim 7, wherein said detector further includes an ozone generator.
9. The system of claim 1, wherein said detector includes an infrared sensor.
10. The system of claim 1, wherein said detector includes a material which reversibly binds NO.
11. The system of claim 1, wherein said filter comprises quartz fibers.
12. The system of claim 1, further comprising
an extractor coupled to said sample inlet and to said collection body to substantially remove NO2 from the gas sample.
13. The system of claim 12, wherein the extractor comprises a hydroxyl-bearing solvent and a base.
14. The system of claim 13, wherein the hydroxyl-bearing solvent is glycerol and the base is an organic base.
15. The system of claim 14, wherein the organic base is an amine.
16. The system of claim 12, further comprising
a selection platform, situated between said sample inlet and said extractor, to substantially remove particles larger than about 2.5 microns.
17. The system of claim 16, wherein said selection platform is a filter.
18. The system of claim 16, wherein said selection platform is an inertial impactor.
19. The system of claim 1, further comprising
a cooling system to cool the collection body.
20. A method for measuring a level of nitrate, comprising
receiving a gas sample,
collecting nitrate particles from the gas sample on a filter,
passing a stream of gas substantially free of oxygen over the collected particles,
volatilizing the collected particles by heating to generate NOx, and
measuring a level of NOx.
21. The method of claim 20, further comprising
substantially removing NO2 prior to collecting nitrate particles.
22. The method of claim 21, wherein substantially removing NO2 includes passing the received sample over a hydroxyl-bearing solvent and a base.
23. The method of claim 21, wherein substantially removing NO2 includes passing the received sample over a hydroxyl-bearing solvent and an organic base.
24. The method of claim 21, wherein substantially removing NO2 includes passing the received sample over a mixture comprising glycerol and triethanolamine.
25. The method of claim 20, further comprising
removing particles larger than about 2.5 microns from the received gas sample.
26. The method of claim 25, wherein substantially removing particles larger than about 2.5 microns includes passing the received sample through an inertial impactor.
27. The method of claim 25, wherein substantially removing particles larger than about 2.5 microns includes passing the received sample through a filter.
28. The method of claim 20, wherein passing a stream of gas includes passing a stream of nitrogen over the collected particles.
29. The method of claim 20, further comprising
reducing generated NO2 to NO using a metal catalyst.
30. The method of claim 29, wherein reducing generated NO2 includes contacting said NO2 with a molybdenum catalyst.
31. The method of claim 20, wherein measuring a level of NOx includes reacting NO with ozone.
32. The method of claim 20, wherein measuring a level of NOx includes detecting infrared absorption.
33. The method of claim 20, wherein measuring a level of NOx includes adsorbing NOx on a conductive material.
34. The method of claim 20, wherein collecting nitrate particles comprises collecting nitrate particles on a filter comprising quartz fibers.
35. The method of claim 20, wherein volatilizing the collected particles includes rapidly heating the collected particles to at least 300° C.
36. A system for measuring nitrate levels, comprising
a sample inlet to receive a sample of gas,
an extractor coupled to said sample inlet to substantially remove NO2 from the gas sample,
a collection body coupled to said sample inlet,
an inertial impactor mounted within said body to collect particles from the gas sample,
a current source coupled to the inertial impactor to heat the inertial impactor and generate NOx, and
a detector coupled to said catalyst to measure an NOx concentration.
37. A method for measuring a level of nitrate, comprising
receiving a gas sample,
substantially removing NO2 from the gas sample,
collecting nitrate particles from the gas sample with an inertial impactor,
passing a stream of gas substantially free of oxygen over the collected particles,
volatilizing the collected particles by heating to generate NOx, and
measuring a level of NO, generated by the heated particles.
38. A system for measuring nitrate levels, comprising
means for receiving a sample of gas,
support means coupled to said means for receiving,
means for collecting particles coupled to said support means,
means, coupled to said support means, for heating the support means to generate NOx,
means, coupled to said support means, for flowing a stream of gas through said support means, and
means for measuring an NOx concentration coupled to said support means.
39. The system of claim 38, further comprising
means for substantially removing NO2 from the sample of gas, coupled to said means for receiving and said support means.
40. The system of claim 38, further comprising
means for reducing NO2 to NO, coupled to said support means and to said means for measuring.
41. A method of manufacturing a nitrate measurement apparatus, comprising
providing a sample inlet for receiving a sample of gas,
coupling a collection body to said sample inlet,
disposing a filter within said body,
coupling a heater to the body,
coupling a gas inlet to said body, and
coupling an NOx detector to said body.
42. The method of claim 41, further comprising
disposing an NO2 extractor between said sample inlet and said collection body.
43. The method of claim 41, further comprising
disposing a catalyst capable of reducing NO2 to NO between said collection body and said NOx detector.
US10/895,240 1999-10-12 2004-07-20 Systems and methods for measuring nitrate levels Abandoned US20050059157A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/895,240 US20050059157A1 (en) 1999-10-12 2004-07-20 Systems and methods for measuring nitrate levels

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US15886199P 1999-10-12 1999-10-12
US09/687,190 US6503758B1 (en) 1999-10-12 2000-10-12 Systems and methods for measuring nitrate levels
US10/267,807 US6764857B2 (en) 1999-10-12 2002-10-09 Systems and methods for measuring nitrate levels
US10/895,240 US20050059157A1 (en) 1999-10-12 2004-07-20 Systems and methods for measuring nitrate levels

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/267,807 Continuation US6764857B2 (en) 1999-10-12 2002-10-09 Systems and methods for measuring nitrate levels

Publications (1)

Publication Number Publication Date
US20050059157A1 true US20050059157A1 (en) 2005-03-17

Family

ID=26855462

Family Applications (3)

Application Number Title Priority Date Filing Date
US09/687,190 Expired - Fee Related US6503758B1 (en) 1999-10-12 2000-10-12 Systems and methods for measuring nitrate levels
US10/267,807 Expired - Fee Related US6764857B2 (en) 1999-10-12 2002-10-09 Systems and methods for measuring nitrate levels
US10/895,240 Abandoned US20050059157A1 (en) 1999-10-12 2004-07-20 Systems and methods for measuring nitrate levels

Family Applications Before (2)

Application Number Title Priority Date Filing Date
US09/687,190 Expired - Fee Related US6503758B1 (en) 1999-10-12 2000-10-12 Systems and methods for measuring nitrate levels
US10/267,807 Expired - Fee Related US6764857B2 (en) 1999-10-12 2002-10-09 Systems and methods for measuring nitrate levels

Country Status (1)

Country Link
US (3) US6503758B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130186269A1 (en) * 2011-06-14 2013-07-25 Ut-Battelle, Llc Membrane based apparatus for measurement of volatile particles

Families Citing this family (270)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030138965A1 (en) * 1999-10-12 2003-07-24 Allen George A. Systems and methods for measuring nitrate levels
US6503758B1 (en) * 1999-10-12 2003-01-07 President & Fellows Of Harvard College Systems and methods for measuring nitrate levels
DE102004028701B3 (en) * 2004-06-14 2005-11-24 Siemens Ag Gas sensor for the determination of ammonia
US7141786B2 (en) * 2004-09-08 2006-11-28 General Electric Company Particle sampling preconcentrator
NL1028013C2 (en) * 2005-01-12 2006-07-17 Stichting Energie Method and assembly for determining soot particles in a gas stream.
US7721588B2 (en) * 2006-03-21 2010-05-25 Morpho Detection, Inc. Systems and methods for detecting particles
US8846407B2 (en) 2009-02-10 2014-09-30 James M. Hargrove Chemical explosive detector
US20110027899A1 (en) * 2009-02-10 2011-02-03 Hargrove James M Hazardous chemicals detector & methods of use thereof
US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
JP2012529056A (en) * 2009-06-05 2012-11-15 アリゾナ・ボード・オブ・リージェンツ・アクティング・フォー・アンド・オン・ビハーフ・オブ・アリゾナ・ステイト・ユニバーシティ Integrated photoelectrochemical sensor for nitric oxide in gaseous samples
US8802201B2 (en) * 2009-08-14 2014-08-12 Asm America, Inc. Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
GB2490509A (en) * 2011-05-04 2012-11-07 Malcolm Smith Particle collector apparatus
US9312155B2 (en) 2011-06-06 2016-04-12 Asm Japan K.K. High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
US10854498B2 (en) 2011-07-15 2020-12-01 Asm Ip Holding B.V. Wafer-supporting device and method for producing same
US20130023129A1 (en) 2011-07-20 2013-01-24 Asm America, Inc. Pressure transmitter for a semiconductor processing environment
US9017481B1 (en) 2011-10-28 2015-04-28 Asm America, Inc. Process feed management for semiconductor substrate processing
US10714315B2 (en) 2012-10-12 2020-07-14 Asm Ip Holdings B.V. Semiconductor reaction chamber showerhead
US20160376700A1 (en) 2013-02-01 2016-12-29 Asm Ip Holding B.V. System for treatment of deposition reactor
CN103267716B (en) * 2013-04-27 2015-05-27 北方工业大学 System for rapid discovery of initiation point of large-area PM 2.5 pollution and operation method thereof
US10683571B2 (en) 2014-02-25 2020-06-16 Asm Ip Holding B.V. Gas supply manifold and method of supplying gases to chamber using same
JP6313609B2 (en) * 2014-02-25 2018-04-18 国立大学法人京都大学 Nitrate particle measuring apparatus and measuring method thereof
US10167557B2 (en) 2014-03-18 2019-01-01 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en) 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
CN103954543B (en) * 2014-05-14 2017-11-24 中国石油大学(北京) A kind of PM2.5 monitors and its method
US10858737B2 (en) 2014-07-28 2020-12-08 Asm Ip Holding B.V. Showerhead assembly and components thereof
US9890456B2 (en) 2014-08-21 2018-02-13 Asm Ip Holding B.V. Method and system for in situ formation of gas-phase compounds
US10941490B2 (en) 2014-10-07 2021-03-09 Asm Ip Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US9657845B2 (en) 2014-10-07 2017-05-23 Asm Ip Holding B.V. Variable conductance gas distribution apparatus and method
CN104458352A (en) * 2014-12-22 2015-03-25 天津水泥工业设计研究院有限公司 Large-flow sampling device for industrial flue gas particulate matters
US10276355B2 (en) 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
US10458018B2 (en) 2015-06-26 2019-10-29 Asm Ip Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
US10600673B2 (en) 2015-07-07 2020-03-24 Asm Ip Holding B.V. Magnetic susceptor to baseplate seal
CN105184012B (en) * 2015-09-28 2017-12-22 宁波大学 A kind of regional air PM2.5 concentration prediction methods
US10211308B2 (en) 2015-10-21 2019-02-19 Asm Ip Holding B.V. NbMC layers
US11139308B2 (en) 2015-12-29 2021-10-05 Asm Ip Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
US10529554B2 (en) 2016-02-19 2020-01-07 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10865475B2 (en) 2016-04-21 2020-12-15 Asm Ip Holding B.V. Deposition of metal borides and silicides
US10190213B2 (en) 2016-04-21 2019-01-29 Asm Ip Holding B.V. Deposition of metal borides
US10032628B2 (en) 2016-05-02 2018-07-24 Asm Ip Holding B.V. Source/drain performance through conformal solid state doping
US10367080B2 (en) 2016-05-02 2019-07-30 Asm Ip Holding B.V. Method of forming a germanium oxynitride film
US11453943B2 (en) 2016-05-25 2022-09-27 Asm Ip Holding B.V. Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
US9859151B1 (en) 2016-07-08 2018-01-02 Asm Ip Holding B.V. Selective film deposition method to form air gaps
US10612137B2 (en) 2016-07-08 2020-04-07 Asm Ip Holdings B.V. Organic reactants for atomic layer deposition
US10714385B2 (en) 2016-07-19 2020-07-14 Asm Ip Holding B.V. Selective deposition of tungsten
US9887082B1 (en) 2016-07-28 2018-02-06 Asm Ip Holding B.V. Method and apparatus for filling a gap
KR102532607B1 (en) 2016-07-28 2023-05-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and method of operating the same
US9812320B1 (en) 2016-07-28 2017-11-07 Asm Ip Holding B.V. Method and apparatus for filling a gap
US10643826B2 (en) 2016-10-26 2020-05-05 Asm Ip Holdings B.V. Methods for thermally calibrating reaction chambers
US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
US10643904B2 (en) 2016-11-01 2020-05-05 Asm Ip Holdings B.V. Methods for forming a semiconductor device and related semiconductor device structures
US10229833B2 (en) 2016-11-01 2019-03-12 Asm Ip Holding B.V. Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10714350B2 (en) 2016-11-01 2020-07-14 ASM IP Holdings, B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10134757B2 (en) 2016-11-07 2018-11-20 Asm Ip Holding B.V. Method of processing a substrate and a device manufactured by using the method
KR102546317B1 (en) 2016-11-15 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Gas supply unit and substrate processing apparatus including the same
KR20180068582A (en) 2016-12-14 2018-06-22 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11581186B2 (en) 2016-12-15 2023-02-14 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
KR20180070971A (en) 2016-12-19 2018-06-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US10269558B2 (en) 2016-12-22 2019-04-23 Asm Ip Holding B.V. Method of forming a structure on a substrate
US10867788B2 (en) 2016-12-28 2020-12-15 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11390950B2 (en) 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process
US10655221B2 (en) 2017-02-09 2020-05-19 Asm Ip Holding B.V. Method for depositing oxide film by thermal ALD and PEALD
US10468261B2 (en) 2017-02-15 2019-11-05 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
USD876504S1 (en) 2017-04-03 2020-02-25 Asm Ip Holding B.V. Exhaust flow control ring for semiconductor deposition apparatus
KR102457289B1 (en) 2017-04-25 2022-10-21 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10770286B2 (en) 2017-05-08 2020-09-08 Asm Ip Holdings B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10892156B2 (en) 2017-05-08 2021-01-12 Asm Ip Holding B.V. Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US11306395B2 (en) 2017-06-28 2022-04-19 Asm Ip Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US10685834B2 (en) 2017-07-05 2020-06-16 Asm Ip Holdings B.V. Methods for forming a silicon germanium tin layer and related semiconductor device structures
KR20190009245A (en) 2017-07-18 2019-01-28 에이에스엠 아이피 홀딩 비.브이. Methods for forming a semiconductor device structure and related semiconductor device structures
US11374112B2 (en) 2017-07-19 2022-06-28 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11018002B2 (en) 2017-07-19 2021-05-25 Asm Ip Holding B.V. Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US10541333B2 (en) 2017-07-19 2020-01-21 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US10590535B2 (en) 2017-07-26 2020-03-17 Asm Ip Holdings B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10692741B2 (en) 2017-08-08 2020-06-23 Asm Ip Holdings B.V. Radiation shield
US10770336B2 (en) 2017-08-08 2020-09-08 Asm Ip Holding B.V. Substrate lift mechanism and reactor including same
US11769682B2 (en) 2017-08-09 2023-09-26 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11139191B2 (en) 2017-08-09 2021-10-05 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US10249524B2 (en) 2017-08-09 2019-04-02 Asm Ip Holding B.V. Cassette holder assembly for a substrate cassette and holding member for use in such assembly
USD900036S1 (en) 2017-08-24 2020-10-27 Asm Ip Holding B.V. Heater electrical connector and adapter
US11830730B2 (en) 2017-08-29 2023-11-28 Asm Ip Holding B.V. Layer forming method and apparatus
KR102491945B1 (en) 2017-08-30 2023-01-26 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11295980B2 (en) 2017-08-30 2022-04-05 Asm Ip Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US11056344B2 (en) 2017-08-30 2021-07-06 Asm Ip Holding B.V. Layer forming method
KR102630301B1 (en) 2017-09-21 2024-01-29 에이에스엠 아이피 홀딩 비.브이. Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
US10844484B2 (en) 2017-09-22 2020-11-24 Asm Ip Holding B.V. Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US10658205B2 (en) 2017-09-28 2020-05-19 Asm Ip Holdings B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10403504B2 (en) 2017-10-05 2019-09-03 Asm Ip Holding B.V. Method for selectively depositing a metallic film on a substrate
US10319588B2 (en) 2017-10-10 2019-06-11 Asm Ip Holding B.V. Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10923344B2 (en) 2017-10-30 2021-02-16 Asm Ip Holding B.V. Methods for forming a semiconductor structure and related semiconductor structures
US10910262B2 (en) 2017-11-16 2021-02-02 Asm Ip Holding B.V. Method of selectively depositing a capping layer structure on a semiconductor device structure
KR102443047B1 (en) 2017-11-16 2022-09-14 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
US11022879B2 (en) 2017-11-24 2021-06-01 Asm Ip Holding B.V. Method of forming an enhanced unexposed photoresist layer
TWI791689B (en) 2017-11-27 2023-02-11 荷蘭商Asm智慧財產控股私人有限公司 Apparatus including a clean mini environment
JP7214724B2 (en) 2017-11-27 2023-01-30 エーエスエム アイピー ホールディング ビー.ブイ. Storage device for storing wafer cassettes used in batch furnaces
CN107860618B (en) * 2017-12-26 2023-11-17 清华大学 Sampling device and detecting system
US10872771B2 (en) 2018-01-16 2020-12-22 Asm Ip Holding B. V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
TW202325889A (en) 2018-01-19 2023-07-01 荷蘭商Asm 智慧財產控股公司 Deposition method
CN111630203A (en) 2018-01-19 2020-09-04 Asm Ip私人控股有限公司 Method for depositing gap filling layer by plasma auxiliary deposition
USD903477S1 (en) 2018-01-24 2020-12-01 Asm Ip Holdings B.V. Metal clamp
US11018047B2 (en) 2018-01-25 2021-05-25 Asm Ip Holding B.V. Hybrid lift pin
USD880437S1 (en) 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US11081345B2 (en) 2018-02-06 2021-08-03 Asm Ip Holding B.V. Method of post-deposition treatment for silicon oxide film
US10896820B2 (en) 2018-02-14 2021-01-19 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
JP7124098B2 (en) 2018-02-14 2022-08-23 エーエスエム・アイピー・ホールディング・ベー・フェー Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10731249B2 (en) 2018-02-15 2020-08-04 Asm Ip Holding B.V. Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
US10658181B2 (en) 2018-02-20 2020-05-19 Asm Ip Holding B.V. Method of spacer-defined direct patterning in semiconductor fabrication
KR102636427B1 (en) 2018-02-20 2024-02-13 에이에스엠 아이피 홀딩 비.브이. Substrate processing method and apparatus
US10975470B2 (en) 2018-02-23 2021-04-13 Asm Ip Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11473195B2 (en) 2018-03-01 2022-10-18 Asm Ip Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
US11629406B2 (en) 2018-03-09 2023-04-18 Asm Ip Holding B.V. Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11114283B2 (en) 2018-03-16 2021-09-07 Asm Ip Holding B.V. Reactor, system including the reactor, and methods of manufacturing and using same
KR102646467B1 (en) 2018-03-27 2024-03-11 에이에스엠 아이피 홀딩 비.브이. Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US11088002B2 (en) 2018-03-29 2021-08-10 Asm Ip Holding B.V. Substrate rack and a substrate processing system and method
US11230766B2 (en) 2018-03-29 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102501472B1 (en) 2018-03-30 2023-02-20 에이에스엠 아이피 홀딩 비.브이. Substrate processing method
KR20190128558A (en) 2018-05-08 2019-11-18 에이에스엠 아이피 홀딩 비.브이. Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
TW202349473A (en) 2018-05-11 2023-12-16 荷蘭商Asm Ip私人控股有限公司 Methods for forming a doped metal carbide film on a substrate and related semiconductor device structures
KR102596988B1 (en) 2018-05-28 2023-10-31 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
US11718913B2 (en) 2018-06-04 2023-08-08 Asm Ip Holding B.V. Gas distribution system and reactor system including same
US11270899B2 (en) 2018-06-04 2022-03-08 Asm Ip Holding B.V. Wafer handling chamber with moisture reduction
US11286562B2 (en) 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
KR102568797B1 (en) 2018-06-21 2023-08-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing system
US10797133B2 (en) 2018-06-21 2020-10-06 Asm Ip Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
CN112292478A (en) 2018-06-27 2021-01-29 Asm Ip私人控股有限公司 Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials
WO2020003000A1 (en) 2018-06-27 2020-01-02 Asm Ip Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
KR20200002519A (en) 2018-06-29 2020-01-08 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10612136B2 (en) 2018-06-29 2020-04-07 ASM IP Holding, B.V. Temperature-controlled flange and reactor system including same
US10755922B2 (en) 2018-07-03 2020-08-25 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10388513B1 (en) 2018-07-03 2019-08-20 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10767789B2 (en) 2018-07-16 2020-09-08 Asm Ip Holding B.V. Diaphragm valves, valve components, and methods for forming valve components
US11053591B2 (en) 2018-08-06 2021-07-06 Asm Ip Holding B.V. Multi-port gas injection system and reactor system including same
US10883175B2 (en) 2018-08-09 2021-01-05 Asm Ip Holding B.V. Vertical furnace for processing substrates and a liner for use therein
US10829852B2 (en) 2018-08-16 2020-11-10 Asm Ip Holding B.V. Gas distribution device for a wafer processing apparatus
US11430674B2 (en) 2018-08-22 2022-08-30 Asm Ip Holding B.V. Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
KR20200030162A (en) 2018-09-11 2020-03-20 에이에스엠 아이피 홀딩 비.브이. Method for deposition of a thin film
US11024523B2 (en) 2018-09-11 2021-06-01 Asm Ip Holding B.V. Substrate processing apparatus and method
US11049751B2 (en) 2018-09-14 2021-06-29 Asm Ip Holding B.V. Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
CN110970344A (en) 2018-10-01 2020-04-07 Asm Ip控股有限公司 Substrate holding apparatus, system including the same, and method of using the same
US11232963B2 (en) 2018-10-03 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102592699B1 (en) 2018-10-08 2023-10-23 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and apparatuses for depositing thin film and processing the substrate including the same
US10847365B2 (en) 2018-10-11 2020-11-24 Asm Ip Holding B.V. Method of forming conformal silicon carbide film by cyclic CVD
US10811256B2 (en) 2018-10-16 2020-10-20 Asm Ip Holding B.V. Method for etching a carbon-containing feature
KR102605121B1 (en) 2018-10-19 2023-11-23 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
KR102546322B1 (en) 2018-10-19 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
USD948463S1 (en) 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US11087997B2 (en) 2018-10-31 2021-08-10 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
KR20200051105A (en) 2018-11-02 2020-05-13 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and substrate processing apparatus including the same
US11572620B2 (en) 2018-11-06 2023-02-07 Asm Ip Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
US11031242B2 (en) 2018-11-07 2021-06-08 Asm Ip Holding B.V. Methods for depositing a boron doped silicon germanium film
US10847366B2 (en) 2018-11-16 2020-11-24 Asm Ip Holding B.V. Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US10818758B2 (en) 2018-11-16 2020-10-27 Asm Ip Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10559458B1 (en) 2018-11-26 2020-02-11 Asm Ip Holding B.V. Method of forming oxynitride film
US11217444B2 (en) 2018-11-30 2022-01-04 Asm Ip Holding B.V. Method for forming an ultraviolet radiation responsive metal oxide-containing film
KR102636428B1 (en) 2018-12-04 2024-02-13 에이에스엠 아이피 홀딩 비.브이. A method for cleaning a substrate processing apparatus
US11158513B2 (en) 2018-12-13 2021-10-26 Asm Ip Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
JP2020096183A (en) 2018-12-14 2020-06-18 エーエスエム・アイピー・ホールディング・ベー・フェー Method of forming device structure using selective deposition of gallium nitride, and system for the same
TWI819180B (en) 2019-01-17 2023-10-21 荷蘭商Asm 智慧財產控股公司 Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
KR20200091543A (en) 2019-01-22 2020-07-31 에이에스엠 아이피 홀딩 비.브이. Semiconductor processing device
CN111524788B (en) 2019-02-01 2023-11-24 Asm Ip私人控股有限公司 Method for topologically selective film formation of silicon oxide
KR20200102357A (en) 2019-02-20 2020-08-31 에이에스엠 아이피 홀딩 비.브이. Apparatus and methods for plug fill deposition in 3-d nand applications
TW202044325A (en) 2019-02-20 2020-12-01 荷蘭商Asm Ip私人控股有限公司 Method of filling a recess formed within a surface of a substrate, semiconductor structure formed according to the method, and semiconductor processing apparatus
TW202104632A (en) 2019-02-20 2021-02-01 荷蘭商Asm Ip私人控股有限公司 Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
KR102626263B1 (en) 2019-02-20 2024-01-16 에이에스엠 아이피 홀딩 비.브이. Cyclical deposition method including treatment step and apparatus for same
TW202100794A (en) 2019-02-22 2021-01-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing apparatus and method for processing substrate
US11742198B2 (en) 2019-03-08 2023-08-29 Asm Ip Holding B.V. Structure including SiOCN layer and method of forming same
KR20200108243A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Structure Including SiOC Layer and Method of Forming Same
KR20200108242A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Method for Selective Deposition of Silicon Nitride Layer and Structure Including Selectively-Deposited Silicon Nitride Layer
KR20200116033A (en) 2019-03-28 2020-10-08 에이에스엠 아이피 홀딩 비.브이. Door opener and substrate processing apparatus provided therewith
KR20200116855A (en) 2019-04-01 2020-10-13 에이에스엠 아이피 홀딩 비.브이. Method of manufacturing semiconductor device
KR20200123380A (en) 2019-04-19 2020-10-29 에이에스엠 아이피 홀딩 비.브이. Layer forming method and apparatus
KR20200125453A (en) 2019-04-24 2020-11-04 에이에스엠 아이피 홀딩 비.브이. Gas-phase reactor system and method of using same
KR20200130118A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Method for Reforming Amorphous Carbon Polymer Film
KR20200130121A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Chemical source vessel with dip tube
KR20200130652A (en) 2019-05-10 2020-11-19 에이에스엠 아이피 홀딩 비.브이. Method of depositing material onto a surface and structure formed according to the method
JP2020188255A (en) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー.ブイ. Wafer boat handling device, vertical batch furnace, and method
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD947913S1 (en) 2019-05-17 2022-04-05 Asm Ip Holding B.V. Susceptor shaft
USD935572S1 (en) 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
USD922229S1 (en) 2019-06-05 2021-06-15 Asm Ip Holding B.V. Device for controlling a temperature of a gas supply unit
KR20200141003A (en) 2019-06-06 2020-12-17 에이에스엠 아이피 홀딩 비.브이. Gas-phase reactor system including a gas detector
KR20200143254A (en) 2019-06-11 2020-12-23 에이에스엠 아이피 홀딩 비.브이. Method of forming an electronic structure using an reforming gas, system for performing the method, and structure formed using the method
USD944946S1 (en) 2019-06-14 2022-03-01 Asm Ip Holding B.V. Shower plate
USD931978S1 (en) 2019-06-27 2021-09-28 Asm Ip Holding B.V. Showerhead vacuum transport
KR20210005515A (en) 2019-07-03 2021-01-14 에이에스엠 아이피 홀딩 비.브이. Temperature control assembly for substrate processing apparatus and method of using same
JP2021015791A (en) 2019-07-09 2021-02-12 エーエスエム アイピー ホールディング ビー.ブイ. Plasma device and substrate processing method using coaxial waveguide
CN112216646A (en) 2019-07-10 2021-01-12 Asm Ip私人控股有限公司 Substrate supporting assembly and substrate processing device comprising same
KR20210010307A (en) 2019-07-16 2021-01-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210010816A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Radical assist ignition plasma system and method
KR20210010820A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Methods of forming silicon germanium structures
US11643724B2 (en) 2019-07-18 2023-05-09 Asm Ip Holding B.V. Method of forming structures using a neutral beam
CN112242296A (en) 2019-07-19 2021-01-19 Asm Ip私人控股有限公司 Method of forming topologically controlled amorphous carbon polymer films
TW202113936A (en) 2019-07-29 2021-04-01 荷蘭商Asm Ip私人控股有限公司 Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
CN112309899A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112309900A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
US11227782B2 (en) 2019-07-31 2022-01-18 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587815B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587814B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
CN112323048B (en) 2019-08-05 2024-02-09 Asm Ip私人控股有限公司 Liquid level sensor for chemical source container
USD965044S1 (en) 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD965524S1 (en) 2019-08-19 2022-10-04 Asm Ip Holding B.V. Susceptor support
JP2021031769A (en) 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー.ブイ. Production apparatus of mixed gas of film deposition raw material and film deposition apparatus
USD940837S1 (en) 2019-08-22 2022-01-11 Asm Ip Holding B.V. Electrode
KR20210024423A (en) 2019-08-22 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for forming a structure with a hole
USD979506S1 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
USD930782S1 (en) 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
USD949319S1 (en) 2019-08-22 2022-04-19 Asm Ip Holding B.V. Exhaust duct
US11286558B2 (en) 2019-08-23 2022-03-29 Asm Ip Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
KR20210024420A (en) 2019-08-23 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
KR20210029090A (en) 2019-09-04 2021-03-15 에이에스엠 아이피 홀딩 비.브이. Methods for selective deposition using a sacrificial capping layer
KR20210029663A (en) 2019-09-05 2021-03-16 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11562901B2 (en) 2019-09-25 2023-01-24 Asm Ip Holding B.V. Substrate processing method
CN112593212B (en) 2019-10-02 2023-12-22 Asm Ip私人控股有限公司 Method for forming topologically selective silicon oxide film by cyclic plasma enhanced deposition process
TW202129060A (en) 2019-10-08 2021-08-01 荷蘭商Asm Ip控股公司 Substrate processing device, and substrate processing method
KR20210043460A (en) 2019-10-10 2021-04-21 에이에스엠 아이피 홀딩 비.브이. Method of forming a photoresist underlayer and structure including same
KR20210045930A (en) 2019-10-16 2021-04-27 에이에스엠 아이피 홀딩 비.브이. Method of Topology-Selective Film Formation of Silicon Oxide
US11637014B2 (en) 2019-10-17 2023-04-25 Asm Ip Holding B.V. Methods for selective deposition of doped semiconductor material
KR20210047808A (en) 2019-10-21 2021-04-30 에이에스엠 아이피 홀딩 비.브이. Apparatus and methods for selectively etching films
US11646205B2 (en) 2019-10-29 2023-05-09 Asm Ip Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
KR20210054983A (en) 2019-11-05 2021-05-14 에이에스엠 아이피 홀딩 비.브이. Structures with doped semiconductor layers and methods and systems for forming same
US11501968B2 (en) 2019-11-15 2022-11-15 Asm Ip Holding B.V. Method for providing a semiconductor device with silicon filled gaps
KR20210062561A (en) 2019-11-20 2021-05-31 에이에스엠 아이피 홀딩 비.브이. Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
US11450529B2 (en) 2019-11-26 2022-09-20 Asm Ip Holding B.V. Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
CN112951697A (en) 2019-11-26 2021-06-11 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112885692A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112885693A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
JP2021090042A (en) 2019-12-02 2021-06-10 エーエスエム アイピー ホールディング ビー.ブイ. Substrate processing apparatus and substrate processing method
KR20210070898A (en) 2019-12-04 2021-06-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11885013B2 (en) 2019-12-17 2024-01-30 Asm Ip Holding B.V. Method of forming vanadium nitride layer and structure including the vanadium nitride layer
KR20210080214A (en) 2019-12-19 2021-06-30 에이에스엠 아이피 홀딩 비.브이. Methods for filling a gap feature on a substrate and related semiconductor structures
KR20210095050A (en) 2020-01-20 2021-07-30 에이에스엠 아이피 홀딩 비.브이. Method of forming thin film and method of modifying surface of thin film
TW202130846A (en) 2020-02-03 2021-08-16 荷蘭商Asm Ip私人控股有限公司 Method of forming structures including a vanadium or indium layer
TW202146882A (en) 2020-02-04 2021-12-16 荷蘭商Asm Ip私人控股有限公司 Method of verifying an article, apparatus for verifying an article, and system for verifying a reaction chamber
US11776846B2 (en) 2020-02-07 2023-10-03 Asm Ip Holding B.V. Methods for depositing gap filling fluids and related systems and devices
TW202146715A (en) 2020-02-17 2021-12-16 荷蘭商Asm Ip私人控股有限公司 Method for growing phosphorous-doped silicon layer and system of the same
KR20210116240A (en) 2020-03-11 2021-09-27 에이에스엠 아이피 홀딩 비.브이. Substrate handling device with adjustable joints
KR20210116249A (en) 2020-03-11 2021-09-27 에이에스엠 아이피 홀딩 비.브이. lockout tagout assembly and system and method of using same
KR20210117157A (en) 2020-03-12 2021-09-28 에이에스엠 아이피 홀딩 비.브이. Method for Fabricating Layer Structure Having Target Topological Profile
KR20210124042A (en) 2020-04-02 2021-10-14 에이에스엠 아이피 홀딩 비.브이. Thin film forming method
TW202146689A (en) 2020-04-03 2021-12-16 荷蘭商Asm Ip控股公司 Method for forming barrier layer and method for manufacturing semiconductor device
TW202145344A (en) 2020-04-08 2021-12-01 荷蘭商Asm Ip私人控股有限公司 Apparatus and methods for selectively etching silcon oxide films
US11821078B2 (en) 2020-04-15 2023-11-21 Asm Ip Holding B.V. Method for forming precoat film and method for forming silicon-containing film
KR20210132605A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Vertical batch furnace assembly comprising a cooling gas supply
CN113555279A (en) 2020-04-24 2021-10-26 Asm Ip私人控股有限公司 Method of forming vanadium nitride-containing layers and structures including the same
KR20210132600A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
KR20210134226A (en) 2020-04-29 2021-11-09 에이에스엠 아이피 홀딩 비.브이. Solid source precursor vessel
KR20210134869A (en) 2020-05-01 2021-11-11 에이에스엠 아이피 홀딩 비.브이. Fast FOUP swapping with a FOUP handler
KR20210141379A (en) 2020-05-13 2021-11-23 에이에스엠 아이피 홀딩 비.브이. Laser alignment fixture for a reactor system
KR20210143653A (en) 2020-05-19 2021-11-29 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210145078A (en) 2020-05-21 2021-12-01 에이에스엠 아이피 홀딩 비.브이. Structures including multiple carbon layers and methods of forming and using same
TW202201602A (en) 2020-05-29 2022-01-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing device
TW202218133A (en) 2020-06-24 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Method for forming a layer provided with silicon
TW202217953A (en) 2020-06-30 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing method
KR20220010438A (en) 2020-07-17 2022-01-25 에이에스엠 아이피 홀딩 비.브이. Structures and methods for use in photolithography
TW202204662A (en) 2020-07-20 2022-02-01 荷蘭商Asm Ip私人控股有限公司 Method and system for depositing molybdenum layers
TW202212623A (en) 2020-08-26 2022-04-01 荷蘭商Asm Ip私人控股有限公司 Method of forming metal silicon oxide layer and metal silicon oxynitride layer, semiconductor structure, and system
USD990534S1 (en) 2020-09-11 2023-06-27 Asm Ip Holding B.V. Weighted lift pin
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
TW202229613A (en) 2020-10-14 2022-08-01 荷蘭商Asm Ip私人控股有限公司 Method of depositing material on stepped structure
TW202217037A (en) 2020-10-22 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Method of depositing vanadium metal, structure, device and a deposition assembly
TW202223136A (en) 2020-10-28 2022-06-16 荷蘭商Asm Ip私人控股有限公司 Method for forming layer on substrate, and semiconductor processing system
KR20220076343A (en) 2020-11-30 2022-06-08 에이에스엠 아이피 홀딩 비.브이. an injector configured for arrangement within a reaction chamber of a substrate processing apparatus
US11946137B2 (en) 2020-12-16 2024-04-02 Asm Ip Holding B.V. Runout and wobble measurement fixtures
TW202231903A (en) 2020-12-22 2022-08-16 荷蘭商Asm Ip私人控股有限公司 Transition metal deposition method, transition metal layer, and deposition assembly for depositing transition metal on substrate
USD980814S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD1023959S1 (en) 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD981973S1 (en) 2021-05-11 2023-03-28 Asm Ip Holding B.V. Reactor wall for substrate processing apparatus
USD990441S1 (en) 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4236895A (en) * 1979-06-11 1980-12-02 Meloy Laboratories, Inc. Analytical apparatus and method employing purified ozone
US4647777A (en) * 1985-05-31 1987-03-03 Ametrek, Inc. Selective gas detector
US5401468A (en) * 1990-11-13 1995-03-28 Rupprecht & Patashnick Company Dual flow path carbon particulate monitor
US5854077A (en) * 1996-06-04 1998-12-29 President And Fellows Of Harvard College Continuous measurement of particulate nitrate
US5970804A (en) * 1996-04-26 1999-10-26 Trustees Of Tufts College Methods and apparatus for analysis of complex mixtures
US5983732A (en) * 1997-03-21 1999-11-16 Aerosol Dynamics Inc. Integrated collection and vaporization particle chemistry monitoring
US6503758B1 (en) * 1999-10-12 2003-01-07 President & Fellows Of Harvard College Systems and methods for measuring nitrate levels

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4236895A (en) * 1979-06-11 1980-12-02 Meloy Laboratories, Inc. Analytical apparatus and method employing purified ozone
US4647777A (en) * 1985-05-31 1987-03-03 Ametrek, Inc. Selective gas detector
US5401468A (en) * 1990-11-13 1995-03-28 Rupprecht & Patashnick Company Dual flow path carbon particulate monitor
US5970804A (en) * 1996-04-26 1999-10-26 Trustees Of Tufts College Methods and apparatus for analysis of complex mixtures
US5854077A (en) * 1996-06-04 1998-12-29 President And Fellows Of Harvard College Continuous measurement of particulate nitrate
US5983732A (en) * 1997-03-21 1999-11-16 Aerosol Dynamics Inc. Integrated collection and vaporization particle chemistry monitoring
US6503758B1 (en) * 1999-10-12 2003-01-07 President & Fellows Of Harvard College Systems and methods for measuring nitrate levels
US6764857B2 (en) * 1999-10-12 2004-07-20 President And Fellows Of Harvard College Systems and methods for measuring nitrate levels

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130186269A1 (en) * 2011-06-14 2013-07-25 Ut-Battelle, Llc Membrane based apparatus for measurement of volatile particles
US8771402B2 (en) * 2011-06-14 2014-07-08 Ut-Battelle, Llc Membrane based apparatus for measurement of volatile particles

Also Published As

Publication number Publication date
US6503758B1 (en) 2003-01-07
US6764857B2 (en) 2004-07-20
US20030040120A1 (en) 2003-02-27

Similar Documents

Publication Publication Date Title
US6503758B1 (en) Systems and methods for measuring nitrate levels
Munthe et al. Intercomparison of methods for sampling and analysis of atmospheric mercury species
EP3514533B1 (en) Apparatus for monitoring mercury gas in a sample
US7454952B2 (en) Method and apparatus for monitoring mercury in a gas sample
US5983732A (en) Integrated collection and vaporization particle chemistry monitoring
Sipin et al. Recent advances and some remaining challenges in analytical chemistry of the atmosphere
Scaringelli et al. Determination of atmospheric concentrations of sulfuric acid aerosol by spectrophotometry, coulometry, and flame photometry
US6852543B2 (en) Method and apparatus for measurement of sulfate
US20030138965A1 (en) Systems and methods for measuring nitrate levels
Licki et al. Monitoring and control systems for an EB flue gas treatment pilot plant—Part I. Analytical system and methods
Allegrini et al. Measurement of atmospheric pollutants relevant to dry acid deposition
Brown et al. Characterising and reducing the blank response from mercury vapour sorbent tubes
Harrison Secondary pollutants
Jimmy et al. Direct determination of mercury in atmospheric particulate matter by graphite plate filtration–electrothermal atomic absorption spectrometry with Zeeman background correction
Sibbett et al. Mercury in Air
Brończyk et al. Two approaches (GC-ECD and electrochemical sensors signals processing) to the determination of carbonyl compounds as markers of air pollution
Herrick et al. Measurement of Vapors and Gases
Helas Techniques for the Measurement of Tropospheric Nitrogen Compounds: NH3, N20, N0, HN02, N02, HN03, N03, and PAN
Münchmeyer et al. Online measurement of polycyclic aromatic hydrocarbons by fast GC/MS
Mitra et al. Application and field validation of a continuous nonmethane organic carbon analyzer
JPS5970964A (en) Analysis of carbon and carbon compound
Bahlmann et al. Air/surface exchange processes of mercury and their linkage to atmospheric pools
Kellner et al. Portable Continuous Aerosol Concentrator for the Determination of NO in the Air
SIBBETT et al. 8.30 Mercury in Ambient Air
Keenan Instrumentation in Industrial Hygiene

Legal Events

Date Code Title Description
STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION